公开(公告)号：US09076803B2

公开(公告)日：2015-07-07

申请号：US14063274

申请日：2013-10-25

Applicant: STATS ChipPAC, Ltd.

Inventor： Reza A. Pagaila

IPC: H01L23/48 ,  H01L23/52 ,  H01L29/40 ,  H01L21/44 ,  H01L21/48 ,  H01L21/50 ,  H01L21/56 ,  H01L21/683 ,  H01L23/498 ,  H01L23/538 ,  H01L23/552 ,  H01L25/065 ,  H01L23/31 ,  H01L23/00

CPC classification number: H01L25/0657 ,  H01L21/56 ,  H01L21/561 ,  H01L21/568 ,  H01L21/6835 ,  H01L23/3107 ,  H01L23/3128 ,  H01L23/49811 ,  H01L23/49816 ,  H01L23/49827 ,  H01L23/5389 ,  H01L23/552 ,  H01L24/11 ,  H01L24/16 ,  H01L24/19 ,  H01L24/24 ,  H01L24/25 ,  H01L24/81 ,  H01L24/82 ,  H01L24/96 ,  H01L24/97 ,  H01L25/50 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/16145 ,  H01L2224/16227 ,  H01L2224/18 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06527 ,  H01L2225/06537 ,  H01L2225/06548 ,  H01L2924/00011 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01076 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2924/18162 ,  H01L2924/19041 ,  H01L2924/30105 ,  H01L2924/3025 ,  H01L2224/82 ,  H01L2924/00 ,  H01L2224/81 ,  H01L2924/00012 ,  H01L2224/81805

Abstract: A semiconductor device has a first interconnect structure. A first semiconductor die has an active surface oriented towards and mounted to a first surface of the first interconnect structure. A first encapsulant is deposited over the first interconnect structure and first semiconductor die. A second semiconductor die has an active surface oriented towards and mounted to a second surface of the first interconnect structure opposite the first surface. A plurality of first conductive pillars is formed over the second surface of the first interconnect structure and around the second semiconductor die. A second encapsulant is deposited over the second semiconductor die and around the plurality of first conductive pillars. A second interconnect structure including a conductive layer and bumps are formed over the second encapsulant and electrically connect to the plurality of first conductive pillars and the first and second semiconductor die.

Abstract translation: 半导体器件具有第一互连结构。 第一半导体管芯具有朝向并安装到第一互连结构的第一表面的有源表面。 第一密封剂沉积在第一互连结构和第一半导体管芯上。 第二半导体管芯具有朝向并安装到与第一表面相对的第一互连结构的第二表面的有源表面。 多个第一导电柱形成在第一互连结构的第二表面上并且围绕第二半导体管芯。 第二密封剂沉积在第二半导体管芯上并围绕多个第一导电柱。 包括导电层和凸块的第二互连结构形成在第二密封剂上并且电连接到多个第一导电柱和第一和第二半导体管芯。

公开(公告)号：US08994184B2

公开(公告)日：2015-03-31

申请号：US13887180

申请日：2013-05-03

Applicant: STATS ChipPAC, Ltd.

Inventor： Reza A. Pagaila

IPC: H01L23/538 ,  H01L21/48 ,  H01L21/683 ,  H01L23/31 ,  H01L23/00 ,  H01L23/498 ,  H01L21/56 ,  H01L23/544 ,  H05K1/11 ,  H05K3/42 ,  H05K3/46 ,  H01L25/065 ,  H01L25/10 ,  H01L25/00

