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    SUBSTRATES AND METHODS OF MANUFACTURE
    35.
    发明申请
    SUBSTRATES AND METHODS OF MANUFACTURE 有权
    基板和制造方法

    公开(公告)号：US20160126174A1

    公开(公告)日：2016-05-05

    申请号：US14533728

    申请日：2014-11-05

    Applicant: Invensas Corporation

    Inventor： Hong Shen ,  Liang Wang ,  Gabriel Z. Guevara ,  Rajesh Katkar ,  Cyprian Emeka Uzoh ,  Laura Wills Mirkarimi

    IPC: H01L23/498 ,  H01L21/48 ,  H01L25/00 ,  H01L25/065

    CPC classification number: H01L23/49822 ,  H01L21/4853 ,  H01L21/4857 ,  H01L21/486 ,  H01L23/49805 ,  H01L23/49827 ,  H01L23/49838 ,  H01L24/09 ,  H01L24/48 ,  H01L25/0655 ,  H01L25/50 ,  H01L2224/16225 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2924/00014 ,  H01L2924/15192 ,  H01L2224/05599 ,  H01L2224/45099 ,  H01L2224/85399

    Abstract: An interposer (110) has contact pads at the top and/or bottom surfaces for connection to circuit modules (e.g. ICs 112). The interposer includes a substrate made of multiple layers (110.i). Each layer can be a substrate (110S), possibly a ceramic substrate, with circuitry. The substrates extend vertically. Multiple interposers are fabricated in a single structure (310) made of vertical layers (310.i) corresponding to the interposers' layers. The structure is diced along horizontal planes (314) to provide the interposers. An interposer's vertical conductive lines (similar to through-substrate vias) can be formed on the substrates' surfaces before dicing and before all the substrates are attached to each other. Thus, there is no need to make through-substrate holes for the vertical conductive lines. Non-vertical features can also be formed on the substrates' surfaces before the substrates are attached to each other. Other embodiments are also provided.

    Abstract translation: 插入器（110）在顶部和/或底部表面处具有用于连接到电路模块（例如IC 112）的接触焊盘。 插入器包括由多层（110.i）制成的衬底。 每个层可以是具有电路的衬底（110S），可能是陶瓷衬底。 基板垂直延伸。 在由对应于插入层的垂直层（310.i）制成的单个结构（310）中制造多个插入件。 沿着水平面（314）切割结构以提供插入件。 在切割之前和所有基板彼此附接之前，可以在基板表面上形成插入件的垂直导线（类似于贯穿基板通孔）。 因此，不需要对垂直导线进行贯通基板孔。 在基板彼此附接之前，也可以在基板表面上形成非垂直特征。 还提供了其他实施例。

    Methods and structure for carrier-less thin wafer handling
    38.
    发明授权
    Methods and structure for carrier-less thin wafer handling 有权
    无载体薄晶片处理的方法和结构

    公开(公告)号：US09064933B2

    公开(公告)日：2015-06-23

    申请号：US13724223

    申请日：2012-12-21

    Applicant: Invensas Corporation

    Inventor： Cyprian Emeka Uzoh ,  Pezhman Monadgemi ,  Michael Newman ,  Charles G. Woychik ,  Terrence Caskey

    IPC: H01L21/4763 ,  H01L21/768 ,  H01L21/78 ,  H01L21/56 ,  H01L23/48

    CPC classification number: H01L21/76898 ,  H01L21/31053 ,  H01L21/561 ,  H01L21/6835 ,  H01L21/768 ,  H01L21/76841 ,  H01L21/76877 ,  H01L21/78 ,  H01L23/481 ,  H01L24/94 ,  H01L2221/68327 ,  H01L2221/68381 ,  H01L2924/0002 ,  H01L2924/12042 ,  H01L2924/00

    Abstract: Methods of forming a microelectronic assembly and the resulting structures and devices are disclosed herein. In one embodiment, a method of forming a microelectronic assembly includes removing material exposed at portions of a surface of a substrate to form a processed substrate having a plurality of thinned portions separated by integral supporting portions of the processed substrate having a thickness greater than a thickness of the thinned portions, at least some of the thinned portions including a plurality of electrically conductive interconnects extending in a direction of the thicknesses of the thinned portions and exposed at the surface; and removing the supporting portions of the substrate to sever the substrate into a plurality of individual thinned portions, at least some individual thinned portions including the interconnects.

    Abstract translation: 本文公开了形成微电子组件的方法以及所得到的结构和装置。 在一个实施例中，形成微电子组件的方法包括去除在衬底的表面的部分处暴露的材料，以形成经处理的衬底，该衬底具有多个由处理衬底的整体支撑部分分隔开的薄化部分，该部分的厚度大于厚度 减薄部分中的至少一些薄化部分包括在薄壁部分的厚度方向上延伸并在表面露出的多个导电互连件; 以及去除衬底的支撑部分以将衬底切割成多个单独的薄化部分，至少一些单独的变薄部分，包括互连。

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