公开(公告)号：US20150340193A1

公开(公告)日：2015-11-26

申请号：US14813768

申请日：2015-07-30

Applicant: EBARA CORPORATION

Inventor： Shoji YOSHIKAWA ,  Kiwamu TSUKAMOTO ,  Takeshi MURAKAMI ,  Masahiro HATAKEYAMA ,  Tsutomu KARIMATA

IPC: H01J37/02 ,  H01J37/20 ,  H01J37/285

CPC classification number: H01J37/023 ,  G01N21/9501 ,  G01N23/2204 ,  H01J37/09 ,  H01J37/16 ,  H01J37/20 ,  H01J37/285 ,  H01J2237/022 ,  H01J2237/0264 ,  H01J2237/1501 ,  H01J2237/166 ,  H01J2237/20 ,  H01J2237/2007 ,  H01J2237/20221 ,  H01J2237/20278 ,  H01J2237/26

Abstract: An inspection apparatus capable of facilitating reduction in cost of the apparatus is provided. The inspection apparatus includes: beam generation means for generating any of charged particles and electromagnetic waves as a beam; a primary optical system that guides the beam into an inspection object held on a movable stage in a working chamber and irradiates the inspection object with the beam; a secondary optical system that detects secondary charged particles occurring from the inspection object; and an image processing system that forms an image on the basis of the detected secondary charged particles. The inspection apparatus further includes: a linear motor that drives the movable stage; and a Helmholtz coil that causes a magnetic field for canceling a magnetic field caused by the linear motor when the movable stage is driven.

Abstract translation: 提供了能够有助于降低设备成本的检查装置。 检查装置包括：用于产生任何带电粒子和电磁波作为光束的光束产生装置; 将光束引导到保持在工作室中的可移动台上的检查对象中并用该束照射检查对象的主光学系统; 第二光学系统，其检测从检查对象发生的次级带电粒子; 以及基于检测到的二次带电粒子形成图像的图像处理系统。 检查装置还包括：驱动可动台的直线电机; 以及亥姆霍兹线圈，其在驱动可动载物台时引起磁场消除由线性马达引起的磁场。

公开(公告)号：US20150321356A1

公开(公告)日：2015-11-12

申请号：US14705928

申请日：2015-05-06

Applicant: Mapper Lithography IP B.V.

Inventor： Joep Gerard Vijverberg ,  Laurens Vincent Plandsoen ,  Bas van Gelder ,  Guido de Boer ,  Michel Pieter Dansberg

IPC: B25J11/00 ,  G03F9/00

CPC classification number: B25J11/00 ,  G03F7/7075 ,  G03F7/70808 ,  G03F7/70841 ,  G03F9/7096 ,  H01J37/16 ,  H01J37/3177 ,  H01J2237/024 ,  H01J2237/166 ,  H01L21/6719 ,  H01L21/67225 ,  H01L21/67775

Abstract: The invention relates to an assembly for enclosing a target processing machine. The assembly comprises an enclosure and a transfer unit. The enclosure comprises a base plate for arranging said target processing machine thereon, side wall panels, which are fixed to said base plate, and a top wall panel which is fixed to said side wall panels. In addition, the enclosure comprises an access opening in a side wall of the enclosure. The transfer unit comprising one or more transfer elements for moving the transfer unit with respect to the base plate. The transfer unit further comprises a door panel which is arranged for closing the access opening, wherein the door panel is movably mounted to the transfer unit by means of a flexible coupling which allows a movement of the door panel with respect to the transfer unit at least in a direction towards and/or away from the enclosure.

Abstract translation: 本发明涉及用于封闭目标加工机器的组件。 组件包括外壳和转移单元。 外壳包括用于在其上布置所述目标加工机的基板，固定到所述基板的侧壁板和固定到所述侧壁板的顶壁板。 此外，外壳包括在外壳的侧壁中的进入开口。 转印单元包括用于相对于基板移动转印单元的一个或多个转印元件。 传送单元还包括门板，其被布置成用于关闭进入开口，其中门板通过柔性联接件可移动地安装到传送单元，该柔性联接器允许门板相对于传送单元至少移动 在朝向和/或远离外壳的方向上。

公开(公告)号：US09076716B2

公开(公告)日：2015-07-07

申请号：US14077137

申请日：2013-11-11

Applicant: Intermolecular, Inc.