CPC classification number: H01L23/5384 ,  H01L21/486 ,  H01L21/561 ,  H01L21/563 ,  H01L21/6835 ,  H01L23/3107 ,  H01L23/3121 ,  H01L23/3128 ,  H01L23/49827 ,  H01L23/49833 ,  H01L23/5389 ,  H01L23/544 ,  H01L24/03 ,  H01L24/05 ,  H01L24/06 ,  H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L24/19 ,  H01L24/20 ,  H01L24/29 ,  H01L24/83 ,  H01L24/96 ,  H01L24/97 ,  H01L25/0657 ,  H01L25/105 ,  H01L25/50 ,  H01L2221/68327 ,  H01L2221/68345 ,  H01L2221/68381 ,  H01L2221/68386 ,  H01L2223/54426 ,  H01L2224/0345 ,  H01L2224/03452 ,  H01L2224/03462 ,  H01L2224/03464 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/06131 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/1134 ,  H01L2224/1145 ,  H01L2224/11462 ,  H01L2224/11464 ,  H01L2224/11849 ,  H01L2224/11901 ,  H01L2224/12105 ,  H01L2224/131 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/16225 ,  H01L2224/21 ,  H01L2224/2105 ,  H01L2224/215 ,  H01L2224/22 ,  H01L2224/221 ,  H01L2224/29144 ,  H01L2224/2919 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48105 ,  H01L2224/48175 ,  H01L2224/48227 ,  H01L2224/48228 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/83005 ,  H01L2224/8385 ,  H01L2224/92244 ,  H01L2224/94 ,  H01L2224/95001 ,  H01L2224/95121 ,  H01L2224/96 ,  H01L2224/97 ,  H01L2225/06517 ,  H01L2225/06548 ,  H01L2225/06558 ,  H01L2225/1023 ,  H01L2225/1035 ,  H01L2225/1041 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/0105 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/0665 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/181 ,  H05K1/115 ,  H05K3/429 ,  H05K3/4647 ,  H05K2201/09518 ,  H01L2924/01014 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2224/83 ,  H01L2224/82 ,  H01L2924/00012 ,  H01L2224/03

Abstract: A semiconductor device has a substrate with a plurality of conductive vias and conductive layer formed over the substrate. A semiconductor die is mounted over a carrier. The substrate is mounted to the semiconductor die opposite the carrier. An encapsulant is deposited between the substrate and carrier around the semiconductor die. A plurality of conductive TMVs is formed through the substrate and encapsulant. The conductive TMVs protrude from the encapsulant to aid with alignment of the interconnect structure. The conductive TMVs are electrically connected to the conductive layer and conductive vias. The carrier is removed and an interconnect structure is formed over a surface of the encapsulant and semiconductor die opposite the substrate. The interconnect structure is electrically connected to the conductive TMVs. A plurality of semiconductor devices can be stacked and electrically connected through the substrate, conductive TMVs, and interconnect structure.

Abstract translation: 半导体器件具有在衬底上形成多个导电通孔和导电层的衬底。 半导体管芯安装在载体上。 衬底被安装到与载体相对的半导体管芯上。 在半导体管芯周围的衬底和载体之间沉积密封剂。 通过衬底和密封剂形成多个导电TMV。 导电TMV从密封剂突出以帮助互连结构的对准。 导电TMV电连接到导电层和导电通孔。 移除载体并且在与衬底相对的密封剂和半导体管芯的表面上形成互连结构。 互连结构电连接到导电TMV。 多个半导体器件可以通过衬底层叠并电连接，导电TMV和互连结构。

公开(公告)号：US08896109B2

公开(公告)日：2014-11-25

申请号：US13684055

申请日：2012-11-21

Applicant: STATS ChipPAC, Ltd.

Inventor： Reza A. Pagaila ,  Seng Guan Chow ,  Seung Uk Yoon

IPC: H01L23/02 ,  H01L23/06 ,  H01L23/22 ,  H01L21/44 ,  H01L21/50 ,  H01L25/065 ,  H01L23/00 ,  H01L25/16 ,  H01L23/498 ,  H01L25/00 ,  H01L23/538 ,  H01L21/56 ,  H01L25/10 ,  H01L23/31

CPC classification number: H01L23/49811 ,  H01L21/561 ,  H01L21/568 ,  H01L23/3128 ,  H01L23/5389 ,  H01L24/17 ,  H01L24/19 ,  H01L24/96 ,  H01L24/97 ,  H01L25/0652 ,  H01L25/0657 ,  H01L25/105 ,  H01L25/16 ,  H01L25/50 ,  H01L2224/03462 ,  H01L2224/03464 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/0557 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/12105 ,  H01L2224/13025 ,  H01L2224/1403 ,  H01L2224/141 ,  H01L2224/16145 ,  H01L2224/16146 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/1703 ,  H01L2224/18 ,  H01L2224/2518 ,  H01L2224/73209 ,  H01L2224/73259 ,  H01L2224/73267 ,  H01L2224/81005 ,  H01L2224/8203 ,  H01L2224/92124 ,  H01L2224/9222 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06524 ,  H01L2225/06541 ,  H01L2225/06548 ,  H01L2225/06562 ,  H01L2225/1035 ,  H01L2225/1052 ,  H01L2225/1058 ,  H01L2225/107 ,  H01L2924/00014 ,  H01L2924/01004 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/00 ,  H01L2224/05552 ,  H01L2224/82 ,  H01L2224/81

Abstract: A semiconductor device has a first semiconductor die mounted over a carrier. Wettable contact pads can be formed over the carrier. A second semiconductor die is mounted over the first semiconductor die. The second die is laterally offset with respect to the first die. An electrical interconnect is formed between an overlapping portion of the first die and second die. A plurality of first conductive pillars is disposed over the first die. A plurality of second conductive pillars is disposed over the second die. An encapsulant is deposited over the first and second die and first and second conductive pillars. A first interconnect structure is formed over the encapsulant, first conductive pillars, and second die. The carrier is removed. A second interconnect structure is formed over the encapsulant, second conductive pillars, and first die. A third conductive pillar is formed between the first and second build-up interconnect structures.

