Process for manufacturing semiconductor devices
    4.
    发明授权
    Process for manufacturing semiconductor devices 失效
    制造半导体器件的工艺

    公开(公告)号:US5336638A

    公开(公告)日:1994-08-09

    申请号:US846828

    申请日:1992-03-06

    摘要: Herein disclosed is a process for manufacturing a semiconductor device, which comprises: a step of forming a first electrode composed of tantalum and tungsten over a semiconductor substrate; a step of depositing a dielectric film of tantalum oxide on the first electrode; a step of oxidizing the first electrode and the dielectric film of tantalum oxide; and a step of forming a second electrode over the dielectric film.

    摘要翻译: 这里公开了一种半导体器件的制造方法,其包括:在半导体衬底上形成由钽和钨构成的第一电极的步骤; 在所述第一电极上沉积氧化钽的电介质膜的步骤; 氧化钽的第一电极和电介质膜的氧化步骤; 以及在所述电介质膜上形成第二电极的步骤。