Chip assembly including package element and integrated circuit chip
    111.
    发明授权
    Chip assembly including package element and integrated circuit chip 有权
    芯片组件包括封装元件和集成电路芯片

    公开(公告)号:US07737513B2

    公开(公告)日:2010-06-15

    申请号:US11809213

    申请日:2007-05-30

    IPC分类号: H01L29/84 H01L21/58

    摘要: The present invention provides an integrated circuit chip assembly and a method of manufacturing the same. The assembly includes a package element having a top surface and an integrated circuit chip having a top surface, a bottom surface, edge surface between the top and bottom surfaces, and contacts exposed at the top surface. The package element is disposed below the chip with the top surface of the package element facing toward the bottom surface of the chip. At least one spacer element resides between the top surface of the package element and the bottom surface of the chip. According to one embodiment, the at least one spacer element may form a substantially closed cavity between the package element and the integrated circuit chip. According to another embodiment, first conductive features may extend from the contacts of the chip along the top surface, and at least some of said first conductive features extend along at least one of the edge surfaces of the chip.

    摘要翻译: 本发明提供一种集成电路芯片组件及其制造方法。 组件包括具有顶表面的封装元件和集成电路芯片,其具有顶表面,底表面,顶表面和底表面之间的边缘表面以及暴露在顶表面处的触点。 封装元件设置在芯片的下方,封装元件的顶表面朝向芯片的底表面。 至少一个间隔元件位于封装元件的顶表面和芯片的底表面之间。 根据一个实施例,所述至少一个间隔元件可以在封装元件和集成电路芯片之间形成基本封闭的空腔。 根据另一个实施例,第一导电特征可以沿着顶表面从芯片的触点延伸,并且至少一些所述第一导电特征沿芯片的至少一个边缘表面延伸。

    SPATIALLY DISTRIBUTED VENTILATION BOUNDARY USING ELECTROHYDRODYNAMIC FLUID ACCELERATORS
    113.
    发明申请
    SPATIALLY DISTRIBUTED VENTILATION BOUNDARY USING ELECTROHYDRODYNAMIC FLUID ACCELERATORS 审中-公开
    使用电动液态加速器的空间分布式通风边界

    公开(公告)号:US20100116460A1

    公开(公告)日:2010-05-13

    申请号:US12615905

    申请日:2009-11-10

    IPC分类号: F24H9/02 H02K44/02 F28D15/00

    摘要: In thermal management systems that employ EHD devices to motivate flow of air through an enclosure, spatial distribution of a ventilation boundary may facilitate reductions in flow resistance by reducing average transit distance for cooling air from an inlet portion of the ventilation boundary to an outlet portion. Some thermal management systems described herein distribute a ventilation boundary over opposing surfaces, adjacent surfaces or even a single surface of an enclosure while providing a short, “U” shaped, “L” shaped or generally straight through flow path. In some cases, spatial distributions of the ventilation boundary facilitate or enable enclosure geometries for which conventional fan or blower ventilation would be impractical. In some cases, provision of multiple portions of the ventilation boundary may allow the thermal management system to tolerate blockage or occlusion of a subset of the inlet and/or outlet portions and, when at least some of such portions are non-contiguous spatially-distributed, tolerance to a single cause of blockage or occlusion is enhanced.

    摘要翻译: 在采用EHD装置来激励空气流过外壳的热管理系统中,通风边界的空间分布可以通过减少从通风边界的入口部分到出口部分的冷却空气的平均运输距离来促进流动阻力的降低。 本文所述的一些热管理系统在相对表面,相邻表面或甚至单个外壳的表面上分配通气边界,同时提供短的“U”形“L”形或大致直的流动路径。 在某些情况下,通风边界的空间分布有助于或实现常规风扇或鼓风机通风不切实际的外壳几何形状。 在一些情况下,提供通风边界的多个部分可以允许热管理系统容忍入口和/或出口部分的子集的阻塞或闭塞,并且当这些部分中的至少一些是不连续的空间分布 对单一阻塞或闭塞原因的耐受性得到提高。

    Layered metal structure for interconnect element
    114.
    发明授权
    Layered metal structure for interconnect element 有权
    用于互连元件的分层金属结构

    公开(公告)号:US07696439B2

    公开(公告)日:2010-04-13

    申请号:US11801336

    申请日:2007-05-09

    申请人: David Light

    发明人: David Light

    IPC分类号: H01B7/18 H05K1/00

    摘要: A layered metal structure is provided in accordance with an aspect of the invention. The structure can be used, for example, to fabricate a conductive interconnect element for conductively interconnecting one or more microelectronic elements. The layered structure includes first and second metal layers each of which may include one or more of copper or aluminum, for example. An intervening layer, may include for example, chromium between the first and second metal layers, chromium being resistant to an etchant usable to pattern the first and second metal layers selectively to the intervening layer. An etchant such as cupric chloride, ferric chloride (FeCl3), a peroxysulfuric composition, or a persulfate composition may be used to pattern the first and second metal layers in such case.

    摘要翻译: 根据本发明的一个方面提供了层状金属结构。 该结构可以用于例如制造导电互连一个或多个微电子元件的导电互连元件。 层状结构包括例如可以包括铜或铝中的一种或多种的第一和第二金属层。 中间层可以包括例如在第一和第二金属层之间的铬,铬耐腐蚀剂可以选择性地将第一和第二金属层图案化成中间层。 在这种情况下,可以使用诸如氯化铜,氯化铁(FeCl 3),过氧化硫组合物或过硫酸盐组合物的蚀刻剂来图案化第一和第二金属层。