摘要:
In some embodiments, to increase the height-to-pitch ratio of a solder connection that connects different structures with one or more solder balls, only a portion (510) of a solder ball's (140) surface is melted when the connection is formed on one structure (110) and/or when the connection is being attached to another structure (HOB). The structure (110) may be an integrated circuit, an interposer, a rigid or flexible wiring substrate, a printed circuit board, some other packaging substrate, or an integrated circuit package. In some embodiments, solder balls (140.1, 140.2) are joined by an intermediate solder ball (140i), upon melting of the latter only. Any of the solder balls (140, 140i) may have a non-solder central core (140C) coated by solder shell (140S). Some of the molten or softened solder may be squeezed out, to form a "squeeze-out" region (520, 520A, 520B, 520.1, 520.2). In some embodiments, a solder connection (210) such as discussed above, on a structure (110A), may be surrounded by a dielectric layer (1210), and may be recessed in a hole (1230) in that layer (1210), to help in aligning a post (1240) of a structure (HOB) with the connection (210) during attachment of the structures (110A, HOB). The dielectric layer (1210) may be formed by moulding. The dielectric layer may comprise a number of layers (1210.1, 1210.2), "shaved" (partially removed) to expose the solder connection (210). Alternatively, the recessed solder connections (210) may be formed using a sublimating or vapourisable material (1250), placed on top of the solder (210) before formation of the dielectric layer (1210) or coating solder balls (140); in the latter case, the solder (140C) sinks within the dielectric material (1210) upon removal of the material (1250) and subsequent reflow. The solder connections (210.1, 210.2) may be used for bonding one or more structures (HOB, HOC) (e.g. an integrated circuit die or wafer, a packaging substrate or a package) to a structure (110A) (a wiring substrate) on which a die (HOB) is flip-chip connected. The solder connections (210.1, 210.2) may differ from each other, in particular in height.
摘要:
A microelectronic assembly (10, 110, 210, 310, 410) includes a first substrate (12, 112, 212, 312, 412, 512, 612, 712, 812, 912) having a first conductive element (26, 126, 226, 326, 426, 526, 626, 726, 826, 926, 1022) and a second substrate (14, 114, 214, 314, 414) having a second conductive element (26, 126, 226, 326, 426). The assembly further includes an electrically conductive alloy mass (16, 116) joined to the first and second conductive elements (26, 126, 226, 326, 426, 526, 626, 726, 826, 926, 1022), including a first, a second and a third material. First and second materials of the alloy mass (16, 116) each have a melting point lower than a melting point of the alloy. A concentration of the first material varies in concentration from a relatively higher amount at a location disposed toward the first conductive element (26, 126, 226, 326, 426, 526, 626, 726, 826, 926, 1022) to a relatively lower amount toward the second conductive element (26, 126, 226, 326, 426), and a concentration of the second material varies in concentration from a relatively higher amount at a location disposed toward the second conductive element (26, 126, 226, 326, 426) to a relatively lower amount toward the first conductive element (26, 126, 226, 326, 426, 526, 626, 726, 826, 926, 1022). The microelectronic assembly (10, 110, 210, 310, 410) is formed by aligning the first substrate (12, 112, 212, 312, 412, 512, 612, 712, 812, 912), having a first bond component (30, 230, 330, 430), with the second substrate (14, 114, 214, 314, 414), having a second bond component (40, 240, 340, 440), such that the first (30, 230, 330, 430, 1030) and second (40, 240, 340, 440) bond components are in contact with each other, the first bond component (30, 230, 330, 430, 1030) including a first material layer (36, 536, 636, 736, 836, 936) adjacent the first conductive element (26, 126, 226, 326, 426, 526, 626, 726, 826, 926, 1022) and a first protective layer (38, 538, 638, 738, 838, 938) overlying the first material layer (36, 536, 636, 736, 836, 936), the second bond component (40, 240, 340, 440) including a second material layer (46) adjacent the second conductive element (26) and a second protective layer (48) overlying the second material layer (46), and heating the first (30, 230, 330, 430, 1030) and second (40, 240, 340, 440) bond components such that at least portions of the first (36, 536, 636, 736, 836, 936) and second (46) material layers diffuse together to form the alloy mass (16, 116) joining the first (12, 112, 212, 312, 412, 512, 612, 712, 812, 912) and second (14, 114, 214, 314, 414) substrates with one another. There may be formed a plurality of first conductive elements (26, 126, 226, 326, 426, 526, 626, 726, 826, 926, 1022) on the first substrate (12, 112, 212, 312, 412, 512, 612, 712, 812, 912) and a plurality of second conductive elements (26, 126, 226, 326, 426) on the second substrate (14, 114, 214, 314, 414), joined by a plurality of conductive alloy masses (16, 116). The conductive alloy mass (116) may also surround and hermetically seal an internal volume.