Inventor： Thomas R. Boussie ,  Tony P. Chiang ,  Alexander Gorer ,  David E. Lazovsky

IPC: C40B50/00 ,  H01L21/66 ,  C23C14/54 ,  C23C16/52 ,  H01L21/67 ,  H01L21/768

CPC classification number: H01L21/67011 ,  C23C14/54 ,  C23C16/4412 ,  C23C16/45544 ,  C23C16/4557 ,  C23C16/45578 ,  C23C16/4583 ,  C23C16/46 ,  C23C16/52 ,  H01J37/32449 ,  H01J37/32513 ,  H01J37/32724 ,  H01J2237/166 ,  H01J2237/20228 ,  H01J2237/20235 ,  H01L21/6715 ,  H01L21/76849 ,  H01L22/20 ,  H01L2924/0002 ,  Y10S438/907 ,  Y10S438/913 ,  Y10T137/8593 ,  H01L2924/00

Abstract: The present invention provides methods and systems for discretized, combinatorial processing of regions of a substrate such as for the discovery, implementation, optimization, and qualification of new materials, processes, and process sequence integration schemes used in integrated circuit fabrication. A substrate having an array of differentially processed regions thereon is processed by delivering materials to or modifying regions of the substrate.

Abstract translation: 本发明提供了用于基板区域的离散化，组合处理的方法和系统，例如用于集成电路制造中使用的新材料，工艺和工艺顺序集成方案的发现，实现，优化和鉴定。 通过将材料输送到衬底或修改衬底的区域来处理其上具有差分处理区域阵列的衬底。

公开(公告)号：US20140151553A1

公开(公告)日：2014-06-05

申请号：US14235892

申请日：2012-07-04

Applicant: Yusuke Ominami ,  Tomohisa Ohtaki ,  Sukehiro Ito

Inventor： Yusuke Ominami ,  Tomohisa Ohtaki ,  Sukehiro Ito

IPC: H01J37/06

CPC classification number: H01J37/18 ,  H01J37/06 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/164 ,  H01J2237/166 ,  H01J2237/18 ,  H01J2237/202 ,  H01J2237/2445 ,  H01J2237/2608

Abstract: A charged particle beam device capable of observing a sample in an air atmosphere or gas atmosphere has a thin film for separating the atmospheric pressure space from the decompressed space. A vacuum evacuation pump evacuates a first housing; and a detector detects a charged particle beam (obtained by irradiation of the sample) in the first housing. A thin film is provided to separate the inside of the first housing and the inside of a second housing at least along part of the interface between the first and second housings. An opening part is formed in the thin film so that its opening area on a charged particle irradiation unit's side is larger than its opening area on the sample side; and the thin film which covers the sample side of the opening part transmits or allows through the primary charged particle beam and the charged particle beam.

Abstract translation: 能够在空气气氛或气体气氛中观察样品的带电粒子束装置具有用于将压缩空间与减压空间分离的薄膜。 真空排气泵抽出第一壳体; 并且检测器检测在第一壳体中的带电粒子束（通过样品的照射获得）。 提供薄膜以至少沿着第一和第二壳体之间的界面的一部分分离第一壳体的内部和第二壳体的内部。 在薄膜中形成开口部，使得带电粒子照射单元侧的开口面积大于样品侧的开口面积; 并且覆盖开口部的样品侧的薄膜透过或允许通过初级带电粒子束和带电粒子束。

公开(公告)号：US08690005B2

公开(公告)日：2014-04-08

申请号：US12708545

申请日：2010-02-19

Applicant: Sander Baltussen ,  Guido De Boer ,  Tijs Frans Teepen ,  Hugo Martijn Makkink

Inventor： Sander Baltussen ,  Guido De Boer ,  Tijs Frans Teepen ,  Hugo Martijn Makkink

IPC: B65D6/00 ,  B65D8/04

CPC classification number: H01J37/16 ,  H01J37/18 ,  H01J2237/166 ,  H01L21/67161 ,  H01L21/6719

Abstract: A vacuum chamber comprising a plurality of wall panels enclosing an interior space, in which the wall panels are removably attached to form the chamber using a plurality of connection members for locating the wall panels in a predetermined arrangement. The vacuum chamber further comprises one or more sealing members provided at the edges of the wall panels. The wall panels are arranged so that a vacuum tight seal is formed at the edges of the wall panels as a result of forming a vacuum in the interior space.

