Semiconductor device and fabrication methods thereof
    70.
    发明授权
    Semiconductor device and fabrication methods thereof 有权
    半导体器件及其制造方法

    公开(公告)号:US07888236B2

    公开(公告)日:2011-02-15

    申请号:US11798432

    申请日:2007-05-14

    IPC分类号: H01L21/00

    摘要: A method for packaging a semiconductor device disclosed. A substrate comprising a plurality of dies, separated by scribe line areas respectively is provided, wherein at least one layer is overlying the substrate. A portion of the layer within the scribe lines area is removed by photolithography and etching to form openings. The substrate is sawed along the scribe line areas, passing the openings. In alternative embodiment, a first substrate comprising a plurality of first dies separated by first scribe line areas respectively is provided, wherein at least one first structural layer is overlying the first substrate. The first structural layer is patterned to form first openings within the first scribe line areas. A second substrate comprising a plurality of second dies separated by second scribe line areas respectively is provided, wherein at least one second structural layer is overlying the substrate. The second structural layer is patterned to form second openings within the second scribe line areas. The first substrate and the second substrate are bonded to form a stack structure. The stack structure is cut along the first and second scribe line areas, passing the first and second openings.

    摘要翻译: 一种封装半导体器件的方法。 提供了包括分别由划线区域分隔的多个管芯的衬底,其中至少一层覆盖衬底。 通过光刻和蚀刻去除划线部分内的层的一部分以形成开口。 沿着划线区域锯切基板,通过开口。 在替代实施例中,提供了包括分别由第一划线区域分开的多个第一裸片的第一衬底,其中至少一个第一结构层覆盖在第一衬底上。 图案化第一结构层以在第一划线区域内形成第一开口。 提供了包括分别由第二划线区域分开的多个第二裸片的第二衬底,其中至少一个第二结构层覆盖在衬底上。 图案化第二结构层以在第二划线区域内形成第二开口。 第一基板和第二基板被接合以形成堆叠结构。 沿着第一和第二划线区域切割堆叠结构,使第一和第二开口通过。