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公开(公告)号:US20190155160A1
公开(公告)日:2019-05-23
申请号:US16252427
申请日:2019-01-18
申请人: Intel Corporation
IPC分类号: G03F7/20 , H01L21/311 , H01L21/027 , H01J37/317
CPC分类号: G03F7/2037 , H01J37/045 , H01J37/3026 , H01J37/3174 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/303 , H01J2237/30422 , H01J2237/30438 , H01J2237/31762 , H01J2237/31764 , H01L21/0277 , H01L21/31144
摘要: Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool includes a first column of openings along a first direction. The BAA also includes a second column of openings along the first direction and staggered from the first column of openings. The first and second columns of openings together form an array having a pitch in the first direction. A scan direction of the BAA is along a second direction, orthogonal to the first direction. The pitch of the array corresponds to half of a minimal pitch layout of a target pattern of lines for orientation parallel with the second direction.
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公开(公告)号:US20180143526A1
公开(公告)日:2018-05-24
申请号:US15873782
申请日:2018-01-17
申请人: Intel Corporation
IPC分类号: G03F1/20 , H01J37/04 , H01J37/302 , H01J37/317 , G03F7/20 , H01L21/768
CPC分类号: G03F1/20 , G03F7/203 , H01J37/045 , H01J37/3026 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/303 , H01J2237/30422 , H01J2237/30438 , H01J2237/31762 , H01J2237/31764 , H01L21/76802
摘要: Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool is described. The BAA includes three distinct aperture arrays of different pitch.
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公开(公告)号:US09852882B2
公开(公告)日:2017-12-26
申请号:US14873284
申请日:2015-10-02
发明人: Scott Barraclough , James S. Buff
IPC分类号: H01J3/14 , H01J37/30 , H01F7/20 , H01J37/147 , H01J37/317 , H05K7/20 , H01F27/10
CPC分类号: H01J37/3007 , H01F7/20 , H01F27/10 , H01J37/1472 , H01J37/1475 , H01J37/3171 , H01J2237/002 , H01J2237/152 , H01J2237/1526 , H01J2237/303 , H01J2237/31701 , H05K7/20
摘要: A magnet having an annular coolant fluid passage is generally described. Various examples provide a magnet including a first magnet and a second magnet disposed around an ion beam coupler with an aperture there through. The first and second magnets each including a metal core having a cavity therein, one or more conductive wire wraps disposed around the metal core, and an annular core element configured to be inserted into the cavity, wherein an annular coolant fluid passage is formed between the cavity and the annular core element. Furthermore, the annular core element may have a first diameter and a middle section having a second diameter, the second diameter being less than the first diameter. Other embodiments are disclosed and claimed.
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公开(公告)号:US20170183795A1
公开(公告)日:2017-06-29
申请号:US15327503
申请日:2015-07-23
IPC分类号: C30B31/20 , C30B31/08 , H01L21/02 , H01J37/32 , H01L33/00 , H01L29/16 , H01L21/223 , C30B29/40 , H01L29/20
CPC分类号: C30B31/20 , B82Y40/00 , C30B29/02 , C30B29/406 , C30B31/08 , H01J37/32192 , H01J37/32706 , H01J2237/303 , H01J2237/316 , H01J2237/3165 , H01J2237/31701 , H01L21/02527 , H01L21/0254 , H01L21/02603 , H01L21/02664 , H01L21/2236 , H01L29/1606 , H01L29/2003 , H01L33/0075
摘要: There are provided non-destructive methods for incorporating an atom such as N into a material such as graphene. The methods can comprise subjecting a gas comprising the atom to conditions to obtain a flowing plasma afterglow then exposing the material to the flowing plasma afterglow. There are also provided materials such as N-doped graphene produced by such methods.
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公开(公告)号:US09627169B2
公开(公告)日:2017-04-18
申请号:US14804148
申请日:2015-07-20
申请人: FEI Company
发明人: Anthony Graupera , Charles Otis
IPC分类号: H01J37/05 , H01J37/317 , H01J37/08
CPC分类号: H01J37/05 , H01J37/08 , H01J37/317 , H01J2237/006 , H01J2237/049 , H01J2237/057 , H01J2237/08 , H01J2237/0817 , H01J2237/0827 , H01J2237/303 , H01J2237/31749
摘要: An inductively coupled plasma source having multiple gases in the plasma chamber provides multiple ion species to a focusing column. A mass filter allows for selection of a specific ion species and rapid changing from one species to another.
