公开(公告)号：US20150004756A1

公开(公告)日：2015-01-01

申请号：US13929776

申请日：2013-06-27

Applicant: STATS ChipPAC, Ltd.

Inventor： HeeJo Chi ,  HanGil Shin ,  KyungMoon Kim

IPC: H01L23/00

CPC classification number: H01L25/105 ,  H01L21/563 ,  H01L23/3128 ,  H01L23/49816 ,  H01L23/49822 ,  H01L23/49827 ,  H01L23/5389 ,  H01L24/13 ,  H01L24/14 ,  H01L24/16 ,  H01L24/17 ,  H01L24/29 ,  H01L24/32 ,  H01L24/48 ,  H01L24/83 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/131 ,  H01L2224/13147 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/2919 ,  H01L2224/32225 ,  H01L2224/48225 ,  H01L2224/73204 ,  H01L2224/73265 ,  H01L2224/831 ,  H01L2224/8385 ,  H01L2225/1023 ,  H01L2225/1041 ,  H01L2225/1058 ,  H01L2924/00014 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2924/00 ,  H01L2924/014 ,  H01L2924/0665 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: Methods of forming conductive and insulating layers for semiconductor devices and packages. Substrate is provided with integrated circuit device and interconnect structure mounted thereon, the interconnect structure adjacent the integrated circuit device. The integrated circuit device and portions of the interconnect structure can be covered with an encapsulation exposing a portion of the interconnect structure. Conductive material is formed over the exposed portion of the interconnect structure by a depositing process followed by a heating process to alter the chemical properties of the conductive material. Optionally, a dispersing process may be incorporated.

Abstract translation: 形成用于半导体器件和封装的导电和绝缘层的方法。 衬底上装有集成电路器件和互连结构，其中互连结构与集成电路器件相邻。 集成电路器件和互连结构的部分可以覆盖暴露一部分互连结构的封装。 导电材料通过沉积过程形成在互连结构的暴露部分上，然后进行加热过程以改变导电材料的化学性质。 任选地，可以并入分散过程。

公开(公告)号：US20150001741A1

公开(公告)日：2015-01-01

申请号：US13929426

申请日：2013-06-27

Applicant: STATS ChipPAC, Ltd.

Inventor： Koo Hong Lee ,  Tae Keun Lee

IPC: H01L23/31 ,  H01L21/56

CPC classification number: H01L23/49833 ,  H01L23/13 ,  H01L23/3128 ,  H01L2224/16225 ,  H01L2224/32225 ,  H01L2224/73204 ,  H01L2224/73253 ,  H01L2924/13091 ,  H01L2924/15331 ,  H01L2924/00

Abstract: A semiconductor device includes a first substrate. The first substrate may be a wafer-level interposer or a die-level interposer. A portion of the first substrate is removed to form a beveled edge. The beveled edge may be formed during singulation of the first substrate. A second substrate is disposed over the first substrate. The beveled edge is oriented towards the second substrate. A semiconductor die is disposed over the second substrate. The first and second substrates are disposed within a cavity of a mold. An encapsulant is deposited within the cavity over a first surface of the first substrate between the first and second substrates. The beveled edge reduces encapsulant flow onto a second surface of the first substrate opposite the first surface. The second surface of the first substrate remains free from the encapsulant. The first substrate is singulated before or after the encapsulant is deposited.

Abstract translation: 半导体器件包括第一衬底。 第一衬底可以是晶片级插入器或晶片级插入器。 去除第一衬底的一部分以形成斜边。 斜切边缘可以在第一基板的分割期间形成。 第二基板设置在第一基板上。 斜边缘朝向第二基板。 半导体管芯设置在第二衬底上。 第一和第二基板设置在模具的空腔内。 密封剂在第一和第二基底之间的第一基底的第一表面上沉积在空腔内。 倾斜的边缘减少了密封剂流到与第一表面相对的第一基底的第二表面上。 第一衬底的第二表面保持不含密封剂。 第一衬底在密封剂沉积之前或之后被分离。

公开(公告)号：US20140367848A1

公开(公告)日：2014-12-18

申请号：US13918103

申请日：2013-06-14

Applicant: STATS ChipPAC, Ltd.

