公开(公告)号：US20150084206A1

公开(公告)日：2015-03-26

申请号：US14035726

申请日：2013-09-24

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin

IPC: H01L23/538 ,  H01L23/31 ,  H01L21/768

CPC classification number: H01L23/3135 ,  H01L21/568 ,  H01L23/5389 ,  H01L24/19 ,  H01L24/96 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/16225 ,  H01L2224/24195 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2224/81005 ,  H01L2225/1035 ,  H01L2225/1058 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/13091 ,  H01L2924/15192 ,  H01L2924/15311 ,  H01L2924/15313 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2924/18162 ,  H01L2924/19105 ,  H01L2924/3511 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2924/00012

Abstract: A semiconductor device has a semiconductor die with a first encapsulant disposed over the semiconductor die. A first build-up interconnect structure is formed over the semiconductor die and first encapsulant. The first build-up interconnect structure has a first conductive layer. The first conductive layer includes a plurality of first conductive traces. A second encapsulant is disposed over the semiconductor die and the first build-up interconnect structure. A second build-up interconnect structure is formed over the first build-up interconnect structure and the second encapsulant. The second build-up interconnect structure has a second conductive layer. The second conductive layer includes a plurality of second conductive traces. A distance between the second conductive traces is greater than a distance between the first conductive traces. A passive device is disposed within the first encapsulant and/or the second encapsulant. A plurality of conductive vias is disposed in the first encapsulant and/or the second encapsulant.

Abstract translation: 半导体器件具有半导体管芯，其具有设置在半导体管芯上方的第一密封剂。 在半导体管芯和第一密封剂上形成第一堆积互连结构。 第一构建互连结构具有第一导电层。 第一导电层包括多个第一导电迹线。 第二密封剂设置在半导体管芯和第一堆积互连结构之上。 在第一堆积互连结构和第二密封剂上形成第二堆积互连结构。 第二构建互连结构具有第二导电层。 第二导电层包括多个第二导电迹线。 第二导电迹线之间的距离大于第一导电迹线之间的距离。 无源器件设置在第一密封剂和/或第二密封剂内。 多个导电通孔设置在第一密封剂和/或第二密封剂中。

公开(公告)号：US20150008597A1

公开(公告)日：2015-01-08

申请号：US14494508

申请日：2014-09-23

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin ,  Kang Chen ,  Jianmin Fang ,  Xia Feng

IPC: H01L21/3105 ,  H01L21/78 ,  H01L23/31 ,  H01L21/768 ,  H01L21/56

CPC classification number: H01L23/5389 ,  H01L21/31051 ,  H01L21/56 ,  H01L21/568 ,  H01L21/768 ,  H01L21/76802 ,  H01L21/78 ,  H01L23/3107 ,  H01L23/49816 ,  H01L24/19 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/20 ,  H01L2224/94 ,  H01L2924/01004 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01019 ,  H01L2924/01029 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/01073 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2924/00 ,  H01L2224/03

Abstract: A semiconductor wafer contains a plurality of semiconductor die separated by a saw street. An insulating layer is formed over the semiconductor wafer. A protective layer is formed over the insulating layer including an edge of the semiconductor die along the saw street. The protective layer covers an entire surface of the semiconductor wafer. Alternatively, an opening is formed in the protective layer over the saw street. The insulating layer has a non-planar surface and the protective layer has a planar surface. The semiconductor wafer is singulated through the protective layer and saw street to separate the semiconductor die while protecting the edge of the semiconductor die. Leading with the protective layer, the semiconductor die is mounted to a carrier. An encapsulant is deposited over the semiconductor die and carrier. The carrier and protective layer are removed. A build-up interconnect structure is formed over the semiconductor die and encapsulant.

Abstract translation: 半导体晶片包含由锯条分隔开的多个半导体管芯。 在半导体晶片上形成绝缘层。 在绝缘层上形成保护层，该保护层包括沿着锯条的半导体管芯的边缘。 保护层覆盖半导体晶片的整个表面。 或者，在锯路上的保护层中形成开口。 绝缘层具有非平面表面，保护层具有平坦表面。 通过保护层和锯条将半导体晶片分离，以分离半导体管芯，同时保护半导体管芯的边缘。 与保护层一起，将半导体管芯安装到载体上。 密封剂沉积在半导体管芯和载体上。 去除载体和保护层。 在半导体管芯和密封剂上形成积层互连结构。

公开(公告)号：US20150004750A1

公开(公告)日：2015-01-01

申请号：US13929767

申请日：2013-06-27

Applicant: STATS ChipPAC, Ltd.

