公开(公告)号：US20130292850A1

公开(公告)日：2013-11-07

申请号：US13935963

申请日：2013-07-05

Applicant: STATS CHIPPAC, LTD.

Inventor： Linda Pei Ee Chua ,  Byung Tai Do ,  Reza A. Pagaila

IPC: H01L23/538 ,  H01L23/00

CPC classification number: H01L25/0657 ,  H01L21/288 ,  H01L21/561 ,  H01L21/565 ,  H01L21/568 ,  H01L21/76879 ,  H01L21/76885 ,  H01L21/78 ,  H01L23/13 ,  H01L23/3114 ,  H01L23/3128 ,  H01L23/48 ,  H01L23/481 ,  H01L23/49811 ,  H01L23/49816 ,  H01L23/49838 ,  H01L23/52 ,  H01L23/5384 ,  H01L23/5389 ,  H01L23/552 ,  H01L24/17 ,  H01L24/19 ,  H01L24/82 ,  H01L24/96 ,  H01L24/97 ,  H01L25/03 ,  H01L25/50 ,  H01L29/40 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/05111 ,  H01L2224/05124 ,  H01L2224/05139 ,  H01L2224/05144 ,  H01L2224/05147 ,  H01L2224/05155 ,  H01L2224/12105 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/20 ,  H01L2224/2518 ,  H01L2224/2919 ,  H01L2224/32145 ,  H01L2224/32502 ,  H01L2224/48091 ,  H01L2224/48106 ,  H01L2224/48228 ,  H01L2224/73253 ,  H01L2224/73259 ,  H01L2224/73265 ,  H01L2224/97 ,  H01L2225/0651 ,  H01L2225/06517 ,  H01L2225/06548 ,  H01L2225/1035 ,  H01L2225/1041 ,  H01L2225/1058 ,  H01L2225/1088 ,  H01L2924/01004 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01047 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/1815 ,  H01L2224/82 ,  H01L2224/81 ,  H01L2924/00 ,  H01L2924/00012

Abstract: A semiconductor device has conductive pillars formed over a carrier. A first semiconductor die is mounted over the carrier between the conductive pillars. An encapsulant is deposited over the first semiconductor die and carrier and around the conductive pillars. A recess is formed in a first surface of the encapsulant over the first semiconductor die. The recess has sloped or stepped sides. A first interconnect structure is formed over the first surface of the encapsulant. The first interconnect structure follows a contour of the recess in the encapsulant. The carrier is removed. A second interconnect structure is formed over a second surface of the encapsulant and first semiconductor die. The first and second interconnect structures are electrically connected to the conductive pillars. A second semiconductor die is mounted in the recess. A third semiconductor die is mounted over the recess and second semiconductor die.

Abstract translation: 半导体器件具有在载体上形成的导电柱。 第一半导体管芯安装在载体之间的导电柱之间。 密封剂沉积在第一半导体管芯和载体上并且围绕导电柱。 在第一半导体管芯上的密封剂的第一表面中形成凹部。 凹槽有倾斜或阶梯。 在密封剂的第一表面上形成第一互连结构。 第一互连结构遵循密封剂中的凹部的轮廓。 载体被移除。 在密封剂和第一半导体管芯的第二表面上形成第二互连结构。 第一和第二互连结构电连接到导电柱。 第二半导体管芯安装在凹槽中。 第三半导体管芯安装在凹槽和第二半导体管芯上。

公开(公告)号：US20130292804A1

公开(公告)日：2013-11-07

申请号：US13935312

申请日：2013-07-03

Applicant: STATS ChipPAC, Ltd.

Inventor： SinJae Lee ,  JinGwan Kim ,  JiHoon Oh ,  JaeHyun Lim ,  KyuWon Lee

IPC: H01L23/552

CPC classification number: H01L25/0657 ,  H01L21/4857 ,  H01L21/486 ,  H01L21/56 ,  H01L21/76898 ,  H01L23/3107 ,  H01L23/3128 ,  H01L23/481 ,  H01L23/49822 ,  H01L23/49827 ,  H01L23/552 ,  H01L24/48 ,  H01L25/50 ,  H01L2224/16225 ,  H01L2224/32225 ,  H01L2224/48225 ,  H01L2224/48227 ,  H01L2224/73265 ,  H01L2225/0651 ,  H01L2225/06517 ,  H01L2225/06537 ,  H01L2225/06541 ,  H01L2225/06548 ,  H01L2225/06572 ,  H01L2924/00014 ,  H01L2924/01322 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/15156 ,  H01L2924/15174 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/3025 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A semiconductor device has an interconnect structure with a cavity formed partially through the interconnect structure. A first semiconductor die is mounted in the cavity. A first TSV is formed through the first semiconductor die. An adhesive layer is deposited over the interconnect structure and first semiconductor die. A shielding layer is mounted over the first semiconductor die. The shielding layer is secured to the first semiconductor die with the adhesive layer and grounded through the first TSV and interconnect structure to block electromagnetic interference. A second semiconductor die is mounted to the shielding layer and electrically connected to the interconnect structure. A second TSV is formed through the second semiconductor die. An encapsulant is deposited over the shielding layer, second semiconductor die, and interconnect structure. A slot is formed through the shielding layer for the encapsulant to flow into the cavity and cover the first semiconductor die.