Abstract translation: 半导体器件具有安装在载体上的第一半导体管芯。 可以在载体上形成可润湿的接触垫。 第二半导体管芯安装在第一半导体管芯上。 第二模具相对于第一模具横向偏移。 在第一管芯和第二管芯的重叠部分之间形成电互连。 多个第一导电柱设置在第一管芯上方。 多个第二导电柱设置在第二管芯上。 密封剂沉积在第一和第二管芯以及第一和第二导电柱上。 在密封剂，第一导电柱和第二模上形成第一互连结构。 载体被移除。 在密封剂，第二导电柱和第一模上形成第二互连结构。 在第一和第二堆积互连结构之间形成第三导电柱。

公开(公告)号：US20140327145A9

公开(公告)日：2014-11-06

申请号：US13715424

申请日：2012-12-14

Applicant: STATS CHIPPAC, LTD.

Inventor： Reza A. Pagaila ,  Seng Guan Chow ,  Seung Uk Yoon

IPC: H01L23/538

CPC classification number: H01L25/50 ,  H01L21/486 ,  H01L21/56 ,  H01L21/561 ,  H01L21/568 ,  H01L21/6835 ,  H01L23/295 ,  H01L23/3107 ,  H01L23/3121 ,  H01L23/3128 ,  H01L23/3157 ,  H01L23/49827 ,  H01L23/49833 ,  H01L23/5384 ,  H01L23/5389 ,  H01L23/544 ,  H01L24/03 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L24/19 ,  H01L24/20 ,  H01L24/24 ,  H01L24/25 ,  H01L24/27 ,  H01L24/29 ,  H01L24/32 ,  H01L24/48 ,  H01L24/73 ,  H01L24/82 ,  H01L24/83 ,  H01L24/97 ,  H01L25/03 ,  H01L25/0655 ,  H01L25/0657 ,  H01L25/105 ,  H01L25/16 ,  H01L2221/68345 ,  H01L2221/68381 ,  H01L2221/68386 ,  H01L2223/54426 ,  H01L2224/0345 ,  H01L2224/03452 ,  H01L2224/03462 ,  H01L2224/03464 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/04105 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/06131 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/1134 ,  H01L2224/1145 ,  H01L2224/11462 ,  H01L2224/11464 ,  H01L2224/11849 ,  H01L2224/11901 ,  H01L2224/12105 ,  H01L2224/131 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/16225 ,  H01L2224/21 ,  H01L2224/2105 ,  H01L2224/215 ,  H01L2224/22 ,  H01L2224/221 ,  H01L2224/24011 ,  H01L2224/2405 ,  H01L2224/24101 ,  H01L2224/24226 ,  H01L2224/24227 ,  H01L2224/245 ,  H01L2224/25171 ,  H01L2224/27002 ,  H01L2224/29 ,  H01L2224/2902 ,  H01L2224/29101 ,  H01L2224/29144 ,  H01L2224/2919 ,  H01L2224/29298 ,  H01L2224/32155 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48105 ,  H01L2224/48175 ,  H01L2224/48227 ,  H01L2224/48228 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/82101 ,  H01L2224/82104 ,  H01L2224/82106 ,  H01L2224/83005 ,  H01L2224/83191 ,  H01L2224/8385 ,  H01L2224/94 ,  H01L2224/95001 ,  H01L2224/97 ,  H01L2225/06548 ,  H01L2225/1035 ,  H01L2225/1041 ,  H01L2225/1052 ,  H01L2225/107 ,  H01L2924/00013 ,  H01L2924/00014 ,  H01L2924/01004 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/0105 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/0665 ,  H01L2924/078 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/15153 ,  H01L2924/15311 ,  H01L2924/15331 ,  H01L2924/181 ,  H05K1/186 ,  H05K3/007 ,  H05K2201/10674 ,  H01L2224/81 ,  H01L2924/01014 ,  H01L2224/82 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/29099 ,  H01L2224/29199 ,  H01L2224/29299 ,  H01L2224/2929 ,  H01L2224/03 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A semiconductor device has a first semiconductor die mounted over a carrier. An interposer frame has an opening in the interposer frame and a plurality of conductive pillars formed over the interposer frame. The interposer is mounted over the carrier and first die with the conductive pillars disposed around the die. A cavity can be formed in the interposer frame to contain a portion of the first die. An encapsulant is deposited through the opening in the interposer frame over the carrier and first die. Alternatively, the encapsulant is deposited over the carrier and first die and the interposer frame is pressed against the encapsulant. Excess encapsulant exits through the opening in the interposer frame. The carrier is removed. An interconnect structure is formed over the encapsulant and first die. A second semiconductor die can be mounted over the first die or over the interposer frame.

