Plasma treatment on semiconductor wafers
    4.
    发明授权
    Plasma treatment on semiconductor wafers 有权
    半导体晶圆上的等离子体处理

    公开(公告)号:US08912653B2

    公开(公告)日:2014-12-16

    申请号:US13327563

    申请日:2011-12-15

    摘要: A semiconductor wafer has integrated circuits formed thereon and a top passivation layer applied. The passivation layer is patterned and selectively etched to expose contact pads on each semiconductor die. The wafer is exposed to ionized gas causing the upper surface of passivation layer to roughen and to slightly roughen the upper surface of the contact pads. The wafer is cut to form a plurality of semiconductor dies each with a roughened passivation layer. The plurality of semiconductor dies are placed on an adhesive layer and a reconstituted wafer formed. Redistribution layers are formed to complete the semiconductor package having electrical contacts for establishing electrical connections external to the semiconductor package, after which the wafer is singulated to separate the dice.

    摘要翻译: 半导体晶片具有形成在其上的集成电路和施加的顶部钝化层。 钝化层被图案化并选择性地蚀刻以暴露每个半导体管芯上的接触焊盘。 将晶片暴露于电离气体中,导致钝化层的上表面变粗糙,并使接触垫的上表面略微变糙。 切割晶片以形成多个具有粗糙化钝化层的半导体管芯。 多个半导体管芯被放置在粘合剂层上并形成重构的晶片。 形成再分布层,以完成具有用于建立半导体封装外部的电连接的电触头的半导体封装,之后将晶片单分割以分离晶片。