公开(公告)号：US20140127858A1

公开(公告)日：2014-05-08

申请号：US14154049

申请日：2014-01-13

Applicant: STATS ChipPAC, Ltd.

Inventor： Il Kwon Shim ,  Seng Guan Chow ,  Heap Hoe Kuan

IPC: H01L21/56

CPC classification number: H01L21/561 ,  H01L21/568 ,  H01L23/3114 ,  H01L23/3128 ,  H01L23/5389 ,  H01L24/19 ,  H01L24/48 ,  H01L24/97 ,  H01L25/105 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/16 ,  H01L2224/16225 ,  H01L2224/16237 ,  H01L2224/32145 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/97 ,  H01L2225/1035 ,  H01L2225/1058 ,  H01L2924/00014 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/01047 ,  H01L2924/01073 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15174 ,  H01L2924/15311 ,  H01L2924/15331 ,  H01L2924/181 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/19043 ,  H01L2924/30105 ,  H01L2224/82 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: An embedded semiconductor die package is made by mounting a frame carrier to a temporary carrier with an adhesive. The frame carrier includes die mounting sites each including a leadframe interconnect structure around a cavity. A semiconductor die is disposed in each cavity. An encapsulant is deposited in the cavity over the die. A package interconnect structure is formed over the leadframe interconnect structure and encapsulant. The package interconnect structure and leadframe interconnect structure are electrically connected to the die. The frame carrier is singulated into individual embedded die packages. The semiconductor die can be vertically stacked or placed side-by-side within the cavity. The embedded die packages can be stacked and electrically interconnected through the leadframe interconnect structure. A semiconductor device can be mounted to the embedded die package and electrically connected to the die through the leadframe interconnect structure.

Abstract translation: 嵌入式半导体管芯封装通过使用粘合剂将框架载体安装到临时载体上而制成。 框架载体包括每个包括围绕腔的引线框架互连结构的管芯安装位置。 半导体管芯设置在每个腔中。 将密封剂沉积在模具上的空腔中。 封装互连结构形成在引线框架互连结构和密封剂上。 封装互连结构和引线框互连结构电连接到管芯。 帧载体被分成单独的嵌入式芯片封装。 半导体管芯可以垂直堆叠或并排放置在腔内。 嵌入式管芯封装可以通过引线框互连结构堆叠并电互连。 半导体器件可以安装到嵌入式裸片封装并且通过引线框互连结构电连接到裸片。

公开(公告)号：US08703548B2

公开(公告)日：2014-04-22

申请号：US13765478

申请日：2013-02-12

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin ,  Robert C. Frye

IPC: H01L21/339

CPC classification number: H01L28/40 ,  H01L23/5223 ,  H01L24/05 ,  H01L24/13 ,  H01L2224/0401 ,  H01L2924/01079 ,  H01L2924/14 ,  H01L2924/19011 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/19043 ,  H01L2924/30105

Abstract: A method of manufacturing a semiconductor device includes providing a substrate having a first conductive layer disposed on a top surface of the substrate. A high resistivity layer is formed over the substrate and the first conductive layer. A dielectric layer is deposited over the substrate, first conductive layer and high resistivity layer. A portion of the dielectric layer, high resistivity layer, and first conductive layer forms a capacitor stack. A first passivation layer is formed over the dielectric layer. A second conductive layer is formed over the capacitor stack and a portion of the first passivation layer. A first opening is etched in the dielectric layer to expose a surface of the high resistivity layer. A third and fourth conductive layer is deposited over the first opening in the dielectric layer and a portion of the first passivation layer.

Abstract translation: 一种制造半导体器件的方法包括提供具有设置在基板的顶表面上的第一导电层的基板。 在基板和第一导电层上形成高电阻率层。 介电层沉积在衬底，第一导电层和高电阻率层上。 介电层，高电阻率层和第一导电层的一部分形成电容器叠层。 在电介质层上形成第一钝化层。 在电容器堆叠和第一钝化层的一部分上形成第二导电层。 在电介质层中蚀刻第一开口以暴露高电阻率层的表面。 在电介质层中的第一开口和第一钝化层的一部分上沉积第三和第四导电层。

公开(公告)号：US20140103509A1

公开(公告)日：2014-04-17

申请号：US13653242

申请日：2012-10-16

Applicant: STATS CHIPPAC, LTD.

