公开(公告)号：US08637989B2

公开(公告)日：2014-01-28

申请号：US13569653

申请日：2012-08-08

Applicant: Ho-jin Lee ,  Hyun-soo Chung ,  Chang-seong Jeon ,  Sang-sick Park ,  Jae-hyun Phee

Inventor： Ho-jin Lee ,  Hyun-soo Chung ,  Chang-seong Jeon ,  Sang-sick Park ,  Jae-hyun Phee

IPC: H01L23/48

CPC classification number: H01L23/48 ,  H01L21/76898 ,  H01L23/481 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/05001 ,  H01L2224/05009 ,  H01L2224/05025 ,  H01L2224/05124 ,  H01L2224/05147 ,  H01L2224/05166 ,  H01L2224/05181 ,  H01L2224/05184 ,  H01L2224/05186 ,  H01L2224/05647 ,  H01L2224/13025 ,  H01L2224/16145 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2924/01327 ,  H01L2924/15311 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2924/04953 ,  H01L2924/04941

Abstract: A semiconductor device includes a semiconductor substrate and a via electrode. The via electrode has a first portion on the substrate and extends towards the substrate and has a plurality of spikes that extends from the first portion into the substrate, each of the spikes being spaced apart form one another.

Abstract translation: 半导体器件包括半导体衬底和通孔电极。 通孔电极在基板上具有第一部分并且朝向基板延伸并且具有从第一部分延伸到基板中的多个尖峰，每个尖峰彼此间隔开。

公开(公告)号：US20120199981A1

公开(公告)日：2012-08-09

申请号：US13364678

申请日：2012-02-02

Applicant: Se-young Jeong ,  Ho-geon Song ,  Ju-il Choi ,  Jae-hyun Phee

Inventor： Se-young Jeong ,  Ho-geon Song ,  Ju-il Choi ,  Jae-hyun Phee

IPC: H01L23/48 ,  H01L21/50

CPC classification number: H01L25/0657 ,  H01L23/481 ,  H01L24/02 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L24/27 ,  H01L24/29 ,  H01L24/32 ,  H01L24/81 ,  H01L24/83 ,  H01L24/92 ,  H01L24/94 ,  H01L25/50 ,  H01L2224/02372 ,  H01L2224/0401 ,  H01L2224/05568 ,  H01L2224/05569 ,  H01L2224/0557 ,  H01L2224/05571 ,  H01L2224/10135 ,  H01L2224/11015 ,  H01L2224/11464 ,  H01L2224/11622 ,  H01L2224/13025 ,  H01L2224/13111 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/13164 ,  H01L2224/13171 ,  H01L2224/16058 ,  H01L2224/16145 ,  H01L2224/16148 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/27436 ,  H01L2224/27622 ,  H01L2224/2919 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/81007 ,  H01L2224/811 ,  H01L2224/81139 ,  H01L2224/81862 ,  H01L2224/81986 ,  H01L2224/83862 ,  H01L2224/92143 ,  H01L2224/94 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2225/06575 ,  H01L2225/06593 ,  H01L2924/00014 ,  H01L2924/01327 ,  H01L2924/3511 ,  H01L2924/3651 ,  H01L2224/83 ,  H01L2224/81 ,  H01L2924/00 ,  H01L2224/05552

Abstract: A semiconductor device includes a first device including a first substrate and a first external connection terminal for connecting outside the first device; a second device stacked on the first device, the second device including a second substrate and a second external connection terminal for connecting outside the second device; an adhesive pattern disposed between the first device and second device, the adhesive pattern disposed in locations other than locations where the first external connection terminal and second external connection terminal are disposed, and the adhesive pattern causing the first device and second device, when stacked, to be spaced apart by a predetermined distance; and a plated layer disposed between and electrically and physically connecting the first external connection terminal and the second external connection terminal.

