LASER REFLOW METHOD
    42.
    发明公开
    LASER REFLOW METHOD 审中-公开

    公开(公告)号:US20230256546A1

    公开(公告)日:2023-08-17

    申请号:US18162466

    申请日:2023-01-31

    申请人: DISCO CORPORATION

    摘要: A laser reflow method includes a preparation step of preparing a workpiece including a board and semiconductor chips that each have bumps formed on one surface thereof and are placed on the board with the bumps interposed therebetween and a laser beam irradiation step of irradiating the semiconductor chips with a laser beam from a side of another surface opposite to the one surface, thereby reflowing bumps formed within an irradiated area of the workpiece. In the laser beam irradiation step, the irradiation with the laser beam is carried out while an irradiation range of the laser beam is changed in stages from a region including an outer peripheral portion of the irradiated area toward a region including a central portion of the irradiated area.