Method of manufacturing a semiconductor device

    公开(公告)号:US09865463B2

    公开(公告)日:2018-01-09

    申请号:US15193367

    申请日:2016-06-27

    发明人: Hitomi Sakurai

    摘要: In a method of manufacturing a semiconductor device, a first photoresist layer is applied on a polycrystalline silicon layer formed on a semiconductor substrate. The first photoresist layer is then patterned and cured with UV rays. The polycrystalline silicon layer is etched, using the first photoresist layer as a mask, to form a gate electrode and a resistive film of the polycrystalline silicon layer. A second photoresist layer is applied on the cured first photoresist layer and patterned to form an opening portion exposing the first photoresist layer. Impurities are ion implanted through the opening portion in the polycrystalline silicon layer. The channeling of impurities implanted during the ion implantation is suppressed by the cured first photoresist layer.

    METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
    6.
    发明申请
    METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE 有权
    制造半导体器件的方法

    公开(公告)号:US20170005174A1

    公开(公告)日:2017-01-05

    申请号:US15193367

    申请日:2016-06-27

    发明人: Hitomi SAKURAI

    IPC分类号: H01L29/43 H01L29/40

    摘要: Provided is a method of manufacturing a semiconductor device, for suppressing channeling that may occur during ion implantation to a polycrystalline silicon layer (4), the method including: exposing, in an opening portion formed in a second photoresist layer (8), a first photoresist layer (5) that has been used for patterning the polycrystalline silicon layer (4); and implanting impurities by ion implantation with the first photoresist layer (5) being a mask for a gate electrode (4-1) formed of the polycrystalline silicon layer (4).

    摘要翻译: 提供一种制造半导体器件的方法,用于抑制离子注入期间可能发生的多晶硅层(4)的沟道化,该方法包括:在形成于第二光致抗蚀剂层(8)的开口部分中暴露第一 已经用于图案化多晶硅层(4)的光致抗蚀剂层(5); 以及通过第一光致抗蚀剂层(5)作为由多晶硅层(4)形成的栅电极(4-1)的掩模,通过离子注入植入杂质。