Abstract translation: 一种真空室，包括多个围绕内部空间的壁板，其中壁板可移除地连接以形成室，其中多个连接构件用于以预定布置定位壁板。 真空室还包括设置在墙板边缘处的一个或多个密封构件。 壁板被布置成使得由于在内部空间中形成真空而在壁板的边缘处形成真空密封。

公开(公告)号：US20140014848A1

公开(公告)日：2014-01-16

申请号：US13946198

申请日：2013-07-19

Applicant: EBARA CORPORATION

Inventor： Masahiro Hatakeyama ,  Shoji Yoshikawa ,  Takeshi Murakami ,  Kenji Watanabe ,  Yoshihiko Naito ,  Yasushi Toma ,  Tsutomu Karimata ,  Takehide Hayashi ,  Kiwamu Tsukamoto ,  Tatsuya Kohama ,  Noboru Kobayashi

IPC: G01N23/22 ,  G01N23/223

CPC classification number: H01J37/073 ,  G01N23/22 ,  G01N23/223 ,  G01N23/2251 ,  G01N2223/611 ,  H01J1/34 ,  H01J37/09 ,  H01J37/10 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/265 ,  H01J37/28 ,  H01J37/29 ,  H01J2237/0048 ,  H01J2237/022 ,  H01J2237/032 ,  H01J2237/038 ,  H01J2237/045 ,  H01J2237/0458 ,  H01J2237/0473 ,  H01J2237/0492 ,  H01J2237/061 ,  H01J2237/06333 ,  H01J2237/166 ,  H01J2237/186 ,  H01J2237/2002 ,  H01J2237/2007 ,  H01J2237/2008 ,  H01J2237/2448 ,  H01J2237/2482 ,  H01J2237/2485 ,  H01J2237/2817 ,  H01J2237/2855 ,  H01J2237/2857

Abstract: An inspection device for inspecting a surface of an inspection object using a beam includes a beam generator capable of generating one of either charge particles or an electromagnetic wave as a beam, a primary optical system capable of guiding and irradiating the beam to the inspection object supported within a working chamber, a secondary optical system capable of including a first movable numerical aperture and a first detector which detects secondary charge particles generated from the inspection object, the secondary charge particles passing through the first movable numerical aperture, an image processing system capable of forming an image based on the secondary charge particles detected by the first detector; and a second detector arranged between the first movable numerical aperture and the first detector and which detects a location and shape at a cross over location of the secondary charge particles generated from the inspection object.

Abstract translation: 用于使用光束检查检查对象的表面的检查装置包括能够产生电荷粒子或电磁波之一作为光束的光束发生器，能够将所述光束引导并照射到被检查对象的主光学系统 在工作室内，能够包括第一可移动数值孔径的二次光学系统和检测从检查对象产生的二次电荷粒子的第一检测器，通过第一可移动数值孔径的二次电荷粒子，能够 基于由所述第一检测器检测到的次级电荷粒子形成图像; 以及第二检测器，其布置在第一可移动数值孔径和第一检测器之间，并且检测在从检查对象生成的次级充电颗粒的交叉位置处的位置和形状。

公开(公告)号：US20130056101A1

公开(公告)日：2013-03-07

申请号：US13661501

申请日：2012-10-26

Applicant: INTERMOLECULAR, INC.

Inventor： Thomas R. Boussie ,  Tony P. Chiang ,  Alexander Gorer ,  David E. Lazovsky

IPC: F03B11/02

CPC classification number: H01L21/67011 ,  C23C14/54 ,  C23C16/4412 ,  C23C16/45544 ,  C23C16/4557 ,  C23C16/45578 ,  C23C16/4583 ,  C23C16/46 ,  C23C16/52 ,  H01J37/32449 ,  H01J37/32513 ,  H01J37/32724 ,  H01J2237/166 ,  H01J2237/20228 ,  H01J2237/20235 ,  H01L21/6715 ,  H01L21/76849 ,  H01L22/20 ,  H01L2924/0002 ,  Y10S438/907 ,  Y10S438/913 ,  Y10T137/8593 ,  H01L2924/00

Abstract: The present invention provides methods and systems for discretized, combinatorial processing of regions of a substrate such as for the discovery, implementation, optimization, and qualification of new materials, processes, and process sequence integration schemes used in integrated circuit fabrication. A substrate having an array of differentially processed regions thereon is processed by delivering materials to or modifying regions of the substrate.

