DIELECTRIC COVER FOR A THROUGH SILICON VIA
    64.
    发明申请
    DIELECTRIC COVER FOR A THROUGH SILICON VIA 有权
    通过硅的电介质覆盖

    公开(公告)号:US20160111352A1

    公开(公告)日:2016-04-21

    申请号:US14967965

    申请日:2015-12-14

    IPC分类号: H01L23/48

    摘要: An approach to creating a semiconductor structure for a dielectric layer over a void area includes determining a location of a void area of the topographical semiconductor feature. A second dielectric layer is deposited on a first dielectric layer and a top surface of a topographical semiconductor feature. The second dielectric layer is patterned to one or more portions, wherein at least one portion of the patterned second dielectric layer is over the location of the void area of the topographical semiconductor feature. A first metal layer is deposited over the second dielectric layer, at least one portion of the first dielectric layer, and a portion of the top surface of the topographical semiconductor feature. A chemical mechanical polish of the first metal layer is performed, wherein the chemical mechanical polish reaches the top surface of at least one of the one or more portions of the second dielectric layer.

    摘要翻译: 在空隙区域上形成用于介电层的半导体结构的方法包括确定形貌半导体特征的空隙区域的位置。 第二电介质层沉积在第一介电层和地形半导体特征的顶表面上。 将第二介电层图案化成一个或多个部分,其中图案化的第二介电层的至少一部分在形貌半导体特征的空隙区域的位置之上。 第一金属层沉积在第二电介质层上,第一介电层的至少一部分和形貌半导体特征的顶表面的一部分。 执行第一金属层的化学机械抛光,其中化学机械抛光剂到达第二介电层的一个或多个部分中的至少一个的顶表面。