Laser beam processing method for making a semiconductor device
    8.
    发明授权
    Laser beam processing method for making a semiconductor device 失效
    用于制造半导体器件的激光束处理方法

    公开(公告)号:US07829439B2

    公开(公告)日:2010-11-09

    申请号:US11968718

    申请日:2008-01-03

    Applicant: Tsuyoshi Kida

    Inventor: Tsuyoshi Kida

    Abstract: In a laser beam processing apparatus that processes a semiconductor wafer having a multi-layered wiring structure formed thereon, scribe lines defined thereon, and at least one alignment mark formed on any one of the scribe lines, a laser beam generator system generates a laser beam, and a movement system relatively moves the semiconductor wafer with respect to the laser beam such that the semiconductor wafer is irradiated with a laser beam along the scribe lines to partially remove the multi-layered wiring structure from the semiconductor wafer along the scribe lines. An irradiation control system controls the irradiation of the semiconductor wafer with the laser beam along the scribe lines such that the alignment mark is left on the scribe line.

    Abstract translation: 在对其上形成有多层布线结构的半导体晶片进行处理的激光束处理装置中,在其上限定的划线以及形成在任一个划线上的至少一个对准标记,激光束发生器系统产生激光束 并且移动系统相对于激光束相对地移动半导体晶片,使得半导体晶片沿着划线照射激光束,以沿着划线部分地从半导体晶片去除多层布线结构。 照射控制系统利用激光束沿着划线来控制半导体晶片的照射,使得对准标记留在划线上。

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