-
81.
公开(公告)号:US09837303B2
公开(公告)日:2017-12-05
申请号:US13917982
申请日:2013-06-14
Applicant: STATS ChipPAC, Ltd.
Inventor: Yaojian Lin , Kang Chen , Yu Gu , Pandi Chelvam Marimuthu
IPC: H01L21/768 , H01L23/48 , H01L23/00 , H01L23/31 , H01L23/538 , H01L21/56 , H01L23/498
CPC classification number: H01L21/76802 , H01L21/561 , H01L21/568 , H01L23/3128 , H01L23/48 , H01L23/49811 , H01L23/49827 , H01L23/5389 , H01L24/19 , H01L24/96 , H01L24/97 , H01L2224/12105 , H01L2224/16225 , H01L2224/24155 , H01L2224/24195 , H01L2224/48091 , H01L2224/48247 , H01L2224/73265 , H01L2924/01322 , H01L2924/12041 , H01L2924/12042 , H01L2924/1306 , H01L2924/13091 , H01L2924/15311 , H01L2924/181 , H01L2924/18162 , H01L2924/3511 , H01L2924/00014 , H01L2924/00 , H01L2924/00012
Abstract: A semiconductor device has a modular interconnect unit or interconnect structure disposed in a peripheral region of the semiconductor die. An encapsulant is deposited over the semiconductor die and interconnect structure. A first insulating layer is formed over the semiconductor die and interconnect structure. A plurality of openings is formed in the first insulating layer over the interconnect structure. The openings have a pitch of 40 micrometers. The openings include a circular shape, ring shape, cross shape, or lattice shape. A conductive layer is deposited over the first insulating layer. The conductive layer includes a planar surface. A second insulating layer is formed over the conductive layer. A portion of the encapsulant is removed to expose the semiconductor die and the interconnect structure. The modular interconnect unit includes a vertical interconnect structure. The modular interconnect unit forms part of an interlocking pattern around the semiconductor die.
-
82.
公开(公告)号:US20170330840A1
公开(公告)日:2017-11-16
申请号:US15664734
申请日:2017-07-31
Applicant: STATS ChipPAC Pte. Ltd.
Inventor: Yaojian Lin , Byung Joon Han , Rajendra D. Pendse , Il Kwon Shim , Pandi C. Marimuthu , Won Kyoung Choi , Linda Pei Ee Chua
IPC: H01L23/552 , H01L21/683 , H01L23/00 , H01L21/56 , H01L23/538 , H01L23/498
CPC classification number: H01L23/552 , H01L21/561 , H01L21/568 , H01L21/6836 , H01L23/49816 , H01L23/5386 , H01L23/5389 , H01L24/19 , H01L24/24 , H01L24/96 , H01L24/97 , H01L2221/68327 , H01L2221/6834 , H01L2224/04105 , H01L2224/12105 , H01L2224/24137 , H01L2224/24195 , H01L2224/73267 , H01L2224/94 , H01L2224/97 , H01L2924/13091 , H01L2924/1815 , H01L2924/18162 , H01L2924/19041 , H01L2924/19042 , H01L2924/19043 , H01L2924/19105 , H01L2924/3025 , H01L2924/3511 , H01L2224/03 , H01L2224/82 , H01L2924/00
Abstract: A semiconductor device has a first component. A modular interconnect structure is disposed adjacent to the first component. A first interconnect structure is formed over the first component and modular interconnect structure. A shielding layer is formed over the first component, modular interconnect structure, and first interconnect structure. The shielding layer provides protection for the enclosed semiconductor devices against EMI, RFI, or other inter-device interference, whether generated internally or from external semiconductor devices. The shielding layer is electrically connected to an external low-impedance ground point. A second component is disposed adjacent to the first component. The second component includes a passive device. An LC circuit includes the first component and second component. A semiconductor die is disposed adjacent to the first component. A conductive adhesive is disposed over the modular interconnect structure. The modular interconnect structure includes a height less than a height of the first component.
