公开(公告)号：US07897511B2

公开(公告)日：2011-03-01

申请号：US12053478

申请日：2008-03-21

Applicant: In-Young Lee ,  Ho-Jin Lee ,  Hyun-Soo Chung ,  Ju-Il Choi ,  Son-Kwan Hwang

Inventor： In-Young Lee ,  Ho-Jin Lee ,  Hyun-Soo Chung ,  Ju-Il Choi ,  Son-Kwan Hwang

IPC: H01L21/44

CPC classification number: H01L21/76898 ,  H01L24/11 ,  H01L24/12 ,  H01L24/16 ,  H01L24/81 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/0401 ,  H01L2224/05009 ,  H01L2224/0557 ,  H01L2224/06181 ,  H01L2224/11462 ,  H01L2224/13009 ,  H01L2224/13022 ,  H01L2224/13025 ,  H01L2224/13099 ,  H01L2224/13147 ,  H01L2224/16 ,  H01L2224/81801 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2924/0002 ,  H01L2924/01005 ,  H01L2924/01013 ,  H01L2924/01015 ,  H01L2924/01022 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01055 ,  H01L2924/0106 ,  H01L2924/01078 ,  H01L2924/014 ,  H01L2924/04941 ,  H01L2924/14 ,  H01L2924/19043 ,  H01L2224/05552

Abstract: A method of manufacturing a semiconductor device includes forming an integrated circuit region on a semiconductor wafer. A first metal layer pattern is formed over the integrated circuit region. A via hole is formed to extend through the first metal layer pattern and the integrated circuit region. A final metal layer pattern is formed over the first metal layer pattern and within the via hole. A plug is formed within the via hole. Thereafter, a passivation layer is formed to overlie the final metal layer pattern.

Abstract translation: 一种制造半导体器件的方法包括在半导体晶片上形成集成电路区域。 在集成电路区域上形成第一金属层图案。 通孔形成为延伸穿过第一金属层图案和集成电路区域。 最终的金属层图案形成在第一金属层图案之上并且在通孔内。 在通孔内形成插头。 此后，形成钝化层以覆盖最终金属层图案。

公开(公告)号：US07767576B2

公开(公告)日：2010-08-03

申请号：US11556931

申请日：2006-11-06

Applicant: Hyun-soo Chung ,  Seung-duk Baek ,  Ju-il Choi ,  Dong-ho Lee

Inventor： Hyun-soo Chung ,  Seung-duk Baek ,  Ju-il Choi ,  Dong-ho Lee

IPC: H01L21/4763

CPC classification number: H01L24/11 ,  H01L23/3114 ,  H01L23/525 ,  H01L24/12 ,  H01L24/45 ,  H01L24/48 ,  H01L2224/0231 ,  H01L2224/02311 ,  H01L2224/02321 ,  H01L2224/02335 ,  H01L2224/0236 ,  H01L2224/024 ,  H01L2224/0401 ,  H01L2224/13099 ,  H01L2224/16 ,  H01L2224/451 ,  H01L2224/4813 ,  H01L2924/01013 ,  H01L2924/01022 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/14 ,  H01L2924/00 ,  H01L2924/00014

Abstract: A method of forming a wire structure connecting to a bonding pad of a semiconductor chip includes depositing a passivation layer on an active surface of the semiconductor chip, depositing a seed metal layer on the bonding pad and the passivation layer, depositing a metal layer on the seed metal layer, etching selected portions of the seed metal layer, leaving unetched a first area, overlapping the bonding pad and a second area overlapping a connection pad, wherein the wire structure is formed by the metal layer being electrically connected to the bonding pad and the connection pad, but floating from the passivation layer, and depositing an insulting layer on the wire structure.

Abstract translation: 形成连接到半导体芯片的焊盘的导线结构的方法包括在半导体芯片的有源表面上沉积钝化层，在焊盘和钝化层上沉积种子金属层，在金属层上沉积金属层 种子金属层，蚀刻种子金属层的选定部分，留下未蚀刻的第一区域，与接合焊盘重叠，第二区域与连接焊盘重叠，其中线结构由金属层电连接到接合焊盘， 连接焊盘，但是从钝化层浮起，并且在导线结构上沉积绝缘层。

公开(公告)号：US10128168B2

公开(公告)日：2018-11-13

申请号：US14543688

申请日：2014-11-17

Applicant: Ju-il Choi ,  Kun-sang Park ,  Son-kwan Hwang ,  Ji-soon Park ,  Byung-lyul Park