Inventor： Insang Yoon ,  Flynn Carson ,  Il Kwon Shim ,  SeongHun Mun

IPC: H01L23/495 ,  H01L21/98 ,  H01L21/60

CPC classification number: H01L23/49816 ,  H01L21/568 ,  H01L23/49822 ,  H01L23/49838 ,  H01L23/49894 ,  H01L23/5389 ,  H01L24/19 ,  H01L24/20 ,  H01L24/73 ,  H01L25/105 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/73265 ,  H01L2224/94 ,  H01L2224/96 ,  H01L2225/0651 ,  H01L2225/06565 ,  H01L2225/1023 ,  H01L2225/1035 ,  H01L2225/1041 ,  H01L2225/1058 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/15331 ,  H01L2924/181 ,  H01L2924/3511 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2224/11 ,  H01L2224/73204 ,  H01L2224/16225 ,  H01L2924/00012 ,  H01L2224/19

Abstract: A semiconductor device has a semiconductor die with an encapsulant deposited over and around the semiconductor die. An opening is formed in a first surface of the encapsulant by etching or LDA. A plurality of bumps is optionally formed over the semiconductor die. A bump is recessed within the opening of the encapsulant. A conductive ink is formed over the first surface of the encapsulant, bump and sidewall of the opening. The conductive ink can be applied by a printing process. An interconnect structure is formed over a second surface of the encapsulant opposite the first surface of the encapsulant. The interconnect structure is electrically connected to the semiconductor die. A semiconductor package is disposed over the first surface of the encapsulant with a plurality of bumps electrically connected to the conductive ink layer. The semiconductor package may contain a memory device.

Abstract translation: 半导体器件具有沉积在半导体管芯上方和周围的具有密封剂的半导体管芯。 通过蚀刻或LDA在密封剂的第一表面中形成开口。 可选地，在半导体管芯上形成多个凸块。 凹凸凹陷在密封剂的开口内。 导电油墨形成在开口的密封剂，凸起和侧壁的第一表面上。 导电油墨可以通过印刷方法施加。 在密封剂的与密封剂的第一表面相对的第二表面上形成互连结构。 互连结构电连接到半导体管芯。 半导体封装设置在密封剂的第一表面上，多个凸块电连接到导电油墨层。 半导体封装可以包含存储器件。

公开(公告)号：US20140048932A1

公开(公告)日：2014-02-20

申请号：US14063274

申请日：2013-10-25

Applicant: STATS ChipPAC, Ltd.

Inventor： Reza A. Pagaila

IPC: H01L21/56 ,  H01L23/498

CPC classification number: H01L25/0657 ,  H01L21/56 ,  H01L21/561 ,  H01L21/568 ,  H01L21/6835 ,  H01L23/3107 ,  H01L23/3128 ,  H01L23/49811 ,  H01L23/49816 ,  H01L23/49827 ,  H01L23/5389 ,  H01L23/552 ,  H01L24/11 ,  H01L24/16 ,  H01L24/19 ,  H01L24/24 ,  H01L24/25 ,  H01L24/81 ,  H01L24/82 ,  H01L24/96 ,  H01L24/97 ,  H01L25/50 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/16145 ,  H01L2224/16227 ,  H01L2224/18 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06527 ,  H01L2225/06537 ,  H01L2225/06548 ,  H01L2924/00011 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01076 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2924/18162 ,  H01L2924/19041 ,  H01L2924/30105 ,  H01L2924/3025 ,  H01L2224/82 ,  H01L2924/00 ,  H01L2224/81 ,  H01L2924/00012 ,  H01L2224/81805

Abstract: A semiconductor device has a first interconnect structure. A first semiconductor die has an active surface oriented towards and mounted to a first surface of the first interconnect structure. A first encapsulant is deposited over the first interconnect structure and first semiconductor die. A second semiconductor die has an active surface oriented towards and mounted to a second surface of the first interconnect structure opposite the first surface. A plurality of first conductive pillars is formed over the second surface of the first interconnect structure and around the second semiconductor die. A second encapsulant is deposited over the second semiconductor die and around the plurality of first conductive pillars. A second interconnect structure including a conductive layer and bumps are formed over the second encapsulant and electrically connect to the plurality of first conductive pillars and the first and second semiconductor die.