Inventor： HeeJo Chi ,  HanGil Shin ,  NamJu Cho ,  KyungMoon Kim

IPC: H01L23/00 ,  H01L25/00

CPC classification number: H01L24/82 ,  H01L23/498 ,  H01L23/49816 ,  H01L23/49838 ,  H01L23/49866 ,  H01L24/13 ,  H01L24/73 ,  H01L25/105 ,  H01L25/50 ,  H01L2224/13101 ,  H01L2224/16225 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/73204 ,  H01L2224/73265 ,  H01L2225/1023 ,  H01L2225/1058 ,  H01L2924/00014 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/15331 ,  H01L2924/181 ,  H01L2924/00012 ,  H01L2924/00 ,  H01L2224/45015 ,  H01L2924/207 ,  H01L2224/45099 ,  H01L2924/014

Abstract: Methods of forming conductive materials on contact pads for semiconductor devices and packages. Substrate is provided with contact pads formed thereon. Conductive material is formed over the contact pads by a depositing process followed by a heating process to alter the chemical properties of the conductive material. Optionally, a dispersing process may be incorporated. An interconnect structure can be mounted over the conductive material where the interconnect structure is attached to the conductive material without any active treatment to the conductive material after formation.

Abstract translation: 在半导体器件和封装的接触焊盘上形成导电材料的方法。 衬底上形成有接触焊盘。 导电材料通过沉积工艺形成在接触垫上，然后进行加热处理以改变导电材料的化学性质。 任选地，可以并入分散过程。 互连结构可以安装在导电材料上，其中互连结构附接到导电材料，而在形成之后没有对导电材料的任何主动处理。

公开(公告)号：US20150001729A1

公开(公告)日：2015-01-01

申请号：US13929485

申请日：2013-06-27

Applicant: STATS ChipPAC, Ltd.

Inventor： Hoang Lan ,  Wang Zhenliang

IPC: H01L23/31 ,  H01L21/56

CPC classification number: H01L21/563 ,  H01L23/13 ,  H01L23/16 ,  H01L23/18 ,  H01L23/31 ,  H01L23/3121 ,  H01L23/3142 ,  H01L23/49816 ,  H01L23/49827 ,  H01L25/0655 ,  H01L31/0203 ,  H01L31/0216 ,  H01L33/483 ,  H01L33/486 ,  H01L2224/0401 ,  H01L2224/16227 ,  H01L2224/16237 ,  H01L2224/26175 ,  H01L2224/73204 ,  H01L2224/81192 ,  H01L2224/94 ,  H01L2924/15151 ,  H01L2924/15313 ,  H01L2224/03

Abstract: A semiconductor device has a substrate including an opening. A trench is formed over the substrate around the opening. An interconnect structure is formed in the trench. An underfill material is disposed over the interconnect structure. A first semiconductor die is disposed over the underfill material prior to curing the underfill material. An active region of the first semiconductor die is disposed over the opening in the substrate. The trench contains the outward flow of underfill material. Underfill material is blocked from flowing over unintended areas on the surface of substrate, into the opening in the substrate, and over sensors of the first semiconductor die. A second semiconductor die is disposed over the substrate. The trench is formed by a first and second dam or a first insulating layer. A second insulating layer is formed over the first insulating layer. A dam is formed over the second insulating layer.

Abstract translation: 半导体器件具有包括开口的基板。 在开口周围的衬底上形成沟槽。 在沟槽中形成互连结构。 底部填充材料设置在互连结构上。 在固化底部填充材料之前，将第一半导体管芯设置在底部填充材料上方。 第一半导体管芯的有源区域设置在衬底的开口上方。 沟槽包含底部填充材料的向外流动。 底部填充材料被阻止流过基板表面上的非预期区域，进入基板中的开口，以及超过第一半导体管芯的传感器。 第二半导体管芯设置在衬底上。 沟槽由第一和第二坝或第一绝缘层形成。 在第一绝缘层上形成第二绝缘层。 在第二绝缘层上形成坝。

公开(公告)号：US20150001709A1

公开(公告)日：2015-01-01

申请号：US14261252

申请日：2014-04-24

Applicant: STATS ChipPAC, Ltd.