-
公开(公告)号:US09806040B2
公开(公告)日:2017-10-31
申请号:US15219098
申请日:2016-07-25
Applicant: STATS ChipPAC Pte. Ltd.
Inventor: Kai Liu , Yaojian Lin
IPC: H01L27/14 , H01L23/66 , H01L23/498 , H01L23/00 , H01L23/528 , H01L23/522 , H01L21/56 , H01L21/48 , H01L23/552
CPC classification number: H01L23/66 , H01L21/486 , H01L21/568 , H01L23/49816 , H01L23/49827 , H01L23/49833 , H01L23/49838 , H01L23/5225 , H01L23/528 , H01L23/5389 , H01L23/552 , H01L24/19 , H01L24/20 , H01L24/96 , H01L24/97 , H01L2223/6677 , H01L2224/04105 , H01L2224/12105 , H01L2224/19 , H01L2224/24227 , H01L2224/32225 , H01L2224/73267 , H01L2224/92244 , H01L2224/94 , H01L2224/97 , H01L2924/15311 , H01L2924/3025 , H01L2924/3511 , H01L2224/83 , H01L2224/83005
Abstract: A semiconductor device has a semiconductor die and an encapsulant deposited over the semiconductor die. A first conductive layer is formed with an antenna over a first surface of the encapsulant. A second conductive layer is formed with a ground plane over a second surface of the encapsulant with the antenna located within a footprint of the ground plane. A conductive bump is formed on the ground plane. A third conductive layer is formed over the first surface of the encapsulant. A fourth conductive layer is formed over the second surface of the encapsulant. A conductive via is disposed adjacent to the semiconductor die prior to depositing the encapsulant. The antenna is coupled to the semiconductor die through the conductive via. The antenna is formed with the conductive via between the antenna and semiconductor die. A PCB unit is disposed in the encapsulant.
-
公开(公告)号:US09799590B2
公开(公告)日:2017-10-24
申请号:US13801675
申请日:2013-03-13
Applicant: STATS ChipPAC, Ltd.
Inventor: KyungHoon Lee , SangMi Park , KyoungIl Huh , DaeSik Choi
IPC: H01L21/00 , H01L21/44 , H01L23/498 , H01L21/56 , H01L23/36 , H01L25/065 , H01L25/00 , H01L23/00 , H01L23/31
CPC classification number: H01L23/49816 , H01L21/561 , H01L23/3128 , H01L23/36 , H01L23/49822 , H01L24/96 , H01L24/97 , H01L25/0657 , H01L25/50 , H01L2224/04105 , H01L2224/11 , H01L2224/12105 , H01L2224/16145 , H01L2224/16146 , H01L2224/32145 , H01L2224/32245 , H01L2224/48091 , H01L2224/73209 , H01L2224/73253 , H01L2224/73265 , H01L2224/73267 , H01L2224/81005 , H01L2224/94 , H01L2225/06513 , H01L2225/06517 , H01L2225/06541 , H01L2225/06548 , H01L2225/06582 , H01L2225/06589 , H01L2924/13091 , H01L2924/181 , H01L2924/18161 , H01L2924/18162 , H01L2924/00014 , H01L2924/00 , H01L2924/00012 , H01L2224/81
Abstract: A semiconductor device includes a semiconductor wafer including a plurality of first semiconductor die. An opening is formed partially through the semiconductor wafer. A plurality of second semiconductor die is disposed over a first surface of the semiconductor wafer. An encapsulant is disposed over the semiconductor wafer and into the opening leaving a second surface of the semiconductor wafer exposed. A portion of the second surface of the semiconductor wafer is removed to separate the first semiconductor die. An interconnect structure is formed over the second semiconductor die and encapsulant. A thermal interface material is deposited over the second surface of the first semiconductor die. A heat spreader is disposed over the thermal interface material. An insulating layer is formed over the first surface of the semiconductor wafer. A vertical interconnect structure is formed around the first semiconductor die. Conductive vias are formed through the first semiconductor die.
