公开(公告)号：US20130341789A1

公开(公告)日：2013-12-26

申请号：US14011491

申请日：2013-08-27

Applicant: STATS ChipPAC, Ltd.

Inventor： Zigmund R. Camacho ,  Lionel Chien Hui Tay ,  Henry D. Bathan ,  Dioscoro A. Merilo ,  Jeffrey D. Punzalan

IPC: H01L23/498 ,  H01L23/00

CPC classification number: H01L23/49811 ,  H01L21/565 ,  H01L21/568 ,  H01L21/6835 ,  H01L23/3128 ,  H01L23/49816 ,  H01L23/5389 ,  H01L24/11 ,  H01L24/24 ,  H01L24/48 ,  H01L24/96 ,  H01L24/97 ,  H01L25/0657 ,  H01L25/105 ,  H01L2221/68345 ,  H01L2221/68359 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/12105 ,  H01L2224/19 ,  H01L2224/20 ,  H01L2224/211 ,  H01L2224/24145 ,  H01L2224/24998 ,  H01L2224/32145 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/82007 ,  H01L2224/83005 ,  H01L2225/06524 ,  H01L2225/06527 ,  H01L2225/06568 ,  H01L2225/06582 ,  H01L2225/1035 ,  H01L2225/1058 ,  H01L2924/00014 ,  H01L2924/01004 ,  H01L2924/01013 ,  H01L2924/01023 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/0103 ,  H01L2924/01033 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/04941 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15174 ,  H01L2924/15311 ,  H01L2924/15331 ,  H01L2924/15747 ,  H01L2924/181 ,  H01L2924/18162 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/19043 ,  H01L2924/30105 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/45099

Abstract: A semiconductor device is made by forming solder bumps over a copper carrier. Solder capture indentations are formed in the copper carrier to receive the solder bumps. A semiconductor die is mounted to the copper carrier using a die attach adhesive. The semiconductor die has contact pads formed over its active surface. An encapsulant is deposited over the copper carrier, solder bumps, and semiconductor die. A portion of the encapsulant is removed to expose the solder bumps and contact pads. A conductive layer is formed over the encapsulant to connect the solder bumps and contact pads. The conductive layer operates as a redistribution layer to route electrical signals from the solder bumps to the contact pads. The copper carrier is removed. An insulating layer is formed over the conductive layer and encapsulant. A plurality of semiconductor devices can be stacked and electrically connected through the solder bumps.

Abstract translation: 通过在铜载体上形成焊料凸块制成半导体器件。 在铜载体中形成焊接捕获压痕以接收焊料凸块。 使用芯片附着粘合剂将半导体管芯安装到铜载体上。 半导体管芯具有形成在其有源表面上的接触焊盘。 封装剂沉积在铜载体，焊料凸块和半导体芯片上。 去除一部分密封剂以暴露焊料凸块和接触垫。 在密封剂上形成导电层以连接焊料凸块和接触焊盘。 导电层作为再分配层工作，以将电信号从焊料凸块路由到接触焊盘。 铜载体被去除。 在导电层和密封剂上形成绝缘层。 多个半导体器件可以堆叠并通过焊料凸块电连接。

公开(公告)号：US20130328189A1

公开(公告)日：2013-12-12

申请号：US13965356

申请日：2013-08-13

Applicant: STATS ChipPAC, Ltd.

Inventor： Rajendra D. Pendse

IPC: H01L23/498 ,  H01L21/768

CPC classification number: H01L23/49811 ,  H01L21/563 ,  H01L21/76885 ,  H01L23/49838 ,  H01L24/13 ,  H01L24/16 ,  H01L24/75 ,  H01L24/81 ,  H01L2224/13111 ,  H01L2224/1607 ,  H01L2224/16225 ,  H01L2224/16238 ,  H01L2224/2919 ,  H01L2224/32225 ,  H01L2224/73203 ,  H01L2224/73204 ,  H01L2224/75 ,  H01L2224/75301 ,  H01L2224/81191 ,  H01L2224/81203 ,  H01L2224/81801 ,  H01L2224/83191 ,  H01L2224/83192 ,  H01L2224/83856 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01033 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/14 ,  H01L2924/15787 ,  H01L2924/181 ,  H01L2924/3011 ,  H01L2924/00014 ,  H01L2924/00

