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公开(公告)号:WO2014010220A1
公开(公告)日:2014-01-16
申请号:PCT/JP2013/004205
申请日:2013-07-05
Applicant: 先端フォトニクス株式会社
CPC classification number: H01L24/17 , H01L21/561 , H01L23/13 , H01L23/3114 , H01L23/3121 , H01L23/3135 , H01L23/49805 , H01L24/05 , H01L24/45 , H01L24/48 , H01L24/49 , H01L24/85 , H01L25/03 , H01L25/0655 , H01L25/0657 , H01L2224/03334 , H01L2224/0401 , H01L2224/04042 , H01L2224/05552 , H01L2224/05644 , H01L2224/05647 , H01L2224/05669 , H01L2224/06155 , H01L2224/13144 , H01L2224/16105 , H01L2224/16108 , H01L2224/16145 , H01L2224/16225 , H01L2224/16227 , H01L2224/1714 , H01L2224/45015 , H01L2224/45124 , H01L2224/45144 , H01L2224/45147 , H01L2224/45169 , H01L2224/48091 , H01L2224/48137 , H01L2224/48157 , H01L2224/48227 , H01L2224/48465 , H01L2224/48471 , H01L2224/48479 , H01L2224/48496 , H01L2224/48639 , H01L2224/48644 , H01L2224/48647 , H01L2224/48655 , H01L2224/48664 , H01L2224/48666 , H01L2224/48669 , H01L2224/48739 , H01L2224/48744 , H01L2224/48747 , H01L2224/48755 , H01L2224/48764 , H01L2224/48766 , H01L2224/48769 , H01L2224/48839 , H01L2224/48844 , H01L2224/48847 , H01L2224/48855 , H01L2224/48864 , H01L2224/48866 , H01L2224/48869 , H01L2224/48997 , H01L2224/4911 , H01L2224/49175 , H01L2224/73207 , H01L2224/73265 , H01L2224/81193 , H01L2224/85395 , H01L2224/85439 , H01L2224/85444 , H01L2224/85447 , H01L2224/85455 , H01L2224/85464 , H01L2224/85466 , H01L2224/8592 , H01L2224/94 , H01L2224/97 , H01L2225/0651 , H01L2225/06513 , H01L2225/06551 , H01L2225/06562 , H01L2225/06575 , H01L2924/00014 , H01L2924/01015 , H01L2924/01047 , H01L2924/01079 , H01L2924/12042 , H01L2924/14 , H01L2924/15153 , H01L2924/15159 , H01L2924/157 , H01L2924/15787 , H01L2924/15788 , H01L2924/181 , H01L2924/30107 , H01L2924/3011 , H01L2224/03 , H01L2224/85 , H01L2924/00 , H01L2224/48455 , H01L2924/00012 , H01L2224/4554
Abstract: メイン基板上のICと容易に接続することができる、半導体素子(104)を備えたサブマウント(100)を提供すること。本発明の一実施形態に係るサブマウント(100)は、基板(101)と、電極(102),(103)と、半導体素子(104)と、Auワイヤ(105)と、金バンプ(106),(107)とから構成される。電極(102),(103)と、半導体素子(104)と、Auワイヤ(105)と、金バンプ(106),(107)とは、樹脂(108)により基板(101)上で封止される。金バンプ(107)は、電極(103)上かつAuワイヤ(105)上にボールボンディングにより形成された後、ダイシングにより切断されて側面が露出する。露出した面が、サブマウント(100)の側面電極として機能することとなる。
Abstract translation: 提供了一种配备有可以容易地连接到主板上的IC的半导体元件(104)的基座(100)。 该基台(100)由基板(101),电极(102,103),半导体元件(104),金线(105)和金凸块(106,107)构成。 通过树脂(108)将电极(102,103),半导体元件(104),Au线(105)和金凸块(106,107)密封到基板(101)上。 在通过球接合在电极(103)和Au线(105)上形成金凸块(107)之后,通过切割切割暴露侧面。 露出的表面用作副安装座(100)的侧面电极。
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公开(公告)号:WO2007013377A1
公开(公告)日:2007-02-01
申请号:PCT/JP2006/314516
申请日:2006-07-21
