Method of making an interposer with contact structures
    21.
    发明申请
    Method of making an interposer with contact structures 审中-公开
    制造具有接触结构的插入件的方法

    公开(公告)号:US20070017093A1

    公开(公告)日:2007-01-25

    申请号:US11528137

    申请日:2006-09-27

    Abstract: A method of making an interposer having an array of contact structures for making temporary electrical contact with the leads of a chip package. The contact structures may make contact with the leads as close as desired to the body of the chip package. Moreover, the contact structures can be adapted for making contact with leads having a very fine pitch. In one embodiment, the contact structures include raised members formed over a body of the interposer. A conductive layer is formed over each of the raised members to provide a contact surface for engaging the leads of the chip package. In another embodiment, the raised members are replaced with depressions formed into the interposer. A conductive layer is formed on an inside surface of each depression to provide a contact surface for engaging the leads of the chip package. Any combination of raised members and depressions may be used.

    Abstract translation: 一种制造具有用于与芯片封装的引线暂时电接触的接触结构阵列的插入件的方法。 接触结构可以使引线接近芯片封装体的所需位置。 此外,接触结构可以适于与具有非常细的间距的引线接触。 在一个实施例中,接触结构包括形成在插入件的主体上的凸起部件。 在每个凸起构件上形成导电层,以提供用于接合芯片封装引线的接触表面。 在另一个实施例中,凸起构件被形成在插入件中的凹陷所代替。 在每个凹陷的内表面上形成导电层,以提供用于接合芯片封装的引线的接触表面。 可以使用凸起构件和凹陷的任何组合。

    Microelectronic imagers with optical devices having integral reference features and methods for manufacturing such microelectronic imagers
    22.
    发明申请
    Microelectronic imagers with optical devices having integral reference features and methods for manufacturing such microelectronic imagers 有权
    具有整体参考特征的光学器件的微电子成像器和用于制造这种微电子成像器的方法

    公开(公告)号:US20060043512A1

    公开(公告)日:2006-03-02

    申请号:US10925406

    申请日:2004-08-24

    Abstract: Microelectronic imager assemblies with optical devices having integral reference features and methods for assembling such microelectronic imagers is disclosed herein. In one embodiment, the imager assembly can include a workpiece with a substrate having a front side, a back side, and a plurality of imaging dies on and/or in the substrate. The imaging dies include image sensors, integrated circuitry operatively coupled to the image sensors, and external contacts electrically coupled to the integrated circuitry. The assembly also includes optics supports on the workpiece. The optics supports have openings aligned with corresponding image sensors and first interface features at reference locations relative to corresponding image sensors. The assembly further includes optical devices having optics elements and second interface features seated with corresponding first interface features to position the optics elements at a desired location relative to corresponding image sensors.

    Abstract translation: 本文公开了具有整体参考特征的光学装置的微电子成像器组件和用于组装这种微电子成像器的方法。 在一个实施例中,成像器组件可以包括具有衬底的工件,其具有在衬底上和/或衬底中的前侧,后侧和多个成像管芯。 成像管芯包括图像传感器,可操作地耦合到图像传感器的集成电路以及电耦合到集成电路的外部触点。 组件还包括工件上的光学支架。 光学支架具有与对应的图像传感器对准的开口和相对于相应图像传感器的参考位置处的第一界面特征。 组件还包括具有光学元件的光学装置和与对应的第一界面特征相对的第二界面特征,以将光学元件相对于相应的图像传感器定位在期望的位置。

    Method and apparatus for testing bumped die
    29.
    发明申请
    Method and apparatus for testing bumped die 审中-公开
    碰撞模具测试方法和装置

    公开(公告)号:US20070063722A1

    公开(公告)日:2007-03-22

    申请号:US11601546

    申请日:2006-11-17

    Applicant: James Wark

    Inventor: James Wark

    Abstract: An apparatus for testing unpackaged semiconductor dice having raised ball contact locations is disclosed. The apparatus uses a temporary interconnect wafer that is adapted to establish an electrical connection with the raised ball contact locations on the die without damage to the ball contact locations. The interconnect is fabricated on a substrate, such as silicon, where contact members are formed in a pattern that matches the size and spacing of the ball contact locations on the die to be tested. The contact members on the interconnect wafer are formed as either pits, troughs, or spike contacts. The spike contacts penetrate through the oxide layer formed on the raised ball contact locations. Conductive traces are provided in both rows and columns and are terminated on the inner edges of the walls of the pits formed in the substrate.

    Abstract translation: 公开了一种用于测试具有凸起的球接触位置的未包装半导体晶片的测试装置。 该装置使用临时互连晶片,其适于与模具上的凸起的球接触位置建立电连接,而不损坏球接触位置。 互连制造在诸如硅的衬底上,其中接触构件以与待测试的管芯上的球接触位置的尺寸和间距匹配的图案形成。 互连晶片上的接触构件形成为凹坑,凹槽或尖峰触点。 尖钉触点穿过形成在凸起接触位置上的氧化物层。 导电迹线设置在行和列中,并且终止于形成在基板中的凹坑的壁的内边缘。

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