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公开(公告)号:CN106158820B
公开(公告)日:2018-05-18
申请号:CN201610657408.5
申请日:2013-07-05
申请人: 日月光半导体制造股份有限公司
IPC分类号: H01L23/498 , H01L21/48 , H05K3/40
CPC分类号: H01L23/49811 , H01L21/0273 , H01L21/48 , H01L21/4846 , H01L21/4853 , H01L21/768 , H01L23/13 , H01L23/3135 , H01L23/3142 , H01L23/481 , H01L23/49816 , H01L23/49822 , H01L23/49827 , H01L23/49838 , H01L24/14 , H01L24/16 , H01L24/17 , H01L24/32 , H01L24/73 , H01L24/81 , H01L2224/13005 , H01L2224/13013 , H01L2224/13016 , H01L2224/13023 , H01L2224/131 , H01L2224/13144 , H01L2224/13155 , H01L2224/14131 , H01L2224/16055 , H01L2224/16057 , H01L2224/16225 , H01L2224/16238 , H01L2224/32225 , H01L2224/73204 , H01L2224/81193 , H01L2224/81385 , H01L2224/81815 , H01L2924/12042 , H01L2924/15311 , H01L2924/181 , H05K3/4007 , H05K2201/0367 , H05K2201/10674 , H01L2924/00014 , H01L2924/014 , H01L2924/00
摘要: 一封装基板包括一中心部、一上电路层及数个柱体。该多个柱体位于该上电路层上,且从该上电路层朝上。该多个柱体的顶面大致上共平面。该多个柱体提供电性连接至一半导体晶粒。借此,改善该基板及该半导体晶粒间的焊料结合可靠度。
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公开(公告)号:CN103547408B
公开(公告)日:2017-07-28
申请号:CN201280024585.X
申请日:2012-03-28
申请人: 千住金属工业株式会社
CPC分类号: B23K35/0244 , B23K1/0016 , B23K35/0222 , B23K35/025 , B23K35/26 , B23K35/262 , B32B15/018 , C22C13/00 , H01L23/3114 , H01L24/05 , H01L24/11 , H01L24/13 , H01L24/81 , H01L2224/0401 , H01L2224/05644 , H01L2224/05647 , H01L2224/1134 , H01L2224/13005 , H01L2224/13014 , H01L2224/13016 , H01L2224/13105 , H01L2224/13109 , H01L2224/13111 , H01L2224/13113 , H01L2224/1312 , H01L2224/13139 , H01L2224/13147 , H01L2224/13155 , H01L2224/13157 , H01L2224/1316 , H01L2224/13169 , H01L2224/16225 , H01L2224/81815 , H01L2924/01015 , H01L2924/01322 , H01L2924/014 , H01L2924/15311 , H01L2924/2076 , H05K3/3463 , H05K2201/10734 , H01L2924/00 , H01L2924/01047 , H01L2924/01029 , H01L2924/01028 , H01L2924/207 , H01L2924/00014
摘要: 提供一种焊料球,其为抑制焊料球的接合界面的界面剥离并抑制焊料球与焊膏之间产生的未熔合的、电子部件落下时的故障模式低的焊料球,为镀Au等的Ni电极部与在Cu上涂布有水溶性预焊剂的Cu电极部均可使用的焊料球。本发明为一种无铅焊料球,其为Ag0.5~1.1质量%、Cu0.7~0.8质量%、Ni0.05~0.08质量%、余量Sn的BGA、CSP的电极用无铅焊料球,无论被接合的印刷电路板为Cu电极,还是表面处理使用镀Au、镀Au/Pd的Ni电极,落下冲击性都良好。进而,该组成中还可以以总计0.003~0.1质量%添加一种以上选自Fe、Co、Pt中的元素,或者以总计0.003~0.1质量%添加一种以上选自Bi、In、Sb、P、Ge中的元素。
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公开(公告)号:CN103594441B
公开(公告)日:2017-04-12
申请号:CN201210519648.0
申请日:2012-12-06
申请人: 台湾积体电路制造股份有限公司
IPC分类号: H01L23/485 , H01L21/60 , H01L21/50