Abstract translation: 半导体器件具有安装在载体上的第一半导体管芯。 插入器框架在插入器框架中具有开口，并且在内插器框架上形成多个导电柱。 插入器安装在载体上，并且第一管芯与设置在管芯周围的导电柱相连。 可以在插入器框架中形成空腔以容纳第一模具的一部分。 密封剂通过载体和第一模具上的插入器框架中的开口沉积。 或者，密封剂沉积在载体上并且第一模头和插入器框架被压靠在密封剂上。 过多的密封剂通过插入器框架中的开口离开。 载体被移除。 在密封剂和第一模具上形成互连结构。 第二半导体管芯可以安装在第一管芯上方或内插架框架上。

公开(公告)号：US20140291820A1

公开(公告)日：2014-10-02

申请号：US14303484

申请日：2014-06-12

Applicant: STATS ChipPAC, Ltd.

Inventor： Reza A. Pagaila

IPC: H01L23/552 ,  H01L21/768 ,  H01L21/3205

CPC classification number: H01L21/76805 ,  H01L21/3205 ,  H01L21/76898 ,  H01L23/552 ,  H01L24/48 ,  H01L24/49 ,  H01L24/73 ,  H01L2224/02372 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/05548 ,  H01L2224/13025 ,  H01L2224/16225 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/48465 ,  H01L2224/49107 ,  H01L2224/73204 ,  H01L2224/73257 ,  H01L2224/73265 ,  H01L2924/00014 ,  H01L2924/01029 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/19107 ,  H01L2924/3011 ,  H01L2924/3025 ,  H01L2924/00 ,  H01L2224/45099 ,  H01L2924/00012

Abstract: A semiconductor wafer contains a plurality of semiconductor die separated by a non-active area of the semiconductor wafer. A plurality of contact pads is formed on an active surface of the semiconductor die. A first insulating layer is formed over the semiconductor wafer. A portion of the first insulating layer is removed to expose the contact pads on the semiconductor die. An opening is formed partially through the semiconductor wafer in the active surface of the semiconductor die or in the non-active area of the semiconductor wafer. A second insulating layer is formed in the opening in the semiconductor wafer. A shielding layer is formed over the active surface. The shielding layer extends into the opening of the semiconductor wafer to form a conductive via. A portion of a back surface of the semiconductor wafer is removed to singulate the semiconductor die.

Abstract translation: 半导体晶片包含由半导体晶片的非有源区域分离的多个半导体管芯。 在半导体管芯的有源表面上形成多个接触焊盘。 在半导体晶片上形成第一绝缘层。 去除第一绝缘层的一部分以露出半导体管芯上的接触焊盘。 半导体晶片的有源表面中的半导体晶片或半导体晶片的非有源区域部分地形成开口。 第二绝缘层形成在半导体晶片的开口中。 在活性表面上形成屏蔽层。 屏蔽层延伸到半导体晶片的开口中以形成导电通孔。 半导体晶片的背面的一部分被去除以对半导体管芯进行分割。

公开(公告)号：US20140048932A1

公开(公告)日：2014-02-20

申请号：US14063274

申请日：2013-10-25

Applicant: STATS ChipPAC, Ltd.

