Packaging method of molded wafer level chip scale package (WLCSP)
    61.
    发明授权
    Packaging method of molded wafer level chip scale package (WLCSP) 有权
    模制晶圆级芯片级封装(WLCSP)的封装方法

    公开(公告)号:US08778735B1

    公开(公告)日:2014-07-15

    申请号:US13931854

    申请日:2013-06-29

    摘要: A WLCSP method comprises: depositing a metal bump on bonding pads of chips; forming a first packaging layer at front surface of wafer to cover metal bumps while forming an un-covered ring at the edge of wafer to expose the ends of each scribe line located between two adjacent chips; thinning first packaging layer to expose metal bumps; forming a groove on front surface of first packaging layer along each scribe line by cutting along a straight line extended by two ends of scribe line exposed on front surface of un-covered ring; grinding back surface of wafer to form a recessed space and a support ring at the edge of the wafer; depositing a metal layer at bottom surface of wafer in recessed space; cutting off the edge portion of wafer; and separating individual chips from wafer by cutting through first packaging layer, the wafer and metal layer along groove.

    摘要翻译: WLCSP方法包括:在芯片的焊盘上沉积金属凸块; 在晶片的前表面形成第一包装层以覆盖金属凸块,同时在晶片边缘形成未覆盖的环,以露出位于两个相邻芯片之间的每个划线的端部; 稀释第一包装层以暴露金属凸块; 通过沿着未被覆盖的环的前表面上暴露的划线的两端延伸的直线切割沿着每个划线在第一包装层的前表面上形成凹槽; 研磨晶片的后表面以在晶片的边缘处形成凹陷空间和支撑环; 在凹陷空间中在晶片的底面沉积金属层; 切断晶片的边缘部分; 以及通过沿着沟槽切割第一包装层,晶片和金属层,从晶片分离单个芯片。

    Packaging method of molded wafer level chip scale package (WLCSP)
    64.
    发明授权
    Packaging method of molded wafer level chip scale package (WLCSP) 有权
    模制晶圆级芯片级封装(WLCSP)的封装方法

    公开(公告)号:US08563361B2

    公开(公告)日:2013-10-22

    申请号:US13547358

    申请日:2012-07-12

    IPC分类号: H01L21/00

    摘要: A WLCSP method comprises: depositing a metal bump on bonding pads of chips; forming a first packaging layer at front surface of wafer to cover metal bumps while forming an un-covered ring at the edge of wafer to expose the ends of each scribe line located between two adjacent chips; thinning first packaging layer to expose metal bumps; forming a groove on front surface of first packaging layer along each scribe line by cutting along a straight line extended by two ends of scribe line exposed on front surface of un-covered ring; grinding back surface of wafer to form a recessed space and a support ring at the edge of the wafer; depositing a metal layer at bottom surface of wafer in recessed space; cutting off the edge portion of wafer; and separating individual chips from wafer by cutting through first packaging layer, the wafer and metal layer along groove.

    摘要翻译: WLCSP方法包括:在芯片的焊盘上沉积金属凸块; 在晶片的前表面形成第一包装层以覆盖金属凸块,同时在晶片边缘形成未覆盖的环,以露出位于两个相邻芯片之间的每个划线的端部; 稀释第一包装层以暴露金属凸块; 通过沿着未被覆盖的环的前表面上暴露的划线的两端延伸的直线切割沿着每个划线在第一包装层的前表面上形成凹槽; 研磨晶片的后表面以在晶片的边缘处形成凹陷空间和支撑环; 在凹陷空间中在晶片的底面沉积金属层; 切断晶片的边缘部分; 以及通过沿着沟槽切割第一包装层,晶片和金属层,从晶片分离单个芯片。

    Virtually Substrate-less Composite Power Semiconductor Device
    67.
    发明申请
    Virtually Substrate-less Composite Power Semiconductor Device 有权
    几何无基板复合功率半导体器件

    公开(公告)号:US20120235306A1

    公开(公告)日:2012-09-20

    申请号:US13488424

    申请日:2012-06-04

    申请人: Tao Feng Yueh-Se Ho

    发明人: Tao Feng Yueh-Se Ho

    IPC分类号: H01L23/48

    摘要: A virtually substrate-less composite power semiconductor device (VSLCPSD) and method are disclosed. The VSLCPSD has a power semiconductor device (PSD), a front-face device carrier (FDC) made out of a carrier material and an intervening bonding layer (IBL). Both carrier and IBL material can be conductive or non-conductive. The PSD has back substrate portion, front semiconductor device portion with patterned front-face device metallization pads and a virtually diminishing thickness TPSD. The FDC has patterned back-face carrier metallizations contacting the front-face device metallization pads, patterned front-face carrier metallization pads and numerous parallelly connected through-carrier conductive vias respectively connecting the back-face carrier metallizations to the front-face carrier metallization pads. The FDC thickness TFDC is large enough to provide structural rigidity to the VSLCPSD. The diminishing thickness TPSD effects a low back substrate resistance and the through-carrier conductive vias effect a low front-face contact resistance to the front-face device metallization pads.

    摘要翻译: 公开了一种实际上无衬底的复合功率半导体器件(VSLCPSD)和方法。 VSLCPSD具有功率半导体器件(PSD),由载体材料制成的正面器件载体(FDC)和中间键合层(IBL)。 载体和IBL材料都可以是导电的或不导电的。 PSD具有后衬底部分,具有图案化前面装置金属化焊盘的前半导体器件部分和实际上减小的厚度TPSD。 FDC具有接触前表面器件金属化焊盘,图案化前面载体金属化焊盘和多个并联连接的贯穿载体导电通孔的图案化背面载体金属化,其分别将背面载体金属化物连接到前面载体金属化焊盘 。 FDC厚度TFDC足够大以向VSLCPSD提供结构刚度。 厚度减小的TPSD会影响背面的底层电阻,并且贯穿载体的导电通孔会对前面装置的金属化焊盘产生低的前端接触电阻。