CPC分类号: H01L23/3185 , H01L21/302 , H01L21/561 , H01L21/565 , H01L21/6836 , H01L21/78 , H01L23/3114 , H01L23/3178 , H01L23/3192 , H01L24/03 , H01L24/05 , H01L24/11 , H01L24/13 , H01L24/94 , H01L2221/6834 , H01L2224/0401 , H01L2224/05009 , H01L2224/05022 , H01L2224/05124 , H01L2224/05147 , H01L2224/05572 , H01L2224/0558 , H01L2224/05611 , H01L2224/05644 , H01L2224/05647 , H01L2224/05655 , H01L2224/05666 , H01L2224/05681 , H01L2224/05686 , H01L2224/11334 , H01L2224/1134 , H01L2224/11849 , H01L2224/1191 , H01L2224/13005 , H01L2224/13022 , H01L2224/131 , H01L2224/13111 , H01L2224/13144 , H01L2224/13147 , H01L2224/13155 , H01L2224/94 , H01L2924/10156 , H01L2924/12042 , H01L2924/181 , H01L2924/00014 , H01L2924/04941 , H01L2924/04953 , H01L2224/11 , H01L2224/03 , H01L2924/206 , H01L2924/00 , H01L2924/014 , H01L2924/01047
摘要: 本发明提供了一种半导体封装件,包括位于半导体衬底的钝化层、位于钝化层的凸块以及位于钝化层上方并覆盖凸块的下部的模塑料层。模塑料层覆盖钝化层的侧壁。本发明还提供了半导体封装件的制造方法。
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公开(公告)号:CN103426849B
公开(公告)日:2016-12-28
申请号:CN201310003803.8
申请日:2013-01-06
申请人: 台湾积体电路制造股份有限公司
IPC分类号: H01L23/488 , H01L21/60
CPC分类号: H01L23/48 , H01L23/3185 , H01L23/3192 , H01L23/488 , H01L23/52 , H01L24/05 , H01L24/13 , H01L24/16 , H01L24/29 , H01L24/32 , H01L24/73 , H01L24/81 , H01L25/0657 , H01L2224/0401 , H01L2224/05124 , H01L2224/05147 , H01L2224/05572 , H01L2224/05582 , H01L2224/05583 , H01L2224/05611 , H01L2224/05618 , H01L2224/05639 , H01L2224/05644 , H01L2224/05647 , H01L2224/05655 , H01L2224/05664 , H01L2224/05666 , H01L2224/05669 , H01L2224/05676 , H01L2224/05681 , H01L2224/1134 , H01L2224/1146 , H01L2224/11466 , H01L2224/11823 , H01L2224/11825 , H01L2224/1184 , H01L2224/13005 , H01L2224/13019 , H01L2224/13147 , H01L2224/13562 , H01L2224/13582 , H01L2224/13611 , H01L2224/13618 , H01L2224/13639 , H01L2224/13644 , H01L2224/13647 , H01L2224/13655 , H01L2224/13664 , H01L2224/13669 , H01L2224/13673 , H01L2224/13676 , H01L2224/29011 , H01L2224/29035 , H01L2224/2919 , H01L2224/73103 , H01L2224/73203 , H01L2224/81193 , H01L2224/81205 , H01L2224/8183 , H01L2224/81895 , H01L2224/83191 , H01L2224/83193 , H01L2224/94 , H01L2924/00014 , H01L2924/1305 , H01L2924/1306 , H01L2924/13091 , H01L2924/014 , H01L2924/01029 , H01L2924/206 , H01L2224/81 , H01L2924/0665 , H01L2924/00012 , H01L2924/00 , H01L2224/05552
摘要: 一种三维(3D)芯片堆叠件,包括与第二芯片接合的第一芯片。第一芯片包括位于第一衬底上面的第一凸块结构,而第二芯片包括位于第二衬底上面的第二凸块结构。第一凸块结构与第二凸块结构连接,而接合区域在第一凸块结构和第二凸块结构之间形成。该接合区域是包括贵金属的无焊料区域。本发明提供三维芯片堆叠件的形成方法。
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公开(公告)号:CN106158781A
公开(公告)日:2016-11-23
申请号:CN201610769934.0
申请日:2010-11-10
申请人: 台湾积体电路制造股份有限公司
IPC分类号: H01L23/31 , H01L25/065 , H01L23/488 , H01L21/48 , H01L21/60
CPC分类号: H01L24/16 , H01L23/3157 , H01L24/03 , H01L24/05 , H01L24/11 , H01L24/13 , H01L24/81 , H01L25/0657 , H01L25/50 , H01L2224/03614 , H01L2224/0401 , H01L2224/05017 , H01L2224/05023 , H01L2224/05124 , H01L2224/05139 , H01L2224/05147 , H01L2224/05155 , H01L2224/05568 , H01L2224/05572 , H01L2224/05647 , H01L2224/05666 , H01L2224/1146 , H01L2224/11823 , H01L2224/11831 , H01L2224/1191 , H01L2224/13005 , H01L2224/13018 , H01L2224/13019 , H01L2224/13076 , H01L2224/1308 , H01L2224/13083 , H01L2224/13111 , H01L2224/13124 , H01L2224/13139 , H01L2224/13144 , H01L2224/13147 , H01L2224/13155 , H01L2224/13164 , H01L2224/13565 , H01L2224/1357 , H01L2224/1369 , H01L2224/16145 , H01L2224/16148 , H01L2224/16238 , H01L2224/81193 , H01L2224/81345 , H01L2224/81801 , H01L2224/81815 , H01L2225/06513 , H01L2225/06541 , H01L2924/00014 , H01L2924/0002 , H01L2924/01028 , H01L2924/01029 , H01L2924/01046 , H01L2924/01079 , H01L2924/01322 , H01L2924/05042 , H01L2924/10253 , H01L2924/14 , H01L2924/35 , Y10T428/12361 , Y10T428/12396 , H01L2924/00 , H01L2924/00012 , H01L2924/01047 , H01L2924/206 , H01L2224/05552
摘要: 本发明提供一种微凸块接合装置,包括一工件,其包括一金属凸块;以及一介电层,其具有位于上述金属凸块正上方的一部分。上述金属凸块和上述介电层的上述部分的一表面形成一介面。一金属表面处理物形成于上述金属凸块的上方且接触上述金属凸块。上述金属表面处理物从上述介电层的上方延伸上述介面的下方。通过本发明实施例的接合结构,可强化现有技术的弱点,且可改善接合结构的可靠度。
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公开(公告)号:CN105632953A
公开(公告)日:2016-06-01
申请号:CN201610083738.8
申请日:2010-08-24
申请人: 台湾积体电路制造股份有限公司
IPC分类号: H01L21/60 , H01L23/488
CPC分类号: H01L24/11 , H01L24/03 , H01L24/05 , H01L24/13 , H01L2224/03424 , H01L2224/03464 , H01L2224/0347 , H01L2224/0401 , H01L2224/05559 , H01L2224/05571 , H01L2224/05572 , H01L2224/1145 , H01L2224/11452 , H01L2224/11462 , H01L2224/1148 , H01L2224/1161 , H01L2224/11616 , H01L2224/11831 , H01L2224/13005 , H01L2224/13022 , H01L2224/1308 , H01L2224/131 , H01L2224/13109 , H01L2224/13111 , H01L2224/13124 , H01L2224/13139 , H01L2224/13144 , H01L2224/13147 , H01L2224/13155 , H01L2224/13164 , H01L2224/13169 , H01L2924/00013 , H01L2924/0002 , H01L2924/01012 , H01L2924/01013 , H01L2924/01019 , H01L2924/01022 , H01L2924/01023 , H01L2924/01024 , H01L2924/01025 , H01L2924/01029 , H01L2924/0103 , H01L2924/01032 , H01L2924/01033 , H01L2924/01038 , H01L2924/0104 , H01L2924/01046 , H01L2924/01047 , H01L2924/01049 , H01L2924/01073 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/014 , H01L2924/04941 , H01L2924/1305 , H01L2924/1306 , H01L2924/13091 , H01L2924/14 , H01L2924/19041 , H01L2924/00014 , H01L2924/01014 , H01L2924/206 , H01L2224/13099 , H01L2224/05099 , H01L2224/13599 , H01L2224/05599 , H01L2224/29099 , H01L2224/29599 , H01L2924/00 , H01L2224/05552
摘要: 本发明揭示一种半导体装置及其制造方法。该制造方法包括:提供具有一金属垫区的一半导体基底;在该半导体基底上形成一封盖(encapsulating)层,其中该封盖层具有一开口露出该金属垫区的一部分;在该封盖层的该开口内露出的该金属垫区的该部分上形成一凸块下金属层(under-bump metallurgy,UBM);在该凸块下金属层上形成一凸块(bump)层,以填入该封盖层的该开口且延伸至该封盖层的一上表面;自该封盖层的该上表面去除该凸块层;去除该封盖层的该上表面,直至该凸块层的一顶部突出于该封盖层;以及进行一缓冲工艺,以轻微研磨该半导体基底,使该封盖层的厚度达到最终目标厚度。本发明可避免UBM底切问题。
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公开(公告)号:CN104701288A
公开(公告)日:2015-06-10
申请号:CN201410734193.3
申请日:2014-12-04
申请人: 台湾积体电路制造股份有限公司
IPC分类号: H01L23/488 , H01L21/60