Abstract: A semiconductor device has a semiconductor die with a plurality of bumps formed over the die. A substrate has a plurality of conductive traces formed on the substrate. Each trace has an interconnect site for mating to the bumps. The interconnect sites have parallel edges along a length of the conductive traces under the bumps from a plan view for increasing escape routing density. The bumps have a noncollapsible portion for attaching to a contact pad on the die and fusible portion for attaching to the interconnect site. The fusible portion melts at a temperature which avoids damage to the substrate during reflow. The noncollapsible portion includes lead solder, and fusible portion includes eutectic solder. The interconnect sites have a width which is less than 1.2 times a width of the conductive trace. Alternatively, the interconnect sites have a width which is less than one-half a diameter of the bump.

Abstract translation: 半导体器件具有在模具上形成有多个凸块的半导体管芯。 衬底具有形成在衬底上的多个导电迹线。 每个迹线具有用于与凸块配合的互连部位。 互连位置从平面图沿着凸块下方的导电迹线的长度具有平行边缘，用于增加逃逸路由密度。 凸块具有用于附接到管芯上的接触焊盘和可熔部分用于附接到互连部位的非可折叠部分。 可熔部分在回流期间避免对基板的损坏的温度下熔化。 非可收缩部分包括铅焊料，并且可熔部分包括共晶焊料。 互连点的宽度小于导电迹线宽度的1.2倍。 或者，互连部位的宽度小于凸块直径​​的一半。

公开(公告)号：US20130292829A1

公开(公告)日：2013-11-07

申请号：US13935053

申请日：2013-07-03

Applicant: STATS ChipPAC, Ltd.

Inventor： Rajendra D. Pendse

IPC: H01L23/498 ,  H01L21/56

CPC classification number: H01L23/3121 ,  H01L21/56 ,  H01L23/49811 ,  H01L24/03 ,  H01L24/05 ,  H01L24/13 ,  H01L24/24 ,  H01L24/27 ,  H01L24/29 ,  H01L24/45 ,  H01L24/46 ,  H01L24/82 ,  H01L25/105 ,  H01L2224/04042 ,  H01L2224/24051 ,  H01L2224/24226 ,  H01L2224/435 ,  H01L2224/45144 ,  H01L2225/1035 ,  H01L2924/00014 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01012 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01042 ,  H01L2924/01074 ,  H01L2924/01075 ,  H01L2924/01079 ,  H01L2924/014 ,  H01L2924/12042 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/1461 ,  H01L2924/19041 ,  H01L2924/00 ,  H01L2224/45015 ,  H01L2924/207

Abstract: A semiconductor package having an embedded die and solid vertical interconnections, such as stud bump interconnections, for increased integration in the direction of the z-axis (i.e., in a direction normal to the circuit side of the die). The semiconductor package can include a die mounted in a face-up configuration (similar to a wire bond package) or in a face-down or flip chip configuration.

Abstract translation: 一种半导体封装，其具有嵌入裸片和固体垂直互连（例如柱形凸块互连），用于在z轴方向（即，垂直于模具的电路侧的方向）上增加集成。 半导体封装可以包括以面朝上配置（类似于引线键合封装）或面朝下或倒装芯片配置安装的管芯。

公开(公告)号：US20130256840A1

公开(公告)日：2013-10-03

申请号：US13906489

申请日：2013-05-31

Applicant: STATS ChipPAC, Ltd.

Inventor： JaEun Yun ,  HunTeak Lee ,  SeungYong Chai ,  WonJun Ko

IPC: H01L23/544

CPC classification number: H01L23/544 ,  H01L21/561 ,  H01L21/568 ,  H01L21/6836 ,  H01L23/3114 ,  H01L23/3121 ,  H01L24/02 ,  H01L24/11 ,  H01L24/16 ,  H01L24/32 ,  H01L25/0655 ,  H01L2221/68327 ,  H01L2221/6834 ,  H01L2221/68363 ,  H01L2221/68381 ,  H01L2224/0231 ,  H01L2224/02313 ,  H01L2224/02317 ,  H01L2224/0239 ,  H01L2224/024 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/05548 ,  H01L2224/05611 ,  H01L2224/05616 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/1145 ,  H01L2224/11462 ,  H01L2224/11464 ,  H01L2224/11849 ,  H01L2224/11901 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/1416 ,  H01L2224/16225 ,  H01L2224/29144 ,  H01L2224/2919 ,  H01L2224/4805 ,  H01L2224/48091 ,  H01L2224/481 ,  H01L2224/73265 ,  H01L2224/94 ,  H01L2924/01019 ,  H01L2924/01079 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/01014 ,  H01L2924/0105 ,  H01L2924/01082 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2924/00012 ,  H01L2224/11

