Abstract:
In described examples, a microelectronic device (100) is formed by providing a substrate having a recess (124) at a top surface (130), and a liner layer (132) formed over the top surface (130) of the substrate, extending into the recess (124). A protective layer (138) is formed over the liner layer (132), extending into the recess (124). A CMP process (142) removes the protective layer (138) and the liner layer (132) from over the top surface (130) of the subsrate, leaving the protective layer (138) and the liner layer (132) in the recess (124). The protective layer (138) is subsequently removed from the recess (124), leaving the liner layer (132) in the recess (124). The substrate may include an interconnect region (104) with a bond pad (116) and a PO layer (122) having an opening which forms the recess (124); the bond pad (116) is exposed in the recess (124). The liner layer (132) in the recess (124) may be a metal liner suitable for a subsequently-formed wire bond or bump bond.
Abstract:
Provided herein is an apparatus including a first CMOS wafer and a second CMOS wafer. A eutectic bond connects the first CMOS wafer to the second CMOS wafer. The eutectic bond includes aluminum and germanium, and the eutectic bond has a melting point which is lower than the melting point of aluminum and the melting point of germanium.
Abstract:
A microelectronic component (110, 120) has a contact pad (110C, 120C, 920C) recessed in a cavity (410) and covered by underfill tape (130). The cavity has a void (410V) below the underfill tape. A protruding contact pad of another microelectronic component ruptures the underfill tape to enter the cavity and bond to the recessed contact pad. The void helps in rupturing the underfill tape, thus reducing the amount of underfill residue between the two contact pads and improving the contact resistance. Also provided is a microelectronic component having a substrate with a cavity and having a through- substrate via extending into the cavity. Other features are also provided.
Abstract:
Embodiments of the invention include multi-die package and methods of making such multi-die packages. In an embodiment a mold layer has a first surface and a second surface that is opposite from the first surface. One or more first electrical components that each have a solderable terminal that is oriented to face the first surface of the mold layer. The mold layer may also have one or more second electrical components that each have a second type of terminal that is oriented to face the second surface of the mold layer. Embodiments may also include one or more conductive through vias formed between the first surface of the mold layer and the second surface of the mold layer. Accordingly an electrical connection may be made from the second surface of the mold layer to the first electrical components that are oriented to face the first surface of the mold layer.
Abstract:
A microelectronic structure includes a semiconductor having conductive elements at a first surface. Wire bonds have bases joined to the conductive elements and free ends remote from the bases, the free ends being remote from the substrate and the bases and including end surfaces. The wire bonds define edge surfaces between the bases and end surfaces thereof. A compliant material layer extends along the edge surfaces within first portions of the wire bonds at least adjacent the bases thereof and fills spaces between the first portions of the wire bonds such that the first portions of the wire bonds are separated from one another by the compliant material layer. Second portions of the wire bonds are defined by the end surfaces and portions of the edge surfaces adjacent the end surfaces that are extend from a third surface of the compliant later.
Abstract:
L'invention concerne un procédé d'assemblage de type Flip-Chip, entre un premier (1) et un deuxième (2) composants comportant chacun des plots de connexion (11, 21) sur une de leurs faces, dites faces d'assemblage, selon lequel on reporte les composants l'un sur l'autre par leurs faces d'assemblage de sorte à réaliser des interconnexions électriques entre les plots du premier et ceux du deuxième composant. Selon l'invention, on réalise une transformation de l'oxyde de cuivre en cuivre par recuit UV, très localement dans l'espacement entre composants au moins autour des zones au droit des plots de connexion. Le procédé selon l'invention peut être utilisé pour n'importe quel composant transparent aux UV, y compris pour des substrats en matière plastique tels que des substrats en PEN ou en PET. L'invention concerne également l'assemblage entre deux composants obtenu par le procédé.
Abstract:
A semiconductor unit includes a chip having left and right columns of contacts (34, 36) at its front surface. Interconnect pads (40, 42) are provided overlying the front surface of the chip and connected to at least some of the contacts as, for example, by traces (44) or by arrangements including wire bonds (209, 211). The interconnect pads alone, or the interconnect pads and some of the contacts, provide an array of external connection elements. This array includes some reversal pairs of external connection elements in which the external connection element (40b) connected to or incorporating the right contact (36b) is disposed to the left of the external connection element (42b) incorporating or connected to the left contact (34b). Such a unit may be used in a multi chip package. The reversed connections simplify routing, particularly where corresponding contacts of two chips are to be connected to common terminals on the package substrate.