Inventor： HeeJo Chi ,  HanGil Shin ,  NamJu Cho

IPC: H01L23/00 ,  H01L23/498 ,  H01L21/56 ,  H01L23/522

CPC classification number: H01L24/81 ,  H01L21/56 ,  H01L21/561 ,  H01L21/568 ,  H01L21/6835 ,  H01L23/3128 ,  H01L23/36 ,  H01L23/49811 ,  H01L23/49816 ,  H01L23/49822 ,  H01L23/49827 ,  H01L23/49838 ,  H01L23/522 ,  H01L23/5389 ,  H01L23/552 ,  H01L24/11 ,  H01L24/13 ,  H01L24/24 ,  H01L24/29 ,  H01L24/32 ,  H01L24/73 ,  H01L24/82 ,  H01L24/92 ,  H01L24/97 ,  H01L25/105 ,  H01L2221/68327 ,  H01L2221/68372 ,  H01L2221/68377 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/04105 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/1134 ,  H01L2224/1145 ,  H01L2224/11462 ,  H01L2224/11464 ,  H01L2224/11849 ,  H01L2224/11901 ,  H01L2224/12105 ,  H01L2224/13022 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/24246 ,  H01L2224/24247 ,  H01L2224/2919 ,  H01L2224/32245 ,  H01L2224/73267 ,  H01L2224/82031 ,  H01L2224/82039 ,  H01L2224/82047 ,  H01L2224/92244 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2225/1035 ,  H01L2225/1041 ,  H01L2225/1058 ,  H01L2924/00011 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/13091 ,  H01L2924/15151 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/3025 ,  H01L2924/3511 ,  H01L2924/00 ,  H01L2224/83 ,  H01L2224/82 ,  H01L2224/03 ,  H01L2224/81805

Abstract: A semiconductor device has a semiconductor die. The semiconductor die is disposed over a conductive substrate. An encapsulant is deposited over the semiconductor die. A first interconnect structure is formed over the encapsulant. An opening is formed through the substrate to isolate a portion of the substrate electrically connected to the first interconnect structure. A bump is formed over the first interconnect structure. Conductive vias are formed through the encapsulant and electrically connected to the portion of the substrate. A plurality of bumps is formed over the semiconductor die. A first conductive layer is formed over the encapsulant. A first insulating layer is formed over the first conductive layer. A second conductive layer is formed over the first insulating layer and first conductive layer. A second insulating layer is formed over the first insulating layer and second conductive layer. Protrusions extend above the substrate.

Abstract translation: 半导体器件具有半导体管芯。 半导体管芯设置在导电衬底上。 密封剂沉积在半导体管芯上。 在密封剂上形成第一互连结构。 通过衬底形成开口以隔离电连接到第一互连结构的衬底的一部分。 在第一互连结构上形成凸块。 导电孔通过密封剂形成并电连接至基底的部分。 在半导体管芯上形成多个凸点。 在密封剂上形成第一导电层。 第一绝缘层形成在第一导电层上。 在第一绝缘层和第一导电层上形成第二导电层。 在第一绝缘层和第二导电层上形成第二绝缘层。 突起延伸到基底之上。

公开(公告)号：US08896109B2

公开(公告)日：2014-11-25

申请号：US13684055

申请日：2012-11-21

Applicant: STATS ChipPAC, Ltd.

Inventor： Reza A. Pagaila ,  Seng Guan Chow ,  Seung Uk Yoon

IPC: H01L23/02 ,  H01L23/06 ,  H01L23/22 ,  H01L21/44 ,  H01L21/50 ,  H01L25/065 ,  H01L23/00 ,  H01L25/16 ,  H01L23/498 ,  H01L25/00 ,  H01L23/538 ,  H01L21/56 ,  H01L25/10 ,  H01L23/31