Abstract translation: 半导体器件具有互连结构，其中腔部分地穿过互连结构形成。 第一半导体管芯安装在空腔中。 通过第一半导体管芯形成第一TSV。 在互连结构和第一半导体管芯上沉积粘合剂层。 屏蔽层安装在第一半导体管芯上。 屏蔽层通过粘合剂层固定到第一半导体管芯，并通过第一TSV和互连结构接地以阻止电磁干扰。 第二半导体管芯安装到屏蔽层并电连接到互连结构。 通过第二半导体管芯形成第二TSV。 密封剂沉积在屏蔽层，第二半导体管芯和互连结构之上。 通过屏蔽层形成狭缝以使密封剂流入空腔并覆盖第一半导体管芯。

公开(公告)号：USRE44579E1

公开(公告)日：2013-11-05

申请号：US13756679

申请日：2013-02-01

Applicant: STATS ChipPAC, Ltd.

Inventor： Rajendra D. Pendse

IPC: H01L21/44 ,  H01L23/48

CPC classification number: H01L21/563 ,  H01L23/49838 ,  H01L24/13 ,  H01L24/16 ,  H01L24/75 ,  H01L24/81 ,  H01L2224/10145 ,  H01L2224/10175 ,  H01L2224/13111 ,  H01L2224/1607 ,  H01L2224/16225 ,  H01L2224/16238 ,  H01L2224/32225 ,  H01L2224/73203 ,  H01L2224/73204 ,  H01L2224/75 ,  H01L2224/75301 ,  H01L2224/81191 ,  H01L2224/81203 ,  H01L2224/81815 ,  H01L2224/83191 ,  H01L2224/83192 ,  H01L2224/83856 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01033 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/181 ,  H01L2924/3011 ,  H01L2924/00014 ,  H01L2924/00

Abstract: A semiconductor device has a semiconductor die with an die bump pad and substrate with a trace line and integrated bump pad. Conductive bump material is deposited on the substrate bump pad or die bump pad. The semiconductor die over the substrate so that the bump material is disposed between the die bump pad and substrate bump pad. The bump material is reflowed without a solder mask around the die bump pad or substrate bump pad to form an interconnect. The bump material is self-confined within a footprint of the die bump pad or substrate bump pad. The bump material can be immersed in a flux solution prior to reflow to increase wettability. Alternatively, the interconnect includes a non-fusible base and fusible cap. The volume of bump material is selected so that a surface tension maintains self-confinement of the bump material within the bump pads during reflow.

Abstract translation: 半导体器件具有具有管芯凸块焊盘的半导体管芯和具有轨迹线和集成凸块焊盘的衬底。 导电凸块材料沉积在衬底凸块焊盘或模具凸块焊盘上。 半导体裸片在基板上，使得凸块材料设置在管芯凸块焊盘和衬底凸块焊盘之间。 凸块材料在芯片凸块焊盘或基板凸块焊盘周围没有焊接掩模回流以形成互连。 凸块材料在管芯凸块焊盘或衬底凸块焊盘的占用面积内自我限制。 在回流之前，凸起材料可以浸入助熔剂溶液中以增加润湿性。 或者，互连包括不可熔基底和可熔盖。 选择凸起材料的体积，使得表面张力在回流期间保持凸块内的凸起材料的自我约束。

公开(公告)号：US20130256861A1

公开(公告)日：2013-10-03

申请号：US13791375

申请日：2013-03-08

Applicant: STATS CHIPPAC LTD.