Abstract translation: 本发明提供了用于基板区域的离散化，组合处理的方法和系统，例如用于集成电路制造中使用的新材料，工艺和工艺顺序集成方案的发现，实现，优化和鉴定。 通过将材料输送到衬底或修改衬底的区域来处理其上具有差分处理区域阵列的衬底。

公开(公告)号：US20120090991A1

公开(公告)日：2012-04-19

申请号：US13380103

申请日：2011-04-21

Applicant: Zhenyu Xie

Inventor： Zhenyu Xie

IPC: C23C14/35

CPC classification number: C23C14/352 ,  C23C14/564 ,  H01J37/32743 ,  H01J37/32788 ,  H01J37/32899 ,  H01J37/3405 ,  H01J2237/166

Abstract: A magnetron sputtering apparatus comprising: a deposition chamber; a processing chamber in communication with the deposition chamber, wherein a target area composed of targets is located at the place where the processing chamber is connected with the deposition chamber; a transfer chamber provided adjacent to the processing chamber, wherein a first gas-tight gate is provided on a wall of the transfer chamber, the first gas-tight gate being opened or closed so as to control the vacuum degree in the transfer chamber and to replace the targets; a transfer device which is provided in the processing chamber and/or the transfer chamber, transfers the target between the transfer chamber and the processing chamber via a second gas-tight gate provided on the adjacent walls of the transfer chamber and the processing chamber for replacement when the transfer chamber is in a set vacuum degree state.

Abstract translation: 一种磁控溅射装置，包括：沉积室; 与沉积室连通的处理室，其中由目标构成的目标区域位于处理室与沉积室连接的位置处; 与处理室相邻设置的传送室，其中第一气密门设置在传送室的壁上，第一气密门被打开或关闭，以便控制传送室中的真空度，以及 取代目标; 设置在处理室和/或传送室中的传送装置经由设置在传送室和处理室的相邻壁上的第二气密门在传送室和处理室之间传送目标，以便更换 当传送室处于设定真空度状态时。

公开(公告)号：US20120074096A1

公开(公告)日：2012-03-29

申请号：US13311855

申请日：2011-12-06

Applicant: Tony P. Chiang ,  David E. Lazovsky ,  Thomas R. Boussie ,  Alexander Gorer

Inventor： Tony P. Chiang ,  David E. Lazovsky ,  Thomas R. Boussie ,  Alexander Gorer

IPC: C23C16/44 ,  C23F1/02 ,  C23C16/50

CPC classification number: H01L21/67011 ,  C23C14/54 ,  C23C16/4412 ,  C23C16/45544 ,  C23C16/4557 ,  C23C16/45578 ,  C23C16/4583 ,  C23C16/46 ,  C23C16/52 ,  H01J37/32449 ,  H01J37/32513 ,  H01J37/32724 ,  H01J2237/166 ,  H01J2237/20228 ,  H01J2237/20235 ,  H01L21/6715 ,  H01L21/76849 ,  H01L22/20 ,  H01L2924/0002 ,  Y10S438/907 ,  Y10S438/913 ,  Y10T137/8593 ,  H01L2924/00

Abstract: The present invention provides methods and systems for discretized, combinatorial processing of regions of a substrate such as for the discovery, implementation, optimization, and qualification of new materials, processes, and process sequence integration schemes used in integrated circuit fabrication. A substrate having an array of differentially processed regions thereon is processed by delivering materials to or modifying regions of the substrate.

公开(公告)号：US20120048829A1

公开(公告)日：2012-03-01

申请号：US13288786

申请日：2011-11-03

Applicant: Tony P. Chiang ,  David E. Lazovsky ,  Thomas R. Boussie ,  Alexander Gorer

Inventor： Tony P. Chiang ,  David E. Lazovsky ,  Thomas R. Boussie ,  Alexander Gorer

IPC: B05D5/06 ,  C23C16/44 ,  C23C16/50 ,  C23F1/02 ,  B05D3/10

CPC classification number: H01L21/67011 ,  C23C14/54 ,  C23C16/4412 ,  C23C16/45544 ,  C23C16/4557 ,  C23C16/45578 ,  C23C16/4583 ,  C23C16/46 ,  C23C16/52 ,  H01J37/32449 ,  H01J37/32513 ,  H01J37/32724 ,  H01J2237/166 ,  H01J2237/20228 ,  H01J2237/20235 ,  H01L21/6715 ,  H01L21/76849 ,  H01L22/20 ,  H01L2924/0002 ,  Y10S438/907 ,  Y10S438/913 ,  Y10T137/8593 ,  H01L2924/00

Abstract: The present invention provides methods and systems for discretized, combinatorial processing of regions of a substrate such as for the discovery, implementation, optimization, and qualification of new materials, processes, and process sequence integration schemes used in integrated circuit fabrication. A substrate having an array of differentially processed regions thereon is processed by delivering materials to or modifying regions of the substrate.

Abstract translation: 本发明提供了用于基板区域的离散化，组合处理的方法和系统，例如用于集成电路制造中使用的新材料，工艺和工艺顺序集成方案的发现，实现，优化和鉴定。 通过将材料输送到衬底或修改衬底的区域来处理其上具有差分处理区域阵列的衬底。