Abstract:
A method of manufacturing a semiconductor device, includes mounting a semiconductor chip on a wiring substrate such that one surface of the semiconductor chip is faced to one surface of the wiring substrate, and filling a first resin in a gap between the surface of the wiring substrate and the surface of the semiconductor chip such that part of the first resin protrudes from the gap. In the filling of the first resin, the first resin is injected into the gap by use of a first resin injection nozzle while the first resin injection nozzle is being moved along any one of sides of the semiconductor chip or along two sides of the semiconductor chip which are adjacent to each other.
Abstract:
A method of manufacturing a semiconductor device, includes mounting a semiconductor chip on a wiring substrate such that one surface of the semiconductor chip is faced to one surface of the wiring substrate, and filling a first resin in a gap between the surface of the wiring substrate and the surface of the semiconductor chip such that part of the first resin protrudes from the gap. In the filling of the first resin, the first resin is injected into the gap by use of a first resin injection nozzle while the first resin injection nozzle is being moved along any one of sides of the semiconductor chip or along two sides of the semiconductor chip which are adjacent to each other.
Abstract:
The extent of a bow of a semiconductor device is suppressed in a case where the fillet width of an underfill resin is asymmetrical. The center position 12 of a chip 1 is caused to deviate from the center position 13 of a wiring substrate 2 in a direction (the direction of the arrow B) reverse to the deviation direction (the direction of the arrow A) of the center position 11 of an underfill resin 4 from the center position 12 of the chip 1. The center position 14 of a resin for encapsulation 6 is caused to deviate from the center position 13 of the wiring substrate 2 in the same direction (the direction of the arrow A) as the deviation direction (the direction of the arrow A) of the center position 11 of the underfill resin 4 from the center position 12 of the chip 1.
Abstract:
The extent of a bow of a semiconductor device is suppressed in a case where the fillet width of an underfill resin is asymmetrical. The center position 12 of a chip 1 is caused to deviate from the center position 13 of a wiring substrate 2 in a direction (the direction of the arrow B) reverse to the deviation direction (the direction of the arrow A) of the center position 11 of an underfill resin 4 from the center position 12 of the chip 1. The center position 14 of a resin for encapsulation 6 is caused to deviate from the center position 13 of the wiring substrate 2 in the same direction (the direction of the arrow A) as the deviation direction (the direction of the arrow A) of the center position 11 of the underfill resin 4 from the center position 12 of the chip 1.
Abstract:
A method of manufacturing a semiconductor device obtained by laminating a first semiconductor chip and a second semiconductor chip with different planar sizes when seen in a plan view on a wiring board via an adhesive material, in which the second semiconductor chip with a relatively larger planar size is mounted on the first semiconductor chip with a relatively smaller planar size. Also, after the first and second semiconductor chips are mounted, the first and second semiconductor chips are sealed with resin. Here, before sealing with the resin, a gap between the second semiconductor chip and the wiring board is previously sealed with the adhesive material used when the first and second semiconductor chips are mounted.
Abstract:
A semiconductor device includes a substrate, a semiconductor chip that is bonded to one of the faces of the substrate via bumps, and has a device formation face facing the one of the faces, and a resin that fills the space between the device formation face of the semiconductor chip and the one of the faces of the substrate. The resin includes: a first resin that is formed in a formation region of bumps placed on the outermost circumference of the bumps, and is formed inside the formation region, and a second resin that is formed outside the first resin. The thermal expansion coefficient of the substrate is higher than the thermal expansion coefficient of the first resin. The thermal expansion coefficient of the second resin is higher than the thermal expansion coefficient of the first resin.
Abstract:
A semiconductor device (10) that may have a wire bonding structure having reduced interference between bond wires and a path of a capillary has been disclosed. Semiconductor device (10) may include bond pads (12) arranged in a line along an edge of a semiconductor chip (14) and conductive fingers (16) arranged on a substrate (18). Bond pads (12) may be electrically connected to conductive fingers (16) with bond wires (20). Bond wires (20) may be divided into a first group having a relatively short length and a second group having a relatively long length. The bond wires (20) in the first group may have bonding points on a bonding pad (12) that is closer to an edge of semiconductor chip (14) than bonding points of bond wires (20) in the second group. In this way, spacing between bond wires (20) already formed and a capillary forming an adjacent bond wire may be increased.
Abstract:
In a laser beam processing apparatus that processes a semiconductor wafer having a multi-layered wiring structure formed thereon, scribe lines defined thereon, and at least one alignment mark formed on any one of the scribe lines, a laser beam generator system generates a laser beam, and a movement system relatively moves the semiconductor wafer with respect to the laser beam such that the semiconductor wafer is irradiated with a laser beam along the scribe lines to partially remove the multi-layered wiring structure from the semiconductor wafer along the scribe lines. An irradiation control system controls the irradiation of the semiconductor wafer with the laser beam along the scribe lines such that the alignment mark is left on the scribe line.
Abstract:
Disclosed herewith is a semiconductor module manufacturing apparatus capable of reducing occurrence of warping of the wiring substrate, etc., as well as occurrence of failures of bonding between the wiring substrate and semiconductor chips, etc. without lowering the productivity. The semiconductor module manufacturing apparatus employs a batch reflowing process that heats one, two, or more wiring substrates and at least two or more semiconductor chips or semiconductor devices simultaneously. After the heating process, the semiconductor chips or semiconductor devices are heated and bonded on the wiring substrate. The apparatus includes at least a stage for chucking the wiring substrate fixedly; a heat source for heating the semiconductor chips or semiconductor devices out of contact therewith; and a controller for controlling the heating value of the heat source.
Abstract:
A semiconductor module includes a wiring board having a bottom surface and a top surface. A first solder electrode terminal has a given melting point, and is provided on the bottom surface of the wiring board. An electrode pad is provided on or above the top surface of the wiring board, and a second solder electrode terminal is soldered to the electrode pad at a temperature corresponding to the given melting point of the first solder electrode terminal by using a reflow process. The second solder electrode terminal contains an additional metal powder component diffused therein when being soldered to the electrode pad.