Inventor： Byung Tai Do ,  Arnel Senosa Trasporto ,  Linda Pei Ee Chua

IPC: H01L23/28 ,  H01L21/56

CPC classification number: H01L23/28 ,  H01L21/4832 ,  H01L21/56 ,  H01L23/16 ,  H01L23/3107 ,  H01L23/49582 ,  H01L24/73 ,  H01L24/97 ,  H01L2224/16245 ,  H01L2224/32245 ,  H01L2224/45144 ,  H01L2224/48091 ,  H01L2224/48247 ,  H01L2224/73265 ,  H01L2224/97 ,  H01L2924/12042 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2224/83 ,  H01L2224/85 ,  H01L2924/00012 ,  H01L2924/00 ,  H01L2924/00014

Abstract: An integrated circuit packaging system, and a method of manufacture therefor, including: electrical terminals; circuitry protective material around the electrical terminals and formed to have recessed pad volumes; routable circuitry on the top surface of the circuitry protective material; and an integrated circuit die electrically connected to the electrical terminals.

Abstract translation: 一种集成电路封装系统及其制造方法，包括：电端子; 在电气端子周围的电路保护材料，并形成为具有凹陷垫体积; 电路保护材料顶表面上的可路由电路; 以及与电端子电连接的集成电路管芯。

公开(公告)号：US20130241048A1

公开(公告)日：2013-09-19

申请号：US13874150

申请日：2013-04-30

Applicant: STATS CHIPPAC, LTD.

Inventor： Yaojian Lin ,  Kang Chen ,  Yu Gu ,  Wei Meng ,  Chee Siang Ong

IPC: H01L23/00 ,  H01L21/56

CPC classification number: H01L23/562 ,  H01L21/56 ,  H01L21/561 ,  H01L21/565 ,  H01L21/568 ,  H01L23/29 ,  H01L23/3107 ,  H01L23/3121 ,  H01L23/3128 ,  H01L23/49816 ,  H01L23/5389 ,  H01L24/19 ,  H01L24/96 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2924/01029 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2924/3511 ,  H01L2924/00

Abstract: A semiconductor device has a semiconductor die and encapsulant deposited over the semiconductor die. A first insulating layer is formed over the die and encapsulant. The first insulating layer is cured with multiple dwell cycles to enhance adhesion to the die and encapsulant. A first conductive layer is formed over the first insulating layer. A second insulating layer is formed over the first insulating layer and first conductive layer. The second insulating layer is cured with multiple dwell cycles to enhance adhesion to the first insulating layer and first conductive layer. A second conductive layer is formed over the second insulating layer and first conductive layer. A third insulating layer is formed over the second insulating layer and second conductive layer. The first, second, and third insulating layers have different CTE. The second insulating layer or third insulating layer is cured to a dense state to block moisture.

公开(公告)号：USRE44500E1

公开(公告)日：2013-09-17

申请号：US13752157

申请日：2013-01-28

Applicant: STATS ChipPAC, Ltd.

Inventor： Rajendra D. Pendse

IPC: H01L21/44

CPC classification number: H01L21/563 ,  H01L23/49838 ,  H01L24/29 ,  H01L24/75 ,  H01L24/81 ,  H01L2224/13111 ,  H01L2224/1607 ,  H01L2224/16225 ,  H01L2224/16238 ,  H01L2224/32225 ,  H01L2224/73203 ,  H01L2224/73204 ,  H01L2224/75 ,  H01L2224/75301 ,  H01L2224/81191 ,  H01L2224/81203 ,  H01L2224/81801 ,  H01L2224/83191 ,  H01L2224/83192 ,  H01L2224/83856 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01033 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/181 ,  H01L2924/3011 ,  H01L2924/00014 ,  H01L2924/00

Abstract: A semiconductor device has a semiconductor die mounted to a substrate with a plurality of composite interconnects formed between interconnect sites on the substrate and bump pads on the die. The interconnect sites are part of traces formed on the substrate. The interconnect site has a width between 1.0 and 1.2 times a width of the trace. The composite interconnect is tapered. The composite interconnects have a fusible portion connected to the interconnect site and non-fusible portion connected to the bump pad. The non-fusible portion can be gold, copper, nickel, lead solder, or lead-tin alloy. The fusible portion can be tin, lead-free alloy, tin-silver alloy, tin-silver-copper alloy, tin-silver-indium alloy, eutectic solder, or other tin alloys with silver, copper, or lead. An underfill material is deposited between the semiconductor die and substrate. A finish such as Cu-OSP can be formed over the substrate.

