Method of producing printed circuit board incorporating resistance element
    457.
    发明申请
    Method of producing printed circuit board incorporating resistance element 审中-公开
    制造电阻元件的印刷电路板的制造方法

    公开(公告)号:US20080313887A1

    公开(公告)日:2008-12-25

    申请号:US12155663

    申请日:2008-06-06

    Applicant: Garo Miyamoto

    Inventor: Garo Miyamoto

    Abstract: The present invention provides a method of producing a resistance element incorporated in a printed circuit board at an accuracy of resistance value of ±1% or less, at low cost and with a good yield while the resistance element formed by a resistor paste is incorporated. A method of producing a printed circuit board incorporating a resistance element includes: preparing a double-sided copper clad board having a first metallic foil on one face of an insulating base material thereof and a second metallic foil on the other face of the insulating base material thereof; providing at least a pair of electrodes on one of the metallic foils; printing a resistor paste between the electrodes to form a resistor; preparing a circuit board having at least one wiring layer; causing a layer on which the resistor paste is formed to oppose the circuit board to layer the double-sided copper clad board on the circuit board; forming openings in the first and the second metallic foils; and emitting laser through the openings to partly remove the insulating base material and the resistor paste to adjust resistance value. A conformal mask for etching may be formed on the second metallic foil to form openings in the insulating base material by etching to emit laser through the openings.

    Abstract translation: 本发明提供一种以电阻值为±1%以下的精度制造电阻元件的制造方法,低成本且良好的成品率,同时结合电阻浆料形成的电阻元件。 一种制造包含电阻元件的印刷电路板的方法包括:制备在绝缘基材的一个面上具有第一金属箔的双面铜包覆板和在绝缘基材的另一面上的第二金属箔 的; 在一个金属箔上提供至少一对电极; 在电极之间印刷电阻膏以形成电阻器; 准备具有至少一个布线层的电路板; 使形成有电阻浆料的层与电路板相对地层叠电路板上的双面铜箔板; 在第一和第二金属箔中形成开口; 并通过开口发射激光以部分地去除绝缘基材和电阻浆料以调节电阻值。 可以在第二金属箔上形成用于蚀刻的保形掩模,以通过蚀刻在绝缘基材中形成开口,以通过开口发射激光。

    Method for Forming Oxide Dielectric Layer, and Capacitor Layer Forming Material Provided with Oxide Dielectric Layer Obtained by the Forming Method
    459.
    发明申请
    Method for Forming Oxide Dielectric Layer, and Capacitor Layer Forming Material Provided with Oxide Dielectric Layer Obtained by the Forming Method 审中-公开
    形成氧化物介电层的方法以及通过成型方法获得的具有氧化物介电层的电容层形成材料

    公开(公告)号:US20080310073A1

    公开(公告)日:2008-12-18

    申请号:US11912559

    申请日:2006-04-28

    Abstract: The present invention has an object to provide a method for forming an oxide dielectric layer, which dielectric layer is formed by applying the sol-gel method, and is hardly damaged by an etching solution and excellent in dielectric characteristics such as a large electric capacitance. To achieve the object, the forming method of an oxide dielectric layer by applying a sol-gel method characterized by being provided with the following processes (a) to (c) is employed. Process (a): A solution preparing process of preparing a sol-gel solution for manufacturing an aiming oxide dielectric layer. Process (b): A coating process wherein stages of the sol-gel solution coating on the surface of a metal substrate followed by drying in an oxygen-containing atmosphere followed by pyrolysis in an oxygen-containing atmosphere sequentially is made one unit step; the one unit step is repeated twice or more times; and a pre-baking stage at 550-deg.C to 1000-deg.C in an inert gas-substituted atmosphere or the like is provided optionally between the one unit step and the next one unit step to control the film thickness. Process (c): A baking process of finally subjecting the coated metal substrate to a baking process at 550-deg.C to 1000-deg.C in an inert gas-substituted atmosphere or the like to finish the dielectric layer.

    Abstract translation: 本发明的目的是提供一种形成氧化物电介质层的方法,该电介质层通过施加溶胶 - 凝胶法形成,并且几乎不被蚀刻溶液损坏,并且具有优异的诸如大电容的介电特性。 为了达到上述目的,采用以下工序(a)〜(c)为特征的溶胶 - 凝胶法的氧化物介电层的形成方法。 方法(a):制备用于制造瞄准氧化物介电层的溶胶 - 凝胶溶液的溶液制备方法。 方法(b):其中在金属基材表面上涂覆溶胶 - 凝胶溶液的阶段,然后在含氧气氛中干燥,然后依次在含氧气氛中热解的步骤为一个单位步骤; 一个单位步骤重复两次或更多次; 并且在惰性气体取代气氛等中在550℃〜1000℃的预烘烤阶段可选地设置在一个单元步骤和下一个单元步骤之间,以控制膜厚度。 方法(c):在惰性气体取代气氛等中,在550℃〜1000℃下对经涂布的金属基材进行烘烤处理的烧成工序,以完成电介质层。

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