Inventor： XuSheng Bao ,  KwokKeung Szeto

IPC: H01L23/498 ,  H01L23/00 ,  H01L23/522

CPC classification number: H01L23/49811 ,  H01L21/561 ,  H01L21/568 ,  H01L21/6836 ,  H01L23/49816 ,  H01L23/522 ,  H01L23/5389 ,  H01L24/11 ,  H01L24/13 ,  H01L24/14 ,  H01L24/19 ,  H01L24/24 ,  H01L24/82 ,  H01L24/96 ,  H01L24/97 ,  H01L25/0657 ,  H01L25/50 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/05548 ,  H01L2224/05567 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/1145 ,  H01L2224/11452 ,  H01L2224/1147 ,  H01L2224/11849 ,  H01L2224/12105 ,  H01L2224/13013 ,  H01L2224/13014 ,  H01L2224/13082 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/14134 ,  H01L2224/14135 ,  H01L2224/24147 ,  H01L2224/244 ,  H01L2224/821 ,  H01L2224/8236 ,  H01L2224/94 ,  H01L2225/06517 ,  H01L2225/06527 ,  H01L2225/06568 ,  H01L2225/06586 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/13091 ,  H01L2924/181 ,  H01L2924/3511 ,  H01L2924/00 ,  H01L2224/11 ,  H01L2224/03 ,  H01L2924/00014 ,  H01L2224/05572 ,  H01L2224/05664 ,  H01L2224/0345 ,  H01L2224/03452 ,  H01L2224/0346 ,  H01L2224/13184 ,  H01L2924/00012

Abstract: A semiconductor device has a first semiconductor die. A first interconnect structure, such as a conductive pillar including a bump formed over the conductive pillar, and second interconnect structure are formed in a peripheral region of the first semiconductor die. A second semiconductor die is disposed over the first semiconductor die between the first interconnect structure and the second interconnect structure. A height of the second semiconductor die is less than a height of the first interconnect structure. A footprint of the second semiconductor die is smaller than a central region of the first semiconductor die. An encapsulant is deposited over the first semiconductor die and second semiconductor die. Alternatively, the second semiconductor die is disposed over a semiconductor package including a plurality of interconnect structures. External connectivity from the single side fo-WLCSP is performed without the use of conductive vias to provide a high throughput and device reliability.

Abstract translation: 半导体器件具有第一半导体管芯。 在第一半导体管芯的周边区域中形成第一互连结构，例如包括形成在导电柱上的凸块的导电柱和第二互连结构。 第二半导体管芯设置在第一半导体管芯之间的第一互连结构和第二互连结构之间。 第二半导体管芯的高度小于第一互连结构的高度。 第二半导体管芯的占地面积小于第一半导体管芯的中心区域。 密封剂沉积在第一半导体管芯和第二半导体管芯上。 或者，第二半导体管芯设置在包括多个互连结构的半导体封装上。 执行单面fo-WLCSP的外部连接，而不使用导电通孔来提供高吞吐量和器件可靠性。

公开(公告)号：US20150001708A1

公开(公告)日：2015-01-01

申请号：US13931397

申请日：2013-06-28

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin

IPC: H01L23/00 ,  H01L23/498

CPC classification number: H01L23/49811 ,  H01L21/561 ,  H01L21/568 ,  H01L23/3128 ,  H01L23/5389 ,  H01L24/19 ,  H01L24/20 ,  H01L24/73 ,  H01L24/96 ,  H01L24/97 ,  H01L25/105 ,  H01L25/50 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/32225 ,  H01L2224/32245 ,  H01L2224/48091 ,  H01L2224/48227 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2225/1035 ,  H01L2225/1058 ,  H01L2225/1082 ,  H01L2225/1088 ,  H01L2225/1094 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/15331 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2924/3025 ,  H01L2924/3511 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/03

Abstract: A semiconductor device includes a substrate having an insulating layer and a conductive layer embedded in the insulating layer. The conductive layer is patterned to form conductive pads or conductive pillars. The substrate includes a first encapsulant formed over the conductive layer. A first opening is formed through insulating layer and first encapsulant using a stamping process or laser direct ablation. The substrate is separated into individual units, which are mounted to a carrier. A semiconductor die is disposed in the first opening in the substrate. A second encapsulant is deposited over the semiconductor die and substrate. An interconnect structure is formed over the semiconductor die and substrate. An opening is formed through the second encapsulant and through the insulating layer to expose the conductive layer. A bump is formed in the second opening over the conductive layer outside a footprint of the semiconductor die.

