-
公开(公告)号:CN107342272A
公开(公告)日:2017-11-10
申请号:CN201710242963.6
申请日:2017-04-14
Applicant: 台湾积体电路制造股份有限公司
IPC: H01L23/48 , H01L23/488
CPC classification number: H01L22/32 , G01R1/073 , G01R31/00 , G01R31/02 , G01R31/28 , H01L21/4853 , H01L21/4857 , H01L21/486 , H01L21/565 , H01L21/78 , H01L22/14 , H01L22/20 , H01L23/3114 , H01L23/3128 , H01L23/49811 , H01L23/49816 , H01L23/5383 , H01L23/5384 , H01L23/5385 , H01L23/5386 , H01L23/5389 , H01L24/02 , H01L24/03 , H01L24/05 , H01L24/13 , H01L24/19 , H01L24/20 , H01L24/96 , H01L25/0657 , H01L25/105 , H01L25/50 , H01L2224/02373 , H01L2224/02377 , H01L2224/03831 , H01L2224/03845 , H01L2224/0392 , H01L2224/0401 , H01L2224/04105 , H01L2224/05008 , H01L2224/05024 , H01L2224/05569 , H01L2224/12105 , H01L2224/13026 , H01L2224/19 , H01L2224/20 , H01L2224/32145 , H01L2224/32225 , H01L2224/48091 , H01L2224/48227 , H01L2224/73265 , H01L2224/73267 , H01L2224/96 , H01L2225/0651 , H01L2225/06568 , H01L2225/1035 , H01L2225/1058 , H01L2924/15311 , H01L2224/11 , H01L2224/03 , H01L2924/00012 , H01L2924/00014 , H01L2924/00 , H01L23/488 , H01L23/48
Abstract: 提供半导体装置结构及其制造方法,半导体装置结构包含基底及导电焊垫形成于基底之上。半导体装置结构包含保护层形成于导电焊垫之上,且保护层具有沟槽。半导体装置结构包含导电结构形成于沟槽内且形成于保护层上。导电结构电性连接于导电焊垫,且导电结构具有内凹顶面,内凹顶面的最低点高于保护层的顶面。
-
公开(公告)号:CN105280602A
公开(公告)日:2016-01-27
申请号:CN201510364702.2
申请日:2015-06-26
Applicant: 瑞萨电子株式会社
IPC: H01L23/498
CPC classification number: H01L23/49568 , H01L22/32 , H01L23/3128 , H01L23/4951 , H01L23/4952 , H01L23/49558 , H01L23/49811 , H01L23/544 , H01L24/05 , H01L24/06 , H01L24/13 , H01L24/14 , H01L24/16 , H01L24/45 , H01L24/81 , H01L24/97 , H01L25/0657 , H01L2223/5442 , H01L2223/54426 , H01L2224/0345 , H01L2224/0361 , H01L2224/03912 , H01L2224/0392 , H01L2224/0401 , H01L2224/05022 , H01L2224/05166 , H01L2224/05572 , H01L2224/05583 , H01L2224/05624 , H01L2224/05666 , H01L2224/06153 , H01L2224/06155 , H01L2224/11462 , H01L2224/1147 , H01L2224/11849 , H01L2224/13022 , H01L2224/13027 , H01L2224/1308 , H01L2224/13083 , H01L2224/131 , H01L2224/13147 , H01L2224/13155 , H01L2224/16105 , H01L2224/16225 , H01L2224/16238 , H01L2224/32145 , H01L2224/32225 , H01L2224/45144 , H01L2224/48091 , H01L2224/48227 , H01L2224/73204 , H01L2224/73265 , H01L2224/8113 , H01L2224/81191 , H01L2224/97 , H01L2225/0651 , H01L2225/06517 , H01L2225/06565 , H01L2924/00011 , H01L2924/15311 , H01L2924/15313 , H01L2924/181 , H01L2224/81 , H01L2224/83 , H01L2224/32245 , H01L2924/00012 , H01L2924/00 , H01L2924/00014 , H01L2924/014 , H01L2924/01074 , H01L2924/013 , H01L2924/01014 , H01L2924/01029 , H01L2924/01033 , H01L2224/45147