Abstract: A semiconductor device has a build-up interconnect structure formed over an active surface of a semiconductor wafer containing a plurality of semiconductor die separated by a saw street. An insulating layer is formed over the interconnect structure. Bumps are formed over the interconnect structure. A protective coating material is deposited over the insulating layer and saw street. A lamination tape is applied over the coating material. A portion of a back surface of the semiconductor wafer is removed. A mounting tape is applied over the back surface. The lamination tape is removed while leaving the coating material over the insulating layer and saw street. A first channel is formed through the saw street extending partially through the semiconductor wafer. The coating material is removed after forming the first channel. A second channel is formed through the saw street and the mounting tape is removed to singulate the semiconductor wafer.

Abstract translation: 半导体器件具有形成在半导体晶片的有源表面上的积聚互连结构，该半导体晶片包含由锯街隔开的多个半导体管芯。 在互连结构上形成绝缘层。 在互连结构上形成凸起。 保护涂层材料沉积在绝缘层和锯条之上。 层压胶带涂在涂料上。 去除半导体晶片的背面的一部分。 安装带应用在背面上。 除去层压带，同时将涂层材料留在绝缘层和锯条上。 通过部分穿过半导体晶片延伸的锯条形成第一通道。 在形成第一通道之后去除涂层材料。 通过锯道形成第二通道，并且去除安装带以划分半导体晶片。

公开(公告)号：US20130249111A1

公开(公告)日：2013-09-26

申请号：US13893616

申请日：2013-05-14

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin ,  Xia Feng ,  Jianmin Feng ,  Kang Chen

IPC: H01L21/48 ,  H01L23/48

CPC classification number: H01L21/486 ,  H01L21/4857 ,  H01L21/561 ,  H01L23/3107 ,  H01L23/3114 ,  H01L23/3128 ,  H01L23/48 ,  H01L23/525 ,  H01L24/05 ,  H01L24/06 ,  H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L24/29 ,  H01L24/32 ,  H01L2224/0231 ,  H01L2224/02311 ,  H01L2224/02313 ,  H01L2224/02317 ,  H01L2224/0235 ,  H01L2224/02379 ,  H01L2224/0239 ,  H01L2224/024 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/05548 ,  H01L2224/05552 ,  H01L2224/05553 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/06131 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/1134 ,  H01L2224/1145 ,  H01L2224/11462 ,  H01L2224/11464 ,  H01L2224/11849 ,  H01L2224/11901 ,  H01L2224/131 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/16225 ,  H01L2224/29144 ,  H01L2224/2919 ,  H01L2224/48091 ,  H01L2224/48105 ,  H01L2224/48175 ,  H01L2224/48227 ,  H01L2224/48228 ,  H01L2224/73265 ,  H01L2924/00 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/0105 ,  H01L2924/01073 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/181 ,  H01L2924/381 ,  H05K2201/09854 ,  H01L2924/01014 ,  H01L2924/0665 ,  H01L2924/00014 ,  H01L2924/00012

Abstract: A semiconductor device has a semiconductor die and first conductive layer formed over a surface of the semiconductor die. A first insulating layer is formed over the surface of the semiconductor die. A second insulating layer is formed over the first insulating layer and first conductive layer. An opening is formed in the second insulating layer over the first conductive layer. A second conductive layer is formed in the opening over the first conductive layer and second insulating layer. The second conductive layer has a width that is less than a width of the first conductive layer along a first axis. The second conductive layer has a width that is greater than a width of the first conductive layer along a second axis perpendicular to the first axis. A third insulating layer is formed over the second conductive layer and first insulating layer.