CPC分类号: H01L24/17 , H01L21/56 , H01L23/3114 , H01L23/3142 , H01L23/3171 , H01L24/11 , H01L24/81 , H01L2224/03462 , H01L2224/05008 , H01L2224/05155 , H01L2224/05166 , H01L2224/05568 , H01L2224/05569 , H01L2224/05573 , H01L2224/05655 , H01L2224/05664 , H01L2224/05666 , H01L2224/05681 , H01L2224/11334 , H01L2224/1181 , H01L2224/11849 , H01L2224/1191 , H01L2224/13005 , H01L2224/13111 , H01L2224/16057 , H01L2224/16227 , H01L2224/16238 , H01L2224/73204 , H01L2224/81191 , H01L2224/81815 , H01L2224/83104 , H01L2224/83365 , H01L2224/92125 , H01L2224/94 , H01L2924/181 , H01L2924/1811 , H01L2924/2064 , H01L2924/381 , H01L2924/00 , H01L2924/00014 , H01L2924/207 , H01L2224/11 , H01L2224/81 , H01L2924/01047 , H01L2924/01029
摘要: 本发明提供了一种使用改进的焊料接合结构的半导体器件封装件及其形成方法。该封装件包括具有比顶部更薄的底部的焊料接合件。底部由模塑料围绕而顶部未由模塑料围绕。该方法包括使用离型膜在中间焊料接合件周围沉积并且形成液态模塑料,和然后蚀刻模塑料以降低高度。生成的焊料接合件在模塑料和焊料接合件的界面不具有腰部。与形成时的模塑料相比,模塑料在蚀刻之后具有大于约3微米的较大的粗糙度。本发明涉及用于晶圆级封装件中的球栅阵列的焊料接合结构。
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公开(公告)号:CN104425295A
公开(公告)日:2015-03-18
申请号:CN201410016445.9
申请日:2014-01-14
申请人: 株式会社东芝
CPC分类号: H01L21/76877 , H01L21/6835 , H01L21/76898 , H01L23/481 , H01L23/5226 , H01L23/5283 , H01L24/03 , H01L24/05 , H01L24/06 , H01L24/11 , H01L24/13 , H01L24/16 , H01L24/81 , H01L24/92 , H01L24/94 , H01L25/0657 , H01L25/50 , H01L2221/6834 , H01L2224/03002 , H01L2224/03009 , H01L2224/0345 , H01L2224/0346 , H01L2224/03912 , H01L2224/0401 , H01L2224/05009 , H01L2224/05018 , H01L2224/05155 , H01L2224/05187 , H01L2224/05557 , H01L2224/05567 , H01L2224/05568 , H01L2224/0557 , H01L2224/05624 , H01L2224/05644 , H01L2224/05647 , H01L2224/06181 , H01L2224/11002 , H01L2224/13005 , H01L2224/13023 , H01L2224/13025 , H01L2224/131 , H01L2224/16148 , H01L2224/81815 , H01L2224/92 , H01L2224/94 , H01L2225/06513 , H01L2225/06517 , H01L2225/06541 , H01L2225/06544 , H01L2924/00014 , H01L2924/014 , H01L2924/04941 , H01L2924/05 , H01L2924/01028 , H01L2924/00012 , H01L2224/03 , H01L2224/11 , H01L2221/68304 , H01L2224/0352 , H01L2221/68381 , H01L21/78 , H01L2224/81
摘要: 提供一种半导体器件和半导体器件的制造方法,能够降低TSV与集成电路的接触电阻。本发明的一个实施方式的半导体器件具备集成电路和导电性构件。集成电路设置在半导体基板的一方的面侧。导电性构件在厚度方向上贯通半导体基板而与集成电路连接,被埋入于与集成电路接触的接触部的与半导体基板的厚度方向垂直的方向的尺寸比贯通半导体基板的贯通部的与半导体基板的厚度方向垂直的方向的尺寸大的通孔。
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公开(公告)号:CN104099653A
公开(公告)日:2014-10-15
申请号:CN201310680470.2
申请日:2013-12-11
申请人: 南茂科技股份有限公司