Abstract translation: 半导体器件具有第一互连结构。 第一半导体管芯具有朝向并安装到第一互连结构的第一表面的有源表面。 第一密封剂沉积在第一互连结构和第一半导体管芯上。 第二半导体管芯具有朝向并安装到与第一表面相对的第一互连结构的第二表面的有源表面。 多个第一导电柱形成在第一互连结构的第二表面上并且围绕第二半导体管芯。 第二密封剂沉积在第二半导体管芯上并围绕多个第一导电柱。 包括导电层和凸块的第二互连结构形成在第二密封剂上并且电连接到多个第一导电柱和第一和第二半导体管芯。

公开(公告)号：US20140011315A1

公开(公告)日：2014-01-09

申请号：US14021208

申请日：2013-09-09

Applicant: STATS ChipPAC, Ltd.

Inventor： Zigmund R. Camacho ,  Henry D. Bathan ,  Lionel Chien Hui Tay ,  Arnel Senosa Trasporto

IPC: H01L31/0203

CPC classification number: H01L31/0203 ,  H01L21/563 ,  H01L23/3121 ,  H01L24/32 ,  H01L2224/05571 ,  H01L2224/05573 ,  H01L2224/16225 ,  H01L2224/16245 ,  H01L2224/32245 ,  H01L2224/48091 ,  H01L2224/48247 ,  H01L2224/73203 ,  H01L2224/73204 ,  H01L2224/73265 ,  H01L2924/00014 ,  H01L2924/01029 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/14 ,  H01L2924/15151 ,  H01L2924/181 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/05599

Abstract: A semiconductor device is made by providing a semiconductor die having an optically active area, providing a leadframe or pre-molded laminated substrate having a plurality of contact pads and a light transmitting material disposed between the contact pads, attaching the semiconductor die to the leadframe so that the optically active area is aligned with the light transmitting material to provide a light transmission path to the optically active area, and disposing an underfill material between the semiconductor die and leadframe. The light transmitting material includes an elevated area to prevent the underfill material from blocking the light transmission path. The elevated area includes a dam surrounding the light transmission path, an adhesive ring, or the light transmission path itself can be the elevated area. An adhesive ring can be disposed on the dam. A filler material can be disposed between the light transmitting material and contact pads.

Abstract translation: 通过提供具有光学活性区域的半导体管芯制造半导体器件，提供具有多个接触焊盘的引线框架或预成型层叠基板和设置在接触焊盘之间的透光材料，将半导体管芯附接到引线框架 光学活性区域与透光材料对准以提供到光学有效区域的光传输路径，并且在半导体管芯和引线框架之间设置底部填充材料。 透光材料包括用于防止底部填充材料阻挡光传输路径的升高区域。 升高区域包括围绕光传输路径的堤坝，粘合环，或者光传输路径本身可以是高架区域。 可以在大坝上设置粘合环。 填充材料可以设置在透光材料和接触垫之间。

公开(公告)号：US20140008792A1

公开(公告)日：2014-01-09

申请号：US14021914

申请日：2013-09-09

Applicant: STATS ChipPAC, Ltd.