Applicant: 松下電器産業株式会社 , 北畠 真 , 楠本 修 , 内田 正雄 , 山下 賢哉
IPC: H01L27/04 , H01L21/3205 , H01L21/822 , H01L21/8234 , H01L23/52 , H01L27/06 , H01L29/12 , H01L29/47 , H01L29/78 , H01L29/872
CPC classification number: H01L29/7806 , H01L24/06 , H01L24/45 , H01L24/48 , H01L24/49 , H01L27/0629 , H01L29/0619 , H01L29/0696 , H01L29/1602 , H01L29/1608 , H01L29/2003 , H01L29/47 , H01L29/66068 , H01L29/7811 , H01L2224/04042 , H01L2224/05554 , H01L2224/05624 , H01L2224/05666 , H01L2224/0568 , H01L2224/0603 , H01L2224/45015 , H01L2224/45124 , H01L2224/45144 , H01L2224/48091 , H01L2224/4813 , H01L2224/48247 , H01L2224/48472 , H01L2224/48624 , H01L2224/48666 , H01L2224/4868 , H01L2224/48724 , H01L2224/48766 , H01L2224/4878 , H01L2224/4903 , H01L2224/49051 , H01L2224/4911 , H01L2224/49175 , H01L2924/01005 , H01L2924/01006 , H01L2924/01007 , H01L2924/01013 , H01L2924/01014 , H01L2924/01015 , H01L2924/01018 , H01L2924/01022 , H01L2924/01023 , H01L2924/01027 , H01L2924/01028 , H01L2924/01033 , H01L2924/01042 , H01L2924/01079 , H01L2924/01082 , H01L2924/12032 , H01L2924/12036 , H01L2924/12041 , H01L2924/1305 , H01L2924/13055 , H01L2924/1306 , H01L2924/13091 , H01L2924/14 , H01L2924/19043 , H01L2924/30107 , H01L2924/00014 , H01L2924/00
Abstract: 電界効果トランジスタ(90)と、ショットキー電極(9a)と、複数のボンディングパッド(12S,12G)と、を備えた半導体素子(20)において、前記複数のボンディングパッド(12S,12G)の少なくともいずれかが前記ショットキー電極(9a)の上方に位置するように配設した。
Abstract translation: 半导体元件(20)设置有场效应晶体管(90),肖特基电极(9a)和多个接合焊盘(12S,12G)。 至少一个接合焊盘(12S,12G)布置在肖特基电极(9a)上方。
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公开(公告)号:WO2004093186A1
公开(公告)日:2004-10-28
申请号:PCT/JP2004/005365
申请日:2004-04-15
IPC: H01L23/12
CPC classification number: H01L23/66 , H01L21/4857 , H01L23/142 , H01L23/3735 , H01L23/3736 , H01L23/49822 , H01L24/45 , H01L24/48 , H01L24/49 , H01L25/16 , H01L2224/05611 , H01L2224/05624 , H01L2224/05639 , H01L2224/05644 , H01L2224/05647 , H01L2224/05655 , H01L2224/0566 , H01L2224/05666 , H01L2224/45111 , H01L2224/45124 , H01L2224/45144 , H01L2224/45147 , H01L2224/45155 , H01L2224/4516 , H01L2224/45166 , H01L2224/48091 , H01L2224/48227 , H01L2224/48237 , H01L2224/48472 , H01L2224/48611 , H01L2224/48624 , H01L2224/48639 , H01L2224/48644 , H01L2224/48647 , H01L2224/48655 , H01L2224/48666 , H01L2224/48711 , H01L2224/48724 , H01L2224/48739 , H01L2224/48747 , H01L2224/48755 , H01L2224/48766 , H01L2224/48839 , H01L2224/48844 , H01L2224/48847 , H01L2224/48855 , H01L2224/4886 , H01L2224/48866 , H01L2224/4911 , H01L2224/85411 , H01L2224/85424 , H01L2224/85439 , H01L2224/85455 , H01L2224/8546 , H01L2224/85466 , H01L2924/00011 , H01L2924/01005 , H01L2924/01006 , H01L2924/01012 , H01L2924/01013 , H01L2924/01014 , H01L2924/01015 , H01L2924/01019 , H01L2924/01022 , H01L2924/01023 , H01L2924/01027 , H01L2924/01028 , H01L2924/01029 , H01L2924/0103 , H01L2924/01033 , H01L2924/01039 , H01L2924/01045 , H01L2924/01047 , H01L2924/0105 , H01L2924/01056 , H01L2924/01061 , H01L2924/01063 , H01L2924/01073 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/014 , H01L2924/07802 , H01L2924/13091 , H01L2924/14 , H01L2924/19043 , H01L2924/19051 , H01L2924/30105 , H05K1/0224 , H05K1/024 , H05K1/025 , H05K3/0061 , H05K2201/0187 , H05K2201/0209 , H05K2201/09745 , H01L2924/00014 , H01L2924/00 , H01L2224/48811 , H01L2224/48824 , H01L2224/48744 , H01L2224/4876 , H01L2224/4866
Abstract: 混成集積回路の高周波動作時に発生する半導体の誤動作時を大幅に低減し、熱放散性に優れた金属ベース回路基板を提供する。 金属板上に絶縁層(A、B)を介して設けられた回路と、前記回路上に実装される出力用半導体と、前記出力用半導体を制御し、前記回路上に設けられる制御用半導体とからなる混成集積回路に用いられる金属ベース回路基板であって、前記制御用半導体を搭載する回路部分(パッド部分)の下部に低静電容量部分を埋設していることを特徴とする金属ベース回路基板であり、好ましくは、低静電容量部分が、無機質充填材を含有してなる樹脂からなり、しかも誘電率が2~9であることを特徴とする前記の金属ベース回路基板。
Abstract translation: 金属基电路板能够显着降低在混合集成电路的高频工作中发生的半导体器件的故障,并且具有优异的散热能力。 用于混合集成电路的金属基底电路板包括:设置在绝缘层(A,B)之间的金属片上的电路,安装在电路上的输出半导体器件和用于控制输出半导体器件的控制半导体器件 并安装在电路上。 金属基电路板的特征在于,在安装有控制半导体器件的电路部分(焊盘部分)的下方埋设有小电容部分,优选地,小电容部分由含有无机填料的树脂 并且具有2至9的介电常数。
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公开(公告)号:WO2014136303A1
公开(公告)日:2014-09-12
申请号:PCT/JP2013/077115
申请日:2013-10-04
Applicant: 三菱電機株式会社
CPC classification number: H01L24/05 , H01L21/78 , H01L23/49531 , H01L23/49562 , H01L24/03 , H01L24/29 , H01L24/32 , H01L24/33 , H01L24/45 , H01L24/48 , H01L24/83 , H01L24/95 , H01L2224/0345 , H01L2224/0347 , H01L2224/03848 , H01L2224/04026 , H01L2224/05007 , H01L2224/05011 , H01L2224/05073 , H01L2224/05124 , H01L2224/05563 , H01L2224/05565 , H01L2224/05583 , H01L2224/05624 , H01L2224/05639 , H01L2224/05644 , H01L2224/05655 , H01L2224/05666 , H01L2224/0568 , H01L2224/26145 , H01L2224/29027 , H01L2224/291 , H01L2224/29111 , H01L2224/32257 , H01L2224/33181 , H01L2224/45015 , H01L2224/45124 , H01L2224/48091 , H01L2224/48245 , H01L2224/48247 , H01L2224/48472 , H01L2224/48724 , H01L2224/48739 , H01L2224/48744 , H01L2224/48755 , H01L2224/48766 , H01L2224/4878 , H01L2224/73215 , H01L2224/73265 , H01L2224/831 , H01L2224/83801 , H01L2224/83815 , H01L2224/94 , H01L2924/1305 , H01L2924/13055 , H01L2924/181 , H01L2924/014 , H01L2924/00012 , H01L2924/00014 , H01L2924/01047 , H01L2924/01029 , H01L2924/01014 , H01L2224/03 , H01L2924/00
Abstract: 素子電極(103)は、半導体素子(101)の表面に設けられている。金属膜(105)は、素子電極(103)上に設けられており、内側領域(105a)と、内側領域(105a)の周りに位置する外側領域(105b1)とを有する。金属膜(105)には、内側領域(105a)および外側領域(105b1)の間で素子電極(103)を露出する開口(TR)が設けられている。素子電極(103)は、金属膜(105)の半田濡れ性よりも低い半田濡れ性を有する。外部電極(117)は金属膜(105)の内側領域(105a)に半田接合されている。
