CMP apparatus and process sequence method
    127.
    发明授权
    CMP apparatus and process sequence method 有权
    CMP装置和工艺顺序法

    公开(公告)号:US07118451B2

    公开(公告)日:2006-10-10

    申请号:US10788702

    申请日:2004-02-27

    IPC分类号: B24B49/00

    摘要: A CMP apparatus and process sequence. The CMP apparatus includes multiple polishing pads or belts and an in-line metrology tool which is interposed between adjacent polishing pads or belts in the apparatus. A material layer on each of multiple wafers is successively polished on the polishing pads or belts. The metrology tool is used to measure the thickness of a material layer being polished on each of successive wafers in a lot prior to the final polishing step, in order to precisely polish the layer to a desired target thickness at the final polishing step. This renders unnecessary an additional process cycle to polish the layer on each wafer to the desired target thickness. The metrology tool may be modularized as a unit with the polishing pads or belts.

    摘要翻译: CMP装置和处理顺序。 CMP装置包括多个抛光垫或带以及插入在装置中的相邻抛光垫或带之间的在线计量工具。 在多个晶片的每一个上的材料层在抛光垫或带上连续抛光。 测量工具用于测量在最终抛光步骤之前在批次中的每个连续晶片上抛光的材料层的厚度,以便在最终抛光步骤中将层精确抛光到所需目标厚度。 这使得不需要额外的处理循环来将每个晶片上的层抛光到期望的目标厚度。 测量工具可以模块化为具有抛光垫或带的单元。