Abstract:
Die vorliegende Erfindung betrifft ein verfahren zum Bonden eines ersten Festkörpersubstrats (1 ) mit einem eine erstes Material enthaltenden zweiten Festkörpersubstrat (2) mit folgenden Schritten, insbesondere folgendem Ablauf: - Ausbildung oder Aufbringung einer ein zweites Material enthaltenden Funktionsschicht (5) auf das zweite Festkörpersubstrat (2), - Kontaktieren des ersten Festkörpersubstrats (1 ) mit dem zweiten Festkörpersubstrat (2) an der Funktionsschicht (5), - Zusammenpressen der Festkörpersubstrate (1, 2) zur Ausbildung eines permanenten Bonds zwischen dem ersten und dem zweiten Festkörpersubstrat (1, 2), zumindest teilweise verstärkt durch Festkörperdiffusion und/oder Phasenumwandlung des ersten Materials mit dem zweiten Material, wobei eine Volumenvergrößerung an der Funktionsschicht (5) bewirkt wird. Während des Bondens wird die Löslichkeitsgrenze des ersten Materials für das zweite Material nicht oder nur geringfügig überschritten, so dass Ausscheidung von intermetallischen Phasen möglichst weitgehend vermieden wird und dagegen Mischkristall ausgebildet wird. Das erste Material kann Kupfer und das zweite Material kann Zinn sein.
Abstract:
The invention relates to a micromechanical method and a corresponding assembly for bonding semiconductor substrates and a correspondingly bonded semiconductor chip. The assembly according to the invention comprises a semiconductor substrate having a chip pattern having a plurality of semiconductor chips (1), each having a functional region (4) and an edge region (4a) surrounding the functional region (4), wherein there is a bonding frame (2) made of a bonding alloy made from at least two alloy components in the edge region (4a), spaced apart from the functional region (4). Within the part (4a2) of the edge region (4a) surrounding the bonding frame (2) between the bonding frame (2) and the functional region (4), there is at least one stop frame (7; 7a, 7b; 7b'; 70) made of at least one of the alloy components, which is designed such that when a melt of the bond alloy contacts the stop frame (7; 7a, 7b; 7b'; 70) during bonding, the bonding alloy solidifies.
Abstract:
A method for bonding a first semiconductor substrate to a second semiconductor substrate by direct bonding is described. The substrates are both provided on their contact surfaces with a dielectric layer, followed by a CMP step for reducing the roughness of the dielectric layer. Then a layer of SiCN is deposited onto the dielectric layer, followed by a CMP step which reduces the roughness of the SiCN layer to the order of 1 tenth of a nanometre. Then the substrates are subjected to a pre-bond annealing step and then bonded by direct bonding, possibly preceded by one or more pre- treatments of the contact surfaces, and followed by a post- bond annealing step, at a temperature of less than or equal to 250°C. It has been found that the bond strength is excellent, even at the above named annealing temperatures, which are lower than presently known in the art.
Abstract:
A microelectronic assembly includes a first substrate having a surface and a first conductive element and a second substrate having a surface and a second conductive element. The assembly further includes an electrically conductive alloy mass joined to the first and second conductive elements. First and second materials of the alloy mass each have a melting point lower than a melting point of the alloy. A concentration of the first material varies in concentration from a relatively higher amount at a location disposed toward the first conductive element to a relatively lower amount toward the second conductive element, and a concentration of the second material varies in concentration from a relatively higher amount at a location disposed toward the second conductive element to a relatively lower amount toward the first conductive element.
Abstract:
Bonded surfaces are formed by adhering first nanorods and second nanorods to respective first and second surfaces. The first shell is formed on the first nanorods and the second shell is formed on the second nanorods, wherein at least one of the first nanorods and second nanorods, and the first shell and the second shell are formed of distinct metals. The surfaces are then exposed to at least one condition that causes the distinct metals to form an alloy, such as eutectic alloy having a melting point below the temperature at which the alloy is formed, thereby bonding the surfaces upon solidification of the alloy.
Abstract:
A flexible electronic device is provided that includes electronics, metal traces, and other components at least partially encapsulated in a protective, corrosion- and fluid-resistant encapsulating adhesive coating. The device include electronics, sensors, and other components disposed on a flexible substrate that is configured to be mounted to a body or disposed in some other environment of interest. The encapsulating adhesive coating is flexible and adheres securely to the electronics, metal traces, and other components disposed on the flexible substrate. The encapsulating adhesive coating prevents voids from forming proximate the components within which water or other chemicals could be deposited from the environment of the device. The encapsulating adhesive coating could include silicone or other flexible highly adhesive substances. The encapsulating adhesive coating could be a conformal coating.
Abstract:
An electronics packaging system includes an insulator 14 that electrically insulates a heat sink 12 from electrical leads 18. An interface 10 between the insulator 14 and the heat sink 12 includes a stress reliever 16 constructed such that a stiffness of the interface is greater than the stiffness of the interface without the stress reliever.