Abstract translation: 元件电极(103)设置在半导体元件(101)的表面上。 金属膜(105)设置在元件电极(103)上,具有内侧区域(105a)和位于内侧区域(105a)周围的外侧区域(105b1)。 在金属膜(105)上设置开口(TR),使内侧区域(105a)与外侧区域(105b1)之间露出元件电极(103)。 元件电极(103)的焊料润湿性低于金属膜(105)的焊料润湿性。 外部电极(117)焊接到金属膜(105)的内侧区域(105a)。
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5.METHOD OF CONNECTING A CONNECTING WIRE TO A CONTACT OF AN INTEGRATED CIRCUIT 审中-公开
Title translation: 方法用于连接连接线与连接接触AN集成电路公开(公告)号:WO00057472A1
公开(公告)日:2000-09-28
申请号:PCT/DE2000/000907
申请日:2000-03-24
IPC: H01L21/603 , H01L23/485
CPC classification number: H01L24/85 , H01L24/03 , H01L24/05 , H01L24/45 , H01L24/48 , H01L24/78 , H01L2224/02166 , H01L2224/03422 , H01L2224/03436 , H01L2224/03464 , H01L2224/04042 , H01L2224/05073 , H01L2224/05147 , H01L2224/05601 , H01L2224/05609 , H01L2224/05611 , H01L2224/05616 , H01L2224/05624 , H01L2224/05647 , H01L2224/05666 , H01L2224/32225 , H01L2224/45014 , H01L2224/45015 , H01L2224/45032 , H01L2224/45124 , H01L2224/45139 , H01L2224/45144 , H01L2224/45147 , H01L2224/45155 , H01L2224/4556 , H01L2224/45565 , H01L2224/456 , H01L2224/45686 , H01L2224/48091 , H01L2224/48247 , H01L2224/48463 , H01L2224/4847 , H01L2224/48601 , H01L2224/48609 , H01L2224/48611 , H01L2224/48616 , H01L2224/48624 , H01L2224/48647 , H01L2224/48666 , H01L2224/48701 , H01L2224/48709 , H01L2224/48711 , H01L2224/48716 , H01L2224/48724 , H01L2224/48747 , H01L2224/48766 , H01L2224/48801 , H01L2224/48809 , H01L2224/48811 , H01L2224/48816 , H01L2224/48847 , H01L2224/48866 , H01L2224/78252 , H01L2224/78313 , H01L2224/85075 , H01L2224/85201 , H01L2224/8581 , H01L2224/85815 , H01L2224/85825 , H01L2224/8583 , H01L2924/00011 , H01L2924/01005 , H01L2924/01006 , H01L2924/01007 , H01L2924/01013 , H01L2924/01018 , H01L2924/0102 , H01L2924/01022 , H01L2924/01028 , H01L2924/01029 , H01L2924/01031 , H01L2924/01033 , H01L2924/01047 , H01L2924/01049 , H01L2924/0105 , H01L2924/01052 , H01L2924/01061 , H01L2924/01068 , H01L2924/01079 , H01L2924/01082 , H01L2924/01322 , H01L2924/01327 , H01L2924/014 , H01L2924/04941 , H01L2924/14 , H01L2924/00014 , H01L2224/45666 , H01L2224/45647 , H01L2924/0494 , H01L2924/01014 , H01L2924/00015 , H01L2924/0108 , H01L2224/45611 , H01L2924/00 , H01L2224/48824
Abstract: An integrated circuit (1) with a semiconductor substrate (2) comprises electrically active zones to which an electric voltage can be applied via contacts (3). The contacts (3) comprise a contact layer made of copper. The invention provides for each contact (3) to present a connecting wire (7), as well as for a solder layer (6) consisting substantially of a solder-metal compound to be located in an area between the connecting wire (7) and the contact (3).