CPC分类号: H01L21/4853 , H01L24/03 , H01L24/05 , H01L24/11 , H01L24/13 , H01L24/16 , H01L24/29 , H01L24/32 , H01L24/742 , H01L24/81 , H01L2224/0345 , H01L2224/03452 , H01L2224/03462 , H01L2224/03464 , H01L2224/0361 , H01L2224/039 , H01L2224/03912 , H01L2224/0401 , H01L2224/05005 , H01L2224/05027 , H01L2224/05139 , H01L2224/05144 , H01L2224/05155 , H01L2224/05164 , H01L2224/05166 , H01L2224/05541 , H01L2224/05576 , H01L2224/05578 , H01L2224/05639 , H01L2224/05644 , H01L2224/05647 , H01L2224/11462 , H01L2224/11464 , H01L2224/1147 , H01L2224/11825 , H01L2224/11848 , H01L2224/119 , H01L2224/11901 , H01L2224/11906 , H01L2224/13005 , H01L2224/13082 , H01L2224/13111 , H01L2224/13139 , H01L2224/13144 , H01L2224/13147 , H01L2224/13562 , H01L2224/13564 , H01L2224/1357 , H01L2224/13644 , H01L2224/13647 , H01L2224/16225 , H01L2224/16227 , H01L2224/16238 , H01L2224/2919 , H01L2224/32225 , H01L2224/73204 , H01L2224/81191 , H01L2224/814 , H01L2224/8159 , H01L2224/8169 , H01L2224/81744 , H01L2224/81801 , H01L2224/81815 , H01L2224/8185 , H01L2224/81862 , H01L2224/83104 , H01L2924/01322 , H01L2924/15788 , H01L2924/351 , H01L2924/00014 , H01L2924/01074 , H01L2924/01079 , H01L2924/01046 , H01L2924/01082 , H01L2924/00012 , H01L2224/1182 , H01L2924/0665 , H01L2924/206 , H01L2924/014 , H01L2924/00 , H01L2224/1146
摘要: 本发明提供一种用于制造一半导体结构的方法。该方法包括:在一半导体晶粒上形成一导电衬垫;在该导电衬垫上方形成一晶种层;在该晶种层上方界定一第一遮罩层;及在该第一遮罩层中形成一银合金凸块本体。该在该第一遮罩层中形成一银合金凸块本体包括以下操作:制备一第一基于氰化物的电镀浴;将该第一基于氰化物的电镀浴的一pH值控制在6至8的一范围内;将该半导体晶粒浸没至该第一基于氰化物的电镀浴中;及将0.1ASD至0.5ASD的一电镀电流密度施加至该半导体晶粒。
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公开(公告)号:CN103426849A
公开(公告)日:2013-12-04
申请号:CN201310003803.8
申请日:2013-01-06
申请人: 台湾积体电路制造股份有限公司
IPC分类号: H01L23/488 , H01L21/60
CPC分类号: H01L23/48 , H01L23/3185 , H01L23/3192 , H01L23/488 , H01L23/52 , H01L24/05 , H01L24/13 , H01L24/16 , H01L24/29 , H01L24/32 , H01L24/73 , H01L24/81 , H01L25/0657 , H01L2224/0401 , H01L2224/05124 , H01L2224/05147 , H01L2224/05572 , H01L2224/05582 , H01L2224/05583 , H01L2224/05611 , H01L2224/05618 , H01L2224/05639 , H01L2224/05644 , H01L2224/05647 , H01L2224/05655 , H01L2224/05664 , H01L2224/05666 , H01L2224/05669 , H01L2224/05676 , H01L2224/05681 , H01L2224/1134 , H01L2224/1146 , H01L2224/11466 , H01L2224/11823 , H01L2224/11825 , H01L2224/1184 , H01L2224/13005 , H01L2224/13019 , H01L2224/13147 , H01L2224/13562 , H01L2224/13582 , H01L2224/13611 , H01L2224/13618 , H01L2224/13639 , H01L2224/13644 , H01L2224/13647 , H01L2224/13655 , H01L2224/13664 , H01L2224/13669 , H01L2224/13673 , H01L2224/13676 , H01L2224/29011 , H01L2224/29035 , H01L2224/2919 , H01L2224/73103 , H01L2224/73203 , H01L2224/81193 , H01L2224/81205 , H01L2224/8183 , H01L2224/81895 , H01L2224/83191 , H01L2224/83193 , H01L2224/94 , H01L2924/00014 , H01L2924/1305 , H01L2924/1306 , H01L2924/13091 , H01L2924/014 , H01L2924/01029 , H01L2924/206 , H01L2224/81 , H01L2924/0665 , H01L2924/00012 , H01L2924/00 , H01L2224/05552
摘要: 一种三维(3D)芯片堆叠件,包括与第二芯片接合的第一芯片。第一芯片包括位于第一衬底上面的第一凸块结构,而第二芯片包括位于第二衬底上面的第二凸块结构。第一凸块结构与第二凸块结构连接,而接合区域在第一凸块结构和第二凸块结构之间形成。该接合区域是包括贵金属的无焊料区域。本发明提供三维芯片堆叠件的形成方法。
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