Abstract translation: 半导体器件具有形成在半导体管芯的表面上的半导体管芯和第一导电层。 在半导体管芯的表面上形成第一绝缘层。 在第一绝缘层和第一导电层上形成第二绝缘层。 在第一导电层上的第二绝缘层中形成开口。 在第一导电层和第二绝缘层上的开口中形成第二导电层。 第二导电层的宽度小于沿着第一轴线的第一导电层的宽度。 第二导电层的宽度大于沿着垂直于第一轴线的第二轴线的第一导电层的宽度。 在第二导电层和第一绝缘层上形成第三绝缘层。

公开(公告)号：US20130241080A1

公开(公告)日：2013-09-19

申请号：US13887180

申请日：2013-05-03

Applicant: STATS CHIPPAC, LTD.

Inventor： Reza A. Pagaila

IPC: H01L23/538

CPC classification number: H01L23/5384 ,  H01L21/486 ,  H01L21/561 ,  H01L21/563 ,  H01L21/6835 ,  H01L23/3107 ,  H01L23/3121 ,  H01L23/3128 ,  H01L23/49827 ,  H01L23/49833 ,  H01L23/5389 ,  H01L23/544 ,  H01L24/03 ,  H01L24/05 ,  H01L24/06 ,  H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L24/19 ,  H01L24/20 ,  H01L24/29 ,  H01L24/83 ,  H01L24/96 ,  H01L24/97 ,  H01L25/0657 ,  H01L25/105 ,  H01L25/50 ,  H01L2221/68327 ,  H01L2221/68345 ,  H01L2221/68381 ,  H01L2221/68386 ,  H01L2223/54426 ,  H01L2224/0345 ,  H01L2224/03452 ,  H01L2224/03462 ,  H01L2224/03464 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/06131 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/1134 ,  H01L2224/1145 ,  H01L2224/11462 ,  H01L2224/11464 ,  H01L2224/11849 ,  H01L2224/11901 ,  H01L2224/12105 ,  H01L2224/131 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/16225 ,  H01L2224/21 ,  H01L2224/2105 ,  H01L2224/215 ,  H01L2224/22 ,  H01L2224/221 ,  H01L2224/29144 ,  H01L2224/2919 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/48105 ,  H01L2224/48175 ,  H01L2224/48227 ,  H01L2224/48228 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/83005 ,  H01L2224/8385 ,  H01L2224/92244 ,  H01L2224/94 ,  H01L2224/95001 ,  H01L2224/95121 ,  H01L2224/96 ,  H01L2224/97 ,  H01L2225/06517 ,  H01L2225/06548 ,  H01L2225/06558 ,  H01L2225/1023 ,  H01L2225/1035 ,  H01L2225/1041 ,  H01L2924/01013 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/0105 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/0665 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/181 ,  H05K1/115 ,  H05K3/429 ,  H05K3/4647 ,  H05K2201/09518 ,  H01L2924/01014 ,  H01L2924/00 ,  H01L2924/00014 ,  H01L2224/83 ,  H01L2224/82 ,  H01L2924/00012 ,  H01L2224/03

Abstract: A semiconductor device has a substrate with a plurality of conductive vias and conductive layer formed over the substrate. A semiconductor die is mounted over a carrier. The substrate is mounted to the semiconductor die opposite the carrier. An encapsulant is deposited between the substrate and carrier around the semiconductor die. A plurality of conductive TMVs is formed through the substrate and encapsulant. The conductive TMVs protrude from the encapsulant to aid with alignment of the interconnect structure. The conductive TMVs are electrically connected to the conductive layer and conductive vias. The carrier is removed and an interconnect structure is formed over a surface of the encapsulant and semiconductor die opposite the substrate. The interconnect structure is electrically connected to the conductive TMVs. A plurality of semiconductor devices can be stacked and electrically connected through the substrate, conductive TMVs, and interconnect structure.

Abstract translation: 半导体器件具有在衬底上形成多个导电通孔和导电层的衬底。 半导体管芯安装在载体上。 衬底被安装到与载体相对的半导体管芯上。 在半导体管芯周围的衬底和载体之间沉积密封剂。 通过衬底和密封剂形成多个导电TMV。 导电TMV从密封剂突出以帮助互连结构的对准。 导电TMV电连接到导电层和导电通孔。 移除载体并且在与衬底相对的密封剂和半导体管芯的表面上形成互连结构。 互连结构电连接到导电TMV。 多个半导体器件可以通过衬底层叠并电连接，导电TMV和互连结构。

公开(公告)号：US20130234322A1

公开(公告)日：2013-09-12

申请号：US13771825

申请日：2013-02-20

Applicant: STATS CHIPPAC, LTD.