CPC classification number: H01L23/49811 ,  H01L21/561 ,  H01L21/568 ,  H01L23/3128 ,  H01L23/5389 ,  H01L24/17 ,  H01L24/19 ,  H01L24/96 ,  H01L24/97 ,  H01L25/0652 ,  H01L25/0657 ,  H01L25/105 ,  H01L25/16 ,  H01L25/50 ,  H01L2224/03462 ,  H01L2224/03464 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/0557 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/12105 ,  H01L2224/13025 ,  H01L2224/1403 ,  H01L2224/141 ,  H01L2224/16145 ,  H01L2224/16146 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/1703 ,  H01L2224/18 ,  H01L2224/2518 ,  H01L2224/73209 ,  H01L2224/73259 ,  H01L2224/73267 ,  H01L2224/81005 ,  H01L2224/8203 ,  H01L2224/92124 ,  H01L2224/9222 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06524 ,  H01L2225/06541 ,  H01L2225/06548 ,  H01L2225/06562 ,  H01L2225/1035 ,  H01L2225/1052 ,  H01L2225/1058 ,  H01L2225/107 ,  H01L2924/00014 ,  H01L2924/01004 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/00 ,  H01L2224/05552 ,  H01L2224/82 ,  H01L2224/81

Abstract: A semiconductor device has a first semiconductor die mounted over a carrier. Wettable contact pads can be formed over the carrier. A second semiconductor die is mounted over the first semiconductor die. The second die is laterally offset with respect to the first die. An electrical interconnect is formed between an overlapping portion of the first die and second die. A plurality of first conductive pillars is disposed over the first die. A plurality of second conductive pillars is disposed over the second die. An encapsulant is deposited over the first and second die and first and second conductive pillars. A first interconnect structure is formed over the encapsulant, first conductive pillars, and second die. The carrier is removed. A second interconnect structure is formed over the encapsulant, second conductive pillars, and first die. A third conductive pillar is formed between the first and second build-up interconnect structures.

Abstract translation: 半导体器件具有安装在载体上的第一半导体管芯。 可以在载体上形成可润湿的接触垫。 第二半导体管芯安装在第一半导体管芯上。 第二模具相对于第一模具横向偏移。 在第一管芯和第二管芯的重叠部分之间形成电互连。 多个第一导电柱设置在第一管芯上方。 多个第二导电柱设置在第二管芯上。 密封剂沉积在第一和第二管芯以及第一和第二导电柱上。 在密封剂，第一导电柱和第二模上形成第一互连结构。 载体被移除。 在密封剂，第二导电柱和第一模上形成第二互连结构。 在第一和第二堆积互连结构之间形成第三导电柱。

公开(公告)号：US20140327145A9

公开(公告)日：2014-11-06

申请号：US13715424

申请日：2012-12-14

Applicant: STATS CHIPPAC, LTD.