Inventor： Reza A. Pagaila

IPC: H01L21/56 ,  H01L23/498

CPC classification number: H01L25/0657 ,  H01L21/56 ,  H01L21/561 ,  H01L21/568 ,  H01L21/6835 ,  H01L23/3107 ,  H01L23/3128 ,  H01L23/49811 ,  H01L23/49816 ,  H01L23/49827 ,  H01L23/5389 ,  H01L23/552 ,  H01L24/11 ,  H01L24/16 ,  H01L24/19 ,  H01L24/24 ,  H01L24/25 ,  H01L24/81 ,  H01L24/82 ,  H01L24/96 ,  H01L24/97 ,  H01L25/50 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/16145 ,  H01L2224/16227 ,  H01L2224/18 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06527 ,  H01L2225/06537 ,  H01L2225/06548 ,  H01L2924/00011 ,  H01L2924/01004 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01076 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2924/18162 ,  H01L2924/19041 ,  H01L2924/30105 ,  H01L2924/3025 ,  H01L2224/82 ,  H01L2924/00 ,  H01L2224/81 ,  H01L2924/00012 ,  H01L2224/81805

Abstract: A semiconductor device has a first interconnect structure. A first semiconductor die has an active surface oriented towards and mounted to a first surface of the first interconnect structure. A first encapsulant is deposited over the first interconnect structure and first semiconductor die. A second semiconductor die has an active surface oriented towards and mounted to a second surface of the first interconnect structure opposite the first surface. A plurality of first conductive pillars is formed over the second surface of the first interconnect structure and around the second semiconductor die. A second encapsulant is deposited over the second semiconductor die and around the plurality of first conductive pillars. A second interconnect structure including a conductive layer and bumps are formed over the second encapsulant and electrically connect to the plurality of first conductive pillars and the first and second semiconductor die.

Abstract translation: 半导体器件具有第一互连结构。 第一半导体管芯具有朝向并安装到第一互连结构的第一表面的有源表面。 第一密封剂沉积在第一互连结构和第一半导体管芯上。 第二半导体管芯具有朝向并安装到与第一表面相对的第一互连结构的第二表面的有源表面。 多个第一导电柱形成在第一互连结构的第二表面上并且围绕第二半导体管芯。 第二密封剂沉积在第二半导体管芯上并围绕多个第一导电柱。 包括导电层和凸块的第二互连结构形成在第二密封剂上并且电连接到多个第一导电柱和第一和第二半导体管芯。

公开(公告)号：US20130299975A1

公开(公告)日：2013-11-14

申请号：US13944783

申请日：2013-07-17

Applicant: STATS ChipPAC, Ltd.

Inventor： Reza A. Pagaila ,  Byung Tai Do ,  Linda Pei Ee Chua

IPC: H01L23/48 ,  H01L21/50

CPC classification number: H01L23/481 ,  H01L21/50 ,  H01L21/568 ,  H01L21/6835 ,  H01L23/3157 ,  H01L24/18 ,  H01L24/19 ,  H01L24/48 ,  H01L24/73 ,  H01L24/82 ,  H01L24/97 ,  H01L25/0657 ,  H01L25/50 ,  H01L2221/68345 ,  H01L2224/02371 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/18 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/82005 ,  H01L2224/82039 ,  H01L2224/9222 ,  H01L2224/92244 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06524 ,  H01L2225/06541 ,  H01L2924/00014 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01023 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/12042 ,  H01L2924/12044 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/19043 ,  H01L2924/19107 ,  H01L2924/30105 ,  H01L2224/82 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A semiconductor device is made by providing a first semiconductor wafer having semiconductor die. A gap is made between the semiconductor die. An insulating material is deposited in the gap. A portion of the insulating material is removed to form a first through hole via (THV). A conductive lining is conformally deposited in the first THV. A solder material is disposed above the conductive lining of the first THV. A second semiconductor wafer having semiconductor die is disposed over the first wafer. A second THV is formed in a gap between the die of the second wafer. A conductive lining is conformally deposited in the second THV. A solder material is disposed above the second THV. The second THV is aligned to the first THV. The solder material is reflowed to form the conductive vias within the gap. The gap is singulated to separate the semiconductor die.

公开(公告)号：US20130292850A1

公开(公告)日：2013-11-07

申请号：US13935963

申请日：2013-07-05

Applicant: STATS CHIPPAC, LTD.