Abstract: 本发明提高半导体装置的可靠性。在由保护绝缘膜(PIF)覆盖的焊盘(PD)的探针区域(PBR)形成有探针痕迹(PM)。并且,柱状电极(PE)具有:形成在开口区域(OP2)上的第1部分;和从开口区域(OP2)上向探针区域(PBR)上延伸的第2部分。此时,开口区域(OP2)的中心位置相对于与接合指形部相对的柱状电极(PE)的中心位置偏离。
-
公开(公告)号:CN104600043A
公开(公告)日:2015-05-06
申请号:CN201410592542.2
申请日:2014-10-29
Applicant: 瑞萨电子株式会社
IPC: H01L23/488 , H01L21/60
CPC classification number: H01L22/32 , H01L23/3107 , H01L23/562 , H01L23/585 , H01L24/03 , H01L24/05 , H01L24/06 , H01L24/09 , H01L24/32 , H01L24/45 , H01L24/48 , H01L24/49 , H01L24/73 , H01L2224/02166 , H01L2224/0345 , H01L2224/0361 , H01L2224/03622 , H01L2224/03831 , H01L2224/0392 , H01L2224/04042 , H01L2224/05552 , H01L2224/05553 , H01L2224/05554 , H01L2224/05556 , H01L2224/05557 , H01L2224/05624 , H01L2224/0603 , H01L2224/06179 , H01L2224/09051 , H01L2224/32014 , H01L2224/32245 , H01L2224/45015 , H01L2224/45144 , H01L2224/45147 , H01L2224/48091 , H01L2224/48227 , H01L2224/48247 , H01L2224/48463 , H01L2224/48465 , H01L2224/48624 , H01L2224/48824 , H01L2224/49052 , H01L2224/49113 , H01L2224/49431 , H01L2224/73265 , H01L2924/01013 , H01L2924/01028 , H01L2924/01029 , H01L2924/01079 , H01L2924/10162 , H01L2924/10253 , H01L2924/10271 , H01L2924/12042 , H01L2924/13091 , H01L2924/14 , H01L2924/181 , H01L2924/3512 , H01L2924/381 , H01L2924/00014 , H01L2924/00012 , H01L2924/00 , H01L2924/20753
Abstract: 本发明涉及半导体器件和用于制造半导体器件的方法。提供一种具有提高的可靠性的半导体器件。半导体芯片(半导体器件)包括多个电极焊盘,在平面视图中,该多个电极焊盘布置在沿半导体芯片的周界的边(芯片边)延伸的多行中。在这些电极焊盘中,布置在沿芯片边的第一行中的相应电极焊盘的面积小于布置在位置比该第一行离芯片边更远的行中的相应电极焊盘的面积。
-
公开(公告)号:CN101866866B
公开(公告)日:2015-04-22
申请号:CN201010162093.X
申请日:2010-04-15
Applicant: 瑞萨电子株式会社
IPC: H01L21/60 , H01L23/485
CPC classification number: H01L23/50 , H01L22/32 , H01L23/3192 , H01L23/4827 , H01L24/03 , H01L24/06 , H01L24/45 , H01L24/48 , H01L24/73 , H01L2224/02166 , H01L2224/0392 , H01L2224/0401 , H01L2224/04042 , H01L2224/05552 , H01L2224/05553 , H01L2224/05567 , H01L2224/05571 , H01L2224/05624 , H01L2224/32225 , H01L2224/45144 , H01L2224/48091 , H01L2224/48227 , H01L2224/48228 , H01L2224/48624 , H01L2224/73265 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01007 , H01L2924/01013 , H01L2924/01014 , H01L2924/01015 , H01L2924/01018 , H01L2924/01019 , H01L2924/01022 , H01L2924/01025 , H01L2924/01027 , H01L2924/01029 , H01L2924/01033 , H01L2924/01045 , H01L2924/01047 , H01L2924/01051 , H01L2924/01074 , H01L2924/01079 , H01L2924/01082 , H01L2924/014 , H01L2924/04941 , H01L2924/05042 , H01L2924/10253 , H01L2924/1306 , H01L2924/13091 , H01L2924/14 , H01L2924/15311 , H01L2924/15788 , H01L2924/181 , H01L2924/19041 , H01L2924/19043 , H01L2924/00014 , H01L2924/00 , H01L2924/00012