Inventor： Reza A. Pagaila ,  Seng Guan Chow ,  Seung Uk Yoon

IPC: H01L23/538

CPC classification number: H01L25/50 ,  H01L21/486 ,  H01L21/56 ,  H01L21/561 ,  H01L21/568 ,  H01L21/6835 ,  H01L23/295 ,  H01L23/3107 ,  H01L23/3121 ,  H01L23/3128 ,  H01L23/3157 ,  H01L23/49827 ,  H01L23/49833 ,  H01L23/5384 ,  H01L23/5389 ,  H01L23/544 ,  H01L24/03 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L24/19 ,  H01L24/20 ,  H01L24/24 ,  H01L24/25 ,  H01L24/27 ,  H01L24/29 ,  H01L24/32 ,  H01L24/48 ,  H01L24/73 ,  H01L24/82 ,  H01L24/83 ,  H01L24/97 ,  H01L25/03 ,  H01L25/0655 ,  H01L25/0657 ,  H01L25/105 ,  H01L25/16 ,  H01L2221/68345 ,  H01L2221/68381 ,  H01L2221/68386 ,  H01L2223/54426 ,  H01L2224/0345 ,  H01L2224/03452 ,  H01L2224/03462 ,  H01L2224/03464 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/04105 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/06131 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/1134 ,  H01L2224/1145 ,  H01L2224/11462 ,  H01L2224/11464 ,  H01L2224/11849 ,  H01L2224/11901 ,  H01L2224/12105 ,  H01L2224/131 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/16225 ,  H01L2224/21 ,  H01L2224/2105 ,  H01L2224/215 ,  H01L2224/22 ,  H01L2224/221 ,  H01L2224/24011 ,  H01L2224/2405 ,  H01L2224/24101 ,  H01L2224/24226 ,  H01L2224/24227 ,  H01L2224/245 ,  H01L2224/25171 ,  H01L2224/27002 ,  H01L2224/29 ,  H01L2224/2902 ,  H01L2224/29101 ,  H01L2224/29144 ,  H01L2224/2919 ,  H01L2224/29298 ,  H01L2224/32155 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48105 ,  H01L2224/48175 ,  H01L2224/48227 ,  H01L2224/48228 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/82101 ,  H01L2224/82104 ,  H01L2224/82106 ,  H01L2224/83005 ,  H01L2224/83191 ,  H01L2224/8385 ,  H01L2224/94 ,  H01L2224/95001 ,  H01L2224/97 ,  H01L2225/06548 ,  H01L2225/1035 ,  H01L2225/1041 ,  H01L2225/1052 ,  H01L2225/107 ,  H01L2924/00013 ,  H01L2924/00014 ,  H01L2924/01004 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/0105 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/0665 ,  H01L2924/078 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/15153 ,  H01L2924/15311 ,  H01L2924/15331 ,  H01L2924/181 ,  H05K1/186 ,  H05K3/007 ,  H05K2201/10674 ,  H01L2224/81 ,  H01L2924/01014 ,  H01L2224/82 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/29099 ,  H01L2224/29199 ,  H01L2224/29299 ,  H01L2224/2929 ,  H01L2224/03 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A semiconductor device has a first semiconductor die mounted over a carrier. An interposer frame has an opening in the interposer frame and a plurality of conductive pillars formed over the interposer frame. The interposer is mounted over the carrier and first die with the conductive pillars disposed around the die. A cavity can be formed in the interposer frame to contain a portion of the first die. An encapsulant is deposited through the opening in the interposer frame over the carrier and first die. Alternatively, the encapsulant is deposited over the carrier and first die and the interposer frame is pressed against the encapsulant. Excess encapsulant exits through the opening in the interposer frame. The carrier is removed. An interconnect structure is formed over the encapsulant and first die. A second semiconductor die can be mounted over the first die or over the interposer frame.

Abstract translation: 半导体器件具有安装在载体上的第一半导体管芯。 插入器框架在插入器框架中具有开口，并且在内插器框架上形成多个导电柱。 插入器安装在载体上，并且第一管芯与设置在管芯周围的导电柱相连。 可以在插入器框架中形成空腔以容纳第一模具的一部分。 密封剂通过载体和第一模具上的插入器框架中的开口沉积。 或者，密封剂沉积在载体上并且第一模头和插入器框架被压靠在密封剂上。 过多的密封剂通过插入器框架中的开口离开。 载体被移除。 在密封剂和第一模具上形成互连结构。 第二半导体管芯可以安装在第一管芯上方或内插架框架上。

公开(公告)号：US20140327135A1

公开(公告)日：2014-11-06

申请号：US14334229

申请日：2014-07-17

Applicant: STATS ChipPAC, Ltd.

Inventor： Soo Won Lee ,  Kyu Won Lee ,  Eun Jin Jeong

IPC: H01L23/00

CPC classification number: H01L24/13 ,  H01L21/4846 ,  H01L23/498 ,  H01L23/49838 ,  H01L24/11 ,  H01L24/16 ,  H01L24/81 ,  H01L2224/0345 ,  H01L2224/03452 ,  H01L2224/0346 ,  H01L2224/0347 ,  H01L2224/0401 ,  H01L2224/05027 ,  H01L2224/0508 ,  H01L2224/05155 ,  H01L2224/05164 ,  H01L2224/05166 ,  H01L2224/05169 ,  H01L2224/05171 ,  H01L2224/05172 ,  H01L2224/05181 ,  H01L2224/05552 ,  H01L2224/05554 ,  H01L2224/05572 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/05666 ,  H01L2224/05671 ,  H01L2224/1132 ,  H01L2224/1145 ,  H01L2224/1146 ,  H01L2224/1147 ,  H01L2224/13082 ,  H01L2224/131 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13124 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13184 ,  H01L2224/16112 ,  H01L2224/16237 ,  H01L2224/16238 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2224/81191 ,  H01L2224/81203 ,  H01L2224/81385 ,  H01L2224/81815 ,  H01L2224/94 ,  H01L2924/00014 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/3841 ,  H01L2924/00 ,  H01L2224/11 ,  H01L2224/03 ,  H01L2924/01007 ,  H01L2924/01074 ,  H01L2924/01029 ,  H01L2924/01023 ,  H01L2924/014 ,  H01L2924/00012

