LIGHT EMITTING DIODE AND METHOD OF FABRICATION THEREOF
    3.
    发明申请
    LIGHT EMITTING DIODE AND METHOD OF FABRICATION THEREOF 有权
    发光二极管及其制造方法

    公开(公告)号:US20120292629A1

    公开(公告)日:2012-11-22

    申请号:US13112046

    申请日:2011-05-20

    IPC分类号: H01L33/60

    摘要: A method includes providing an LED element including a substrate and a gallium nitride (GaN) layer disposed on the substrate. The GaN layer is treated. The treatment includes performing an ion implantation process on the GaN layer. The ion implantation process may provide a roughened surface region of the GaN layer. In an embodiment, the ion implantation process is performed at a temperature of less than approximately 25 degrees Celsius. In a further embodiment, the substrate is at a temperature less than approximately zero degrees Celsius during the ion implantation process.

    摘要翻译: 一种方法包括提供包括衬底和设置在衬底上的氮化镓(GaN)层)的LED元件。 处理GaN层。 该处理包括在GaN层上执行离子注入工艺。 离子注入工艺可以提供GaN层的粗糙化表面区域。 在一个实施例中,离子注入过程在小于约25摄氏度的温度下进行。 在另一个实施例中,在离子注入过程期间,衬底处于低于约零摄氏度的温度。