Abstract translation: 半导体器件包括：第一器件，包括第一衬底和用于连接第一器件外部的第一外部连接端子; 堆叠在第一装置上的第二装置，第二装置包括第二基板和用于连接第二装置外部的第二外部连接端子; 布置在第一装置和第二装置之间的粘合剂图案，布置在除了设置第一外部连接端子和第二外部连接端子的位置以外的位置的粘合剂图案以及当堆叠时引起第一装置和第二装置的粘合剂图案， 间隔开预定距离; 以及设置在电气和物理上连接第一外部连接端子和第二外部连接端子之间的镀层。

公开(公告)号：US20110284936A1

公开(公告)日：2011-11-24

申请号：US13108231

申请日：2011-05-16

Applicant: Ju-il CHOI ,  Jae-hyun Phee ,  Hyu-ha Lee ,  Ho-jin Lee ,  Son-kwan Hwang

Inventor： Ju-il CHOI ,  Jae-hyun Phee ,  Hyu-ha Lee ,  Ho-jin Lee ,  Son-kwan Hwang

IPC: H01L29/772 ,  H01L23/48

CPC classification number: H01L21/76879 ,  H01L21/76844 ,  H01L21/76873 ,  H01L21/76898 ,  H01L24/05 ,  H01L24/06 ,  H01L2224/05009 ,  H01L2224/06181

Abstract: A semiconductor device and a method of fabricating a semiconductor device. The semiconductor device includes an interlayer insulation layer pattern, a metal wire pattern exposed by a passage formed by a via hole formed in the interlayer insulation layer pattern to input and output an electrical signal, and a plated layer pattern directly contacting the metal wire pattern and filling the via hole. The method includes forming an interlayer insulation layer having a metal wire pattern to input and output an electrical signal formed therein, forming a via hole to define a passage that extends through the interlayer insulation layer until at least a part of the metal wire pattern is exposed, and forming a plated layer pattern to fill the via hole and to directly contact the metal wire pattern by using the metal wire pattern exposed through the via hole as a seed metal layer.

Abstract translation: 半导体器件和半导体器件的制造方法。 半导体器件包括层间绝缘层图案，由形成在层间绝缘层图案中的通孔形成的通道暴露的金属线图案，以输入和输出电信号，以及直接接触金属线图案的镀层图案和 填充通孔。 该方法包括形成具有金属线图案的层间绝缘层，以输入和输出其中形成的电信号，形成通孔以限定延伸穿过层间绝缘层的通道，直到金属线图案的至少一部分露出 并且形成镀层图案以填充通孔并且通过使用通过通孔露出的金属线图案作为种子金属层直接接触金属线图案。

公开(公告)号：US20110226626A1

公开(公告)日：2011-09-22

申请号：US13039822

申请日：2011-03-03

Applicant: Ju-il Choi ,  Uihyoung Lee ,  Jae-hyun Phee ,  Jeong-Woo Park

Inventor： Ju-il Choi ,  Uihyoung Lee ,  Jae-hyun Phee ,  Jeong-Woo Park

IPC: C25D5/48 ,  H01L21/306

CPC classification number: H01L21/6723 ,  C25D7/123 ,  C25D17/001 ,  C25D17/06 ,  H01L21/67028 ,  H01L21/6708 ,  H01L21/6719 ,  H01L21/68728 ,  H01L21/68785

Abstract: A substrate treating device may include a plating treatment portion configured to perform a plating process of a substrate, a wet treatment portion configured to perform a wet treating process of the substrate, the wet treatment portion being under the plating treatment portion, and a substrate support portion configured to support the substrate so that a plating surface of the substrate faces upward, the substrate support portion being further configured to move the substrate between the plating treatment portion and the wet treatment portion.