Inventor： Linda Pei Ee Chua ,  Byung Tai Do ,  Reza A. Pagaila

IPC: H01L23/538 ,  H01L23/00

CPC classification number: H01L25/0657 ,  H01L21/288 ,  H01L21/561 ,  H01L21/565 ,  H01L21/568 ,  H01L21/76879 ,  H01L21/76885 ,  H01L21/78 ,  H01L23/13 ,  H01L23/3114 ,  H01L23/3128 ,  H01L23/48 ,  H01L23/481 ,  H01L23/49811 ,  H01L23/49816 ,  H01L23/49838 ,  H01L23/52 ,  H01L23/5384 ,  H01L23/5389 ,  H01L23/552 ,  H01L24/17 ,  H01L24/19 ,  H01L24/82 ,  H01L24/96 ,  H01L24/97 ,  H01L25/03 ,  H01L25/50 ,  H01L29/40 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/05111 ,  H01L2224/05124 ,  H01L2224/05139 ,  H01L2224/05144 ,  H01L2224/05147 ,  H01L2224/05155 ,  H01L2224/12105 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/20 ,  H01L2224/2518 ,  H01L2224/2919 ,  H01L2224/32145 ,  H01L2224/32502 ,  H01L2224/48091 ,  H01L2224/48106 ,  H01L2224/48228 ,  H01L2224/73253 ,  H01L2224/73259 ,  H01L2224/73265 ,  H01L2224/97 ,  H01L2225/0651 ,  H01L2225/06517 ,  H01L2225/06548 ,  H01L2225/1035 ,  H01L2225/1041 ,  H01L2225/1058 ,  H01L2225/1088 ,  H01L2924/01004 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01047 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/1815 ,  H01L2224/82 ,  H01L2224/81 ,  H01L2924/00 ,  H01L2924/00012

Abstract: A semiconductor device has conductive pillars formed over a carrier. A first semiconductor die is mounted over the carrier between the conductive pillars. An encapsulant is deposited over the first semiconductor die and carrier and around the conductive pillars. A recess is formed in a first surface of the encapsulant over the first semiconductor die. The recess has sloped or stepped sides. A first interconnect structure is formed over the first surface of the encapsulant. The first interconnect structure follows a contour of the recess in the encapsulant. The carrier is removed. A second interconnect structure is formed over a second surface of the encapsulant and first semiconductor die. The first and second interconnect structures are electrically connected to the conductive pillars. A second semiconductor die is mounted in the recess. A third semiconductor die is mounted over the recess and second semiconductor die.

Abstract translation: 半导体器件具有在载体上形成的导电柱。 第一半导体管芯安装在载体之间的导电柱之间。 密封剂沉积在第一半导体管芯和载体上并且围绕导电柱。 在第一半导体管芯上的密封剂的第一表面中形成凹部。 凹槽有倾斜或阶梯。 在密封剂的第一表面上形成第一互连结构。 第一互连结构遵循密封剂中的凹部的轮廓。 载体被移除。 在密封剂和第一半导体管芯的第二表面上形成第二互连结构。 第一和第二互连结构电连接到导电柱。 第二半导体管芯安装在凹槽中。 第三半导体管芯安装在凹槽和第二半导体管芯上。

公开(公告)号：US20130087928A1

公开(公告)日：2013-04-11

申请号：US13691578

申请日：2012-11-30

Applicant: STATS ChipPAC, Ltd.

Inventor： Reza A. Pagaila ,  Byung Tai Do ,  Nathapong Suthiwongsunthorn

IPC: H01L23/538 ,  H01L21/48

CPC classification number: H01L23/5384 ,  H01L21/486 ,  H01L21/76898 ,  H01L2224/16225 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2924/01322 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/00 ,  H01L2924/00014

Abstract: A semiconductor wafer has an insulating layer formed over an active surface of the wafer. A conductive layer is formed over the insulating layer. A first via is formed from a back surface of the semiconductor wafer through the semiconductor wafer and insulating layer to the conductive layer. A conductive material is deposited in the first via to form a conductive TSV. An insulating material can be deposited in the first via to form an insulating core within the conductive via. After forming the conductive TSV, a second via is formed around the conductive TSV from the back surface of the semiconductor wafer through the semiconductor wafer and insulating layer to the conductive layer. An insulating material is deposited in the second via to form an insulating annular ring. The conductive via can be recessed within or extend above a surface of the semiconductor die.

Abstract translation: 半导体晶片具有在晶片的有效表面上形成的绝缘层。 在绝缘层上形成导电层。 第一通孔从半导体晶片的背面通过半导体晶片和绝缘层形成到导电层。 导电材料沉积在第一通孔中以形成导电TSV。 可以在第一通孔中沉积绝缘材料，以在导电通孔内形成绝缘芯。 在形成导电TSV之后，通过半导体晶片和绝缘层从导电TSV周围形成第二通孔，从半导体晶片的背表面到导电层。 绝缘材料沉积在第二通孔中以形成绝缘环形环。 导电通孔可以凹入半导体管芯的表面内或延伸到半导体管芯的表面之上。