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公开(公告)号:US20170076905A1
公开(公告)日:2017-03-16
申请号:US15122400
申请日:2014-12-19
申请人: Intel Corporation
IPC分类号: H01J37/04 , G03F7/20 , H01L21/768 , G03F1/20 , H01J37/317 , H01J37/302
CPC分类号: G03F1/20 , G03F7/203 , H01J37/045 , H01J37/3026 , H01J37/3177 , H01J2237/0435 , H01J2237/0453 , H01J2237/303 , H01J2237/30422 , H01J2237/30438 , H01J2237/31762 , H01J2237/31764 , H01L21/76802
摘要: Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a blanker aperture array (BAA) for an e-beam tool is described. The BAA includes three distinct aperture arrays of different pitch.
摘要翻译: 描述适用于涉及补充电子束光刻(CEBL)的光刻设备和方法。 在一个示例中,描述了用于电子束工具的遮光器孔径阵列(BAA)。 BAA包括三个不同节距的不同孔径阵列。
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公开(公告)号:US09587349B2
公开(公告)日:2017-03-07
申请号:US14557170
申请日:2014-12-01
申请人: XYLECO, INC.
发明人: Marshall Medoff
IPC分类号: D04H1/42 , D04H1/425 , D03D15/00 , H01J37/317 , B01J19/08 , D06M10/00 , D06M10/02 , D06M10/08 , D06M101/04 , D06M101/06
CPC分类号: D06M10/008 , B01J19/08 , B01J2219/08 , D03D15/00 , D04H1/42 , D04H1/425 , D06M10/001 , D06M10/02 , D06M10/06 , D06M10/08 , D06M2101/04 , D06M2101/06 , D10B2201/00 , D10B2201/01 , D10B2201/22 , D10B2201/26 , D10B2201/28 , H01J37/317 , H01J2237/303 , H01J2237/3165 , Y10T156/10
摘要: Textiles are provided that include fibrous cellulosic materials having an α-cellulose content of less than about 93%, the fibrous materials being spun, woven, knitted, or entangled. The fibrous cellulosic materials can be irradiated with a dose of ionizing radiation that is sufficient to increase the molecular weight of the cellulosic materials without causing significant depolymerization of the cellulosic materials. Methods of treating textiles that include irradiating the textiles are also provided.
摘要翻译: 提供纺织品,其包括α-纤维素含量小于约93%的纤维状纤维素材料,纤维材料是纺织的,编织的,针织的或缠结的。 纤维状纤维素材料可以用足以增加纤维素材料的分子量而不引起纤维素材料显着解聚的电离辐射剂量照射。 还提供了包括照射纺织品的纺织品的处理方法。
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公开(公告)号:US09355751B2
公开(公告)日:2016-05-31
申请号:US14541238
申请日:2014-11-14
IPC分类号: G21K1/02 , G21K5/04 , H01J37/24 , H01J37/30 , H01J37/317 , H01J37/02 , H01J37/16 , H01J37/065 , H01J37/12
CPC分类号: G21K1/02 , G21K5/04 , H01J37/026 , H01J37/065 , H01J37/12 , H01J37/16 , H01J37/24 , H01J37/3002 , H01J37/3007 , H01J37/3174 , H01J37/3175 , H01J37/3177 , H01J2237/002 , H01J2237/0216 , H01J2237/024 , H01J2237/032 , H01J2237/04 , H01J2237/1215 , H01J2237/16 , H01J2237/1825 , H01J2237/303 , H01J2237/30472
摘要: The invention relates to an electrode stack (70) comprising stacked electrodes (71-80) for manipulating a charged particle beam along an optical axis (A). Each electrode comprises an electrode body with an aperture for the charged particle beam. The electrode bodies are mutually spaced and the electrode apertures are coaxially aligned along the optical axis. The electrode stack comprises electrically insulating spacing structures (89) between each pair of adjacent electrodes for positioning the electrodes (71-80) at predetermined mutual distances along the axial direction (Z). A first electrode and a second electrode each comprise an electrode body with one or more support portions (86), wherein each support portion is configured to accommodate at least one spacing structure (89). The electrode stack has at least one clamping member (91-91c) configured to hold the support portions (86) of the first and second electrodes, as well as the intermediate spacing structure (89) together.