摘要:
A male connection component (120) for connection with a correspondingly confϊgured female connection component (140) having a recess (144) extending into a main surface (170) of a female Substrate (142) of the female connection component (140), wherein the female connection component (140) comprises a plurality of electrically conductive female contacts (146) which are electrically decoupled from one another and are arranged at different height levels with regard to the main surface (170) of the female Substrate (142), the male connection component (120) comprising a male Substrate (102), a Protrusion (104) protruding from a main surface (160) of the male Substrate (102) and comprising a plurality of electrically conductive male contacts (106) which are electrically decoupled from one another and are arranged at different height levels with regard to the main surface (160) of the male Substrate (102), wherein the male connection component (120) is adapted for connection with the female connection component (140) so that upon connection, each of the plurality of electrically conductive male contacts (106) is brought in contact with one of the plurality of electrically conductive female contacts (146) for providing electric contactation at different height levels, wherein the male Substrate (102) forms at least part of one of a chip, a chip package and a circuit board.
摘要:
Un premier substrat (2) muni d'une zone d'accueil (1 ) en premier matériau métallique est fourni. Un second substrat (4) muni d'une zone d'insertion (3) comportant une surface de base (6) et au moins deux plots (7) en un second matériau métallique est disposé en face du premier substrat (2). Les plots (7) font saillie depuis la surface de base (6). Une pression est appliquée entre le premier substrat (2) et le second substrat (4) de manière à faire pénétrer les plots (7) à l'intérieur de la zone d'accueil (1 ). Le premier matériau métallique (5) réagit avec le second matériau métallique de manière à former une couche continue d'un composé intermétallique (5) à base des premier et second matériaux métalliques le long de l'interface entre les plots (7) et la zone d'accueil (1).
摘要:
A male connection component (120) for connection with a correspondingly conf?gured female connection component (140) having a recess (144) extending into a main surface (170) of a female Substrate (142) of the female connection component (140), wherein the female connection component (140) comprises a plurality of electrically conductive female contacts (146) which are electrically decoupled from one another and are arranged at different height levels with regard to the main surface (170) of the female Substrate (142), the male connection component (120) comprising a male Substrate (102), a Protrusion (104) protruding from a main surface (160) of the male Substrate (102) and comprising a plurality of electrically conductive male contacts (106) which are electrically decoupled from one another and are arranged at different height levels with regard to the main surface (160) of the male Substrate (102), wherein the male connection component (120) is adapted for connection with the female connection component (140) so that upon connection, each of the plurality of electrically conductive male contacts (106) is brought in contact with one of the plurality of electrically conductive female contacts (146) for providing electric contactation at different height levels, wherein the male Substrate (102) forms at least part of one of a chip, a chip package and a circuit board.
摘要:
A carbon nanotube (CNT) array is patterned on a substrate. The substrate can be a microelectronic die, an interposer-type structure for a flip-chip, a mounting substrate, or a board. The CNT array is patterned by using a patterned metallic seed layer on the substrate to form the CNT array by chemical vapor deposition. The patterned CNT array can also be patterned by using a patterned mask on the substrate to form the CNT array by growing. A computing system that uses the CNT array for heat transfer from the die is also used.
摘要:
In some embodiments, to increase the height-to-pitch ratio of a solder connection that connects different structures with one or more solder balls, only a portion of a solder ball's surface is melted when the connection is formed on one structure and/or when the connection is being attached to another structure. In some embodiments, non-solder balls are joined by an intermediate solder ball (140i). A solder connection may be surrounded by a solder locking layer (1210) and may be recessed in a hole (1230) in that layer. Other features are also provided.