Abstract translation: 基板处理装置可以包括：电镀处理部，被配置为进行基板的电镀处理;湿处理部，被配置为进行基板的湿式处理;湿处理部位于电镀处理部下;以及基板支撑 被配置为支撑所述基板的部分，使得所述基板的电镀表面面向上，所述基板支撑部分还被配置为在所述电镀处理部分和所述湿处理部分之间移动所述基板。

公开(公告)号：US08586477B2

公开(公告)日：2013-11-19

申请号：US13195128

申请日：2011-08-01

Applicant: Se-young Jeong ,  Ho-jin Lee ,  Ho-geon Song ,  Jae-hyun Phee

Inventor： Se-young Jeong ,  Ho-jin Lee ,  Ho-geon Song ,  Jae-hyun Phee

IPC: H01L21/44 ,  H01L21/00 ,  H01L23/04

CPC classification number: H01L21/76898 ,  H01L21/563 ,  H01L23/481 ,  H01L24/03 ,  H01L24/04 ,  H01L24/05 ,  H01L24/13 ,  H01L24/16 ,  H01L24/17 ,  H01L24/92 ,  H01L24/94 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/03002 ,  H01L2224/0345 ,  H01L2224/03452 ,  H01L2224/03464 ,  H01L2224/03618 ,  H01L2224/0401 ,  H01L2224/05017 ,  H01L2224/05557 ,  H01L2224/0557 ,  H01L2224/05609 ,  H01L2224/05613 ,  H01L2224/05614 ,  H01L2224/05616 ,  H01L2224/05624 ,  H01L2224/05644 ,  H01L2224/05649 ,  H01L2224/05655 ,  H01L2224/05657 ,  H01L2224/05664 ,  H01L2224/05666 ,  H01L2224/05669 ,  H01L2224/0567 ,  H01L2224/05673 ,  H01L2224/05676 ,  H01L2224/0568 ,  H01L2224/05681 ,  H01L2224/05683 ,  H01L2224/05684 ,  H01L2224/13109 ,  H01L2224/13111 ,  H01L2224/13116 ,  H01L2224/13118 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/13164 ,  H01L2224/13166 ,  H01L2224/13169 ,  H01L2224/13171 ,  H01L2224/16145 ,  H01L2224/16146 ,  H01L2224/16225 ,  H01L2224/16227 ,  H01L2224/1703 ,  H01L2224/17181 ,  H01L2224/73204 ,  H01L2224/92125 ,  H01L2224/94 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/06544 ,  H01L2225/06565 ,  H01L2924/00014 ,  H01L2924/15311 ,  H01L2224/05552

Abstract: A semiconductor apparatus having a through electrode, a semiconductor package, and a method of manufacturing the semiconductor package are provided. The method of includes preparing a substrate including a buried via, the buried via having a first surface at a first end, and the buried via extending from a first substrate surface of the substrate into the substrate; planarizing a second substrate surface of the substrate opposite the first substrate surface to form a through via by exposing a second via surface at a second end of the buried via opposite the first end; forming a conductive capping layer on the exposed second via surface of the through via; and recessing the second substrate surface so that at least a first portion of the through via extends beyond the second substrate surface.

Abstract translation: 提供了具有贯通电极，半导体封装以及半导体封装的制造方法的半导体装置。 该方法包括制备包括掩埋通孔的衬底，所述埋入通孔在第一端具有第一表面，以及所述掩埋通孔从所述衬底的第一衬底表面延伸到所述衬底中; 平行化与第一衬底表面相对的衬底的第二衬底表面以通过在与第一端相对的埋置通孔的第二端处暴露第二通孔表面而形成通孔; 在通孔的暴露的第二通孔表面上形成导电覆盖层; 并且使所述第二衬底表面凹陷，使得所述通孔的至少第一部分延伸超出所述第二衬底表面。

公开(公告)号：US08564102B2

公开(公告)日：2013-10-22

申请号：US13108231

申请日：2011-05-16

Applicant: Ju-il Choi ,  Jae-hyun Phee ,  Kyu-ha Lee ,  Ho-jin Lee ,  Son-kwan Hwang

Inventor： Ju-il Choi ,  Jae-hyun Phee ,  Kyu-ha Lee ,  Ho-jin Lee ,  Son-kwan Hwang

IPC: H01L29/40 ,  H01L23/48 ,  H01L23/52

CPC classification number: H01L21/76879 ,  H01L21/76844 ,  H01L21/76873 ,  H01L21/76898 ,  H01L24/05 ,  H01L24/06 ,  H01L2224/05009 ,  H01L2224/06181