Inventor： Rajendra D. Pendse

IPC: H01L23/498 ,  H01L23/00

CPC classification number: H01L24/17 ,  H01L21/563 ,  H01L23/3128 ,  H01L23/3157 ,  H01L23/49811 ,  H01L23/49838 ,  H01L24/11 ,  H01L24/12 ,  H01L24/16 ,  H01L24/29 ,  H01L24/32 ,  H01L24/48 ,  H01L24/73 ,  H01L24/75 ,  H01L24/81 ,  H01L24/83 ,  H01L33/62 ,  H01L2224/11 ,  H01L2224/1134 ,  H01L2224/13 ,  H01L2224/13016 ,  H01L2224/13018 ,  H01L2224/13019 ,  H01L2224/13023 ,  H01L2224/1308 ,  H01L2224/13082 ,  H01L2224/131 ,  H01L2224/13111 ,  H01L2224/13116 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/1411 ,  H01L2224/16 ,  H01L2224/1601 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/16235 ,  H01L2224/16237 ,  H01L2224/16238 ,  H01L2224/17107 ,  H01L2224/27013 ,  H01L2224/29109 ,  H01L2224/29111 ,  H01L2224/2919 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/73203 ,  H01L2224/73204 ,  H01L2224/73265 ,  H01L2224/75 ,  H01L2224/75301 ,  H01L2224/81191 ,  H01L2224/81193 ,  H01L2224/81194 ,  H01L2224/81203 ,  H01L2224/81208 ,  H01L2224/81345 ,  H01L2224/81385 ,  H01L2224/81801 ,  H01L2224/83051 ,  H01L2224/83191 ,  H01L2224/83192 ,  H01L2224/83385 ,  H01L2224/83856 ,  H01L2224/93 ,  H01L2224/94 ,  H01L2924/00011 ,  H01L2924/00013 ,  H01L2924/00014 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01015 ,  H01L2924/01022 ,  H01L2924/01027 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/0105 ,  H01L2924/01074 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/0132 ,  H01L2924/01322 ,  H01L2924/0133 ,  H01L2924/014 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15174 ,  H01L2924/15787 ,  H01L2924/1579 ,  H01L2924/181 ,  H01L2924/19041 ,  H01L2924/3011 ,  H01L2924/3025 ,  H01L2224/13099 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/13109 ,  H01L2924/3512 ,  H01L2924/0665 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207 ,  H01L2224/81805

Abstract: A semiconductor device has a semiconductor die with a plurality of composite bumps formed over a surface of the semiconductor die. The composite bumps have a fusible portion and non-fusible portion, such as a conductive pillar and bump formed over the conductive pillar. The composite bumps can also be tapered. Conductive traces are formed over a substrate with interconnect sites having edges parallel to the conductive trace from a plan view for increasing escape routing density. The interconnect site can have a width less than 1.2 times a width of the conductive trace. The composite bumps are wider than the interconnect sites. The fusible portion of the composite bumps is bonded to the interconnect sites so that the fusible portion covers a top surface and side surface of the interconnect sites. An encapsulant is deposited around the composite bumps between the semiconductor die and substrate.

Abstract translation: 半导体器件具有形成在半导体管芯的表面上的多个复合凸块的半导体管芯。 复合凸块具有可熔部分和不可熔部分，例如形成在导电柱上的导电柱和凸块。 复合凸块也可以是锥形的。 导电迹线形成在具有从平面图平行于导电迹线的边缘的互连位置的衬底上，以增加逃逸路由密度。 互连部位可以具有小于导电迹线宽度的1.2倍的宽度。 复合凸块比互连部位宽。 复合凸块的可熔部分结合到互连部位，使得可熔部分覆盖互连部位的顶表面和侧表面。 围绕半导体管芯和衬底之间的复合凸块沉积密封剂。

公开(公告)号：US20140008783A1

公开(公告)日：2014-01-09

申请号：US14021740

申请日：2013-09-09

Applicant: STATS ChipPAC, Ltd.