Inventor： Ju-il Choi ,  Kun-sang Park ,  Son-kwan Hwang ,  Ji-soon Park ,  Byung-lyul Park

IPC: H01L23/532 ,  H01L23/48 ,  H01L23/31 ,  H01L25/065 ,  H01L21/768

Abstract: An integrated circuit (IC) device includes a semiconductor substrate having a via hole extending through at least a part thereof, a conductive structure in the via hole, a conductive barrier layer adjacent the conductive structure; and a via insulating layer interposed between the semiconductor substrate and the conductive barrier layer. The conductive barrier layer may include an outer portion oxidized between the conductive barrier layer and the via insulating layer, and the oxidized outer portion of the conductive barrier layer may substantially surrounds the remaining portion of the conductive barrier layer.

公开(公告)号：US20170148753A1

公开(公告)日：2017-05-25

申请号：US15345614

申请日：2016-11-08

Applicant: Ju-il Choi ,  Hyoju KIM ,  Byunglyul PARK ,  Yeun-Sang PARK ,  Jubin SEO ,  Atsushi FUJISAKI

Inventor： Ju-il Choi ,  Hyoju KIM ,  Byunglyul PARK ,  Yeun-Sang PARK ,  Jubin SEO ,  Atsushi FUJISAKI

IPC: H01L23/00 ,  H01L25/065

CPC classification number: H01L24/13 ,  H01L24/11 ,  H01L25/0657 ,  H01L2224/0345 ,  H01L2224/03912 ,  H01L2224/0401 ,  H01L2224/05022 ,  H01L2224/05166 ,  H01L2224/05582 ,  H01L2224/05647 ,  H01L2224/11462 ,  H01L2224/1147 ,  H01L2224/11831 ,  H01L2224/11849 ,  H01L2224/11901 ,  H01L2224/13005 ,  H01L2224/13006 ,  H01L2224/13017 ,  H01L2224/13018 ,  H01L2224/13025 ,  H01L2224/13026 ,  H01L2224/13076 ,  H01L2224/13083 ,  H01L2224/13111 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/13157 ,  H01L2224/13211 ,  H01L2224/13239 ,  H01L2224/16145 ,  H01L2224/16238 ,  H01L2224/81191 ,  H01L2224/81447 ,  H01L2224/81455 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/06544 ,  H01L2924/15311 ,  H01L2924/00014 ,  H01L2924/206 ,  H01L2924/0105 ,  H01L2924/01327 ,  H01L2224/1146 ,  H01L2924/01047 ,  H01L2924/014 ,  H01L2924/01029

Abstract: According to aspects provided herein, a semiconductor device may include a bump providing improved reliability and reduced size. In some aspects, a conductive pad may be formed on a substrate, and a conductive support layer, which may be a pillar, may be formed on the conductive pad. An intermetallic compound (IMC) layer may be formed on the conductive support layer, and a solder layer may be formed on the IMC layer. In some aspects, the conductive support layer may be of a smaller width than the IMC layer. In some aspects, the conductive support layer may have side surfaces which are wider at the solder side than at the conductive pad side. In some aspects, other layers may be formed, such as a seed layer between the conductive pad and the conductive support layer, or a barrier layer between the conductive support layer and the IMC layer.

公开(公告)号：US09219035B2

公开(公告)日：2015-12-22

申请号：US14153478

申请日：2014-01-13

Applicant: Ho-jin Lee ,  Kang-wook Lee ,  Myeong-soon Park ,  Ju-il Choi ,  Son-kwan Hwang

Inventor： Ho-jin Lee ,  Kang-wook Lee ,  Myeong-soon Park ,  Ju-il Choi ,  Son-kwan Hwang

IPC: H01L23/48 ,  H01L23/528 ,  H01L21/768 ,  H01L25/065 ,  H01L25/00 ,  H01L23/522

CPC classification number: H01L23/528 ,  H01L21/76898 ,  H01L23/481 ,  H01L23/5226 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/06181 ,  H01L2224/13009 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/48145 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2924/15311 ,  H01L2924/00012

Abstract: Methods of forming an integrated circuit device include forming an interlayer dielectric layer on a first surface of a semiconductor substrate and then forming an interconnect hole that extends through the interlayer dielectric layer and into the semiconductor substrate. A first sidewall spacer layer is formed on a sidewall of the interconnect hole. The semiconductor substrate at a bottom of the interconnect hole is isotropically etched to define an undercut recess in the semiconductor substrate. This etching step is performed using the first sidewall spacer layer as an etching mask. The interconnect hole and the uncut recess are then filled with a through-via electrode. A second surface of the semiconductor substrate is removed for a sufficient duration to expose the uncut recess containing the through-via electrode.

