Method for fabricating conductive lines of a semiconductor device
    78.
    发明授权
    Method for fabricating conductive lines of a semiconductor device 有权
    一种用于制造半导体器件的导线的方法

    公开(公告)号:US08828861B2

    公开(公告)日:2014-09-09

    申请号:US12860347

    申请日:2010-08-20

    Abstract: Methods for fabricating conductive metal lines of a semiconductor device are described herein. In one embodiment, such a method may comprise depositing a conductive material over a substrate, and depositing a first barrier layer on the conductive layer. Such a method may also comprise patterning a mask on the first barrier layer, the pattern comprising a layout of the conductive lines. Such an exemplary method may also comprise etching the conductive material and the first barrier layer using the patterned mask to form the conductive lines. In addition, a low temperature post-flow may be performed on the structure. The method may also include depositing a dielectric material over and between the patterned conductive lines.

    Abstract translation: 本文描述了制造半导体器件的导电金属线的方法。 在一个实施例中,这种方法可以包括在衬底上沉积导电材料,以及在导电层上沉积第一阻挡层。 这种方法还可以包括在第一阻挡层上图案化掩模,该图案包括导线的布局。 这种示例性方法还可以包括使用图案化掩模蚀刻导电材料和第一阻挡层以形成导电线。 此外,可以对结构进行低温后流。 该方法还可以包括在图案化导电线之上和之间沉积电介质材料。

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