METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

    公开(公告)号:EP4425538A1

    公开(公告)日:2024-09-04

    申请号:EP24155021.9

    申请日:2024-01-31

    摘要: According to one embodiment, a method of manufacturing a semiconductor device includes: forming a laser peeling film above a first semiconductor substrate; forming a circuit layer above the laser peeling film; bonding the first semiconductor substrate and a second semiconductor substrate; applying a laser beam to a back surface of the first semiconductor substrate; and peeling the first semiconductor substrate to maintain the circuit layer on a side of the second semiconductor substrate. Forming the laser peeling film includes forming, inside the laser peeling film, a thermal diffusion layer. The thermal diffusion layer includes a member having a coefficient of thermal conductivity higher than that of the laser peeling film.