Abstract translation: 一种集成电路(1),包括一个半导体衬底(2)具有通过连接触点(3)与电电压作用时电有源区。 连接接点(3)具有由铜构成的连接层,其中,在每个连接接触件(3)设有一个连接线(7),且进一步其中在所述连接线(7)和终端之间的区域(3)提供了一种钎焊层(6), 基本上由焊料金属化合物。
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公开(公告)号:WO2007074529A1
公开(公告)日:2007-07-05
申请号:PCT/JP2005/023964
申请日:2005-12-27
IPC: H01L21/8246 , H01L21/3205 , H01L23/52 , H01L27/105
CPC classification number: H01L27/11507 , H01L23/3157 , H01L23/522 , H01L23/564 , H01L24/05 , H01L24/13 , H01L24/45 , H01L24/48 , H01L24/49 , H01L27/11509 , H01L28/55 , H01L28/65 , H01L2224/0391 , H01L2224/0401 , H01L2224/04042 , H01L2224/04073 , H01L2224/05018 , H01L2224/05027 , H01L2224/05082 , H01L2224/05083 , H01L2224/05093 , H01L2224/05096 , H01L2224/05124 , H01L2224/05164 , H01L2224/05166 , H01L2224/05554 , H01L2224/05556 , H01L2224/05558 , H01L2224/05567 , H01L2224/05572 , H01L2224/05582 , H01L2224/05583 , H01L2224/05624 , H01L2224/05664 , H01L2224/05666 , H01L2224/1134 , H01L2224/1146 , H01L2224/13007 , H01L2224/13014 , H01L2224/13021 , H01L2224/13023 , H01L2224/13144 , H01L2224/45124 , H01L2224/4807 , H01L2224/48453 , H01L2224/48463 , H01L2224/48724 , H01L2224/48764 , H01L2224/48766 , H01L2224/49171 , H01L2224/49173 , H01L2924/00014 , H01L2924/0002 , H01L2924/01007 , H01L2924/01013 , H01L2924/01022 , H01L2924/05042 , H01L2924/10253 , H01L2924/13091 , H01L2924/14 , H01L2924/19041 , H01L2924/3025 , H01L2924/01029 , H01L2924/01046 , H01L2924/00 , H01L2224/05552
Abstract: 耐湿性を向上したパッドを備えた半導体装置を提供する。 半導体装置は、半導体基板に形成された複数の半導体素子を含む回路部と、回路部を覆って、半導体基板上に形成され、最上層に開口を有するパッシベーション膜を含む、絶縁積層と、絶縁積層中に形成された強誘電体キャパシタと、絶縁積層中に形成され、前記半導体素子、前記強誘電体キャパシタに接続された配線構造と、配線構造に接続されて絶縁積層中に形成され、パッシベーション膜の開口において露出されたパッド電極構造と、Pd膜を含み、パッシベーション膜の開口を介してパッド電極構造を覆い、パッシベーション膜上に延在する導電性パッド保護膜と、導電性パッド保護膜を介し、パッド電極構造に接続されたスタッドバンプまたはボンディングワイヤと、を有する。
Abstract translation: 一种设置有具有改善的耐湿性的垫的半导体器件。 半导体器件设置有包括形成在半导体衬底上的多个半导体元件的电路部分; 覆盖电路部分的绝缘层叠层形成在半导体衬底上,并且包括具有开口的最上层的钝化膜; 形成在所述绝缘堆叠层中的铁电电容器; 形成在所述绝缘堆叠层中并与所述半导体元件和所述强电介质电容器连接的布线结构; 焊接电极结构,其与所述布线结构连接,形成在所述绝缘层叠层中并从所述钝化膜上的所述开口露出; 包括Pd膜的导电焊盘保护膜通过钝化膜上的开口覆盖焊盘电极结构,并在钝化膜上延伸; 以及通过导电垫保护膜与焊盘电极结构连接的螺柱凸块或接合线。
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公开(公告)号:WO2007013367A1
公开(公告)日:2007-02-01
申请号:PCT/JP2006/314489
申请日:2006-07-21
Applicant: 松下電器産業株式会社 , 北畠 真 , 楠本 修 , 内田 正雄 , 山下 賢哉
IPC: H01L27/04 , H01L21/822 , H01L21/8234 , H01L27/06 , H01L29/06 , H01L29/12 , H01L29/47 , H01L29/78 , H01L29/872