Abstract translation: 半导体器件具有安装到衬底上的半导体管芯，其具有在衬底上的互连部位和管芯上的焊盘之间形成的多个复合互连。 互连位置是形成在衬底上的迹线的一部分。 互连站点的宽度介于轨迹宽度的1.0到1.2倍之间。 复合互连是锥形的。 复合互连具有连接到互连位置的可熔部分和连接到凸块焊盘的不可熔部分。 非易熔部分可以是金，铜，镍，铅焊料或铅锡合金。 熔融部分可以是锡，无铅合金，锡 - 银合金，锡 - 银 - 铜合金，锡 - 银 - 铟合金，共晶焊料或其他具有银，铜或铅的锡合金。 在半导体管芯和衬底之间沉积底部填充材料。 可以在衬底上形成诸如Cu-OSP的光洁度。

公开(公告)号：US20130234324A1

公开(公告)日：2013-09-12

申请号：US13870928

申请日：2013-04-25

Applicant: STATS CHIPPAC, LTD.

Inventor： SungWon Cho ,  KiYoun Jang ,  YongHee Kang ,  Hyung Sang Park

IPC: H01L23/00

CPC classification number: H01L24/09 ,  H01L21/4857 ,  H01L21/563 ,  H01L23/49822 ,  H01L23/49827 ,  H01L24/11 ,  H01L24/13 ,  H01L24/14 ,  H01L24/16 ,  H01L24/17 ,  H01L24/32 ,  H01L24/48 ,  H01L24/81 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/1145 ,  H01L2224/11452 ,  H01L2224/11462 ,  H01L2224/11464 ,  H01L2224/1147 ,  H01L2224/1155 ,  H01L2224/11831 ,  H01L2224/11849 ,  H01L2224/11901 ,  H01L2224/11903 ,  H01L2224/13023 ,  H01L2224/13082 ,  H01L2224/13083 ,  H01L2224/13099 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/1403 ,  H01L2224/141 ,  H01L2224/16225 ,  H01L2224/16237 ,  H01L2224/16238 ,  H01L2224/17104 ,  H01L2224/29144 ,  H01L2224/2919 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48105 ,  H01L2224/48158 ,  H01L2224/73204 ,  H01L2224/73265 ,  H01L2224/81011 ,  H01L2224/81022 ,  H01L2224/81024 ,  H01L2224/81193 ,  H01L2224/81385 ,  H01L2224/81411 ,  H01L2224/81424 ,  H01L2224/81439 ,  H01L2224/81444 ,  H01L2224/81447 ,  H01L2224/81455 ,  H01L2224/81801 ,  H01L2224/83102 ,  H01L2224/8385 ,  H01L2224/92125 ,  H01L2924/00014 ,  H01L2924/01013 ,  H01L2924/01023 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/10252 ,  H01L2924/10253 ,  H01L2924/10272 ,  H01L2924/10329 ,  H01L2924/10335 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/3841 ,  H01L2924/01014 ,  H01L2924/0105 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A semiconductor device has a first substrate and first conductive pillars formed over the first substrate. Second conductive pillars are formed over the first substrate alternating with the first conductive pillars. The second conductive pillars are vertically offset with respect to the first conductive pillars. First BOT interconnect sites are formed over a second substrate. Second BOT interconnect sites are formed over the second substrate alternating with the first interconnect sites. The second interconnect sites are vertically offset with respect to the first interconnect sites. The first substrate is mounted to the second substrate such that the first conductive pillars are aligned with and electrically connected to the first interconnect sites and the second conductive pillars are aligned with and electrically connected to the second interconnect sites. An underfill material is deposited between the first and second substrates. The first substrate can be a flipchip type semiconductor device.

Abstract translation: 半导体器件具有形成在第一衬底上的第一衬底和第一导电柱。 第二导电柱形成在第一基板上，与第一导电柱交替。 第二导电柱相对于第一导电柱垂直偏移。 第一BOT互连位点形成在第二基底上。 第二BOT互连位置形成在第二衬底上与第一互连位置交替。 第二互连站点相对于第一互连站点垂直偏移。 第一衬底安装到第二衬底，使得第一导电柱与第一互连位置对准并电连接，并且第二导电柱与第二互连位置对准并电连接到第二互连位置。 底部填充材料沉积在第一和第二基底之间。 第一基板可以是倒装芯片型半导体器件。

公开(公告)号：US20130214430A1

公开(公告)日：2013-08-22

申请号：US13242656

申请日：2011-09-23

Applicant: STATS ChipPac Ltd.

Inventor： Reza Argenty Pagaila

IPC: H01L21/56 ,  H01L23/31

CPC classification number: H01L21/563 ,  H01L21/56 ,  H01L23/3107 ,  H01L23/3128 ,  H01L23/3157 ,  H01L24/73 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48227 ,  H01L2224/73204 ,  H01L2224/73207 ,  H01L2224/73265 ,  H01L2224/92125 ,  H01L2225/0651 ,  H01L2225/06517 ,  H01L2225/06558 ,  H01L2924/15151 ,  H01L2924/15311 ,  H01L2924/15321 ,  H01L2924/19105 ,  H01L2924/3025 ,  H01L2924/00012 ,  H01L2924/00

Abstract: A method of manufacture of an integrated circuit packaging system includes: providing a substrate; mounting an integrated circuit above the substrate with an interconnect directly connecting between the substrate and the integrated circuit; and forming an under-fill between the integrated circuit and the substrate having a cast side.