Abstract: 在当前LSI或者半导体集成电路器件制造工艺中,在组装器件的步骤(比如树脂密封步骤)之后通常为在高温度(比如近似范围从85℃至130℃)和高湿度(比如约为80%RH)的环境中的电压施加测试(高温度和高湿度测试)。对于该测试,本发明的发明人在高温度和高湿度测试期间发现作为抗反射膜的氮化钛膜从上方膜出现分离以及在施加有正电压的基于铝的键合焊盘的上表面的边缘部分在氮化钛膜中生成裂缝这一现象,该现象归因于由潮气经过密封树脂等侵入生成氮化钛膜的氧化和膨胀引起的电化学反应。本申请的一项发明在于在基于铝的键合焊盘的外围区域以环或者缝形状去除焊盘之上的氮化钛膜。
-
公开(公告)号:CN102738104A
公开(公告)日:2012-10-17
申请号:CN201210090658.7
申请日:2012-03-30
Applicant: NXP股份有限公司
IPC: H01L23/488 , H01L21/60
CPC classification number: H01L21/76877 , H01L21/76805 , H01L24/05 , H01L2224/02166 , H01L2224/0392 , H01L2224/0401 , H01L2224/04042 , H01L2224/05025 , H01L2224/05086 , H01L2224/05088 , H01L2224/05093 , H01L2224/05096 , H01L2224/05098 , H01L2224/05556 , H01L2224/45124 , H01L2924/00013 , H01L2924/00014 , H01L2924/01029 , H01L2924/01074 , H01L2924/01022 , H01L2924/01007 , H01L2924/01073 , H01L2224/13099 , H01L2224/13599 , H01L2224/05599 , H01L2224/05099 , H01L2224/29099 , H01L2224/29599 , H01L2924/00 , H01L2224/48
Abstract: 一种以鲁棒的电路连接器来配置的电路器件。结合各个示例实施例,一种集成电路器件包括在键合焊盘接触部下方的一个或多个通道网络层,所述一个或多个通道网络层将键合焊盘接触部与一个或多个下部金属层相连。每个通道网络层包括多个通道条带,所述多个通道条带基本上平行于键合焊盘接触部沿不同方向延伸,以结构支撑键合焊盘接触部。
-
公开(公告)号:CN101047156B
公开(公告)日:2011-11-02
申请号:CN200610141451.2
申请日:2006-09-29
Applicant: 富士通半导体股份有限公司
IPC: H01L23/482 , H01L21/60 , H01L21/28
CPC classification number: H01L24/12 , H01L21/563 , H01L23/3128 , H01L23/564 , H01L24/03 , H01L24/05 , H01L24/11 , H01L24/16 , H01L24/45 , H01L24/48 , H01L27/11502 , H01L28/57 , H01L2224/0392 , H01L2224/0401 , H01L2224/04042 , H01L2224/04073 , H01L2224/05017 , H01L2224/05018 , H01L2224/05073 , H01L2224/05093 , H01L2224/05124 , H01L2224/05155 , H01L2224/05157 , H01L2224/05166 , H01L2224/05557 , H01L2224/05558 , H01L2224/0558 , H01L2224/05644 , H01L2224/05647 , H01L2224/05655 , H01L2224/05664 , H01L2224/1134 , H01L2224/13109 , H01L2224/13111 , H01L2224/13116 , H01L2224/13124 , H01L2224/13144 , H01L2224/13147 , H01L2224/13155 , H01L2224/13164 , H01L2224/16 , H01L2224/45144 , H01L2224/45147 , H01L2224/45164 , H01L2224/4807 , H01L2224/48095 , H01L2224/48227 , H01L2224/48453 , H01L2224/48463 , H01L2224/48477 , H01L2224/48644 , H01L2224/48647 , H01L2224/48655 , H01L2224/48664 , H01L2224/48844 , H01L2224/48847 , H01L2224/48855 , H01L2224/48864 , H01L2224/85051 , H01L2924/00013 , H01L2924/01006 , H01L2924/01013 , H01L2924/01014 , H01L2924/01015 , H01L2924/01022 , H01L2924/01024 , H01L2924/01028 , H01L2924/01029 , H01L2924/0103 , H01L2924/01033 , H01L2924/01042 , H01L2924/01046 , H01L2924/01049 , H01L2924/0105 , H01L2924/01077 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/014 , H01L2924/05042 , H01L2924/15183 , H01L2924/15192 , H01L2924/15311 , H01L2924/1532 , H01L2924/181 , H01L2924/19041 , H01L2924/19043 , H01L2924/00014 , H01L2224/13099 , H01L2924/00 , H01L2924/00012
Abstract: 一种提高FeRAM抗湿性的半导体器件及其制造方法。在使用焊盘进行探针测试之后,形成金属膜以覆盖保护膜开口中的焊盘以及从该焊盘到该保护膜的开口外围的区域。在该金属膜上形成金属凸点。该金属膜形成为具有第一和第二金属膜的双层结构。主要考虑与该保护膜的粘着性和与该金属凸点的粘着性,分别选择下层和上层的材料。设置金属膜的膜形成条件以提供具有预期质量和厚度的金属膜。因此,能够阻止湿气从焊盘或外围侵入到铁电电容器中,从而有效地抑制由于侵入的湿气导致的电位反转异常的发生。
-
公开(公告)号:CN101399256A
公开(公告)日:2009-04-01
申请号:CN200810148832.2
申请日:2008-09-27
Applicant: 新光电气工业株式会社
Inventor: 山野孝治
IPC: H01L25/00 , H01L23/485 , H01L21/66 , H01L21/50
CPC classification number: H01L25/105 , H01L23/3128 , H01L23/585 , H01L24/05 , H01L24/48 , H01L24/49 , H01L24/83 , H01L24/85 , H01L25/50 , H01L2224/02333 , H01L2224/0392 , H01L2224/0401 , H01L2224/04042 , H01L2224/05599 , H01L2224/06135 , H01L2224/32145 , H01L2224/32225 , H01L2224/48091 , H01L2224/48145 , H01L2224/48227 , H01L2224/4911 , H01L2224/73265 , H01L2224/83191 , H01L2224/85399 , H01L2225/06562 , H01L2225/1052 , H01L2924/00014 , H01L2924/01004 , H01L2924/01005 , H01L2924/01006 , H01L2924/01013 , H01L2924/01014 , H01L2924/01028 , H01L2924/01029 , H01L2924/01033 , H01L2924/01047 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2924/01087 , H01L2924/014 , H01L2924/10253 , H01L2924/14 , H01L2924/15311 , H01L2924/181 , H01L2924/3511 , H01L2224/45099 , H01L2924/00 , H01L2924/00012
Abstract: 本发明公开了一种电子器件以及这种电子器件的制造方法。本发明提供了多个半导体器件,所述多个半导体器件在电气检验和功能检验中被判定为良品,并且具有:内部连接端子,其布置在半导体芯片的电极焊盘上;树脂层,其布置在半导体芯片的形成有电极焊盘的表面上并使内部连接端子露出;以及配线图案,布置在树脂层上并与内部连接端子连接。本发明还提供了配线基板,其上堆叠有多个半导体器件,所述配线基板与多个半导体器件电连接。本发明还提供了密封树脂,其用于密封多个半导体器件。
-
公开(公告)号:CN100442492C
公开(公告)日:2008-12-10
申请号:CN200510108282.8
申请日:2005-10-10
Applicant: 国际商业机器公司
IPC: H01L23/48