Inventor： SungWon Cho ,  TaeWoo Lee ,  DaeSik Choi ,  KyuWon Lee

IPC: H01L23/48

CPC classification number: H01L23/48 ,  H01L24/05 ,  H01L24/16 ,  H01L24/29 ,  H01L24/81 ,  H01L24/83 ,  H01L2224/0401 ,  H01L2224/05557 ,  H01L2224/05568 ,  H01L2224/13109 ,  H01L2224/13111 ,  H01L2224/16225 ,  H01L2224/165 ,  H01L2224/29 ,  H01L2224/29099 ,  H01L2224/29101 ,  H01L2224/29109 ,  H01L2224/29111 ,  H01L2224/2919 ,  H01L2224/2929 ,  H01L2224/29298 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2224/81101 ,  H01L2224/81193 ,  H01L2224/83889 ,  H01L2224/92125 ,  H01L2924/00011 ,  H01L2924/00013 ,  H01L2924/00014 ,  H01L2924/0002 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01023 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/0105 ,  H01L2924/01051 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/0132 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/0665 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/16152 ,  H01L2924/181 ,  H01L2924/00 ,  H01L2924/01083 ,  H01L2224/29199 ,  H01L2224/29299 ,  H01L2224/05552 ,  H01L2224/81805

Abstract: A semiconductor device has a flipchip type semiconductor die with contact pads and substrate with contact pads. A flux material is deposited over the contact pads of the semiconductor die and contact pads of the substrate. A solder tape formed as a continuous body of solder material with a plurality of recesses is disposed between the contact pads of the semiconductor die and substrate. The solder tape is brought to a liquidus state to separate a portion of the solder tape outside a footprint of the contact pads of the semiconductor die and substrate under surface tension and coalesce the solder material as an electrical interconnect substantially within the footprint of the contact pads of the semiconductor die and substrate. The contact pads on the semiconductor die and substrate can be formed with an extension or recess to increase surface area of the contact pads.

Abstract translation: 半导体器件具有带有接触焊盘和具有接触焊盘的衬底的倒装芯片型半导体管芯。 焊剂材料沉积在半导体管芯的接触焊盘和衬底的接触焊盘上。 形成为具有多个凹部的焊料材料的连续体的焊料带设置在半导体管芯和衬底的接触焊盘之间。 焊带被带到液相线状态，以将表面张力下的半导体管芯和衬底的接触焊盘的一部分焊接区分隔开，并将焊料材料作为基本上在接触焊盘的覆盖区内的电互连 的半导体管芯和衬底。 半导体管芯和衬底上的接触焊盘可以形成有延伸部或凹部，以增加接触焊盘的表面积。

公开(公告)号：US20140002207A1

公开(公告)日：2014-01-02

申请号：US14018282

申请日：2013-09-04

Applicant: STATS ChipPAC, Ltd.

Inventor： Kai Liu ,  Robert C. Frye ,  Yaojian Lin

IPC: H03H7/42 ,  H01L49/02

CPC classification number: H03H7/422 ,  H01L28/10 ,  H03H7/09 ,  H03H7/1766 ,  H03H7/42

Abstract: A band-pass filter has a plurality of frequency band channels each including a first inductor having a first terminal coupled to a first balanced port and a second terminal coupled to a second balanced port. A first capacitor is coupled between the first and second terminals of the first inductor. A second inductor has a first terminal coupled to a first unbalanced port and a second terminal coupled to a second unbalanced port. The second inductor is disposed within a first distance of the first inductor to induce magnetic coupling. A second capacitor is coupled between the first and second terminals of the second inductor. A third inductor is disposed within a second distance of the first inductor and within a third distance of the second inductor to induce magnetic coupling. A second capacitor is coupled between first and second terminals of the third inductor.

Abstract translation: 带通滤波器具有多个频带信道，每个频带信道包括具有耦合到第一平衡端口的第一端子的第一电感器和耦合到第二平衡端口的第二端子。 第一电容器耦合在第一电感器的第一和第二端子之间。 第二电感器具有耦合到第一不平衡端口的第一端子和耦合到第二不平衡端口的第二端子。 第二电感器设置在第一电感器的第一距离内以引起磁耦合。 第二电容器耦合在第二电感器的第一和第二端子之间。 第三电感器设置在第一电感器的第二距离内并且在第二电感器的第三距离内，以引起磁耦合。 第二电容器耦合在第三电感器的第一和第二端子之间。

公开(公告)号：USRE44608E1

公开(公告)日：2013-11-26

申请号：US13756905

申请日：2013-02-01

Applicant: STATS ChipPAC, Ltd.