Inventor： Rajendra D. Pendse

IPC: H01L23/00 ,  H01L23/498

CPC classification number: H01L24/81 ,  H01L21/561 ,  H01L21/568 ,  H01L21/76898 ,  H01L23/49811 ,  H01L23/49822 ,  H01L24/03 ,  H01L24/05 ,  H01L24/06 ,  H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L24/17 ,  H01L24/19 ,  H01L24/94 ,  H01L24/96 ,  H01L24/97 ,  H01L25/03 ,  H01L25/0657 ,  H01L25/50 ,  H01L2224/02379 ,  H01L2224/0401 ,  H01L2224/04042 ,  H01L2224/04105 ,  H01L2224/05008 ,  H01L2224/05022 ,  H01L2224/051 ,  H01L2224/05552 ,  H01L2224/05569 ,  H01L2224/05571 ,  H01L2224/056 ,  H01L2224/0603 ,  H01L2224/11 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/1145 ,  H01L2224/1146 ,  H01L2224/12105 ,  H01L2224/13022 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/1403 ,  H01L2224/141 ,  H01L2224/14135 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/1703 ,  H01L2224/32225 ,  H01L2224/48091 ,  H01L2224/73204 ,  H01L2224/73259 ,  H01L2224/73265 ,  H01L2224/81 ,  H01L2224/81005 ,  H01L2224/81191 ,  H01L2224/81193 ,  H01L2224/81805 ,  H01L2224/83 ,  H01L2224/94 ,  H01L2224/96 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2924/00011 ,  H01L2924/00014 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/15311 ,  H01L2924/181 ,  H01L2924/18161 ,  H01L2924/18162 ,  H01L2924/3511 ,  H01L2924/00 ,  H01L2224/03 ,  H01L2924/00012

Abstract: A semiconductor device has a plurality of first semiconductor die with an encapsulant deposited over a first surface of the first semiconductor die and around the first semiconductor die. An insulating layer is formed over the encapsulant and over a second surface of the first semiconductor die opposite the first surface. The insulating layer includes openings over the first semiconductor die. A first conductive layer is formed over the first semiconductor die within the openings. A second conductive layer is formed over the first conductive layer to form vertical conductive vias. A second semiconductor die is disposed over the first semiconductor die and electrically connected to the first conductive layer. A bump is formed over the second conductive layer outside a footprint of the first semiconductor die. The second semiconductor die is disposed over an active surface or a back surface of the first semiconductor die.

Abstract translation: 半导体器件具有多个第一半导体管芯，其具有沉积在第一半导体管芯的第一表面上并围绕第一半导体管芯的密封剂。 绝缘层形成在密封剂之上并且在与第一表面相对的第一半导体管芯的第二表面之上。 绝缘层包括在第一半导体管芯上的开口。 第一导电层形成在开口内的第一半导体管芯的上方。 在第一导电层上形成第二导电层以形成垂直导电通孔。 第二半导体管芯设置在第一半导体管芯上并电连接到第一导电层。 在第一半导体管芯的覆盖区外的第二导电层上形成凸点。 第二半导体管芯设置在第一半导体管芯的有源表面或后表面上。

公开(公告)号：US20130221452A1

公开(公告)日：2013-08-29

申请号：US13853969

申请日：2013-03-29

Applicant: Stats ChipPAC, Ltd.

Inventor： Thomas J. Strothmann ,  Steve Anderson ,  Byung Joon Han ,  Il Kwon Shim ,  Heap Hoe Kuan

IPC: H01L29/66 ,  H01L21/56

CPC classification number: H01L29/66 ,  H01L21/56 ,  H01L21/568 ,  H01L23/3128 ,  H01L24/19 ,  H01L24/20 ,  H01L24/96 ,  H01L24/97 ,  H01L27/14618 ,  H01L27/14683 ,  H01L2224/04105 ,  H01L2224/16145 ,  H01L2224/73209 ,  H01L2924/01322 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/12043 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/1461 ,  H01L2924/181 ,  H01L2924/00 ,  H01L2924/00012

Abstract: A semiconductor device has a semiconductor die and an encapsulant deposited over the semiconductor die. A conductive layer can be formed over the encapsulant and the semiconductor die. A transmissive layer can be formed over the semiconductor die. An interconnect structure can be formed through the encapsulant and electrically connected to the conductive layer, whereby the interconnect structure is formed off to only one side of the semiconductor die.