Abstract: A semiconductor device and a method of fabricating a semiconductor device. The semiconductor device includes an interlayer insulation layer pattern, a metal wire pattern exposed by a passage formed by a via hole formed in the interlayer insulation layer pattern to input and output an electrical signal, and a plated layer pattern directly contacting the metal wire pattern and filling the via hole. The method includes forming an interlayer insulation layer having a metal wire pattern to input and output an electrical signal formed therein, forming a via hole to define a passage that extends through the interlayer insulation layer until at least a part of the metal wire pattern is exposed, and forming a plated layer pattern to fill the via hole and to directly contact the metal wire pattern by using the metal wire pattern exposed through the via hole as a seed metal layer.

Abstract translation: 半导体器件和半导体器件的制造方法。 半导体器件包括层间绝缘层图案，由形成在层间绝缘层图案中的通孔形成的通道暴露的金属线图案，以输入和输出电信号，以及直接接触金属线图案的镀层图案和 填充通孔。 该方法包括形成具有金属线图案的层间绝缘层，以输入和输出其中形成的电信号，形成通孔以限定延伸穿过层间绝缘层的通道，直到金属线图案的至少一部分露出 并且形成镀层图案以填充通孔并且通过使用通过通孔露出的金属线图案作为种子金属层直接接触金属线图案。

公开(公告)号：US08492902B2

公开(公告)日：2013-07-23

申请号：US13049661

申请日：2011-03-16

Applicant: Ho-Jin Lee ,  SeYoung Jeong ,  Jae-hyun Phee ,  Jung-Hwan Kim ,  Tae Hong Min

Inventor： Ho-Jin Lee ,  SeYoung Jeong ,  Jae-hyun Phee ,  Jung-Hwan Kim ,  Tae Hong Min

IPC: H01L23/48 ,  H01L23/52

CPC classification number: H01L21/76898 ,  H01L21/76831 ,  H01L23/481 ,  H01L25/105 ,  H01L2224/0557 ,  H01L2224/13025 ,  H01L2224/14181 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/1023 ,  H01L2225/1058 ,  H01L2924/12044 ,  H01L2924/15311 ,  H01L2924/00014

Abstract: Provided is a semiconductor device. The semiconductor device may include a substrate and a stacked insulation layer on a sidewall of an opening which penetrates the substrate. The stacked insulation layer can include at least one first insulation layer and at least one second insulation layer whose dielectric constant is different than that of the first insulation layer. One insulation layer may be a polymer and one insulation layer may be a silicon based insulation layer. The insulation layers may be uniform in thickness or may vary as a distance from the substrate changes.

Abstract translation: 提供一种半导体器件。 半导体器件可以包括衬底和在穿透衬底的开口的侧壁上的层叠绝缘层。 层叠绝缘层可以包括至少一个第一绝缘层和至少一个第二绝缘层，其介电常数不同于第一绝缘层的介电常数。 一个绝缘层可以是聚合物，一个绝缘层可以是硅基绝缘层。 绝缘层的厚度可以是均匀的，或者可以随着离开衬底的距离而改变。

公开(公告)号：US20120299194A1

公开(公告)日：2012-11-29

申请号：US13569653

申请日：2012-08-08

Applicant: Ho-jin Lee ,  Hyun-soo Chung ,  Chang-seong Jeon ,  Sang-sick Park ,  Jae-hyun Phee

Inventor： Ho-jin Lee ,  Hyun-soo Chung ,  Chang-seong Jeon ,  Sang-sick Park ,  Jae-hyun Phee

IPC: H01L23/48

CPC classification number: H01L23/48 ,  H01L21/76898 ,  H01L23/481 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/05001 ,  H01L2224/05009 ,  H01L2224/05025 ,  H01L2224/05124 ,  H01L2224/05147 ,  H01L2224/05166 ,  H01L2224/05181 ,  H01L2224/05184 ,  H01L2224/05186 ,  H01L2224/05647 ,  H01L2224/13025 ,  H01L2224/16145 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2924/01327 ,  H01L2924/15311 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2924/04953 ,  H01L2924/04941

Abstract: A semiconductor device includes a semiconductor substrate and a via electrode. The via electrode has a first portion on the substrate and extends towards the substrate and has a plurality of spikes that extends from the first portion into the substrate, each of the spikes being spaced apart form one another.

