Abstract:
A method for bonding a first semiconductor substrate to a second semiconductor substrate by direct bonding is described. The substrates are both provided on their contact surfaces with a dielectric layer, followed by a CMP step for reducing the roughness of the dielectric layer. Then a layer of SiCN is deposited onto the dielectric layer, followed by a CMP step which reduces the roughness of the SiCN layer to the order of 1 tenth of a nanometre. Then the substrates are subjected to a pre-bond annealing step and then bonded by direct bonding, possibly preceded by one or more pre- treatments of the contact surfaces, and followed by a post- bond annealing step, at a temperature of less than or equal to 250°C. It has been found that the bond strength is excellent, even at the above named annealing temperatures, which are lower than presently known in the art.
Abstract:
An apparatus relating generally to a substrate is disclosed. In this apparatus, a first metal layer is on the substrate. The first metal layer has an opening. The opening of the first metal layer has a bottom and one or more sides extending from the bottom. A second metal layer is on the first metal layer. The first metal layer and the second metal layer provide a bowl-shaped structure. An inner surface of the bowl-shaped structure is defined responsive to the opening of the first metal layer and the second metal layer thereon. The opening of the bowl-shaped structure is configured to receive and at least partially retain a bonding material during a reflow process.
Abstract:
A device (100) includes a first chip (104) having a first circuit element (112), a first interconnect pad (116) in electrical contact (118) with the first circuit element, and a barrier layer (120) on the first interconnect pad, a superconducting bump bond (106) on the barrier layer, and a second chip (102) joined to the first chip by the superconducting bump bond, the second chip having a quantum circuit element (108), in which the superconducting bump bond provides an electrical connection between the first circuit element and the quantum circuit element.
Abstract:
Procédé de collage direct d'une puce électronique (100) sur un substrat (102) ou sur une autre puce électronique, comportant les étapes de : - traitement hydrophile d'une partie (105) d'une face de la puce électronique et d'une partie (110) d'une face (108) du substrat ou de l'autre puce électronique; - dépôt d'un fluide aqueux (112) sur la partie de la face du substrat ou de la deuxième puce électronique; - dépôt de la partie de la face de la puce électronique sur le fluide aqueux; - séchage du fluide aqueux jusqu'à une solidarisation de la partie de la face de la puce électronique avec la partie de la face du substrat ou de l'autre puce électronique; et comportant en outre, pendant au moins une partie du séchage du fluide aqueux, une émission d'ultrasons dans le fluide aqueux à travers le substrat ou l'autre puce électronique.
Abstract:
An assembly 100 and method of making same are provided. The assembly 100 can include a first component 105 including a dielectric region 120 having an exposed surface 122, a conductive pad 134 at the surface 122 defined by a conductive element 132 having at least a portion extending in an oscillating or spiral path along the surface 122, and a an electrically conductive bonding material 140 joined to the conductive pad 134 and bridging an exposed portion 137 of the dielectric surface 122 between adjacent segments 136, 138. The conductive pad 134 can permit electrical interconnection of the first component 105 with a second component 107 having a terminal 108 joined to the pad 134 through the electrically conductive bonding material 140. The path of the conductive element 132 may or may not overlap or cross itself.
Abstract:
Various embodiments include methods of forming interconnect structures, and the structures formed by such methods. In one embodiment, a method can include: providing a precursor interconnect structure having: a photosensitive polyimide (PSPI) layer (4); a controlled collapse chip connection (C4) bump (10) overlying the PSPI layer; and a solder (18) overlying the C4 bump and contacting a side (20) of the C4 bump. The method can further include recessing a portion of the PSPI layer (4) adjacent to the C4 bump (10) to form a PSPI pedestal (26) under the C4 bump (10). The method can additionally include forming an Underfill (32) abutting the PSPI pedestal (26) and the C4 bump (10), wherein the Underfill (32) and the solder (18) form an interface separated from the PSPI pedestal (26).
Abstract:
An assembly 100 and method of making same are provided. The assembly 100 can include a first component 105 including a dielectric region 120 having an exposed surface 122, a conductive pad 134 at the surface 122 defined by a conductive element 132 having at least a portion extending in an oscillating or spiral path along the surface 122, and a an electrically conductive bonding material 140 joined to the conductive pad 134 and bridging an exposed portion 137 of the dielectric surface 122 between adjacent segments 136, 138. The conductive pad 134 can permit electrical interconnection of the first component 105 with a second component 107 having a terminal 108 joined to the pad 134 through the electrically conductive bonding material 140. The path of the conductive element 132 may or may not overlap or cross itself.
Abstract:
The present technology is directed to manufacturing collars for under-bump metal (UBM) structures for die-to-die and/or package-to-package interconnects and associated systems. A semiconductor die includes a semiconductor material having solid-state components and an interconnect extending at least partially through the semiconductor material. An under-bump metal (UBM) structure is formed over the semiconductor material and is electrically coupled to corresponding interconnects. A collar surrounds at least a portion of the side surface of the UBM structure, and a solder material is disposed over the top surface of the UBM structure.
Abstract:
A multi-chip module ( MCM ) is described. This MCM includes at least two substrates that are mechanically coupled and aligned by positive and negative features on facing surfaces of the substrates. These positive and negative features may mate and self-lock with each other. The positive features may be self-populated into the negative features on at least one of the substrates using a hydrophilic layer in the negative feature. This hydrophilic layer may be used in conjunction with a hydrophobic layer surrounding the negative features on a top surface of at least one of the substrates.