-
公开(公告)号:US09780063B2
公开(公告)日:2017-10-03
申请号:US14328922
申请日:2014-07-11
Applicant: STATS ChipPAC, Ltd.
Inventor: JoonYoung Choi , YoungJoon Kim , SungWon Cho
IPC: H01L23/00
CPC classification number: H01L24/81 , H01L24/03 , H01L24/05 , H01L24/11 , H01L24/13 , H01L24/16 , H01L24/97 , H01L2224/02126 , H01L2224/0345 , H01L2224/03452 , H01L2224/0346 , H01L2224/03903 , H01L2224/0401 , H01L2224/05011 , H01L2224/05018 , H01L2224/05027 , H01L2224/05073 , H01L2224/0508 , H01L2224/05111 , H01L2224/05124 , H01L2224/05139 , H01L2224/05144 , H01L2224/05147 , H01L2224/05155 , H01L2224/05552 , H01L2224/05558 , H01L2224/05566 , H01L2224/05572 , H01L2224/05573 , H01L2224/05611 , H01L2224/05624 , H01L2224/05639 , H01L2224/05644 , H01L2224/05647 , H01L2224/05655 , H01L2224/10126 , H01L2224/1145 , H01L2224/1146 , H01L2224/1147 , H01L2224/11849 , H01L2224/13007 , H01L2224/13014 , H01L2224/13022 , H01L2224/13076 , H01L2224/136 , H01L2224/13611 , H01L2224/13613 , H01L2224/13616 , H01L2224/13624 , H01L2224/13639 , H01L2224/13644 , H01L2224/13647 , H01L2224/13655 , H01L2224/16238 , H01L2224/81191 , H01L2924/00011 , H01L2924/00013 , H01L2924/00014 , H01L2924/01029 , H01L2924/01322 , H01L2924/12041 , H01L2924/12042 , H01L2924/1306 , H01L2924/13091 , H01L2924/181 , H01L2924/3511 , H01L2924/014 , H01L2924/01082 , H01L2924/00012 , H01L2224/13099 , H01L2224/13599 , H01L2224/05599 , H01L2224/05099 , H01L2224/29099 , H01L2224/29599 , H01L2924/00 , H01L2224/81805
Abstract: A semiconductor wafer has a plurality of semiconductor die with contact pads for electrical interconnect. An insulating layer is formed over the semiconductor wafer. A bump structure is formed over the contact pads. The bump structure has a buffer layer formed over the insulating layer and contact pad. A portion of the buffer layer is removed to expose the contact pad and an outer portion of the insulating layer. A UBM layer is formed over the buffer layer and contact pad. The UBM layer follows a contour of the buffer layer and contact pad. A ring-shaped conductive pillar is formed over the UBM layer using a patterned photoresist layer filled with electrically conductive material. A conductive barrier layer is formed over the ring-shaped conductive pillar. A bump is formed over the conductive barrier layer. The buffer layer reduces thermal and mechanical stress on the bump and contact pad.
-
86.
公开(公告)号:US09768155B2
公开(公告)日:2017-09-19
申请号:US14745203
申请日:2015-06-19
Applicant: STATS ChipPAC, Ltd.