摘要翻译: 本发明涉及一种电极堆叠(70),其包括用于沿光轴(A)操纵带电粒子束的堆叠电极(71-80)。 每个电极包括具有用于带电粒子束的孔的电极体。 电极体相互间隔开,并且电极孔沿光轴同轴对准。 电极堆叠包括在每对相邻电极之间的电绝缘间隔结构(89),用于将电极(71-80)沿着轴向方向(Z)定位在预定的相互距离处。 第一电极和第二电极各自包括具有一个或多个支撑部分(86)的电极主体,其中每个支撑部分构造成容纳至少一个间隔结构(89)。 电极堆叠具有至少一个构造成将第一和第二电极的支撑部分(86)以及中间间隔结构(89)保持在一起的夹紧构件(91-91c)。
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公开(公告)号:US20160027610A1
公开(公告)日:2016-01-28
申请号:US14873284
申请日:2015-10-02
发明人: Scott Barraclough , James S. Buff
IPC分类号: H01J37/30 , H01J37/147 , H01J37/317 , H01F7/20 , H05K7/20
CPC分类号: H01J37/3007 , H01F7/20 , H01F27/10 , H01J37/1472 , H01J37/1475 , H01J37/3171 , H01J2237/002 , H01J2237/152 , H01J2237/1526 , H01J2237/303 , H01J2237/31701 , H05K7/20
摘要: A magnet having an annular coolant fluid passage is generally described. Various examples provide a magnet including a first magnet and a second magnet disposed around an ion beam coupler with an aperture there through. The first and second magnets each including a metal core having a cavity therein, one or more conductive wire wraps disposed around the metal core, and an annular core element configured to be inserted into the cavity, wherein an annular coolant fluid passage is formed between the cavity and the annular core element. Furthermore, the annular core element may have a first diameter and a middle section having a second diameter, the second diameter being less than the first diameter. Other embodiments are disclosed and claimed.
摘要翻译: 通常描述具有环形冷却剂流体通道的磁体。 各种实施例提供一种包括第一磁体和设置在离子束耦合器周围的第二磁体的磁体,其中具有通孔。 所述第一和第二磁体各自包括在其中具有空腔的金属芯,设置在所述金属芯周围的一个或多个导电线圈,以及被构造成插入所述空腔中的环形芯体元件,其中环形冷却剂流体通道形成在 腔和环形芯元件。 此外,环形芯元件可以具有第一直径和具有第二直径的中间部分,第二直径小于第一直径。 公开和要求保护其他实施例。
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公开(公告)号:US20160013017A1
公开(公告)日:2016-01-14
申请号:US14861737
申请日:2015-09-22
申请人: Frederick A. Flitsch
发明人: Frederick A. Flitsch
IPC分类号: H01J37/317 , H01J37/248 , H05K3/32 , H01J37/20
CPC分类号: H01J37/244 , B82B3/00 , G03F9/00 , H01J9/022 , H01J37/06 , H01J37/08 , H01J37/20 , H01J37/248 , H01J37/317 , H01J37/3177 , H01J2237/1205 , H01J2237/20 , H01J2237/303 , H01J2237/304 , H01J2237/3174 , H01J2237/31759 , H01J2237/31798 , Y10T29/49004
摘要: The present invention provides apparatus for an imaging system comprising a multitude of imaging elements upon a substrate. In some embodiments the substrate may be approximately round with a radius of approximately one inch. Various methods relating to using and producing an imaging system are discussed.
摘要翻译: 本发明提供一种用于成像系统的装置,其包括在基板上的多个成像元件。 在一些实施例中,基底可以近似圆形,半径约为一英寸。 讨论了与使用和产生成像系统有关的各种方法。
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