Abstract:
Described is a method of forming a solder alloy deposit on a substrate comprising the following steps i) provide a substrate including a surface bearing electrical circuitry that includes at least one inner layer contact pad, ii) form a solder mask layer that is placed on the substrate surface and patterned to expose the at least one contact area, iii) contact the entire substrate area including the solder mask layer and the at least one contact area with a solution suitable to provide a metal seed layer on the substrate surface, iv) form a structured resist layer on the metal seed layer, v) electroplate a first solder material layer containing tin onto the conductive layer, vi) electroplate a second solder material layer onto the first solder material layer, vii) remove the structured resist layer and etch away an amount of the metal seed layer sufficient to remove the metal seed layer from the solder mask layer area and reflow the substrate and in doing so form a solder alloy deposit from the metal seed layer, the first solder material layer and the second solder material layer.
Abstract:
Electromigration in microbump connections causes voids in the microbumps, which reduces the lifetime of an integrated circuit containing the microbump. Electromigration lifetime may be increased in microbumps by forming a copper shell around the solder. The copper shell of one microbump contacts the copper shell of a second microbump to enclose the solder of the microbump connection. The copper shell allows higher current densities through the microbump. Thus, smaller microbumps may be manufactured on a smaller pitch without suffering failure from electromigration. Additionally, the copper shell reduces shorting or bridging between microbump connections on a substrate.
Abstract:
Interconnect structures for stacked dies, including penetrating structures for through-silicon vias, and associated systems and methods are disclosed. A system in accordance with a particular embodiment includes a first semiconductor substrate having a first substrate material, and a penetrating structure carried by the first semiconductor substrate. The system further includes a second semiconductor substrate having a second substrate material with a preformed recess. The penetrating structure of the first semiconductor substrate is received in the recess of the second semiconductor substrate and is mechanically engaged with the recess and secured to the second semiconductor substrate.
Abstract:
In some embodiments, to increase the height-to-pitch ratio of a solder connection that connects different structures with one or more solder balls, only a portion of a solder ball's surface is melted when the connection is formed on one structure and/or when the connection is being attached to another structure. In some embodiments, non-solder balls are joined by an intermediate solder ball (140i). A solder connection may be surrounded by a solder locking layer (1210) and may be recessed in a hole (1230) in that layer. Other features are also provided.
Abstract:
Pillars having a directed compliance geometry are arranged to couple a semiconductor die to a substrate. The direction of maximum compliance of each pillar may be aligned with the direction of maximum stress caused by unequal thermal expansion and contraction of the semiconductor die and substrate. Pillars may be designed and constructed with various shapes having particular compliance characteristics and particular directions of maximum compliance. The shape and orientation of the pillars may be selected as a function of their location on a die to accommodate the direction and magnitude of stress at their location. A method includes fabricating pillars with particular shapes by patterning to increase surface of materials upon which the pillar is plated or deposited.
Abstract:
A device comprises a surface mount component on a substrate, in which the surface mount component is attached by a set of discrete mechanical coupling parts and by a bonding layer. This enables the mechanical coupling properties and the electrical/thermal properties to be optimized separately.
Abstract:
Pillars (300, 306, 502) having a directed compliance geometry are arranged to couple a semiconductor die (400, 500) to a substrate. The direction of maximum compliance of each pillar (300, 306, 502) may be aligned with the direction of maximum stress caused by unequal thermal expansion and contraction of the semiconductor die (400, 500) and the substrate. Pillars (300, 306, 502) may be designed and constructed with various shapes having particular compliance characteristics and particular directions (302, 304, 308, 310, 504) of maximum compliance. The shape and orientation of the pillars (300, 306, 502) may be selected as a function of their location on a die (400, 500) to accommodate the direction and magnitude of stress at their location. Pillars (610) may also be fabricated with particular shapes by patterning a material (604) such as a passivation material on a pad on a die (600) to increase the surface area upon which the pillar (610) is plated or deposited.
Abstract:
Electromigration in microbump connections causes voids in the microbumps, which reduces the lifetime of an integrated circuit containing the microbump. Electromigration lifetime may be increased in microbumps by forming a copper or nickel shell around the solder. The copper shell (220, 408) of one microbump contacts the copper shell (234) of a second microbump to enclose the solder (222) of the microbump connection. The copper shell (220 & 234) allows higher current densities through the microbump. Thus, smaller microbumps may be manufactured on a smaller pitch without suffering failure from electromigration. Additionally, the copper shell reduces shorting or bridging between microbump connections on a substrate (202, 230). Increased connection densities between two dies (202,230)or between a die and a packaging substrate are therefore possible.