Inventor: Yaojian Lin , Kang Chen , Seung Wook Yoon
IPC: H01L25/00 , H01L21/768 , H01L23/522 , H01L23/31 , H01L23/498 , H01L21/56 , H01L23/538 , H01L23/552 , H01L21/683 , H01L25/065 , H01L25/10 , H01L23/00
CPC classification number: H01L25/50 , H01L21/56 , H01L21/561 , H01L21/568 , H01L21/6835 , H01L21/6836 , H01L21/76802 , H01L21/76877 , H01L23/3157 , H01L23/49816 , H01L23/49827 , H01L23/5226 , H01L23/5389 , H01L23/552 , H01L24/11 , H01L24/13 , H01L24/16 , H01L24/81 , H01L24/82 , H01L24/96 , H01L24/97 , H01L25/0655 , H01L25/0657 , H01L25/105 , H01L2221/68327 , H01L2221/68345 , H01L2221/68381 , H01L2223/54426 , H01L2224/03 , H01L2224/03002 , H01L2224/03003 , H01L2224/0346 , H01L2224/0401 , H01L2224/04105 , H01L2224/05552 , H01L2224/0557 , H01L2224/05571 , H01L2224/05611 , H01L2224/05624 , H01L2224/05639 , H01L2224/05644 , H01L2224/05647 , H01L2224/05655 , H01L2224/0613 , H01L2224/11 , H01L2224/1132 , H01L2224/11334 , H01L2224/1146 , H01L2224/12105 , H01L2224/13014 , H01L2224/13021 , H01L2224/13025 , H01L2224/131 , H01L2224/13111 , H01L2224/13113 , H01L2224/13116 , H01L2224/13124 , H01L2224/13139 , H01L2224/13144 , H01L2224/13147 , H01L2224/13155 , H01L2224/14104 , H01L2224/16145 , H01L2224/16225 , H01L2224/16237 , H01L2224/16238 , H01L2224/24137 , H01L2224/48091 , H01L2224/73253 , H01L2224/73259 , H01L2224/73265 , H01L2224/73267 , H01L2224/76155 , H01L2224/81 , H01L2224/81191 , H01L2224/81193 , H01L2224/81447 , H01L2224/81805 , H01L2224/82005 , H01L2224/92 , H01L2224/94 , H01L2224/96 , H01L2224/97 , H01L2225/06513 , H01L2225/06517 , H01L2225/06541 , H01L2225/06548 , H01L2225/1035 , H01L2225/1058 , H01L2924/00011 , H01L2924/00014 , H01L2924/01004 , H01L2924/01006 , H01L2924/01013 , H01L2924/01023 , H01L2924/01024 , H01L2924/01029 , H01L2924/01033 , H01L2924/01046 , H01L2924/01047 , H01L2924/01049 , H01L2924/01072 , H01L2924/01073 , H01L2924/01074 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/01322 , H01L2924/014 , H01L2924/09701 , H01L2924/12041 , H01L2924/12042 , H01L2924/12043 , H01L2924/1306 , H01L2924/13091 , H01L2924/14 , H01L2924/1433 , H01L2924/15311 , H01L2924/1532 , H01L2924/15331 , H01L2924/181 , H01L2924/1815 , H01L2924/18161 , H01L2924/18162 , H01L2924/19041 , H01L2924/19042 , H01L2924/19043 , H01L2924/30105 , H01L2924/3025 , H01L2924/3511 , H01L2224/82 , H01L2924/00 , H01L2924/00012
Abstract: A semiconductor device has an encapsulant deposited over a first surface of the semiconductor die and around the semiconductor die. A first insulating layer is formed over a second surface of the semiconductor die opposite the first surface. A conductive layer is formed over the first insulating layer. An interconnect structure is formed through the encapsulant outside a footprint of the semiconductor die and electrically connected to the conductive layer. The first insulating layer includes an optically transparent or translucent material. The semiconductor die includes a sensor configured to receive an external stimulus passing through the first insulating layer. A second insulating layer is formed over the first surface of the semiconductor die. A conductive via is formed through the first insulating layer outside a footprint of the semiconductor die. A plurality of stacked semiconductor devices is electrically connected through the interconnect structure.
-
公开(公告)号:US09768038B2
公开(公告)日:2017-09-19
申请号:US14139312
申请日:2013-12-23
Applicant: STATS ChipPAC, Ltd.
