IMAGE SENSOR CHIP PACKAGE AND METHOD FOR FORMING THE SAME
    23.
    发明申请
    IMAGE SENSOR CHIP PACKAGE AND METHOD FOR FORMING THE SAME 审中-公开
    图像传感器芯片封装及其形成方法

    公开(公告)号:US20140154830A1

    公开(公告)日:2014-06-05

    申请号:US14173526

    申请日:2014-02-05

    Applicant: XINTEC INC

    Abstract: A method for forming an image sensor chip package includes: providing a substrate having predetermined scribe lines defined thereon, wherein the predetermined scribe lines define device regions and each of the device regions has at least a device formed therein; disposing a support substrate on a first surface of the substrate; forming at least a spacer layer between the support substrate and the substrate, wherein the spacer layer covers the predetermined scribe lines; forming a package layer on a second surface of the substrate; forming conducting structures on the second surface of the substrate, wherein the conducting structures are electrically connected to the corresponding device in corresponding one of the device regions, respectively; and dicing along the predetermined scribe lines such that the support substrate is removed from the substrate and the substrate is separated into a plurality of individual image sensor chip packages.

    Abstract translation: 一种用于形成图像传感器芯片封装的方法,包括:提供具有限定在其上的预定划线的基板,其中,所述预定划线限定器件区域,并且每个器件区域至少具有形成在其中的器件; 将支撑基板设置在所述基板的第一表面上; 在所述支撑基板和所述基板之间形成至少间隔层,其中所述间隔层覆盖所述预定划线; 在所述基板的第二表面上形成封装层; 在所述衬底的第二表面上形成导电结构,其中所述导电结构分别在相应的一个所述器件区域中电连接到相应的器件; 并且沿着预定的划线切割,使得支撑基板从基板移除,并且基板被分离成多个单独的图像传感器芯片封装。

    CHIP PACKAGE AND METHOD FOR FORMING THE SAME
    24.
    发明申请
    CHIP PACKAGE AND METHOD FOR FORMING THE SAME 有权
    芯片包装及其形成方法

    公开(公告)号:US20130307137A1

    公开(公告)日:2013-11-21

    申请号:US13898300

    申请日:2013-05-20

    Applicant: XINTEC INC.

    Abstract: Embodiments of the present invention provide a chip package including: a semiconductor substrate having a first surface and a second surface; a device region formed in the semiconductor substrate; a dielectric layer disposed on the first surface; and a conducting pad structure disposed in the dielectric layer and electrically connected to the device region; a cover substrate disposed between the chip and the cover substrate, wherein the spacer layer, a cavity is created an surrounded by the chip and the cover substrate on the device region, and the spacer layer is in direct contact with the chip without any adhesion glue disposed between the chip and the spacer layer.

    Abstract translation: 本发明的实施例提供了一种芯片封装,包括:具有第一表面和第二表面的半导体衬底; 形成在所述半导体衬底中的器件区域; 设置在所述第一表面上的电介质层; 以及导电焊盘结构,其设置在所述电介质层中并电连接到所述器件区域; 设置在所述芯片和所述盖基板之间的覆盖基板,其中所述间隔层,空腔由所述芯片和所述器件区域上的覆盖基板所围绕,并且所述间隔层与所述芯片直接接触而没有任何粘合胶 设置在芯片和间隔层之间。

    SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF
    29.
    发明申请
    SEMICONDUCTOR STRUCTURE AND MANUFACTURING METHOD THEREOF 有权
    半导体结构及其制造方法

    公开(公告)号:US20160329283A1

    公开(公告)日:2016-11-10

    申请号:US15140289

    申请日:2016-04-27

    Applicant: XINTEC INC.

    Abstract: A semiconductor structure includes a first substrate, a second substrate, a dam layer, a photoresist layer, and a conductive layer. The first substrate has a conductive pad. The second substrate has a through via, a sidewall surface surrounding the through via, a first surface, and a second surface opposite to the first surface. The through via penetrates through the first and second surfaces. The conductive pad is aligned with the through via. The dam layer is located between the first substrate and the second surface. The dam layer protrudes toward the through via. The photoresist layer is located on the first surface, the sidewall surface, the dam layer protruding toward the through via, and between the conductive pad and the dam layer protruding toward the through via. The conductive layer is located on the photoresist layer and the conductive pad.

    Abstract translation: 半导体结构包括第一基板,第二基板,阻挡层,光致抗蚀剂层和导电层。 第一基板具有导电垫。 第二基板具有通孔,围绕通孔的侧壁表面,第一表面和与第一表面相对的第二表面。 通孔穿过第一和第二表面。 导电垫与通孔对齐。 坝层位于第一基板和第二表面之间。 坝层朝向通孔突出。 光致抗蚀剂层位于第一表面上,侧壁表面,阻挡层朝向通孔突出,并且在导电垫和阻挡层之间朝向通孔突出。 导电层位于光致抗蚀剂层和导电垫上。

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