Abstract: A semiconductor device has a substrate. A conductive layer is formed over the substrate. A duplex plated bump on lead pad is formed over the substrate. An insulating layer is formed over the conductive layer and the substrate. A portion of the insulating over the duplex plated bump on lead pad is removed using a laser direct ablation process. The insulating layer is a lamination layer. The duplex plated bump on lead pad has a wide bump on lead pad. A semiconductor die is mounted over the substrate. The semiconductor die has a composite conductive interconnect structure. The semiconductor die has a first bump and a second bump with a pitch ranging from 90-150 micrometers between the first bump and the second bump. A duplex plated contact pad is formed on a surface of the substrate opposite the duplex plated bump-on-lead pad.

Abstract translation: 半导体器件具有基板。 导电层形成在衬底上。 引线板上的双面电镀凸块形成在衬底上。 在导电层和基板上形成绝缘层。 使用激光直接烧蚀工艺去除铅焊盘上的双面电镀凸块上绝缘层的一部分。 绝缘层是层叠层。 导线焊盘上的双面电镀凸块在导线焊盘上有一个很大的凹凸。 半导体管芯安装在衬底上。 半导体管芯具有复合导电互连结构。 半导体管芯具有第一凸块和在第一凸块和第二凸块之间具有从90-150微米的间距的第二凸块。 双面电镀接触焊盘形成在与双面电镀凸块焊盘相对的基板的表面上。

公开(公告)号：US20140322865A1

公开(公告)日：2014-10-30

申请号：US14330704

申请日：2014-07-14

Applicant: STATS ChipPAC, Ltd.

Inventor： YoungJoon Kim ,  SangMi Park ,  YongHyuk Jeong

IPC: H01L21/768 ,  H01L23/00

CPC classification number: H01L21/76877 ,  H01L21/561 ,  H01L21/565 ,  H01L21/6835 ,  H01L23/3128 ,  H01L23/3135 ,  H01L23/49816 ,  H01L23/49827 ,  H01L23/5389 ,  H01L24/19 ,  H01L24/80 ,  H01L24/96 ,  H01L24/97 ,  H01L25/03 ,  H01L25/0657 ,  H01L25/105 ,  H01L25/50 ,  H01L2221/68345 ,  H01L2221/68363 ,  H01L2221/68381 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/16225 ,  H01L2224/19 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/73215 ,  H01L2224/73253 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/81005 ,  H01L2224/83005 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2225/06524 ,  H01L2225/06548 ,  H01L2225/06572 ,  H01L2924/01029 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2924/19107 ,  H01L2224/81 ,  H01L2224/85 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2924/00012 ,  H01L2224/11 ,  H01L2224/03

Abstract: A semiconductor device has a first conductive layer formed over a first substrate. A second conductive layer is formed over a second substrate. A first semiconductor die is mounted to the first substrate and electrically connected to the first conductive layer. A second semiconductor die is mounted to the second substrate and electrically connected to the second conductive layer. The first semiconductor die is mounted over the second semiconductor die. An encapsulant is deposited over the first and second semiconductor die and the first and second substrates. A conductive interconnect structure is formed through the encapsulant to electrically connect the first and second semiconductor die to the second surface of the semiconductor device. Forming the conductive interconnect structure includes forming a plurality of conductive vias through the encapsulant and the first substrate outside a footprint of the first and second semiconductor die.

Abstract translation: 半导体器件具有形成在第一衬底上的第一导电层。 在第二衬底上形成第二导电层。 第一半导体管芯安装到第一基板并电连接到第一导电层。 第二半导体管芯安装到第二衬底并电连接到第二导电层。 第一半导体管芯安装在第二半导体管芯上。 密封剂沉积在第一和第二半导体管芯以及第一和第二衬底上。 通过密封剂形成导电互连结构，以将第一和第二半导体管芯电连接到半导体器件的第二表面。 形成导电互连结构包括在第一和第二半导体管芯的覆盖区之外形成通过密封剂和第一衬底的多个导电通孔。

公开(公告)号：US20140319680A1

公开(公告)日：2014-10-30

申请号：US14328922

申请日：2014-07-11

Applicant: STATS ChipPAC, Ltd.