Inventor: Yaojian Lin
CPC classification number: H01L21/568 , H01L21/561 , H01L23/3114 , H01L23/3135 , H01L24/19 , H01L24/96 , H01L24/97 , H01L2224/04105 , H01L2224/11 , H01L2224/12105 , H01L2924/12041 , H01L2924/12042 , H01L2924/13091 , H01L2924/181 , H01L2924/1815 , H01L2924/18162 , H01L2924/3511 , H01L2924/00
Abstract: A semiconductor device includes a carrier and a plurality of semiconductor die disposed over the carrier. An encapsulant is deposited over the semiconductor die. A composite layer is formed over the encapsulant to form a panel. The carrier is removed. A conductive layer is formed over the panel. An insulating layer is formed over the conductive layer. The carrier includes a glass layer, a second composite layer formed over the glass layer, and an interface layer formed over the glass layer. The composite layer and encapsulant are selected to tune a coefficient of thermal expansion of the panel. The panel includes panel blocks comprising an opening separating the panel blocks. The encapsulant or insulating material is deposited in the opening. A plurality of support members are disposed around the panel blocks. An interconnect structure is formed over the conductive layer.
-
公开(公告)号:US09754867B2
公开(公告)日:2017-09-05
申请号:US15367423
申请日:2016-12-02
Applicant: STATS ChipPAC Pte. Ltd.
Inventor: Yaojian Lin , Kang Chen , Jianmin Fang , Xia Feng
IPC: H01L23/498 , H01L21/768 , H01L23/31 , H01L21/56 , H01L23/538 , H01L23/00
CPC classification number: H01L23/49816 , H01L21/56 , H01L21/563 , H01L21/568 , H01L21/76802 , H01L21/76879 , H01L23/3114 , H01L23/3192 , H01L23/49822 , H01L23/5389 , H01L24/06 , H01L24/11 , H01L24/14 , H01L24/19 , H01L24/82 , H01L24/96 , H01L2223/5448 , H01L2224/0401 , H01L2224/04105 , H01L2224/12105 , H01L2224/48091 , H01L2224/73265 , H01L2224/94 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01029 , H01L2924/01032 , H01L2924/01033 , H01L2924/01047 , H01L2924/01049 , H01L2924/01073 , H01L2924/01075 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/01322 , H01L2924/014 , H01L2924/09701 , H01L2924/10329 , H01L2924/12041 , H01L2924/12042 , H01L2924/1306 , H01L2924/13091 , H01L2924/15311 , H01L2924/181 , H01L2924/1815 , H01L2924/18162 , H01L2924/3511 , H01L2924/37001 , H01L2924/00014 , H01L2924/00 , H01L2224/03
Abstract: A semiconductor device comprises a semiconductor die including a conductive layer. A first insulating layer is formed over the semiconductor die and conductive layer. An encapsulant is disposed over the semiconductor die. A compliant island is formed over the first insulating layer. An interconnect structure is formed over the compliant island. An under bump metallization (UBM) is formed over the compliant island. The compliant island includes a diameter greater than 5 μm larger than a diameter of the UBM. An opening is formed in the compliant island over the conductive layer. A second insulating layer is formed over the first insulating layer and compliant island. A third insulating layer is formed over an interface between the semiconductor die and the encapsulant. An opening is formed in the third insulating layer over the encapsulant for stress relief.
-
89.
公开(公告)号:US09704857B2
公开(公告)日:2017-07-11
申请号:US13678134
申请日:2012-11-15
Applicant: STATS ChipPAC, Ltd.