Abstract translation: 形成集成电路器件的方法包括在半导体衬底的第一表面上形成层间电介质层，然后形成延伸穿过层间电介质层并进入半导体衬底的互连孔。 第一侧壁间隔层形成在互连孔的侧壁上。 在互连孔的底部的半导体衬底被各向同性蚀刻以在半导体衬底中限定底切凹部。 该蚀刻步骤使用第一侧壁间隔层作为蚀刻掩模进行。 然后用通孔电极填充互连孔和未切割凹部。 去除半导体衬底的第二表面足够的持续时间以露出包含通孔电极的未切割凹部。

公开(公告)号：US20150279825A1

公开(公告)日：2015-10-01

申请号：US14669291

申请日：2015-03-26

Applicant: Pil-Kyu KANG ,  Byung Lyul PARK ,  Taeyeong KIM ,  Yeun-Sang PARK ,  Dosun LEE ,  Ho-Jin LEE ,  Jinho CHUN ,  Ju-il CHOI ,  Yi Koan HONG

Inventor： Pil-Kyu KANG ,  Byung Lyul PARK ,  Taeyeong KIM ,  Yeun-Sang PARK ,  Dosun LEE ,  Ho-Jin LEE ,  Jinho CHUN ,  Ju-il CHOI ,  Yi Koan HONG

IPC: H01L25/16 ,  H01L23/538 ,  H01L23/495 ,  H01L21/48 ,  H01L21/768 ,  H01L21/66 ,  H01L25/00 ,  H01L21/304

CPC classification number: H01L25/50 ,  H01L21/304 ,  H01L21/561 ,  H01L21/76898 ,  H01L22/32 ,  H01L23/3128 ,  H01L23/481 ,  H01L24/03 ,  H01L24/05 ,  H01L24/06 ,  H01L24/08 ,  H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L24/92 ,  H01L24/94 ,  H01L25/0657 ,  H01L25/18 ,  H01L2224/0401 ,  H01L2224/05568 ,  H01L2224/0557 ,  H01L2224/05573 ,  H01L2224/05624 ,  H01L2224/05647 ,  H01L2224/06181 ,  H01L2224/08146 ,  H01L2224/131 ,  H01L2224/13124 ,  H01L2224/13147 ,  H01L2224/16145 ,  H01L2224/16146 ,  H01L2224/16225 ,  H01L2224/81191 ,  H01L2224/81193 ,  H01L2224/9202 ,  H01L2224/94 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/06558 ,  H01L2225/06565 ,  H01L2225/06596 ,  H01L2924/10253 ,  H01L2924/14 ,  H01L2924/1431 ,  H01L2924/1434 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/00012 ,  H01L2224/81 ,  H01L2224/11 ,  H01L2224/03 ,  H01L2924/00014 ,  H01L2924/014

Abstract: A semiconductor device having a chip stack and an interconnection terminal is provided. The chip stack includes a first semiconductor chip, a second semiconductor chip and a third semiconductor chip stacked on each other. The interconnection terminal is electrically coupled to the chip stack. The first semiconductor chip includes a first front surface and a first backside surface. The second semiconductor chip includes a second front surface, a second backside surface, a second circuit layer and a through-electrode which is electrically coupled to the second circuit layer and penetrates the second semiconductor chip. The third semiconductor chip includes a third front surface, a third backside surface opposite to the third front surface and a third circuit layer adjacent to the third front surface. The first front surface and the second front surface face each other. The third front surface and the second backside surface face each other.