Inventor： JoonYoung Choi ,  YoungJoon Kim ,  SungWon Cho

IPC: H01L23/00

CPC classification number: H01L24/81 ,  H01L24/03 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L24/97 ,  H01L2224/02126 ,  H01L2224/0345 ,  H01L2224/03452 ,  H01L2224/0346 ,  H01L2224/03903 ,  H01L2224/0401 ,  H01L2224/05011 ,  H01L2224/05018 ,  H01L2224/05027 ,  H01L2224/05073 ,  H01L2224/0508 ,  H01L2224/05111 ,  H01L2224/05124 ,  H01L2224/05139 ,  H01L2224/05144 ,  H01L2224/05147 ,  H01L2224/05155 ,  H01L2224/05552 ,  H01L2224/05558 ,  H01L2224/05566 ,  H01L2224/05572 ,  H01L2224/05573 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/10126 ,  H01L2224/1145 ,  H01L2224/1146 ,  H01L2224/1147 ,  H01L2224/11849 ,  H01L2224/13007 ,  H01L2224/13014 ,  H01L2224/13022 ,  H01L2224/13076 ,  H01L2224/136 ,  H01L2224/13611 ,  H01L2224/13613 ,  H01L2224/13616 ,  H01L2224/13624 ,  H01L2224/13639 ,  H01L2224/13644 ,  H01L2224/13647 ,  H01L2224/13655 ,  H01L2224/16238 ,  H01L2224/81191 ,  H01L2924/00011 ,  H01L2924/00013 ,  H01L2924/00014 ,  H01L2924/01029 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/181 ,  H01L2924/3511 ,  H01L2924/014 ,  H01L2924/01082 ,  H01L2924/00012 ,  H01L2224/13099 ,  H01L2224/13599 ,  H01L2224/05599 ,  H01L2224/05099 ,  H01L2224/29099 ,  H01L2224/29599 ,  H01L2924/00 ,  H01L2224/81805

Abstract: A semiconductor wafer has a plurality of semiconductor die with contact pads for electrical interconnect. An insulating layer is formed over the semiconductor wafer. A bump structure is formed over the contact pads. The bump structure has a buffer layer formed over the insulating layer and contact pad. A portion of the buffer layer is removed to expose the contact pad and an outer portion of the insulating layer. A UBM layer is formed over the buffer layer and contact pad. The UBM layer follows a contour of the buffer layer and contact pad. A ring-shaped conductive pillar is formed over the UBM layer using a patterned photoresist layer filled with electrically conductive material. A conductive barrier layer is formed over the ring-shaped conductive pillar. A bump is formed over the conductive barrier layer. The buffer layer reduces thermal and mechanical stress on the bump and contact pad.

Abstract translation: 半导体晶片具有多个具有用于电互连的接触焊盘的半导体管芯。 在半导体晶片上形成绝缘层。 在接触焊盘上形成凸块结构。 凸块结构具有形成在绝缘层和接触垫上的缓冲层。 去除缓冲层的一部分以暴露接触焊盘和绝缘层的外部部分。 在缓冲层和接触垫上形成UBM层。 UBM层遵循缓冲层和接触垫的轮廓。 使用填充有导电材料的图案化光致抗蚀剂层在UBM层之上形成环形导电柱。 导电阻挡层形成在环形导电柱上。 在导电阻挡层上形成凸块。 缓冲层减少凸块和接触垫上的热应力和机械应力。

公开(公告)号：US20140295618A1

公开(公告)日：2014-10-02

申请号：US13853810

申请日：2013-03-29

Applicant: STATS CHIPPAC, LTD.