Abstract translation: 半导体器件包括具有绝缘层和嵌入绝缘层中的导电层的衬底。 将导电层图案化以形成导电焊盘或导电柱。 衬底包括形成在导电层上的第一密封剂。 通过使用冲压工艺或激光直接烧蚀的绝缘层和第一密封剂形成第一开口。 将基板分离成单独的单元，其安装到载体上。 半导体管芯设置在衬底的第一开口中。 第二密封剂沉积在半导体管芯和衬底上。 在半导体管芯和衬底上形成互连结构。 通过第二密封剂形成开口并穿过绝缘层以露出导电层。 在半导体管芯的覆盖区外的导电层上的第二开口中形成凸块。

公开(公告)号：US20150001707A1

公开(公告)日：2015-01-01

申请号：US13930980

申请日：2013-06-28

Applicant: STATS ChipPAC, Ltd.

Inventor： Byung Tai Do ,  Arnel Trasporto ,  Linda Pei Ee Chua ,  Asri Yusof

IPC: H01L23/00 ,  H01L23/498 ,  H01L25/065

CPC classification number: H01L23/3121 ,  H01L21/4832 ,  H01L21/568 ,  H01L23/49582 ,  H01L24/06 ,  H01L24/32 ,  H01L24/48 ,  H01L24/49 ,  H01L24/83 ,  H01L24/85 ,  H01L24/92 ,  H01L24/97 ,  H01L2224/04042 ,  H01L2224/06135 ,  H01L2224/32245 ,  H01L2224/48091 ,  H01L2224/48247 ,  H01L2224/49433 ,  H01L2224/83191 ,  H01L2224/85411 ,  H01L2224/85424 ,  H01L2224/85439 ,  H01L2224/85444 ,  H01L2224/85447 ,  H01L2224/85455 ,  H01L2224/8592 ,  H01L2224/92247 ,  H01L2224/94 ,  H01L2224/97 ,  H01L2924/00014 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/12043 ,  H01L2924/13091 ,  H01L2924/15153 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/1815 ,  H01L2224/03 ,  H01L2924/00 ,  H01L2224/83 ,  H01L2224/85 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A semiconductor device has a substrate including a base and a plurality of conductive posts extending from the base. A semiconductor die is disposed on a surface of the base between the conductive posts. An interconnect structure is formed over the semiconductor die and conductive posts. An adhesive layer is disposed over the semiconductor die. A conductive layer is disposed over the adhesive layer. An encapsulant is deposited over the semiconductor die and around the conductive posts. One or more conductive posts are electrically isolated from the substrate. The conductive layer is a removable or sacrificial cap layer. The substrate includes a wafer-shape, panel, or singulated form. The semiconductor die is disposed below a height of the conductive posts. An interconnect structure is formed over the semiconductor die, encapsulant, and conductive posts.

Abstract translation: 半导体器件具有包括基底和从基底延伸的多个导电柱的基底。 半导体管芯设置在导电柱之间的基座的表面上。 在半导体管芯和导电柱上形成互连结构。 粘合剂层设置在半导体管芯上。 导电层设置在粘合剂层上。 密封剂沉积在半导体管芯上并且在导电柱周围。 一个或多个导电柱与衬底电隔离。 导电层是可移除或牺牲的盖层。 基板包括晶片形状，面板或单切形式。 半导体管芯设置在导电柱的高度的下方。 在半导体管芯，密封剂和导电柱上形成互连结构。

公开(公告)号：US08912650B2

公开(公告)日：2014-12-16

申请号：US13846742

申请日：2013-03-18

Applicant: STATS ChipPAC, Ltd.