Abstract translation: 一种集成电路封装系统的制造方法，包括：提供基板; 在衬底之上安装集成电路，其中直接连接在衬底和集成电路之间的互连; 并且在集成电路和具有铸造侧的基板之间形成欠填充。

公开(公告)号：US20130175668A1

公开(公告)日：2013-07-11

申请号：US13782939

申请日：2013-03-01

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin ,  Haijing Cao ,  Qing Zhang ,  Kang Chen ,  Jianmin Fang

IPC: H01L49/02

CPC classification number: H01L23/5389 ,  H01L21/6835 ,  H01L23/49822 ,  H01L23/50 ,  H01L24/16 ,  H01L24/48 ,  H01L27/1266 ,  H01L28/00 ,  H01L28/10 ,  H01L28/20 ,  H01L28/40 ,  H01L2221/68345 ,  H01L2224/05571 ,  H01L2224/05573 ,  H01L2224/16 ,  H01L2924/00014 ,  H01L2924/01004 ,  H01L2924/01019 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/04941 ,  H01L2924/14 ,  H01L2924/19041 ,  H01L2924/30105 ,  H01L2224/05599 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A semiconductor device has integrated passive circuit elements. A first substrate is formed on a backside of the semiconductor device. The passive circuit element is formed over the insulating layer. The passive circuit element can be an inductor, capacitor, or resistor. A passivation layer is formed over the passive circuit element. A carrier is attached to the passivation layer. The first substrate is removed. A non-silicon substrate is formed over the insulating layer on the backside of the semiconductor device. The non-silicon substrate is made with glass, molding compound, epoxy, polymer, or polymer composite. An adhesive layer is formed between the non-silicon substrate and insulating layer. A via is formed between the insulating layer and first passivation layer. The carrier is removed. An under bump metallization is formed over the passivation layer in electrical contact with the passive circuit element. A solder bump is formed on the under bump metallization.

公开(公告)号：USRE44355E1

公开(公告)日：2013-07-09

申请号：US13750975

申请日：2013-01-25

Applicant: STATS ChipPAC, Ltd.

Inventor： Rajendra D. Pendse

IPC: H01L21/44

CPC classification number: H01L23/49811 ,  H01L21/563 ,  H01L21/76885 ,  H01L23/49838 ,  H01L24/13 ,  H01L24/16 ,  H01L24/75 ,  H01L24/81 ,  H01L2224/13111 ,  H01L2224/1607 ,  H01L2224/16225 ,  H01L2224/16238 ,  H01L2224/2919 ,  H01L2224/32225 ,  H01L2224/73203 ,  H01L2224/73204 ,  H01L2224/75 ,  H01L2224/75301 ,  H01L2224/81191 ,  H01L2224/81203 ,  H01L2224/81801 ,  H01L2224/83191 ,  H01L2224/83192 ,  H01L2224/83856 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01033 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/14 ,  H01L2924/15787 ,  H01L2924/181 ,  H01L2924/3011 ,  H01L2924/00014 ,  H01L2924/00

Abstract: A flip chip interconnect is made by mating the interconnect bump directly onto a lead, rather than onto a capture pad. Also, a flip chip package includes a die having solder bumps attached to interconnect pads in an active surface, and a substrate having electrically conductive traces in a die attach surface, in which the bumps are mated directly onto the traces. In some embodiments the interconnection is formed without employing a solder mask. In some methods a curable adhesive is dispensed either onto the bumps on the die or onto the traces on the substrate; the adhesive is partly cured during the mating process, and the partly cured adhesive serves to confine the molten solder during a reflow process.

Abstract translation: 通过将互连凸块直接配合到引线上而不是在捕获垫上来制造倒装芯片互连。 此外，倒装芯片封装包括具有附着到有源表面中的互连焊盘的焊料凸块的芯片，以及在芯片附着表面中具有导电迹线的衬底，其中凸块直接配合到迹线上。 在一些实施例中，互连是在不使用焊接掩模的情况下形成的。 在一些方法中，可固化粘合剂分配到模具上的凸块上或衬底上的迹线上; 粘合剂在配合过程中部分固化，并且部分固化的粘合剂用于在回流过程中限制熔融焊料。