Abstract:
A semiconductor wafer contains a plurality of first semiconductor die. The semiconductor wafer is mounted to a carrier. A channel is formed through the semiconductor wafer to separate the first semiconductor die. A second semiconductor die is mounted to the first semiconductor die. An encapsulant is deposited over the carrier and first semiconductor die and into the channel while a side portion and surface portion of the second semiconductor die remain exposed from the encapsulant. A first conductive via is formed through the encapsulant in the channel. A second conductive via is formed through the encapsulant over a contact pad of the first semiconductor die. A conductive layer is formed over the encapsulant between the first and second conductive vias. An insulating layer is formed over the conductive layer and encapsulant. The carrier is removed. An interconnect structure is formed over the first conductive via.
Abstract:
A wiring board of the present invention (1) is arranged so that: pads (30) arranged in a plurality of rows include: first-row pads (30a) connected to first metal wires (10a) among metal wires (10); and second-row pads (30b) connected to second metal wires (10b) among the metal wires (10), the first metal wires (10a) being longer than the second metal wires (10b); each of the first metal wires (10a) is formed so as to be separated from a corresponding one of the second-row pads (30b) by at least an insulating layer, and so as to have a widthwise center in a lower region below the corresponding second-row pad (30b); and each of the first metal wires (10a) has widthwise edges provided, in a plan view, beyond widthwise edges of a corresponding one of the second-row pads (30b) in a region in which the first metal wire (10a) overlaps with the corresponding second-row pad (30b).
Abstract:
A semiconductor device has a base substrate with first and second etch-resistant conductive layers formed over opposing surfaces of the base substrate. First cavities are etched in the base substrate through an opening in the first conductive layer. The first cavities have a width greater than a width of the opening in the first conductive layer. Second cavities are etched in the base substrate between portions of the first or second conductive layer. A semiconductor die is mounted over the base substrate with bumps disposed over the first conductive layer. The bumps are reflowed to electrically connect to the first conductive layer and cause bump material to flow into the first cavities. An encapsulant is deposited over the die and base substrate. A portion of the base substrate is removed down to the second cavities to form electrically isolated base leads between the first and second conductive layers.
Abstract:
The sensor assembly comprises a substrate (1), such as a flexible printed circuit board, and a sensor chip (2) flip-chip mounted to the substrate (1), with a first side (3) of the sensor chip (2) facing the substrate (1). A sensing area (4) and contact pads (5) are integrated on the first side (3) of the sensor chip (2) and located in a chamber (17) between the substrate (1) and the sensor chip (2). Chamber (17) is bordered along at least two sides by a dam (16). Underfill (18) and/or solder flux is arranged between the sensor chip (2) and the substrate (1), and the dam (16) prevents the underfill from entering the chamber (17). An opening (19) extends from the chamber to the environment and is located between the substrate (1) and the sensor chip (2) or extends through the sensor chip (2).
Abstract:
Semiconductor dies are mounted on a heat sink array frame structure. The heat sink array frame structure and the semiconductor dies are assembled together with an insulating substrate that has a corresponding array of apertures on an adhesive tape. The semiconductor dies are connected electrically with electrical contacts on the insulating substrate. The semiconductor dies, heat sinks and electrical connections to the contacts are encapsulated with a mold compound and then the encapsulated array is de-taped and singulated.
Abstract:
Contactless differential coupling structures can be used to communicate signals between circuits located on separate chips or from one chip to a probing device. The contactless coupling structures avoid problems (breaks, erosion, corrosion) that can degrade the performance of ohmic-type contact pads. The contactless coupling structures comprise pairs of conductive pads placed in close proximity. Differential signals are applied across a first pair of differential pads, and the signals are coupled wirelessly to a mating pair of conductive pads. Circuitry for generating and receiving differential signals is described.
Abstract:
To provide an anisotropic conductive film, which contains: an electric conductive layer containing Ni particles, metal-coated resin particles, a binder, a polymerizable monomer, and a curing agent; and an insulating layer containing a binder, a monofunctional polymerizable monomer, and a curing agent, wherein the metal-coated resin particles are resin particles each containing a resin core coated at least with Ni.
Abstract:
A semiconductor device includes a semiconductor chip, an electrode pad formed on the semiconductor chip, an underlying barrier metal formed on the electrode pad, a solder bump formed on the underlying barrier metal, and an underfill material surrounding the underlying barrier metal and the solder bump. A junction interface of the solder bump with the underlying barrier metal corresponds to an upper surface of the underlying barrier metal, and a portion of the underfill material bonded to a side surface of the solder bump and an end surface of the underlying barrier metal forms a right angle or an obtuse angle.
Abstract:
A semiconductor device package comprises a lead frame having a die paddle comprising a first chip installation area and a second chip installation area, a recess area formed in the first chip installation area, and multiple metal pillars formed in the recess area, a notch divides the first chip installation area into a transverse base extending transversely and a longitudinal base extending longitudinally, and separates the recess area into a transverse recess part formed in the transverse base and a longitudinal recess part formed in longitudinal base; a portion of a transverse extending part connecting to an external pin extends into a portion inside of the notch.
Abstract:
A method includes forming a buffer lower metal line over a semiconductor substrate for absorbing an external impact, forming a pre-metal-dielectric layer which covers the buffer lower metal line, the pre-metal-dielectric layer having a via hole formed therein to expose a portion of the buffer lower metal line, forming a seed layer over a surface of the pre-metal-dielectric layer having the via hole formed therein, forming polyimide which exposes the via hole and the seed layer formed over the pre-metal-dielectric layer in the vicinity of the via hole, growing an upper metal line over the exposed seed layer, subjecting the semiconductor substrate having the upper metal line formed thereon to a thermal process, removing the polyimide by dry etching, and bonding a bonding portion onto the upper metal line.