Abstract:
A method and device for interconnecting stacked die surfaces with electrically conductive traces is provided that includes bonding, using a first layer of a photoresist compound, a second die on top of a first die, heating the first layer above a pyrolyzation point of the photoresist compound, where the photoresist compound transitions to a stable layer, depositing a second layer of the photoresist compound, using lithography, from a top surface of the first die to a top surface of the second die, heating the second photoresist compound layer to a liquid state, where the liquid photoresist compound forms a smooth convex bridge between the first die top surface and the second die top surface, and depositing an electrically conductive layer on the smooth convex bridge, where an electrically conductive trace is formed between the first die top surface and the second die top surface.
Abstract:
A vertical GaN-based blue LED has an n-type GaN layer that was grown over a ZnS layer that in turn was grown directly on a silicon substrate. In one example, the ZnS layer is a transitional buffer layer that is 50nm thick, and the n-type GaN layer is at least 2000nm thick. Growing the n-type GaN layer on the ZnS buffer layer reduces lattice defect density in the n-type layer. The ZnS buffer layer provides a good lattice constant match with the silicon substrate and provides a compound polar template for subsequent GaN growth. After the epitaxial layers of the LED are formed, a conductive carrier is wafer bonded to the structure. The silicon substrate and the ZnS buffer layer are then removed. Electrodes are added and the structure is singulated to form finished LED devices.
Abstract:
A microelectronic element (101) having memory storage array function has a front face (105) facing away from a substrate (102) of a microelectronic package (100), and is electrically connected with the substrate (102) through conductive structure (112) extending above the front face (105). First and second sets (114, 124) of first terminals are exposed at a surface (110) of the substrate (102) on respective first and second sides of a theoretical axis (132), each set configured to carry address information usable to determine an addressable memory location of a memory storage array of the microelectronic element. Signal assignments of the first terminals in the first set are a mirror image of the signal assignments of the first terminals in the second set.
Abstract:
In wireless communication devices, internally matching impedance in millimeter wave packaging enables better signal retention at high frequencies in the range of 15 GHz and above. Through the use of differential wire bond signal transmission, the inherent inductance of a millimeter wave package can be matched by the capacitance of the package wire bonds if the capacitance is tailored. The capacitance can be tailored by calculating a suitable distance between wire bonds and tuning the dielectric constant of the over-mold material. A differential set of wire bonds act like a differential transmission line whose characteristic impedance can be tuned by configuring the dielectric constant of the over- mold of the millimeter wave package.
Abstract:
In accordance with certain embodiments, illumination systems are formed by aligning light-emitting elements with optical elements and/or disposing light-conversion materials on the light-emitting elements, as well as by providing electrical connectivity to the light-emitting elements
Abstract:
Die Erfindung betrifft ein Verfahren zum Draht-, Bändchen- und/oder Chipboden eines Halbleiterbauelements mit den elektrischen Anschlüssen seines Gehäuses oder Schaltungsträgers, wobei eine elektrische Kontaktierung über wenigstens eine am Halbleiterbauelement vorhandene Kupferoberfläche erfolgt. Das Verfahren zeichnet sich dadurch aus, dass vor dem Bonden die Kupferoberfläche (12, 12') mit einer selbstorganisierenden Monoschicht (20, 20') aus einer organischen Verbindung bedeckt wird.
Abstract:
A first contact (310) surface of a semiconductor laser chip (302) is formed to a surface roughness selected to have a maximum peak to valley height that is substantially smaller than a diffusion barrier layer thickness. A diffusion barrier layer that includes a non-metallic, electrically-conducting compound and that has the barrier layer thickness is applied to the first contact surface, and the semiconductor laser chip is soldered to a carrier mounting (304) along the first contact surface using a solder composition (306) by heating the soldering composition to less than a threshold temperature at which dissolution of the barrier layer into the soldering composition occurs. Thereby the diffusion barrier remains contiguous. The non-metallic, electrically conducting compound may comprise at least one of titanium nitride, titanium oxy-nitride, tungsten nitride, cerium oxide and cerium gadolinium oxy-nitride
Abstract:
Embodiments of the present disclosure provide a method that comprises providing a first die having a surface comprising a bond pad to route electrical signals of the first die and attaching the first die to a layer of a substrate. The method further comprises forming one or more additional layers of the substrate to embed the first die in the substrate and coupling a second die to the one or more additional layers, the second die having a surface comprising a bond pad to route electrical signals of the second die. The second die is coupled to the one or more additional layers such that electrical signals are routed between the first die and the second die.