Inventor： KyungMoon Kim ,  YoungChul Kim ,  HunTeak Lee ,  KeonTaek Kang ,  HeeJo Chi

IPC: H01L23/00

CPC classification number: H01L25/0657 ,  H01L23/3128 ,  H01L24/05 ,  H01L24/13 ,  H01L24/16 ,  H01L24/17 ,  H01L24/29 ,  H01L24/32 ,  H01L24/48 ,  H01L24/73 ,  H01L24/75 ,  H01L24/81 ,  H01L24/83 ,  H01L24/97 ,  H01L2224/0345 ,  H01L2224/03452 ,  H01L2224/0346 ,  H01L2224/0401 ,  H01L2224/05573 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/1134 ,  H01L2224/13023 ,  H01L2224/131 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/1703 ,  H01L2224/17181 ,  H01L2224/2919 ,  H01L2224/32225 ,  H01L2224/48145 ,  H01L2224/73104 ,  H01L2224/73204 ,  H01L2224/73207 ,  H01L2224/75251 ,  H01L2224/75252 ,  H01L2224/75704 ,  H01L2224/75705 ,  H01L2224/81191 ,  H01L2224/81203 ,  H01L2224/83191 ,  H01L2224/83192 ,  H01L2224/9211 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2225/06506 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/06568 ,  H01L2924/00011 ,  H01L2924/00014 ,  H01L2924/01322 ,  H01L2924/12042 ,  H01L2924/12043 ,  H01L2924/15311 ,  H01L2924/15321 ,  H01L2924/15331 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2924/00 ,  H01L2224/03 ,  H01L2224/11 ,  H01L2224/81 ,  H01L2924/00012 ,  H01L2924/014 ,  H01L2224/83 ,  H01L2224/81805 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: Methods of producing a semiconductor package using dual-sided thermal compression bonding includes providing a substrate having an upper surface and a lower surface. A first device having a first surface and a second surface can be provided along with a second device having a third surface and a fourth surface. The first surface of the first device can be coupled to the upper surface of the substrate while the third surface of the second device can be coupled to the lower surface of the substrate, the coupling occurring simultaneously to produce the semiconductor package.

Abstract translation: 使用双面热压接的半导体封装的制造方法包括提供具有上表面和下表面的基板。 具有第一表面和第二表面的第一装置可以与具有第三表面和第四表面的第二装置一起提供。 第一器件的第一表面可以耦合到衬底的上表面，而第二器件的第三表面可以耦合到衬底的下表面，耦合同时发生以产生半导体封装。

公开(公告)号：US20140291820A1

公开(公告)日：2014-10-02

申请号：US14303484

申请日：2014-06-12

Applicant: STATS ChipPAC, Ltd.

Inventor： Reza A. Pagaila

IPC: H01L23/552 ,  H01L21/768 ,  H01L21/3205

CPC classification number: H01L21/76805 ,  H01L21/3205 ,  H01L21/76898 ,  H01L23/552 ,  H01L24/48 ,  H01L24/49 ,  H01L24/73 ,  H01L2224/02372 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/05548 ,  H01L2224/13025 ,  H01L2224/16225 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/48465 ,  H01L2224/49107 ,  H01L2224/73204 ,  H01L2224/73257 ,  H01L2224/73265 ,  H01L2924/00014 ,  H01L2924/01029 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/19107 ,  H01L2924/3011 ,  H01L2924/3025 ,  H01L2924/00 ,  H01L2224/45099 ,  H01L2924/00012

Abstract: A semiconductor wafer contains a plurality of semiconductor die separated by a non-active area of the semiconductor wafer. A plurality of contact pads is formed on an active surface of the semiconductor die. A first insulating layer is formed over the semiconductor wafer. A portion of the first insulating layer is removed to expose the contact pads on the semiconductor die. An opening is formed partially through the semiconductor wafer in the active surface of the semiconductor die or in the non-active area of the semiconductor wafer. A second insulating layer is formed in the opening in the semiconductor wafer. A shielding layer is formed over the active surface. The shielding layer extends into the opening of the semiconductor wafer to form a conductive via. A portion of a back surface of the semiconductor wafer is removed to singulate the semiconductor die.

Abstract translation: 半导体晶片包含由半导体晶片的非有源区域分离的多个半导体管芯。 在半导体管芯的有源表面上形成多个接触焊盘。 在半导体晶片上形成第一绝缘层。 去除第一绝缘层的一部分以露出半导体管芯上的接触焊盘。 半导体晶片的有源表面中的半导体晶片或半导体晶片的非有源区域部分地形成开口。 第二绝缘层形成在半导体晶片的开口中。 在活性表面上形成屏蔽层。 屏蔽层延伸到半导体晶片的开口中以形成导电通孔。 半导体晶片的背面的一部分被去除以对半导体管芯进行分割。