CPC classification number: H01L29/7806 , H01L23/62 , H01L24/06 , H01L24/45 , H01L24/48 , H01L24/49 , H01L27/0629 , H01L29/0619 , H01L29/0696 , H01L29/1602 , H01L29/1608 , H01L29/2003 , H01L29/47 , H01L29/66068 , H01L29/7811 , H01L2224/04042 , H01L2224/05554 , H01L2224/05624 , H01L2224/05644 , H01L2224/05655 , H01L2224/05666 , H01L2224/0568 , H01L2224/0603 , H01L2224/45015 , H01L2224/45124 , H01L2224/45144 , H01L2224/48091 , H01L2224/4813 , H01L2224/48247 , H01L2224/48472 , H01L2224/48624 , H01L2224/48644 , H01L2224/48655 , H01L2224/48666 , H01L2224/4868 , H01L2224/48724 , H01L2224/48755 , H01L2224/48766 , H01L2224/4878 , H01L2224/4903 , H01L2224/49051 , H01L2224/4911 , H01L2224/49175 , H01L2224/85399 , H01L2224/85424 , H01L2224/85444 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01007 , H01L2924/01014 , H01L2924/01015 , H01L2924/01018 , H01L2924/01022 , H01L2924/01023 , H01L2924/01027 , H01L2924/01028 , H01L2924/01033 , H01L2924/01042 , H01L2924/01079 , H01L2924/01082 , H01L2924/12032 , H01L2924/12036 , H01L2924/12041 , H01L2924/1305 , H01L2924/13055 , H01L2924/1306 , H01L2924/13091 , H01L2924/14 , H01L2924/19042 , H01L2924/19043 , H01L2924/30107 , H01L2924/00 , H01L2224/48744
Abstract: 本発明の半導体素子(20)は、複数の電界効果トランジスタ(90)と、ショットキー電極(9a)とを備え、前記複数の電界効果トランジスタ(90)が形成された領域の外周に沿うようにして前記ショットキー電極(9a)を設けた。
Abstract translation: 半导体元件(20)设置有多个场效应晶体管(90)和肖特基电极(9a)。 肖特基电极(9a)沿着形成场效应晶体管(90)的区域的外周排列。
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8.A WIREBOND STRUCTURE AND METHOD TO CONNECT TO A MICROELECTRONIC DIE 审中-公开
Title translation: 一种连接到微电子芯片的线束结构和方法公开(公告)号:WO03056625A2
公开(公告)日:2003-07-10
申请号:PCT/US0233568
申请日:2002-10-17
Applicant: INTEL CORP
Inventor: DANIELSON DONALD , PALUDA PATRICK , GLEIXNER ROBERT , NAIK RAJAN
IPC: H01L21/603 , H01L23/485 , H01L23/00
CPC classification number: H01L24/85 , H01L24/03 , H01L24/05 , H01L24/45 , H01L24/48 , H01L2224/04042 , H01L2224/05009 , H01L2224/05073 , H01L2224/05147 , H01L2224/05556 , H01L2224/05644 , H01L2224/05647 , H01L2224/05664 , H01L2224/05666 , H01L2224/05669 , H01L2224/45124 , H01L2224/45144 , H01L2224/48091 , H01L2224/48227 , H01L2224/48465 , H01L2224/48644 , H01L2224/48647 , H01L2224/48664 , H01L2224/48666 , H01L2224/48669 , H01L2224/48747 , H01L2224/48764 , H01L2224/48766 , H01L2224/48769 , H01L2224/85 , H01L2224/85205 , H01L2924/00014 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01014 , H01L2924/01022 , H01L2924/01029 , H01L2924/01073 , H01L2924/01078 , H01L2924/01079 , H01L2924/05042 , H01L2924/14 , Y10T428/1291 , Y10T428/24248 , H01L2224/78 , H01L2924/00 , H01L2224/48744
Abstract: A wirebond structure includes a copper pad formed on or in a surface of a microelectronic die. A conductive layer is included in contact with the copper pad and a bond wire is bonded to the conductive layer. The conductive layer is formed of a material to provide a stable contact between the bond wire and the copper pad in at least one of an oxidizing environment and an environment with temperature up to at least about 350°C.