Abstract translation: 提供具有芯片堆叠和互连端子的半导体器件。 芯片堆叠包括彼此堆叠的第一半导体芯片，第二半导体芯片和第三半导体芯片。 互连端子电耦合到芯片堆叠。 第一半导体芯片包括第一正面和第一背面。 第二半导体芯片包括电耦合到第二电路层并穿透第二半导体芯片的第二前表面，第二背面，第二电路层和贯通电极。 第三半导体芯片包括第三前表面，与第三前表面相对的第三背面和与第三前表面相邻的第三电路层。 第一前表面和第二前表面彼此面对。 第三前表面和第二后侧表面彼此面对。

公开(公告)号：US20120199981A1

公开(公告)日：2012-08-09

申请号：US13364678

申请日：2012-02-02

Applicant: Se-young Jeong ,  Ho-geon Song ,  Ju-il Choi ,  Jae-hyun Phee

Inventor： Se-young Jeong ,  Ho-geon Song ,  Ju-il Choi ,  Jae-hyun Phee

IPC: H01L23/48 ,  H01L21/50

CPC classification number: H01L25/0657 ,  H01L23/481 ,  H01L24/02 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L24/27 ,  H01L24/29 ,  H01L24/32 ,  H01L24/81 ,  H01L24/83 ,  H01L24/92 ,  H01L24/94 ,  H01L25/50 ,  H01L2224/02372 ,  H01L2224/0401 ,  H01L2224/05568 ,  H01L2224/05569 ,  H01L2224/0557 ,  H01L2224/05571 ,  H01L2224/10135 ,  H01L2224/11015 ,  H01L2224/11464 ,  H01L2224/11622 ,  H01L2224/13025 ,  H01L2224/13111 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/13164 ,  H01L2224/13171 ,  H01L2224/16058 ,  H01L2224/16145 ,  H01L2224/16148 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/27436 ,  H01L2224/27622 ,  H01L2224/2919 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/81007 ,  H01L2224/811 ,  H01L2224/81139 ,  H01L2224/81862 ,  H01L2224/81986 ,  H01L2224/83862 ,  H01L2224/92143 ,  H01L2224/94 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2225/06575 ,  H01L2225/06593 ,  H01L2924/00014 ,  H01L2924/01327 ,  H01L2924/3511 ,  H01L2924/3651 ,  H01L2224/83 ,  H01L2224/81 ,  H01L2924/00 ,  H01L2224/05552

Abstract: A semiconductor device includes a first device including a first substrate and a first external connection terminal for connecting outside the first device; a second device stacked on the first device, the second device including a second substrate and a second external connection terminal for connecting outside the second device; an adhesive pattern disposed between the first device and second device, the adhesive pattern disposed in locations other than locations where the first external connection terminal and second external connection terminal are disposed, and the adhesive pattern causing the first device and second device, when stacked, to be spaced apart by a predetermined distance; and a plated layer disposed between and electrically and physically connecting the first external connection terminal and the second external connection terminal.

Abstract translation: 半导体器件包括：第一器件，包括第一衬底和用于连接第一器件外部的第一外部连接端子; 堆叠在第一装置上的第二装置，第二装置包括第二基板和用于连接第二装置外部的第二外部连接端子; 布置在第一装置和第二装置之间的粘合剂图案，布置在除了设置第一外部连接端子和第二外部连接端子的位置以外的位置的粘合剂图案以及当堆叠时引起第一装置和第二装置的粘合剂图案， 间隔开预定距离; 以及设置在电气和物理上连接第一外部连接端子和第二外部连接端子之间的镀层。

公开(公告)号：US20110284936A1

公开(公告)日：2011-11-24

申请号：US13108231

申请日：2011-05-16

Applicant: Ju-il CHOI ,  Jae-hyun Phee ,  Hyu-ha Lee ,  Ho-jin Lee ,  Son-kwan Hwang

Inventor： Ju-il CHOI ,  Jae-hyun Phee ,  Hyu-ha Lee ,  Ho-jin Lee ,  Son-kwan Hwang

IPC: H01L29/772 ,  H01L23/48

CPC classification number: H01L21/76879 ,  H01L21/76844 ,  H01L21/76873 ,  H01L21/76898 ,  H01L24/05 ,  H01L24/06 ,  H01L2224/05009 ,  H01L2224/06181

Abstract: A semiconductor device and a method of fabricating a semiconductor device. The semiconductor device includes an interlayer insulation layer pattern, a metal wire pattern exposed by a passage formed by a via hole formed in the interlayer insulation layer pattern to input and output an electrical signal, and a plated layer pattern directly contacting the metal wire pattern and filling the via hole. The method includes forming an interlayer insulation layer having a metal wire pattern to input and output an electrical signal formed therein, forming a via hole to define a passage that extends through the interlayer insulation layer until at least a part of the metal wire pattern is exposed, and forming a plated layer pattern to fill the via hole and to directly contact the metal wire pattern by using the metal wire pattern exposed through the via hole as a seed metal layer.

