A METHOD TO IMPROVE CMP SCRATCH RESISTANCE FOR NON-PLANAR SURFACES
    1.
    发明申请
    A METHOD TO IMPROVE CMP SCRATCH RESISTANCE FOR NON-PLANAR SURFACES 审中-公开
    一种提高非平面表面的CMP耐蚀性的方法

    公开(公告)号:WO2017024186A1

    公开(公告)日:2017-02-09

    申请号:PCT/US2016/045660

    申请日:2016-08-04

    Abstract: In described examples, a microelectronic device (100) is formed by providing a substrate having a recess (124) at a top surface (130), and a liner layer (132) formed over the top surface (130) of the substrate, extending into the recess (124). A protective layer (138) is formed over the liner layer (132), extending into the recess (124). A CMP process (142) removes the protective layer (138) and the liner layer (132) from over the top surface (130) of the subsrate, leaving the protective layer (138) and the liner layer (132) in the recess (124). The protective layer (138) is subsequently removed from the recess (124), leaving the liner layer (132) in the recess (124). The substrate may include an interconnect region (104) with a bond pad (116) and a PO layer (122) having an opening which forms the recess (124); the bond pad (116) is exposed in the recess (124). The liner layer (132) in the recess (124) may be a metal liner suitable for a subsequently-formed wire bond or bump bond.

    Abstract translation: 在所描述的实施例中,微电子器件(100)通过在顶表面(130)处提供具有凹陷(124)的衬底和形成在衬底的顶表面(130)上的衬层(132)形成,延伸 进入凹部(124)。 保护层(138)形成在衬层(132)上方,延伸到凹部(124)中。 CMP工艺(142)从保护层(138)和衬垫层(132)离开凹槽(130)的上表面(130)上方去除保护层(138)和衬垫层(132) 124)。 随后将保护层(138)从凹部(124)中移除,使衬里层(132)留在凹部(124)中。 衬底可以包括具有接合焊盘(116)和具有形成凹部(124)的开口的PO层(122)的互连区域(104)。 接合焊盘(116)暴露在凹部(124)中。 凹部(124)中的衬垫层(132)可以是适于随后形成的引线接合或凸起接合的金属衬垫。

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