Semiconductor device
    10.
    发明专利
    Semiconductor device 失效
    半导体器件

    公开(公告)号:JPS61112362A

    公开(公告)日:1986-05-30

    申请号:JP23310584

    申请日:1984-11-07

    申请人: Hitachi Ltd

    摘要: PURPOSE:To improve reliability of a semiconductor, device by providing an insulating film, which has the approximately same or close thermal expansion coefficient as the thermal expansion coefficient of a semiconductor chip having the different material, selectively, in the multiple-chip type semiconductor device, on which a silicon chip and a gallium arsenide chip are mounted as a mixed manner. CONSTITUTION:A gallium arsenide chip 9 is used at a part where high speed operation is to be performed. A silicon chip 7 is used at a part where high degree of integration is required. An insulating film 10, which is made of a material having the approximately same or close thermal expansion coefficient as the thermal expansion coefficient of the gallium arsenide chip 9, is selectively provided. The gallium arsenide chip 9 is mounted on the insulating film 10. The silicon chip 7 having high degree of integration and the high speed gallium arsenide chip 9 are provided in a multiple-chip type semiconductor device in a mixed manner. Thus the high density and high speed can be implemented in said semiconductor device and highly reliable mounting can be achieved.

    摘要翻译: 目的:通过在多芯片型半导体器件中选择性地提供具有与具有不同材料的半导体芯片的热膨胀系数大致相同或接近的热膨胀系数的绝缘膜来提高半导体器件的可靠性, ,以其混合的方式安装硅芯片和砷化镓芯片。 构成:在要执行高速运行的部分使用砷化镓芯片9。 在需要高度集成度的部分使用硅芯片7。 选择性地提供由具有与砷化镓芯片9的热膨胀系数大致相同或接近的热膨胀系数的材料制成的绝缘膜10。 砷化镓芯片9安装在绝缘膜10上。具有高集成度的硅芯片7和高速砷化镓芯片9以混合的方式设置在多芯片型半导体器件中。 因此,可以在所述半导体器件中实现高密度和高速度,并且可以实现高度可靠的安装。