Abstract translation: 引线键合结构包括形成在微电子管芯的表面上或其中的铜焊盘。 导电层被包括在与铜焊盘接触的位置,并且接合线接合到导电层。 导电层由材料形成,以在氧化环境和温度至少约350℃的环境中的至少一个中提供接合线和铜焊盘之间的稳定接触。
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公开(公告)号:WO00035013A1
公开(公告)日:2000-06-15
申请号:PCT/EP1999/009153
申请日:1999-11-22
IPC: H01L21/60 , H01L23/485
CPC classification number: H01L24/06 , H01L24/05 , H01L24/45 , H01L24/48 , H01L2224/04042 , H01L2224/05073 , H01L2224/05552 , H01L2224/05624 , H01L2224/05639 , H01L2224/05647 , H01L2224/05666 , H01L2224/45015 , H01L2224/45124 , H01L2224/45144 , H01L2224/45147 , H01L2224/48463 , H01L2224/48624 , H01L2224/48639 , H01L2224/48647 , H01L2224/48666 , H01L2224/48724 , H01L2224/48739 , H01L2224/48747 , H01L2224/48766 , H01L2224/48824 , H01L2224/48839 , H01L2224/48847 , H01L2224/48866 , H01L2224/85201 , H01L2224/85205 , H01L2924/01006 , H01L2924/01011 , H01L2924/01013 , H01L2924/01014 , H01L2924/01015 , H01L2924/01022 , H01L2924/01029 , H01L2924/01039 , H01L2924/01047 , H01L2924/01074 , H01L2924/01079 , H01L2924/01082 , H01L2924/05042 , H01L2924/1305 , H01L2924/1306 , H01L2924/13091 , H01L2924/14 , H01L2924/20752 , H01L2924/20753 , H01L2924/20754 , H01L2924/20755 , H01L2924/00014 , H01L2924/00 , H01L2924/2075
Abstract: An integrated circuit device comprises an active circuit (4) provided in an active circuit area at a surface (5) of a semiconductor body (6), a plurality of bond pads (3) disposed substantially over the active circuit area and electrical connections between the bond pads (3) and the active circuit (4). Each one of the bond pads (3) has a wire-bonding region (23) for bonding a wire (24) and a circuit-connecting region (22) for the electrical connection with the active circuit (4). The active circuit (4) comprises active circuit devices (7), an interconnect structure comprising at least one patterned metal layer disposed in overlying relationship relative to the active circuit devices (7) and a layer (20) of passivating material disposed atop the interconnect structure, through which the electrical connections pass. The layer (20) of passivating material substantially consists of inorganic material and is substantially free from interruptions beneath the wire-bonding region (23) of the bond pads (3). The bond pads (3) and the layer (20) of passivating material have thicknesses that jointly counteract the occurrence of damage to the active circuit (4) during bonding of the wire (24) to the wire-bonding region (23).
Abstract translation: 集成电路器件包括设置在半导体本体(6)的表面(5)的有源电路区域中的有源电路(4),基本上位于有源电路区域上的多个接合焊盘(3) 接合焊盘(3)和有源电路(4)。 每个接合焊盘(3)具有用于接合线(24)的引线接合区域(23)和用于与有源电路(4)的电连接的电路连接区域(22)。 有源电路(4)包括有源电路器件(7),互连结构包括至少一个图案化的金属层,其相对于有源电路器件(7)以覆盖的关系设置,以及设置在互连顶部的钝化材料层(20) 电气连接通过的结构。 钝化材料层(20)基本上由无机材料组成,并且在接合焊盘(3)的引线接合区域(23)之下基本上没有中断。 接合焊盘(3)和钝化材料层(20)具有在将导线(24)接合到引线接合区域(23)期间共同抵消对有源电路(4)的损坏的发生的厚度。
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