Abstract translation: 半导体器件具有沉积在半导体管芯上的半导体管芯和密封剂。 可以在密封剂和半导体管芯上方形成导电层。 可以在半导体管芯上形成透射层。 可以通过密封剂形成互连结构并且电连接到导电层，由此互连结构仅形成在半导体管芯的仅一侧。

公开(公告)号：US20130214385A1

公开(公告)日：2013-08-22

申请号：US13845409

申请日：2013-03-18

Applicant: STATS ChipPAC, Ltd.

Inventor： Byung Tai Do ,  Heap Hoe Kuan ,  Seng Guan Chow

IPC: H01L23/538

CPC classification number: H01L23/5384 ,  H01L21/568 ,  H01L21/6835 ,  H01L21/6836 ,  H01L23/3114 ,  H01L23/481 ,  H01L24/03 ,  H01L24/05 ,  H01L24/11 ,  H01L24/13 ,  H01L24/14 ,  H01L24/73 ,  H01L24/96 ,  H01L24/97 ,  H01L25/0657 ,  H01L25/50 ,  H01L2221/68327 ,  H01L2221/68336 ,  H01L2221/68372 ,  H01L2224/02371 ,  H01L2224/02372 ,  H01L2224/02379 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/05548 ,  H01L2224/05554 ,  H01L2224/1134 ,  H01L2224/12105 ,  H01L2224/131 ,  H01L2224/13138 ,  H01L2224/13147 ,  H01L2224/14131 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/20 ,  H01L2224/32145 ,  H01L2224/32225 ,  H01L2224/32245 ,  H01L2224/45139 ,  H01L2224/48091 ,  H01L2224/48145 ,  H01L2224/48227 ,  H01L2224/48247 ,  H01L2224/48472 ,  H01L2224/73204 ,  H01L2224/73265 ,  H01L2224/96 ,  H01L2224/97 ,  H01L2225/06506 ,  H01L2225/0651 ,  H01L2225/06513 ,  H01L2225/06541 ,  H01L2225/06551 ,  H01L2225/06582 ,  H01L2924/00011 ,  H01L2924/00014 ,  H01L2924/01005 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01015 ,  H01L2924/01022 ,  H01L2924/01027 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01047 ,  H01L2924/01074 ,  H01L2924/01075 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/12042 ,  H01L2924/14 ,  H01L2924/15173 ,  H01L2924/15311 ,  H01L2924/15313 ,  H01L2924/15787 ,  H01L2924/181 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/19043 ,  H01L2924/19104 ,  H01L2924/19107 ,  H01L2924/30105 ,  H01L2924/00 ,  H01L2924/00012

Abstract: A semiconductor device includes a first die having top, bottom, and peripheral surfaces. A bond pad is formed over the top surface. An organic material is connected to the first die and disposed around the peripheral surface. A via hole is formed in the organic material. A metal trace connects the via hole to the bond pad. A conductive material is deposited in the via hole. A redistribution layer (RDL) has an interconnection pad disposed over the top surface of the first die.

Abstract translation: 半导体器件包括具有顶部，底部和外围表面的第一裸片。 在顶表面上形成接合垫。 有机材料连接到第一模具并围绕周边表面设置。 在有机材料中形成通孔。 金属迹线将通孔连接到接合垫。 导电材料沉积在通孔中。 再分布层（RDL）具有设置在第一管芯的顶表面上的互连焊盘。

公开(公告)号：US20130200528A1

公开(公告)日：2013-08-08

申请号：US13832333

申请日：2013-03-15

Applicant: STATS ChipPAC, Ltd.