Abstract translation: 半导体器件包括半导体衬底和通孔电极。 通孔电极在基板上具有第一部分并且朝向基板延伸并且具有从第一部分延伸到基板中的多个尖峰，每个尖峰彼此间隔开。

公开(公告)号：US20120292195A1

公开(公告)日：2012-11-22

申请号：US13438020

申请日：2012-04-03

Applicant: Ui Hyoung LEE ,  Ju-Il Choi ,  Jae-Hyun Phee ,  Dong Hyeon Jang ,  Jeong-Woo Park

Inventor： Ui Hyoung LEE ,  Ju-Il Choi ,  Jae-Hyun Phee ,  Dong Hyeon Jang ,  Jeong-Woo Park

IPC: C25B15/00 ,  C25B9/00

CPC classification number: C25D17/001 ,  C25D5/02 ,  C25D5/08 ,  C25D7/123 ,  C25D17/008 ,  H01L21/2885

Abstract: An apparatus for electroplating a semiconductor device includes a plating bath accommodating a plating solution, and a paddle in the plating bath, the paddle including a plurality of holes configured to pass the plating solution through the paddle toward a substrate, and a plating solution flow reinforcement portion configured to selectively reinforce a flow of the plating solution to a predetermined area of the substrate, the predetermined area of the substrate being an area requiring a relatively increased supply of metal ions of the plating solution.

Abstract translation: 一种用于电镀半导体器件的设备包括一个容纳电镀溶液的电镀液和一个在电镀槽中的一个电极板，该电极板包括多个孔，该多个孔被配置成将电镀液通过桨向衬底通过，电镀液流动加强 所述部分被配置为选择性地将所述电镀溶液的流动加强到所述基板的预定区域，所述基板的所述预定区域是需要相对增加所述电镀液的金属离子供应的区域。

公开(公告)号：US20120074584A1

公开(公告)日：2012-03-29

申请号：US13049661

申请日：2011-03-16

Applicant: Ho-Jin LEE ,  SeYoung Jeong ,  Jae-hyun Phee ,  Jung-Hwan Kim ,  Tae Hong Min

Inventor： Ho-Jin LEE ,  SeYoung Jeong ,  Jae-hyun Phee ,  Jung-Hwan Kim ,  Tae Hong Min

IPC: H01L23/48 ,  H01L21/768

CPC classification number: H01L21/76898 ,  H01L21/76831 ,  H01L23/481 ,  H01L25/105 ,  H01L2224/0557 ,  H01L2224/13025 ,  H01L2224/14181 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/1023 ,  H01L2225/1058 ,  H01L2924/12044 ,  H01L2924/15311 ,  H01L2924/00014

Abstract: Provided is a semiconductor device. The semiconductor device may include a substrate and a stacked insulation layer on a sidewall of an opening which penetrates the substrate. The stacked insulation layer can include at least one first insulation layer and at least one second insulation layer whose dielectric constant is different than that of the first insulation layer. One insulation layer may be a polymer and one insulation layer may be a silicon based insulation layer. The insulation layers may be uniform in thickness or may vary as a distance from the substrate changes.

Abstract translation: 提供一种半导体器件。 半导体器件可以包括衬底和在穿透衬底的开口的侧壁上的层叠绝缘层。 层叠绝缘层可以包括至少一个第一绝缘层和至少一个第二绝缘层，其介电常数不同于第一绝缘层的介电常数。 一个绝缘层可以是聚合物，一个绝缘层可以是硅基绝缘层。 绝缘层的厚度可以是均匀的，或者可以随着离开衬底的距离而改变。