Inventor： Rajendra D. Pendse ,  KyungOe Kim ,  TaeWoo Kang

IPC: H01L23/48 ,  H01L21/44

CPC classification number: H01L21/563 ,  H01L23/49838 ,  H01L24/16 ,  H01L24/29 ,  H01L24/75 ,  H01L24/81 ,  H01L24/83 ,  H01L2224/05571 ,  H01L2224/05573 ,  H01L2224/056 ,  H01L2224/1132 ,  H01L2224/1147 ,  H01L2224/13111 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/1607 ,  H01L2224/16225 ,  H01L2224/32225 ,  H01L2224/73203 ,  H01L2224/73204 ,  H01L2224/75 ,  H01L2224/81191 ,  H01L2224/81203 ,  H01L2224/8121 ,  H01L2224/81815 ,  H01L2224/83102 ,  H01L2224/83191 ,  H01L2224/83192 ,  H01L2224/83856 ,  H01L2224/92125 ,  H01L2924/00013 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01027 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/0105 ,  H01L2924/01058 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/10253 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/3011 ,  H01L2924/351 ,  H01L2924/00014 ,  H01L2224/13099 ,  H01L2924/00 ,  H01L2224/29099

Abstract: A flip chip interconnect has a tapering interconnect structure, and the area of contact of the interconnect structure with the site on the substrate metallization is less than the area of contact of the interconnect structure with the die pad. Also, a bond-on-lead or bond-on-narrow pad or bond on a small area of a contact pad interconnection includes such tapering flip chip interconnects. Also, methods for making the interconnect structure include providing a die having interconnect pads, providing a substrate having interconnect sites on a patterned conductive layer, providing a bump on a die pad, providing a fusible electrically conductive material either at the interconnect site or on the bump, mating the bump to the interconnect site, and heating to melt the fusible material.

Abstract translation: 倒装芯片互连具有渐缩的互连结构，并且互连结构与衬底金属化部位的接触面积小于互连结构与管芯焊盘的接触面积。 此外，接触焊盘互连的小区域上的引线键合或窄键焊接或键合包括这种锥形倒装芯片互连。 此外，用于制造互连结构的方法包括提供具有互连焊盘的管芯，提供在图案化导电层上具有互连位置的衬底，在管芯焊盘上提供凸块，在互连位置处或在互连位置上提供可熔电导材料 碰撞，将凸块配合到互连部位，并加热熔化可熔材料。

公开(公告)号：US20130299975A1

公开(公告)日：2013-11-14

申请号：US13944783

申请日：2013-07-17

Applicant: STATS ChipPAC, Ltd.

Inventor： Reza A. Pagaila ,  Byung Tai Do ,  Linda Pei Ee Chua

IPC: H01L23/48 ,  H01L21/50

CPC classification number: H01L23/481 ,  H01L21/50 ,  H01L21/568 ,  H01L21/6835 ,  H01L23/3157 ,  H01L24/18 ,  H01L24/19 ,  H01L24/48 ,  H01L24/73 ,  H01L24/82 ,  H01L24/97 ,  H01L25/0657 ,  H01L25/50 ,  H01L2221/68345 ,  H01L2224/02371 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/18 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/82005 ,  H01L2224/82039 ,  H01L2224/9222 ,  H01L2224/92244 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06524 ,  H01L2225/06541 ,  H01L2924/00014 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01023 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/12042 ,  H01L2924/12044 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/19043 ,  H01L2924/19107 ,  H01L2924/30105 ,  H01L2224/82 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A semiconductor device is made by providing a first semiconductor wafer having semiconductor die. A gap is made between the semiconductor die. An insulating material is deposited in the gap. A portion of the insulating material is removed to form a first through hole via (THV). A conductive lining is conformally deposited in the first THV. A solder material is disposed above the conductive lining of the first THV. A second semiconductor wafer having semiconductor die is disposed over the first wafer. A second THV is formed in a gap between the die of the second wafer. A conductive lining is conformally deposited in the second THV. A solder material is disposed above the second THV. The second THV is aligned to the first THV. The solder material is reflowed to form the conductive vias within the gap. The gap is singulated to separate the semiconductor die.