Masking method and apparatus
    76.
    发明授权
    Masking method and apparatus 有权
    掩蔽方法和装置

    公开(公告)号:US08709270B2

    公开(公告)日:2014-04-29

    申请号:US13324818

    申请日:2011-12-13

    Abstract: A chamber for combinatorially processing a substrate is provided. The chamber includes a first mask and a second mask that share a common central axis. The first mask and the second mask are independently rotatable around the common central axis. The first mask has a first plurality of radial apertures and the second mask has a second plurality of radial apertures. An axis of the first plurality of radial apertures is offset from an axis of the second plurality of radial apertures. A substrate support that is operable to support a substrate below the first and second masks is included. The substrate support shares the common central axis.

    Abstract translation: 提供了用于组合处理衬底的腔室。 腔室包括共享公共中心轴的第一掩模和第二掩模。 第一掩模和第二掩模可以围绕公共中心轴独立地旋转。 第一掩模具有第一多个径向孔,并且第二掩模具有第二多个径向孔。 第一多个径向孔的轴线偏离第二多个径向孔的轴线。 包括可操作以支撑第一和第二掩模下面的衬底的衬底支撑件。 基板支架共用共同的中心轴。

    Masking Method and Apparatus
    78.
    发明申请
    Masking Method and Apparatus 有权
    掩蔽方法和装置

    公开(公告)号:US20130149868A1

    公开(公告)日:2013-06-13

    申请号:US13324818

    申请日:2011-12-13

    Abstract: A chamber for combinatorially processing a substrate is provided. The chamber includes a first mask and a second mask that share a common central axis. The first mask and the second mask are independently rotatable around the common central axis. The first mask has a first plurality of radial apertures and the second mask has a second plurality of radial apertures. An axis of the first plurality of radial apertures is offset from an axis of the second plurality of radial apertures. A substrate support that is operable to support a substrate below the first and second masks is included. The substrate support shares the common central axis.

    Abstract translation: 提供了用于组合处理衬底的腔室。 腔室包括共享公共中心轴的第一掩模和第二掩模。 第一掩模和第二掩模可以围绕公共中心轴独立地旋转。 第一掩模具有第一多个径向孔,并且第二掩模具有第二多个径向孔。 第一多个径向孔的轴线偏离第二多个径向孔的轴线。 包括可操作以支撑第一和第二掩模下面的衬底的衬底支撑件。 基板支架共用共同的中心轴。

    Dual path gas distribution device
    80.
    发明授权
    Dual path gas distribution device 失效
    双路气体分配装置

    公开(公告)号:US08402845B2

    公开(公告)日:2013-03-26

    申请号:US13596884

    申请日:2012-08-28

    Inventor: Jay B. Dedontney

    Abstract: An apparatus for deploying two fluids separately into a reaction chamber is provided. The apparatus includes a first distribution network that is formed on a plate having a distribution face and a dispensing face. The first distribution network is defined by a plurality of recessed channels on the distribution face. The plurality of recessed channels includes a plurality of thru-ports that extend from the plurality of recessed channels to the dispensing face. The apparatus further includes a second distribution network that has passages formed below the plurality of recessed channels and above the dispensing face. A first set of ports extends from the passages to the distribution face and a second set of ports extends from a top surface of the distribution face to the dispensing face.

    Abstract translation: 提供了一种用于将两种流体单独地部署到反应室中的装置。 该装置包括形成在具有分配面和分配面的板上的第一分配网络。 第一分配网络由分配面上的多个凹陷通道限定。 多个凹陷通道包括从多个凹陷通道延伸到分配面的多个通孔。 该装置还包括第二分配网络,其具有形成在多个凹陷通道下方并且在分配面上方的通道。 第一组端口从通道延伸到分配面,并且第二组端口从分配面的顶表面延伸到分配面。

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