Abstract translation: 半导体器件和半导体器件的制造方法。 半导体器件包括层间绝缘层图案，由形成在层间绝缘层图案中的通孔形成的通道暴露的金属线图案，以输入和输出电信号，以及直接接触金属线图案的镀层图案和 填充通孔。 该方法包括形成具有金属线图案的层间绝缘层，以输入和输出其中形成的电信号，形成通孔以限定延伸穿过层间绝缘层的通道，直到金属线图案的至少一部分露出 并且形成镀层图案以填充通孔并且通过使用通过通孔露出的金属线图案作为种子金属层直接接触金属线图案。

公开(公告)号：US08039937B2

公开(公告)日：2011-10-18

申请号：US12432003

申请日：2009-04-29

Applicant: Hyun-Soo Chung ,  Seung-Kwan Ryu ,  Ju-Il Choi ,  Dong-Ho Lee ,  Seong-Deok Hwang

Inventor： Hyun-Soo Chung ,  Seung-Kwan Ryu ,  Ju-Il Choi ,  Dong-Ho Lee ,  Seong-Deok Hwang

IPC: H01L23/02

CPC classification number: H01L21/76898 ,  H01L23/3128 ,  H01L23/3178 ,  H01L23/481 ,  H01L24/03 ,  H01L24/05 ,  H01L24/06 ,  H01L24/16 ,  H01L24/19 ,  H01L24/20 ,  H01L24/82 ,  H01L25/0657 ,  H01L25/105 ,  H01L25/50 ,  H01L2224/02313 ,  H01L2224/02372 ,  H01L2224/02379 ,  H01L2224/0239 ,  H01L2224/036 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/05009 ,  H01L2224/05548 ,  H01L2224/06181 ,  H01L2224/11334 ,  H01L2224/11462 ,  H01L2224/12105 ,  H01L2224/13024 ,  H01L2224/13025 ,  H01L2224/16145 ,  H01L2224/16235 ,  H01L2224/94 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/06586 ,  H01L2225/1058 ,  H01L2924/00 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01015 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01079 ,  H01L2924/014 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2924/01028 ,  H01L2224/03

Abstract: Provided are methods of fabricating semiconductor chips, semiconductor chips formed by the methods, and chip-stack packages having the semiconductor chips. One embodiment specifies a method that includes patterning a scribe line region of a semiconductor substrate to form a semiconductor strut spaced apart from edges of a chip region of the semiconductor substrate.

Abstract translation: 提供制造半导体芯片的方法，通过该方法形成的半导体芯片和具有半导体芯片的芯片堆叠封装。 一个实施例规定了一种方法，其包括图案化半导体衬底的划线区域以形成与半导体衬底的芯片区域的边缘间隔开的半导体支柱。

公开(公告)号：US20110226626A1

公开(公告)日：2011-09-22

申请号：US13039822

申请日：2011-03-03

Applicant: Ju-il Choi ,  Uihyoung Lee ,  Jae-hyun Phee ,  Jeong-Woo Park

Inventor： Ju-il Choi ,  Uihyoung Lee ,  Jae-hyun Phee ,  Jeong-Woo Park

IPC: C25D5/48 ,  H01L21/306

CPC classification number: H01L21/6723 ,  C25D7/123 ,  C25D17/001 ,  C25D17/06 ,  H01L21/67028 ,  H01L21/6708 ,  H01L21/6719 ,  H01L21/68728 ,  H01L21/68785

Abstract: A substrate treating device may include a plating treatment portion configured to perform a plating process of a substrate, a wet treatment portion configured to perform a wet treating process of the substrate, the wet treatment portion being under the plating treatment portion, and a substrate support portion configured to support the substrate so that a plating surface of the substrate faces upward, the substrate support portion being further configured to move the substrate between the plating treatment portion and the wet treatment portion.

Abstract translation: 基板处理装置可以包括：电镀处理部，被配置为进行基板的电镀处理;湿处理部，被配置为进行基板的湿式处理;湿处理部位于电镀处理部下;以及基板支撑 被配置为支撑所述基板的部分，使得所述基板的电镀表面面向上，所述基板支撑部分还被配置为在所述电镀处理部分和所述湿处理部分之间移动所述基板。