Inventor： Yaojian Lin ,  Kang Chen ,  Seung Wook Yoon

IPC: H01L21/768 ,  H01L23/522

CPC classification number: H01L25/50 ,  H01L21/56 ,  H01L21/561 ,  H01L21/568 ,  H01L21/6835 ,  H01L21/6836 ,  H01L21/76802 ,  H01L21/76877 ,  H01L23/3157 ,  H01L23/49816 ,  H01L23/49827 ,  H01L23/5226 ,  H01L23/5389 ,  H01L23/552 ,  H01L24/11 ,  H01L24/13 ,  H01L24/16 ,  H01L24/81 ,  H01L24/82 ,  H01L24/96 ,  H01L24/97 ,  H01L25/0655 ,  H01L25/0657 ,  H01L25/105 ,  H01L2221/68327 ,  H01L2221/68345 ,  H01L2221/68381 ,  H01L2223/54426 ,  H01L2224/03 ,  H01L2224/03002 ,  H01L2224/03003 ,  H01L2224/0346 ,  H01L2224/0401 ,  H01L2224/04105 ,  H01L2224/05552 ,  H01L2224/0557 ,  H01L2224/05571 ,  H01L2224/05611 ,  H01L2224/05624 ,  H01L2224/05639 ,  H01L2224/05644 ,  H01L2224/05647 ,  H01L2224/05655 ,  H01L2224/0613 ,  H01L2224/11 ,  H01L2224/1132 ,  H01L2224/11334 ,  H01L2224/1146 ,  H01L2224/12105 ,  H01L2224/13014 ,  H01L2224/13021 ,  H01L2224/13025 ,  H01L2224/131 ,  H01L2224/13111 ,  H01L2224/13113 ,  H01L2224/13116 ,  H01L2224/13124 ,  H01L2224/13139 ,  H01L2224/13144 ,  H01L2224/13147 ,  H01L2224/13155 ,  H01L2224/14104 ,  H01L2224/16145 ,  H01L2224/16225 ,  H01L2224/16237 ,  H01L2224/16238 ,  H01L2224/24137 ,  H01L2224/48091 ,  H01L2224/73253 ,  H01L2224/73259 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/76155 ,  H01L2224/81 ,  H01L2224/81191 ,  H01L2224/81193 ,  H01L2224/81447 ,  H01L2224/81805 ,  H01L2224/82005 ,  H01L2224/92 ,  H01L2224/94 ,  H01L2224/96 ,  H01L2224/97 ,  H01L2225/06513 ,  H01L2225/06517 ,  H01L2225/06541 ,  H01L2225/06548 ,  H01L2225/1035 ,  H01L2225/1058 ,  H01L2924/00011 ,  H01L2924/00014 ,  H01L2924/01004 ,  H01L2924/01006 ,  H01L2924/01013 ,  H01L2924/01023 ,  H01L2924/01024 ,  H01L2924/01029 ,  H01L2924/01033 ,  H01L2924/01046 ,  H01L2924/01047 ,  H01L2924/01049 ,  H01L2924/01072 ,  H01L2924/01073 ,  H01L2924/01074 ,  H01L2924/01078 ,  H01L2924/01079 ,  H01L2924/01082 ,  H01L2924/01322 ,  H01L2924/014 ,  H01L2924/09701 ,  H01L2924/12041 ,  H01L2924/12042 ,  H01L2924/12043 ,  H01L2924/1306 ,  H01L2924/13091 ,  H01L2924/14 ,  H01L2924/1433 ,  H01L2924/15311 ,  H01L2924/1532 ,  H01L2924/15331 ,  H01L2924/181 ,  H01L2924/1815 ,  H01L2924/18161 ,  H01L2924/18162 ,  H01L2924/19041 ,  H01L2924/19042 ,  H01L2924/19043 ,  H01L2924/30105 ,  H01L2924/3025 ,  H01L2924/3511 ,  H01L2224/82 ,  H01L2924/00 ,  H01L2924/00012

Abstract: A semiconductor device has an encapsulant deposited over a first surface of the semiconductor die and around the semiconductor die. A first insulating layer is formed over a second surface of the semiconductor die opposite the first surface. A conductive layer is formed over the first insulating layer. An interconnect structure is formed through the encapsulant outside a footprint of the semiconductor die and electrically connected to the conductive layer. The first insulating layer includes an optically transparent or translucent material. The semiconductor die includes a sensor configured to receive an external stimulus passing through the first insulating layer. A second insulating layer is formed over the first surface of the semiconductor die. A conductive via is formed through the first insulating layer outside a footprint of the semiconductor die. A plurality of stacked semiconductor devices is electrically connected through the interconnect structure.