Inventor: HyunTai Kim , YongTaek Lee , Gwang Kim , ByungHoon Ahn , Kai Liu
IPC: H01G9/00 , H01L21/00 , H01L27/06 , H01L21/56 , H01L23/31 , H01L23/64 , H01L23/66 , H01L27/01 , H01L49/02 , H01L27/08 , H01L23/00
CPC classification number: H01L27/0676 , H01L21/56 , H01L21/563 , H01L23/3121 , H01L23/3128 , H01L23/642 , H01L23/645 , H01L23/66 , H01L24/16 , H01L24/48 , H01L24/73 , H01L27/016 , H01L27/0805 , H01L28/10 , H01L28/40 , H01L2223/6677 , H01L2224/16145 , H01L2224/16225 , H01L2224/32145 , H01L2224/48145 , H01L2224/48227 , H01L2224/48228 , H01L2224/73204 , H01L2224/73257 , H01L2224/73265 , H01L2225/06506 , H01L2225/0651 , H01L2225/06513 , H01L2225/06517 , H01L2924/00014 , H01L2924/01078 , H01L2924/01079 , H01L2924/01322 , H01L2924/09701 , H01L2924/10252 , H01L2924/10253 , H01L2924/10329 , H01L2924/12041 , H01L2924/12042 , H01L2924/1306 , H01L2924/13091 , H01L2924/14 , H01L2924/1433 , H01L2924/15174 , H01L2924/15192 , H01L2924/15311 , H01L2924/181 , H01L2924/19011 , H01L2924/19041 , H01L2924/19042 , H01L2924/19043 , H01L2924/19105 , H01L2924/30105 , H01L2924/30107 , H01L2924/3011 , H01L2924/00012 , H01L2924/00 , H01L2224/45099 , H01L2224/45015 , H01L2924/207
Abstract: A semiconductor device has a substrate and RF FEM formed over the substrate. The RF FEM includes an LC low-pass filter having an input coupled for receiving a transmit signal. A Tx/Rx switch has a first terminal coupled to an output of the LC filter. A diplexer has a first terminal coupled to a second terminal of the Tx/Rx switch and a second terminal for providing an RF signal. An IPD band-pass filter has an input coupled to a third terminal of the Tx/Rx switch and an output providing a receive signal. The LC filter includes conductive traces wound to exhibit inductive and mutual inductive properties and capacitors coupled to the conductive traces. The IPD filter includes conductive traces wound to exhibit inductive and mutual inductive properties and capacitors coupled to the conductive traces. The RF FEM substrate can be stacked over a semiconductor package containing an RF transceiver.
-
公开(公告)号:US09679846B2
公开(公告)日:2017-06-13
申请号:US14572298
申请日:2014-12-16
Applicant: STATS ChipPAC, Ltd.
Inventor: JaeHyun Lee , SunJae Kim , JoongGi Kim
IPC: H01L23/48 , H01L23/528 , H01L23/498 , H01L21/48 , H01L23/31 , H01L21/768 , H01L23/522 , H01L23/525 , H01L21/56 , H01L23/00
CPC classification number: H01L23/528 , H01L21/4867 , H01L21/563 , H01L21/565 , H01L21/768 , H01L23/3121 , H01L23/3128 , H01L23/49838 , H01L23/49894 , H01L23/5221 , H01L23/5252 , H01L23/5256 , H01L24/13 , H01L24/16 , H01L24/81 , H01L2224/10175 , H01L2224/16237 , H01L2224/81191 , H01L2224/81385 , H01L2224/81411 , H01L2224/81424 , H01L2224/81439 , H01L2224/81444 , H01L2224/81447 , H01L2224/81455 , H01L2224/81815 , H01L2224/94 , H01L2924/01322 , H01L2924/12041 , H01L2924/12042 , H01L2924/1306 , H01L2924/13091 , H01L2924/181 , H01L2224/11 , H01L2924/00014 , H01L2924/00
Abstract: A semiconductor device has a semiconductor die with a plurality of bumps formed over a surface of the semiconductor die. A first conductive layer having first and second segments is formed over a surface of the substrate with a first vent separating an end of the first segment and the second segment and a second vent separating an end of the second segment and the first segment. A second conductive layer is formed over the surface of the substrate to electrically connect the first segment and second segment. The thickness of the second conductive layer can be less than a thickness of the first conductive layer to form the first vent and second vent. The semiconductor die is mounted to the substrate with the bumps aligned to the first segment and second segment. Bump material from reflow of the bumps is channeled into the first vent and second vent.
-
-
-
-
-
-
-
-
-