Structure for Bumped Wafer Test
    60.
    发明申请
    Structure for Bumped Wafer Test 有权
    冲击晶片测试结构

    公开(公告)号:US20110121295A1

    公开(公告)日:2011-05-26

    申请号:US13019643

    申请日:2011-02-02

    IPC分类号: H01L23/488

    摘要: A semiconductor device includes a substrate having a first conductive layer disposed on a top surface of the substrate. A first insulation layer is formed over the substrate and contacts a sidewall of the first conductive layer. A second conductive layer is formed over the first insulation layer. The second conductive layer includes a first portion disposed over the first conductive layer and a second portion that extends beyond an end of the first conductive layer. A second insulation layer is formed over the second conductive layer. A first opening in the second insulation layer exposes the first portion of the second conductive layer. A second opening in the second insulation layer away from the first opening exposes the second portion of the second conductive layer. The second insulation layer is maintained around the first opening. A conductive bump is formed over the first portion of the second conductive layer.

    摘要翻译: 半导体器件包括具有设置在衬底顶表面上的第一导电层的衬底。 第一绝缘层形成在衬底上并与第一导电层的侧壁接触。 在第一绝缘层上形成第二导电层。 第二导电层包括设置在第一导电层上的第一部分和延伸超出第一导电层的端部的第二部分。 在第二导电层上形成第二绝缘层。 第二绝缘层中的第一开口露出第二导电层的第一部分。 远离第一开口的第二绝缘层中的第二开口暴露第二导电层的第二部分。 第二绝缘层保持在第一开口周围。 导电凸块形成在第二导电层的第一部分之上。