CPC classification number: H01L23/544 , H01L22/24 , H01L22/32 , H01L22/34 , H01L24/03 , H01L24/05 , H01L24/11 , H01L24/48 , H01L2223/5448 , H01L2224/02166 , H01L2224/0392 , H01L2224/0401 , H01L2224/04042 , H01L2224/05181 , H01L2224/05624 , H01L2224/05666 , H01L2224/05681 , H01L2224/13099 , H01L2224/48463 , H01L2224/85399 , H01L2924/00014 , H01L2924/01013 , H01L2924/01022 , H01L2924/01033 , H01L2924/01073 , H01L2924/01082 , H01L2924/014 , H01L2924/14 , Y10T29/49155 , Y10T29/49165 , Y10T29/49204 , Y10T29/49227 , H01L2224/45099
Abstract: 一种在绝缘体层下具有布线层的集成电路。焊盘包括在所述绝缘体层上的导体材料。所述焊盘具有引线焊接连接区和探针焊盘区。检查标记在所述引线焊接连接区与所述探针焊盘区之间。所述检查标记包括在所述绝缘体层中用所述导体材料填充的开口。另外,通过所述绝缘体层的接触适于将在所述布线层中的所述导体布线电连接到所述焊盘。所述接触由与用于所述焊盘和所述检查标记相同的导体材料形成。
-
公开(公告)号:CN100428456C
公开(公告)日:2008-10-22
申请号:CN200510118100.5
申请日:2005-10-25
Applicant: 三洋电机株式会社 , 关东三洋半导体股份有限公司
IPC: H01L23/485 , H01L21/28
CPC classification number: H01L21/76898 , H01L21/6835 , H01L23/3114 , H01L23/481 , H01L24/10 , H01L24/13 , H01L2224/02371 , H01L2224/02372 , H01L2224/0392 , H01L2224/0401 , H01L2224/05124 , H01L2224/05166 , H01L2224/05181 , H01L2224/05548 , H01L2224/05624 , H01L2224/05647 , H01L2224/13 , H01L2224/13022 , H01L2224/13024 , H01L2224/13099 , H01L2224/16 , H01L2924/01006 , H01L2924/01013 , H01L2924/01015 , H01L2924/01022 , H01L2924/01029 , H01L2924/01033 , H01L2924/01073 , H01L2924/01074 , H01L2924/01078 , H01L2924/01082 , H01L2924/014 , H01L2924/04941 , H01L2924/04953 , H01L2924/351 , H01L2924/00 , H01L2924/00014 , H01L2924/013
Abstract: 一种具有贯通电极的半导体装置及其制造方法,谋求半导体装置的可靠性及成品率的提高。介由第一绝缘膜(11)形成在半导体衬底(10)上的焊盘电极(12)上形成高熔点金属层(13)。其次,在含焊盘电极(12)及高熔点金属层(13)上的半导体衬底(10)的表面上形成钝化层14,进而介由树脂层(15)形成支承体(16)。其次,蚀刻半导体衬底(10),形成从半导体衬底(10)的背面到达焊盘电极(12)的通孔(17)。其次,介由第二绝缘膜(18)形成与在通孔17底部露出的焊盘电极(12)电连接的贯通电极(20)及配线层(21)。进而形成抗焊剂层(22)、导电端子(23)。最后,通过进行切割,将半导体衬底(10)切断分离成半导体芯片(10A)。
-
公开(公告)号:CN100426497C
公开(公告)日:2008-10-15
申请号:CN200610006463.4
申请日:2006-02-08
Applicant: 恩益禧电子股份有限公司
Inventor: 田边昭人
IPC: H01L23/482 , H01L23/544 , H01L21/28 , H01L21/60
CPC classification number: H01L24/03 , H01L22/32 , H01L23/544 , H01L24/06 , H01L24/49 , H01L2223/54453 , H01L2224/02166 , H01L2224/0392 , H01L2224/04042 , H01L2224/05553 , H01L2224/05554 , H01L2224/0603 , H01L2224/4943 , H01L2924/00014 , H01L2924/01004 , H01L2924/01006 , H01L2924/01013 , H01L2924/01014 , H01L2924/01015 , H01L2924/01029 , H01L2924/01033 , H01L2924/01078 , H01L2924/01079 , H01L2924/01082 , H01L2224/45099 , H01L2224/45015 , H01L2924/207
Abstract: 本发明的目的是实现在给定区域内可靠地进行测试探针的接触和焊接方法。半导体装置(100)具有:探针标记(111)形成区域;焊盘(110),具有焊接区域(113);及与焊盘(110)分离的检查标记(120)。在该构造中,能够根据检查标记(120)的平面形状来识别探针标记(111)形成区域和焊接区域(113)。
-
-
-
-
-
-
-
-
-