Inventor： Won Kyoung Choi ,  Pandi Chelvam Marimuthu

IPC: H01L23/00 ,  H01L23/31

CPC classification number: H01L23/564 ,  H01L23/3171 ,  H01L24/03 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L2224/0345 ,  H01L2224/03452 ,  H01L2224/0346 ,  H01L2224/0361 ,  H01L2224/03912 ,  H01L2224/0401 ,  H01L2224/05022 ,  H01L2224/05111 ,  H01L2224/05124 ,  H01L2224/05139 ,  H01L2224/05144 ,  H01L2224/05147 ,  H01L2224/05155 ,  H01L2224/05572 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/05666 ,  H01L2224/1145 ,  H01L2224/11452 ,  H01L2224/1146 ,  H01L2224/1147 ,  H01L2224/11822 ,  H01L2224/11902 ,  H01L2224/1308 ,  H01L2224/13082 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/13562 ,  H01L2224/1357 ,  H01L2224/13609 ,  H01L2224/13611 ,  H01L2224/81191 ,  H01L2224/81201 ,  H01L2224/81815 ,  H01L2224/94 ,  H01L2924/00014 ,  H01L2924/01322 ,  H01L2924/01327 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/181 ,  H01L2224/03 ,  H01L2224/11 ,  H01L2924/01082 ,  H01L2924/00 ,  H01L2224/05552

Abstract: A semiconductor device has a semiconductor die with a first conductive layer formed over the semiconductor die. A first insulating layer is formed over the semiconductor die with a first opening in the first insulating layer disposed over the first conductive layer. A second conductive layer is formed over the first insulating layer and into the first opening over the first conductive layer. An interconnect structure is formed over the first and second conductive layers within openings of a second insulating layer. The second insulating layer is removed. The interconnect structure can be a conductive pillar or conductive pad. A bump material can be formed over the conductive pillar. A protective coating is formed over the conductive pillar or pad to a thickness less than one micrometer to reduce oxidation. The protective coating is formed by immersing the conductive pillar or pad into the bath containing tin or indium.

Abstract translation: 半导体器件具有形成在半导体管芯上的第一导电层的半导体管芯。 第一绝缘层形成在半导体管芯上，第一绝缘层中的第一开口布置在第一导电层上。 在第一绝缘层上形成第二导电层，并在第一导电层上形成第一导电层。 互连结构形成在第二绝缘层的开口内的第一和第二导电层之上。 去除第二绝缘层。 互连结构可以是导电柱或导电垫。 凸起材料可以形成在导电柱上。 在导电柱或垫上方形成一层厚度小于1微米的保护涂层以减少氧化。 通过将导电柱或垫浸入含有锡或铟的浴中形成保护涂层。

公开(公告)号：US08907498B2

公开(公告)日：2014-12-09

申请号：US13691440

申请日：2012-11-30

Applicant: STATS ChipPAC, Ltd.

Inventor： Reza A. Pagaila ,  Byung Tai Do ,  Nathapong Suthiwongsunthorn

IPC: H01L23/29 ,  H01L23/552 ,  H01L25/065 ,  H01L25/00 ,  H01L23/498 ,  H01L23/538 ,  H01L23/31 ,  H01L21/56 ,  H01L23/00

CPC classification number: H01L23/552 ,  H01L21/568 ,  H01L21/76898 ,  H01L23/3128 ,  H01L23/481 ,  H01L23/49816 ,  H01L23/49827 ,  H01L23/50 ,  H01L23/5389 ,  H01L24/19 ,  H01L24/48 ,  H01L24/85 ,  H01L25/0657 ,  H01L25/50 ,  H01L2223/6677 ,  H01L2224/0554 ,  H01L2224/0557 ,  H01L2224/05571 ,  H01L2224/05573 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/12105 ,  H01L2224/16225 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/73203 ,  H01L2224/73204 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/85 ,  H01L2225/06517 ,  H01L2225/06527 ,  H01L2924/00014 ,  H01L2924/01004 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01322 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/181 ,  H01L2924/19041 ,  H01L2924/30105 ,  H01L2924/3011 ,  H01L2924/3025 ,  H01L2924/00012 ,  H01L2224/45099 ,  H01L2924/00 ,  H01L2224/05599 ,  H01L2224/0555 ,  H01L2224/0556

Abstract: A semiconductor device has a first semiconductor die with a shielding layer formed over its back surface. The first semiconductor die is mounted to a carrier. A first insulating layer is formed over the shielding layer. A second semiconductor die is mounted over the first semiconductor die separated by the shielding layer and first insulating layer. A second insulating layer is deposited over the first and second semiconductor die. A first interconnect structure is formed over the second semiconductor die and second insulating layer. A second interconnect structure is formed over the first semiconductor die and second insulating layer. The shielding layer is electrically connected to a low-impedance ground point through a bond wire, RDL, or TSV. The second semiconductor die may also have a shielding layer formed on its back surface. The semiconductor die are bonded through the metal-to-metal shielding layers.

