摘要:
A semiconductor device, in which a solder layer bonding chip parts and wiring members are enclosed with the resin layer, and the solder layer is comprised of a compound body in which metal powder is distributed in the matrix metal, is disclosed. When a semiconductor device in which the chip parts are installed in the wiring member with the solders, the soldering part is sealed with the resin is mounted secondly on the external wiring member, the outflow of the solders and the short circuit due to the outflow, the disconnections, and the displacement of the chip parts can be prevented.
摘要:
There is provided a method for producing a reliable metal/ceramic bonding substrate at low costs by forming a desired fillet on the peripheral portion of a metal circuit by a small number of steps. After an active metal containing brazing filler metal 12 is applied on a ceramic substrate 10 to bond a metal member 14 thereto, a resist 16 is applied on a predetermined portion of a surface of the metal member 14 to etch unnecessary portions, and then the resist is removed. Thereafter, unnecessary part of a metal layer 12b, which is formed of a metal other than an active metal of the active metal containing brazing filler metal 12, is etched with a chemical to be removed. Then, unnecessary part of an active metal layer 12a, which is formed of the active metal and a compound thereof, is selectively etched with a chemical, which inhibits the metal member 14 and the metal layer 12b from being etched and which selectively etch the active metal layer 12b, to form a metal circuit on the ceramic substrate 10. This metal circuit is chemically polished to form a fillet on the peripheral portion of the metal circuit.
摘要:
The active brazing solder for brazing ceramic parts of alumina, particularly of high-purity alumina, contains a maximum of 12 wt. % Ti, a maximum of 8 wt. % Be, and less than 16.5 wt. % Fe, the remainder being Zr and any impurities that may be present. The active brazing solder has the following behaviour/features: Brazing temperature: lower than 1,000° C.; the brazed joint is high-vacuum-tight over a long period of time; the coefficient of thermal expansion of the active brazing alloy is substantially identical to that of the alumina ceramic in the entire temperature range covered during the brazing process; the strength of the brazed joint between the two ceramic parts is so high that under tensile loading, fracture will result not at the joint, but in the adjacent ceramic; the pressure resistance of the active brazing solder is greater than 2 GPa; the active brazing solder is very good processable into powders having particle sizes on the order of 10 &mgr;m.
摘要:
A glazed ceramic article is provided which comprises a glaze layer formed on an outer surface of a ceramic main body. The glaze layer is made of a glaze comprising 60 to 74% by weight of Si when calculated in terms of SiO2 and 16 to 30% by weight of Al when calculated in terms of Al2O3. Such a composition can raise the softening temperature and can prevent deterioration of the appearance due to the surface roughening caused at the time of soldering of a metallic member to the ceramic main body after glost firing and deterioration of the insulation ability due to adherence of dirt to the surface of the glaze layer. A metal and ceramic assembly having such a glazed ceramic article, and a vacuum switch having such a metal and ceramic assembly are also provided.
摘要翻译:提供了一种玻璃陶瓷制品,其包括形成在陶瓷主体的外表面上的釉层。 釉层由以SiO 2为60〜74重量%的Si和以Al 2 O 3换算为16〜30重量%的Al构成。 这种组合物可以提高软化温度,并且可以防止由于在烧结之后将金属构件焊接到陶瓷主体时引起的表面粗糙化导致的外观劣化,并且由于粘附到污垢而导致的绝缘能力的劣化 釉层的表面。 还提供了具有这种玻璃陶瓷制品的金属和陶瓷组件以及具有这种金属和陶瓷组件的真空开关。
摘要:
A laminated radiation member includes a radiation plate, an insulation substrate bonded to the upper surface of the radiation plate and an electrode provided on the upper surface of the insulation substrate. The laminated radiation member is made by a method including the steps of surface treating a bonding surface of the radiation plate and/or the insulation substrate, interposing ceramic particles surface treated to assure wettability with a hard solder or a metal between the radiation plate and the insulation substrate, disposing a hard solder above and/or below the ceramic particles, heating the hard solder to a temperature higher than the melting point of the solder, penetrating the molten hard solder into spaces between the ceramic particles to react the ceramic particles with the solder to produce a metal base composite material, and bonding the radiation plate and the insulation substrate with the metal base composite material.
摘要:
A laminated radiation member includes a radiation plate, an insulation substrate bonded to the upper surface of the radiation plate and an electrode provided on the upper surface of the insulation substrate. The laminated radiation member is made by a method including the steps of surface treating a bonding surface of the radiation plate and/or the insulation substrate, interposing ceramic particles surface treated to assure wettability with a hard solder or a metal between the radiation plate and the insulation substrate, disposing a hard solder above and/or below the ceramic particles, heating the hard solder to a temperature higher than the melting point of the solder, penetrating the molten hard solder into spaces between the ceramic particles to react the ceramic particles with the solder to produce a metal base composite material, and bonding the radiation plate and the insulation substrate with the metal base composite material.
摘要:
A motor (17a, 17b) opens and closes a shutter turnably mounted so as to open and close a discharge port relevant to a hopper, and generates a torque against a load in a gravity direction of materials dropped from a material supply mechanism to the hopper. A shutter control portion (19a, 19b, . . . 19h) sets a hold current applied to the motor from the start of loading relevant to the shutter caused by the materials to be dropped to a predetermined period, to a first hold current value for applying to the shutter a torque sufficient to bear the shock during charge of the materials. In addition, the control portion sets a hold current applied to the motor from an elapse of the predetermined period after reception of the materials by the hopper to the start of discharging the materials from a discharge port of the hopper, to a second hold current value that is smaller than the first hold current value, the second hold current value applying to the shutter a torque against a force released downwardly under a load in the gravity direction of the materials.
摘要:
The present invention provides a ceramic circuit board comprising: a ceramic substrate and a metal circuit plate bonded to the ceramic substrate through a brazing material layer; wherein the brazing material layer is composed of Al—Si group brazing material and an amount of Si contained in the brazing material is 7 wt % or less. In addition, it is preferable to form a thinned portion, holes, or grooves to outer peripheral portion of the metal circuit plate. According to the above structure of the present invention, there can be provided a ceramic circuit board having both high bonding strength and high heat-cycle resistance, and capable of increasing an operating reliability as electronic device.
摘要:
A method of bonding a diamond compact comprising a polycrystalline mass of diamond and a bonding phase which contains free-silicon to a substrate is provided. The method includes the steps of contacting a surface of the compact with carbon or nitrogen or a mixture thereof under conditions suitable to cause free-silicon in the surface to react with the carbon and/or nitrogen and thereafter bonding that surface to the substrate, preferably by means of a braze. In a preferred form of the invention, the surface which is bonded to the substrate is acid cleaned after contact of that surface with carbon or nitrogen or a mixture thereof.
摘要:
A jointed member, such as a tappet, obtained by brazing a disc which is ceramic member, and a tappet body which is a metal member, to each other by a brazing layer, the jointed member includes a reaction layer formed on the surface of the metal member adjacent to the brazing material and having a thickness of not less than 5 .mu.m, wherein the reaction layer contains, in addition to main elements forming the metal member, Cu in the range of 0.5 weight % to 8 weight % and Si in the range of 0.5 weight % to 8 weight %.