SEMICONDUCTOR DEVICE STRUCTURES AND METHODS FOR COPPER BOND PADS
    7.
    发明申请
    SEMICONDUCTOR DEVICE STRUCTURES AND METHODS FOR COPPER BOND PADS 审中-公开
    铜焊盘的半导体器件结构和方法

    公开(公告)号:US20140061910A1

    公开(公告)日:2014-03-06

    申请号:US13601746

    申请日:2012-08-31

    Abstract: A method of making a semiconductor device can comprise forming a copper bond pad on an integrated circuit device; forming a first passivation layer on the integrated circuit device and the copper bond pad; forming a second passivation layer on the first passivation layer; forming a mask over the first and second passivation layers around the copper bond pad; etching the second passivation layer over the copper bond pad; and cleaning the first passivation layer over the copper bond pad. At least a portion of the first passivation layer remains over the copper bond pad after the etching the second passivation layer. A thickness of the first passivation layer over the copper bond pad is selected to protect the copper bond pad from oxidation and to allow wire bonding to the copper bond pad through the first passivation layer.

    Abstract translation: 制造半导体器件的方法可以包括在集成电路器件上形成铜焊盘; 在集成电路器件和铜接合焊盘上形成第一钝化层; 在所述第一钝化层上形成第二钝化层; 在铜接合焊盘周围的第一钝化层和第二钝化层上形成掩模; 在铜焊盘上蚀刻第二钝化层; 以及在所述铜接合焊盘上清洁所述第一钝化层。 在蚀刻第二钝化层之后,第一钝化层的至少一部分保留在铜接合焊盘上。 选择铜接合焊盘上的第一钝化层的厚度以保护铜结合焊盘免于氧化,并允许通过第一钝化层引线键合至铜键合焊盘。

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