Abstract translation: 半导体器件具有形成在其背面上的屏蔽层的第一半导体管芯。 第一半导体管芯安装到载体上。 在屏蔽层上形成第一绝缘层。 第二半导体管芯安装在由屏蔽层和第一绝缘层隔开的第一半导体管芯上。 在第一和第二半导体管芯上沉积第二绝缘层。 在第二半导体管芯和第二绝缘层上形成第一互连结构。 在第一半导体管芯和第二绝缘层上形成第二互连结构。 屏蔽层通过接合线，RDL或TSV电连接到低阻抗接地点。 第二半导体管芯也可以在其背面形成有屏蔽层。 半导体管芯通过金属对金属屏蔽层接合。

公开(公告)号：US08890315B2

公开(公告)日：2014-11-18

申请号：US14021056

申请日：2013-09-09

Applicant: STATS ChipPAC, Ltd.

Inventor： Won Kyoung Choi ,  Pandi C. Marimuthu

IPC: H01L23/485 ,  H01L23/00 ,  H01L23/31

CPC classification number: H01L24/13 ,  H01L23/3171 ,  H01L24/03 ,  H01L24/05 ,  H01L24/10 ,  H01L24/11 ,  H01L2224/0345 ,  H01L2224/03452 ,  H01L2224/0346 ,  H01L2224/03912 ,  H01L2224/0401 ,  H01L2224/05022 ,  H01L2224/05111 ,  H01L2224/05124 ,  H01L2224/05139 ,  H01L2224/05144 ,  H01L2224/05147 ,  H01L2224/05155 ,  H01L2224/05552 ,  H01L2224/05555 ,  H01L2224/05572 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/05666 ,  H01L2224/11 ,  H01L2224/1145 ,  H01L2224/11452 ,  H01L2224/1146 ,  H01L2224/1147 ,  H01L2224/11472 ,  H01L2224/11822 ,  H01L2224/11906 ,  H01L2224/13 ,  H01L2224/13007 ,  H01L2224/13017 ,  H01L2224/13076 ,  H01L2224/13082 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/13166 ,  H01L2224/13562 ,  H01L2224/1357 ,  H01L2224/13609 ,  H01L2224/13611 ,  H01L2224/81191 ,  H01L2224/81201 ,  H01L2224/81815 ,  H01L2224/94 ,  H01L2924/01322 ,  H01L2924/01327 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/181 ,  H01L2224/03 ,  H01L2924/00014 ,  H01L2924/00

Abstract: A semiconductor device has a semiconductor die with a first conductive layer formed over the die. A first insulating layer is formed over the die with a first opening in the first insulating layer disposed over the first conductive layer. A second conductive layer is formed over the first insulating layer and into the first opening over the first conductive layer. An interconnect structure is constructed by forming a second insulating layer over the first insulating layer with a second opening having a width less than the first opening and depositing a conductive material into the second opening. The interconnect structure can be a conductive pillar or conductive pad. The interconnect structure has a width less than a width of the first opening. The second conductive layer over the first insulating layer outside the first opening is removed while leaving the second conductive layer under the interconnect structure.

Abstract translation: 半导体器件具有半导体管芯，其具有形成在管芯上的第一导电层。 第一绝缘层形成在管芯上方，第一绝缘层中的第一开口布置在第一导电层上。 在第一绝缘层上形成第二导电层，并在第一导电层上形成第一导电层。 通过在第一绝缘层上形成第二绝缘层，其宽度小于第一开口的第二开口并将导电材料沉积到第二开口中来构造互连结构。 互连结构可以是导电柱或导电垫。 互连结构的宽度小于第一开口的宽度。 除去第一开口外部的第一绝缘层上的第二导电层，同时将第二导电层留在互连结构下。