Abstract:
A method 10, 110 for making multi-layer electronic circuit boards 82, 148 having metallized apertures 18, 20, 118, 120 which may be selectively and electrically connected to a source of ground potential.
Abstract:
The present invention discloses a semiconductor package that forms a solder array joints on the die surface and their corresponding PCB respectively. The life times of array solders are increased through use of two set of array joints that have high and low melting points. The high melting solders are served as the dummy ones to sustain the overall stand-offs of array joints. The solder size in the same solder array is identical. The melting solders with high and low melting points implemented on a semiconductor die are heading one to one attached to thecorrespondingly melting solders of high and low melting points in PCB site. The reflow temperature of smt assembly is between the aforemetioned high and low melting points. In addition, the solder joints with directional properties are made so as to make the fanout connections on PCB site.
Abstract:
A reflection characteristic in a high frequency region at a feeding point into a strip line is improved and the assembly of a strip line feeding apparatus facilitated by the method and apparatus herein. The strip line includes a strip line pattern on a surface of a first dielectric substrate having a ground conductor pattern disposed on the opposite surface thereof, and a second ground conductor pattern disposed on a surface of a second dielectric substrate. A serial high impedance portion is disposed at an area near the tip portion of the strip line pattern. The high impedance portion includes a portion of the strip line pattern having narrowed width or a hole disposed under a through-hole for an inner conductor, which electrically connects the strip line pattern and an inner conductor. Dimensions of the high impedance portion are controlled to cancel out parasitic susceptance due to the discontinuous structure. A matching through-hole is further disposed in the second dielectric substrate in an area separated from the tip portion of the strip line pattern by a distance of around 25% of the typical wave length. The matching through-hole is elongated to a land pattern in a hole disposed in the second ground conductor pattern so as to electrically connect the conductor strip pattern and the land pattern.
Abstract:
Within a method for forming a solder interconnection structure for use within a microelectronic fabrication, there is first provided a substrate having formed thereover a bond pad. There is then formed upon the bond pad a first solder interconnection layer. There is then formed over the first solder interconnection layer an annular solder non-wettable copper oxide layer which does not cover an upper dome portion of the first solder interconnection layer. There is then formed over the upper dome portion of the first solder interconnection layer and not upon the annular solder non-wettable copper oxide layer a second solder interconnection layer.
Abstract:
A first plurality of metal bumps is formed on a semiconductor wafer containing a plurality of chips, each of the first plurality of bumps being in electrical contact with a contact pad on one of the chips. An encapsulant layer is deposited over the first plurality of metal bumps and then polished to expose a top surface on each of the metal bumps. A second plurality of metal bumps is formed on the exposed top surfaces of the first plurality of plurality of bumps, respectively. The wafer is then sawed to separate the individual chips, yielding semiconductor packages which have the same lateral dimensions as the chips. Alternatively, to facilitate the encapsulation process, the wafer can be sawed into rectangular, multi-chip segments before the encapsulant layer is deposited. After the encapsulant layer has been applied and polished and the second plurality of conductive bumps have been formed, the segments are then separated into individual chips. The first plurality of metal bumps can be deposited directly on the contact pads, with or without an underbump metalization layer, or on metal conductive traces over one or more dielectric layers.
Abstract:
A method for final testing die on a wafer is provided wherein wafers having die are first enhanced by adding contact extensions to contact pads of the die, adding a protective polymer layer covering the contact extensions and planarizing the polymer layer to expose the contact extensions. After this enhancement final testing may be done by probe in the wafer form.
Abstract:
A packaging process providing a die with C4 solder bumps and a polymer substrate first. It then jets the melted second solder onto each of the C4 solder bumps forming a second solder bump. After reflowing and leveling the solder bumps, the die is flipped and combined with the substrate. Then heat treatment proceeds with the combination of the die and the substrate forming a flip chip package with collapse-controlled solder bump on the polymer substrate.
Abstract:
A method 10, 90 for making a multi-layer electronic circuit board 82, 168 including the steps of forming at least one protuberance 15, 100 upon an electrically conductive member 12, 92 and adding additional electrically conductive layers of material 34, 56, 58, 104, 114, 138, 140 to the member 12, 92 while selectively extending the protuberance 15, 100 within the layers 82, 168, thereby forming a circuit board 82, 168. A portion of the formed circuit board may be etched in order to selectively create air-bridges 86 or interconnection portions 164.
Abstract:
A method of forming interconnects on an electronic device that can be bonded to another electronic device at a low processing temperature can be carried out by depositing a first interconnect material on the electronic device forming protrusions and then depositing a second interconnect material to at least partially cover the protrusions, wherein the second interconnect material has a lower flow temperature than the first interconnect material. The method is carried out by flowing a molten solder into a mold having microcavities to fill the cavities and then allowed to solidify. The mold is then aligned with a silicon wafer containing chips deposited with high melting temperatures solder bumps such that each microcavity of the mold is aligned with each high melting temperature solder bump on the chip. The aligned mold/wafer assembly is then passed through a reflow furnace to effect the transfer of the low melting temperature solder in the mold cavities onto the tip of the high melting temperature solder bumps on the wafer. A dual metallurgical composition bump is thereby formed by the two different solder alloys.
Abstract:
A laminate organic resin wiring board and a method of producing the same are disclosed. The wiring board has a plurality of subassemblies each having a conductive resin layer serving as a ground or feed layer on its top. The subassemblies are adhered to each other at their conductive resin layers. This successfully eliminates the need for an organic resin layer for insulation customarily formed on the top of the individual subassembly. The decrease in the number of layers reduces the period of time necessary for the production of the wiring board.